KR20190125192A - 펠리클 프레임 및 그 제조 방법 - Google Patents

펠리클 프레임 및 그 제조 방법 Download PDF

Info

Publication number: KR20190125192A
Authority: KR; South Korea
Prior art keywords: pellicle frame; base; fixing; frame; pellicle
Prior art date: 2018-04-27

Application number

KR1020190047247A

Other languages

English (en)

Korean (ko)

Inventor

유키히로 기무라

Original Assignee

니뽄 도쿠슈 도교 가부시키가이샤

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2018-04-27

Filing date

2019-04-23

Publication date

2019-11-06

2019-04-23 Application filed by 니뽄 도쿠슈 도교 가부시키가이샤 filed Critical 니뽄 도쿠슈 도교 가부시키가이샤

2019-11-06 Publication of KR20190125192A publication Critical patent/KR20190125192A/ko

Links

238000000034 method Methods 0.000 title claims abstract description 101
238000004519 manufacturing process Methods 0.000 title claims abstract description 30
238000012545 processing Methods 0.000 claims abstract description 118
230000008569 process Effects 0.000 claims description 77
239000000463 material Substances 0.000 claims description 41
239000000919 ceramic Substances 0.000 claims description 21
238000000926 separation method Methods 0.000 claims description 7
239000007788 liquid Substances 0.000 claims description 6
239000007787 solid Substances 0.000 claims description 3
239000000843 powder Substances 0.000 description 13
PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 12
238000000227 grinding Methods 0.000 description 11
230000000052 comparative effect Effects 0.000 description 9
238000003754 machining Methods 0.000 description 9
239000002245 particle Substances 0.000 description 9
238000005488 sandblasting Methods 0.000 description 8
MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 7
238000009423 ventilation Methods 0.000 description 7
MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 6
239000002131 composite material Substances 0.000 description 5
238000001816 cooling Methods 0.000 description 5
239000010408 film Substances 0.000 description 5
238000005452 bending Methods 0.000 description 4
238000009760 electrical discharge machining Methods 0.000 description 4
238000000465 moulding Methods 0.000 description 4
230000002093 peripheral effect Effects 0.000 description 4
HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 4
229910010271 silicon carbide Inorganic materials 0.000 description 4
238000004381 surface treatment Methods 0.000 description 4
229910000838 Al alloy Inorganic materials 0.000 description 3
229910052581 Si3N4 Inorganic materials 0.000 description 3
NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 3
239000000853 adhesive Substances 0.000 description 3
230000007547 defect Effects 0.000 description 3
230000000694 effects Effects 0.000 description 3
230000005489 elastic deformation Effects 0.000 description 3
229910052751 metal Inorganic materials 0.000 description 3
239000002184 metal Substances 0.000 description 3
239000002994 raw material Substances 0.000 description 3
239000004065 semiconductor Substances 0.000 description 3
HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 3
241001422033 Thestylus Species 0.000 description 2
239000006061 abrasive grain Substances 0.000 description 2
229910002065 alloy metal Inorganic materials 0.000 description 2
239000011195 cermet Substances 0.000 description 2
PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 2
238000010586 diagram Methods 0.000 description 2
239000000428 dust Substances 0.000 description 2
238000002474 experimental method Methods 0.000 description 2
238000011049 filling Methods 0.000 description 2
238000010304 firing Methods 0.000 description 2
230000006870 function Effects 0.000 description 2
238000010438 heat treatment Methods 0.000 description 2
238000005498 polishing Methods 0.000 description 2
238000004080 punching Methods 0.000 description 2
238000005245 sintering Methods 0.000 description 2
238000012360 testing method Methods 0.000 description 2
230000001070 adhesive effect Effects 0.000 description 1
239000002671 adjuvant Substances 0.000 description 1
230000004075 alteration Effects 0.000 description 1
239000011230 binding agent Substances 0.000 description 1
229910010293 ceramic material Inorganic materials 0.000 description 1
238000004140 cleaning Methods 0.000 description 1
238000012937 correction Methods 0.000 description 1
229910003460 diamond Inorganic materials 0.000 description 1
239000010432 diamond Substances 0.000 description 1
238000002296 dynamic light scattering Methods 0.000 description 1
239000008187 granular material Substances 0.000 description 1
230000006872 improvement Effects 0.000 description 1
239000011261 inert gas Substances 0.000 description 1
238000002955 isolation Methods 0.000 description 1
239000000203 mixture Substances 0.000 description 1
238000013001 point bending Methods 0.000 description 1
238000007517 polishing process Methods 0.000 description 1
238000000790 scattering method Methods 0.000 description 1
238000004062 sedimentation Methods 0.000 description 1
239000002904 solvent Substances 0.000 description 1
238000001694 spray drying Methods 0.000 description 1
239000000126 substance Substances 0.000 description 1
239000010409 thin film Substances 0.000 description 1
230000009466 transformation Effects 0.000 description 1
238000005406 washing Methods 0.000 description 1

