KR960002692U - Low pressure chemical vapor deposition equipment - Google Patents

Low pressure chemical vapor deposition equipment

Info

Publication number
KR960002692U
KR960002692U KR2019940013732U KR19940013732U KR960002692U KR 960002692 U KR960002692 U KR 960002692U KR 2019940013732 U KR2019940013732 U KR 2019940013732U KR 19940013732 U KR19940013732 U KR 19940013732U KR 960002692 U KR960002692 U KR 960002692U
Authority
KR
South Korea
Prior art keywords
vapor deposition
low pressure
chemical vapor
pressure chemical
deposition equipment
Prior art date
Application number
KR2019940013732U
Other languages
Korean (ko)
Other versions
KR0116697Y1 (en
Inventor
황철주
Original Assignee
황철주
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 황철주 filed Critical 황철주
Priority to KR2019940013732U priority Critical patent/KR0116697Y1/en
Priority to JP6163179A priority patent/JP2805589B2/en
Priority to TW083105792A priority patent/TW276350B/zh
Publication of KR960002692U publication Critical patent/KR960002692U/en
Application granted granted Critical
Publication of KR0116697Y1 publication Critical patent/KR0116697Y1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45559—Diffusion of reactive gas to substrate

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
KR2019940013732U 1993-06-22 1994-06-14 Low pressure cvd apparatus KR0116697Y1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR2019940013732U KR0116697Y1 (en) 1994-06-14 1994-06-14 Low pressure cvd apparatus
JP6163179A JP2805589B2 (en) 1994-01-27 1994-06-22 Low pressure chemical vapor deposition equipment
TW083105792A TW276350B (en) 1993-06-22 1994-06-25

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940013732U KR0116697Y1 (en) 1994-06-14 1994-06-14 Low pressure cvd apparatus

Publications (2)

Publication Number Publication Date
KR960002692U true KR960002692U (en) 1996-01-22
KR0116697Y1 KR0116697Y1 (en) 1998-04-22

Family

ID=19385504

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940013732U KR0116697Y1 (en) 1993-06-22 1994-06-14 Low pressure cvd apparatus

Country Status (1)

Country Link
KR (1) KR0116697Y1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100568536B1 (en) * 2000-01-19 2006-04-07 삼성전자주식회사 Vertical diffusion furnace for manufacturing a semiconductor element

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100568536B1 (en) * 2000-01-19 2006-04-07 삼성전자주식회사 Vertical diffusion furnace for manufacturing a semiconductor element

Also Published As

Publication number Publication date
KR0116697Y1 (en) 1998-04-22

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Legal Events

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Payment date: 20090102

Year of fee payment: 12

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