KR20180087124A - 현상액 관리 장치 - Google Patents

현상액 관리 장치 Download PDF

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Publication number
KR20180087124A
KR20180087124A KR1020170161409A KR20170161409A KR20180087124A KR 20180087124 A KR20180087124 A KR 20180087124A KR 1020170161409 A KR1020170161409 A KR 1020170161409A KR 20170161409 A KR20170161409 A KR 20170161409A KR 20180087124 A KR20180087124 A KR 20180087124A
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KR
South Korea
Prior art keywords
developer
concentration
value
carbon dioxide
absorbed carbon
Prior art date
Application number
KR1020170161409A
Other languages
English (en)
Korean (ko)
Inventor
도시모토 나카가와
Original Assignee
가부시키가이샤 히라마리카겐큐죠
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=62962095&utm_source=***_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=KR20180087124(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by 가부시키가이샤 히라마리카겐큐죠 filed Critical 가부시키가이샤 히라마리카겐큐죠
Publication of KR20180087124A publication Critical patent/KR20180087124A/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/002—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor
    • G03F7/0022—Devices or apparatus
    • G03F7/0025—Devices or apparatus characterised by means for coating the developer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • G03F7/3071—Process control means, e.g. for replenishing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)
KR1020170161409A 2017-01-23 2017-11-29 현상액 관리 장치 KR20180087124A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017009836A JP6712415B2 (ja) 2017-01-23 2017-01-23 現像液管理装置
JPJP-P-2017-009836 2017-01-23

Publications (1)

Publication Number Publication Date
KR20180087124A true KR20180087124A (ko) 2018-08-01

Family

ID=62962095

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020170161409A KR20180087124A (ko) 2017-01-23 2017-11-29 현상액 관리 장치

Country Status (4)

Country Link
JP (1) JP6712415B2 (ja)
KR (1) KR20180087124A (ja)
CN (1) CN108345183A (ja)
TW (1) TW201827947A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102262358B1 (ko) * 2020-04-08 2021-06-08 주식회사 에이치에스테크놀로지 다중 농도 측정 장치 및 가스 공급 장치를 구비한 현상액 농도 관리 장치

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018120897A (ja) * 2017-01-23 2018-08-02 株式会社平間理化研究所 現像液の濃度監視装置、及び現像液管理装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2561578B2 (ja) 1991-08-07 1996-12-11 株式会社平間理化研究所 現像液管理装置
JP2008283162A (ja) 2006-11-30 2008-11-20 Mitsubishi Chemical Engineering Corp 現像液の濃度調節方法および調製装置ならびに現像液

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5890708A (ja) * 1981-11-25 1983-05-30 Tdk Corp チョークコイル
JPS6228128A (ja) * 1985-07-31 1987-02-06 Shimano & Co Ltd 楕円ギヤの製造法
JPS62186265A (ja) * 1986-02-12 1987-08-14 Canon Inc 現像装置
JPH067910B2 (ja) * 1987-02-10 1994-02-02 日立プラント建設株式会社 現像原液の希釈装置
JP3686822B2 (ja) * 2000-05-19 2005-08-24 東京エレクトロン株式会社 現像処理装置および現像処理方法
JP2004271974A (ja) * 2003-03-10 2004-09-30 Fuji Photo Film Co Ltd 感光性平版印刷版の現像液疲労度検出方法および現像液管理方法
JP4281439B2 (ja) * 2003-07-30 2009-06-17 三菱化学エンジニアリング株式会社 現像液の供給装置
JP4366490B2 (ja) * 2003-08-22 2009-11-18 長瀬産業株式会社 現像液供給方法及び装置
JP2005249818A (ja) * 2004-03-01 2005-09-15 Nishimura Yasuji フォトレジスト用現像液管理方法、管理装置
JP4839820B2 (ja) * 2005-12-19 2011-12-21 三菱化学エンジニアリング株式会社 現像液の供給装置
JP2011128455A (ja) * 2009-12-18 2011-06-30 Nagase & Co Ltd 炭酸系塩類濃度測定装置、アルカリ現像液管理システム、及び、炭酸系塩類濃度測定方法
KR20160010259A (ko) * 2014-07-17 2016-01-27 가부시키가이샤 히라마 리카 켄큐쇼 고체입자 회수 제거장치, 액체 관리장치 및 에칭액 관리장치

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2561578B2 (ja) 1991-08-07 1996-12-11 株式会社平間理化研究所 現像液管理装置
JP2008283162A (ja) 2006-11-30 2008-11-20 Mitsubishi Chemical Engineering Corp 現像液の濃度調節方法および調製装置ならびに現像液

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102262358B1 (ko) * 2020-04-08 2021-06-08 주식회사 에이치에스테크놀로지 다중 농도 측정 장치 및 가스 공급 장치를 구비한 현상액 농도 관리 장치

Also Published As

Publication number Publication date
JP2018120899A (ja) 2018-08-02
TW201827947A (zh) 2018-08-01
CN108345183A (zh) 2018-07-31
JP6712415B2 (ja) 2020-06-24

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