CN86105600A - 真空化学反应设备 - Google Patents

真空化学反应设备 Download PDF

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Publication number
CN86105600A
CN86105600A CN198686105600A CN86105600A CN86105600A CN 86105600 A CN86105600 A CN 86105600A CN 198686105600 A CN198686105600 A CN 198686105600A CN 86105600 A CN86105600 A CN 86105600A CN 86105600 A CN86105600 A CN 86105600A
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CN
China
Prior art keywords
chemical reaction
reaction apparatus
hanging plate
vacuum
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN198686105600A
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English (en)
Chinese (zh)
Inventor
麻莳立男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Original Assignee
Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Anelva Corp filed Critical Anelva Corp
Publication of CN86105600A publication Critical patent/CN86105600A/zh
Pending legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J12/00—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Vapour Deposition (AREA)
CN198686105600A 1985-07-25 1986-07-25 真空化学反应设备 Pending CN86105600A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP60164670A JPS6223983A (ja) 1985-07-25 1985-07-25 真空化学反応装置
JP164670/85 1985-07-25

Publications (1)

Publication Number Publication Date
CN86105600A true CN86105600A (zh) 1987-02-04

Family

ID=15797595

Family Applications (1)

Application Number Title Priority Date Filing Date
CN198686105600A Pending CN86105600A (zh) 1985-07-25 1986-07-25 真空化学反应设备

Country Status (3)

Country Link
JP (1) JPS6223983A (ja)
KR (1) KR890005267B1 (ja)
CN (1) CN86105600A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102242352A (zh) * 2010-05-14 2011-11-16 佛山市奇明光电有限公司 有机金属化学气相沉积机台
CN104178750A (zh) * 2013-05-21 2014-12-03 常州碳维纳米科技有限公司 一种悬挂式加热***

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10140761B4 (de) * 2001-08-20 2004-08-26 Infineon Technologies Ag Wafer-Handhabungsvorrichtung
JP2007284766A (ja) * 2006-04-19 2007-11-01 Shimadzu Corp 縦型プラズマｃｖｄ装置
JP7160421B1 (ja) * 2022-02-10 2022-10-25 株式会社シー・ヴィ・リサーチ 成膜装置、成膜方法及びガスノズル

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5117376B2 (ja) * 1971-11-10 1976-06-02
FR2227640B1 (ja) * 1973-04-27 1977-12-30 Radiotechnique Compelec
JPS5091255A (ja) * 1973-12-12 1975-07-21

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102242352A (zh) * 2010-05-14 2011-11-16 佛山市奇明光电有限公司 有机金属化学气相沉积机台
CN104178750A (zh) * 2013-05-21 2014-12-03 常州碳维纳米科技有限公司 一种悬挂式加热***

Also Published As

Publication number Publication date
KR890005267B1 (ko) 1989-12-20
KR870000960A (ko) 1987-03-10
JPS6223983A (ja) 1987-01-31

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