NL161619C - Werkwijze voor het vervaardigen van een half- geleiderinrichting. - Google Patents
Werkwijze voor het vervaardigen van een half- geleiderinrichting.Info
- Publication number
- NL161619C NL161619C NL7310947.A NL7310947A NL161619C NL 161619 C NL161619 C NL 161619C NL 7310947 A NL7310947 A NL 7310947A NL 161619 C NL161619 C NL 161619C
- Authority
- NL
- Netherlands
- Prior art keywords
- manufacturing
- semiconductor device
- semiconductor
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3157—Partial encapsulation or coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68318—Auxiliary support including means facilitating the separation of a device or wafer from the auxiliary support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10S156/918—Delaminating processes adapted for specified product, e.g. delaminating medical specimen slide
- Y10S156/93—Semiconductive product delaminating, e.g. delaminating emiconductive wafer from underlayer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/11—Methods of delaminating, per se; i.e., separating at bonding face
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Thyristors (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Dicing (AREA)
- Die Bonding (AREA)
- Weting (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7911772A JPS5218069B2 (de) | 1972-08-09 | 1972-08-09 |
Publications (3)
Publication Number | Publication Date |
---|---|
NL7310947A NL7310947A (de) | 1974-02-12 |
NL161619B NL161619B (nl) | 1979-09-17 |
NL161619C true NL161619C (nl) | 1980-02-15 |
Family
ID=13680958
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL7310947.A NL161619C (nl) | 1972-08-09 | 1973-08-08 | Werkwijze voor het vervaardigen van een half- geleiderinrichting. |
Country Status (5)
Country | Link |
---|---|
US (1) | US3913217A (de) |
JP (1) | JPS5218069B2 (de) |
DE (1) | DE2340142C3 (de) |
GB (1) | GB1400313A (de) |
NL (1) | NL161619C (de) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3969813A (en) * | 1975-08-15 | 1976-07-20 | Bell Telephone Laboratories, Incorporated | Method and apparatus for removal of semiconductor chips from hybrid circuits |
FR2469000A1 (fr) * | 1979-10-30 | 1981-05-08 | Silicium Semiconducteur Ssc | Structure de thyristor tres haute tension glassive et son procede de fabrication |
US4571093A (en) * | 1983-11-04 | 1986-02-18 | Burroughs Corporation | Method of testing plastic-packaged semiconductor devices |
GB2174539B (en) * | 1985-04-30 | 1988-12-29 | Marconi Electronic Devices | Semiconductor devices |
DE3524301A1 (de) * | 1985-07-06 | 1987-01-15 | Semikron Gleichrichterbau | Verfahren zum herstellen von halbleiterelementen |
US4904610A (en) * | 1988-01-27 | 1990-02-27 | General Instrument Corporation | Wafer level process for fabricating passivated semiconductor devices |
US5000811A (en) * | 1989-11-22 | 1991-03-19 | Xerox Corporation | Precision buttable subunits via dicing |
US5213590A (en) * | 1989-12-20 | 1993-05-25 | Neff Charles E | Article and a method for producing an article having a high friction surface |
US5236871A (en) * | 1992-04-29 | 1993-08-17 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Method for producing a hybridization of detector array and integrated circuit for readout |
US6465743B1 (en) * | 1994-12-05 | 2002-10-15 | Motorola, Inc. | Multi-strand substrate for ball-grid array assemblies and method |
US5776798A (en) * | 1996-09-04 | 1998-07-07 | Motorola, Inc. | Semiconductor package and method thereof |
JP2005517753A (ja) * | 2002-02-13 | 2005-06-16 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | ポリマー箔の製造方法 |
US8092734B2 (en) * | 2004-05-13 | 2012-01-10 | Aptina Imaging Corporation | Covers for microelectronic imagers and methods for wafer-level packaging of microelectronics imagers |
US7968379B2 (en) * | 2006-03-09 | 2011-06-28 | SemiLEDs Optoelectronics Co., Ltd. | Method of separating semiconductor dies |
US7452739B2 (en) * | 2006-03-09 | 2008-11-18 | Semi-Photonics Co., Ltd. | Method of separating semiconductor dies |
CN111999632B (zh) * | 2019-05-27 | 2023-02-03 | 合肥晶合集成电路股份有限公司 | Pn结样品的获取方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3416224A (en) * | 1966-03-08 | 1968-12-17 | Ibm | Integrated semiconductor devices and fabrication methods therefor |
US3432919A (en) * | 1966-10-31 | 1969-03-18 | Raytheon Co | Method of making semiconductor diodes |
US3508980A (en) * | 1967-07-26 | 1970-04-28 | Motorola Inc | Method of fabricating an integrated circuit structure with dielectric isolation |
US3681139A (en) * | 1969-10-16 | 1972-08-01 | Western Electric Co | Method for handling and maintaining the orientation of a matrix of miniature electrical devices |
US3608186A (en) * | 1969-10-30 | 1971-09-28 | Jearld L Hutson | Semiconductor device manufacture with junction passivation |
US3771219A (en) * | 1970-02-05 | 1973-11-13 | Sharp Kk | Method for manufacturing semiconductor device |
US3768150A (en) * | 1970-02-13 | 1973-10-30 | B Sloan | Integrated circuit process utilizing orientation dependent silicon etch |
US3720997A (en) * | 1971-01-11 | 1973-03-20 | Motorola Inc | Eutectic plating and breaking silicon wafers |
-
1972
- 1972-08-09 JP JP7911772A patent/JPS5218069B2/ja not_active Expired
-
1973
- 1973-07-26 US US382691A patent/US3913217A/en not_active Expired - Lifetime
- 1973-08-01 GB GB3660473A patent/GB1400313A/en not_active Expired
- 1973-08-08 NL NL7310947.A patent/NL161619C/xx not_active IP Right Cessation
- 1973-08-08 DE DE2340142A patent/DE2340142C3/de not_active Expired
Also Published As
Publication number | Publication date |
---|---|
NL161619B (nl) | 1979-09-17 |
NL7310947A (de) | 1974-02-12 |
GB1400313A (en) | 1975-07-16 |
US3913217A (en) | 1975-10-21 |
DE2340142C3 (de) | 1978-03-16 |
JPS5218069B2 (de) | 1977-05-19 |
DE2340142B2 (de) | 1977-07-28 |
JPS4937577A (de) | 1974-04-08 |
DE2340142A1 (de) | 1974-03-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
V1 | Lapsed because of non-payment of the annual fee | ||
NL80 | Abbreviated name of patent owner mentioned of already nullified patent |
Owner name: HITACHI |