KR890005267B1 - 진공화학반응장치 - Google Patents

진공화학반응장치 Download PDF

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Publication number
KR890005267B1
KR890005267B1 KR1019860006093A KR860006093A KR890005267B1 KR 890005267 B1 KR890005267 B1 KR 890005267B1 KR 1019860006093 A KR1019860006093 A KR 1019860006093A KR 860006093 A KR860006093 A KR 860006093A KR 890005267 B1 KR890005267 B1 KR 890005267B1
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KR
South Korea
Prior art keywords
chemical reaction
vacuum
carrier
reaction apparatus
vacuum chemical
Prior art date
Application number
KR1019860006093A
Other languages
English (en)
Korean (ko)
Other versions
KR870000960A (ko
Inventor
다쯔오 아사마끼
Original Assignee
니찌덴 아넬바 가부시끼가이샤
야스다 스스무
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 니찌덴 아넬바 가부시끼가이샤, 야스다 스스무 filed Critical 니찌덴 아넬바 가부시끼가이샤
Publication of KR870000960A publication Critical patent/KR870000960A/ko
Application granted granted Critical
Publication of KR890005267B1 publication Critical patent/KR890005267B1/ko

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J12/00—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Vapour Deposition (AREA)
KR1019860006093A 1985-07-25 1986-07-25 진공화학반응장치 KR890005267B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP60164670A JPS6223983A (ja) 1985-07-25 1985-07-25 真空化学反応装置
JP164670 1985-07-25
JP60-164670 1985-07-25

Publications (2)

Publication Number Publication Date
KR870000960A KR870000960A (ko) 1987-03-10
KR890005267B1 true KR890005267B1 (ko) 1989-12-20

Family

ID=15797595

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019860006093A KR890005267B1 (ko) 1985-07-25 1986-07-25 진공화학반응장치

Country Status (3)

Country Link
JP (1) JPS6223983A (ja)
KR (1) KR890005267B1 (ja)
CN (1) CN86105600A (ja)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10140761B4 (de) * 2001-08-20 2004-08-26 Infineon Technologies Ag Wafer-Handhabungsvorrichtung
JP2007284766A (ja) * 2006-04-19 2007-11-01 Shimadzu Corp 縦型プラズマｃｖｄ装置
CN102242352A (zh) * 2010-05-14 2011-11-16 佛山市奇明光电有限公司 有机金属化学气相沉积机台
CN104178750A (zh) * 2013-05-21 2014-12-03 常州碳维纳米科技有限公司 一种悬挂式加热***
JP7160421B1 (ja) * 2022-02-10 2022-10-25 株式会社シー・ヴィ・リサーチ 成膜装置、成膜方法及びガスノズル

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5117376B2 (ja) * 1971-11-10 1976-06-02
FR2227640B1 (ja) * 1973-04-27 1977-12-30 Radiotechnique Compelec
JPS5091255A (ja) * 1973-12-12 1975-07-21

Also Published As

Publication number Publication date
CN86105600A (zh) 1987-02-04
KR870000960A (ko) 1987-03-10
JPS6223983A (ja) 1987-01-31

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