Images

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
- G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Health & Medical Sciences (AREA)
Engineering & Computer Science (AREA)
Environmental & Geological Engineering (AREA)
Epidemiology (AREA)
Public Health (AREA)
Preparing Plates And Mask In Photomechanical Process (AREA)
Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
Grinding Of Cylindrical And Plane Surfaces (AREA)

KR1020190047247A 2018-04-27 2019-04-23 펠리클 프레임 및 그 제조 방법 KR20190125192A (ko)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
JPJP-P-2018-086876		2018-04-27
JP2018086876A JP7096063B2 (ja)	2018-04-27	2018-04-27	ペリクル枠の製造方法

Publications (1)

Publication Number	Publication Date
KR20190125192A true KR20190125192A (ko)	2019-11-06

Family

ID=68390157

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
KR1020190047247A KR20190125192A (ko)	2018-04-27	2019-04-23	펠리클 프레임 및 그 제조 방법

Country Status (2)

Country	Link
JP (1)	JP7096063B2 (ja)
KR (1)	KR20190125192A (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
WO2023181869A1 (ja) *	2022-03-22	2023-09-28	三井化学株式会社	ペリクル枠、ペリクル、露光原版、露光装置、及びペリクルの製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP2011007933A (ja)	2009-06-24	2011-01-13	Shin-Etsu Chemical Co Ltd	ペリクルフレーム及びリソグラフィ用ペリクル

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JP3072962B2 (ja) *	1995-11-30	2000-08-07	ロデール・ニッタ株式会社	研磨のための被加工物の保持具及びその製法
JP2001312047A (ja)	2000-04-28	2001-11-09	Asahi Glass Co Ltd	ペリクルおよびその製造方法
JP4186400B2 (ja)	2000-09-20	2008-11-26	日本軽金属株式会社	ショットブラスト加工方法およびその装置
JP2003186180A (ja)	2001-12-14	2003-07-03	Asahi Glass Co Ltd	ペリクルフレームの製造方法およびペリクル
JP2003307832A (ja)	2002-04-16	2003-10-31	Asahi Glass Co Ltd	ペリクル及びペリクル装着フォトマスク
JP4995103B2 (ja)	2008-01-15	2012-08-08	新日本製鐵株式会社	研磨用定盤
JP6326737B2 (ja)	2013-08-26	2018-05-23	学校法人立命館	研磨工具
JP6526588B2 (ja)	2016-03-10	2019-06-05	日本特殊陶業株式会社	ペリクル枠およびペリクル枠の製造方法

2018
- 2018-04-27 JP JP2018086876A patent/JP7096063B2/ja active Active
2019
- 2019-04-23 KR KR1020190047247A patent/KR20190125192A/ko not_active Application Discontinuation

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP2011007933A (ja)	2009-06-24	2011-01-13	Shin-Etsu Chemical Co Ltd	ペリクルフレーム及びリソグラフィ用ペリクル

Also Published As

Publication number	Publication date
JP2019191488A (ja)	2019-10-31
JP7096063B2 (ja)	2022-07-05

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Date	Code	Title
2021-10-27	A201	Request for examination
2023-12-08	E902	Notification of reason for refusal
2024-02-26	E601	Decision to refuse application

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