KR940023545U - Low Pressure Chemical Vapor Deposition Equipment - Google Patents

Low Pressure Chemical Vapor Deposition Equipment

Info

Publication number
KR940023545U
KR940023545U KR2019930004679U KR930004679U KR940023545U KR 940023545 U KR940023545 U KR 940023545U KR 2019930004679 U KR2019930004679 U KR 2019930004679U KR 930004679 U KR930004679 U KR 930004679U KR 940023545 U KR940023545 U KR 940023545U
Authority
KR
South Korea
Prior art keywords
vapor deposition
low pressure
chemical vapor
pressure chemical
deposition equipment
Prior art date
Application number
KR2019930004679U
Other languages
Korean (ko)
Other versions
KR960002545Y1 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to KR2019930004679U priority Critical patent/KR960002545Y1/en
Publication of KR940023545U publication Critical patent/KR940023545U/en
Application granted granted Critical
Publication of KR960002545Y1 publication Critical patent/KR960002545Y1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45587—Mechanical means for changing the gas flow
    • C23C16/45591—Fixed means, e.g. wings, baffles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/4558—Perforated rings

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
KR2019930004679U 1993-03-27 1993-03-27 Low pressure chemical vapor deposition apparatus KR960002545Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019930004679U KR960002545Y1 (en) 1993-03-27 1993-03-27 Low pressure chemical vapor deposition apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019930004679U KR960002545Y1 (en) 1993-03-27 1993-03-27 Low pressure chemical vapor deposition apparatus

Publications (2)

Publication Number Publication Date
KR940023545U true KR940023545U (en) 1994-10-22
KR960002545Y1 KR960002545Y1 (en) 1996-03-27

Family

ID=19352750

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019930004679U KR960002545Y1 (en) 1993-03-27 1993-03-27 Low pressure chemical vapor deposition apparatus

Country Status (1)

Country Link
KR (1) KR960002545Y1 (en)

Also Published As

Publication number Publication date
KR960002545Y1 (en) 1996-03-27

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Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20070221

Year of fee payment: 12

EXPY Expiration of term