CN108345183A - 显影液管理装置 - Google Patents
显影液管理装置 Download PDFInfo
- Publication number
- CN108345183A CN108345183A CN201711232620.8A CN201711232620A CN108345183A CN 108345183 A CN108345183 A CN 108345183A CN 201711232620 A CN201711232620 A CN 201711232620A CN 108345183 A CN108345183 A CN 108345183A
- Authority
- CN
- China
- Prior art keywords
- developer solution
- concentration
- value
- carbon dioxide
- managing device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/002—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor
- G03F7/0022—Devices or apparatus
- G03F7/0025—Devices or apparatus characterised by means for coating the developer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
- G03F7/3071—Process control means, e.g. for replenishing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Automation & Control Theory (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Coating Apparatus (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017009836A JP6712415B2 (ja) | 2017-01-23 | 2017-01-23 | 現像液管理装置 |
JP2017-009836 | 2017-01-23 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN108345183A true CN108345183A (zh) | 2018-07-31 |
Family
ID=62962095
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201711232620.8A Pending CN108345183A (zh) | 2017-01-23 | 2017-11-29 | 显影液管理装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6712415B2 (ja) |
KR (1) | KR20180087124A (ja) |
CN (1) | CN108345183A (ja) |
TW (1) | TW201827947A (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018120897A (ja) * | 2017-01-23 | 2018-08-02 | 株式会社平間理化研究所 | 現像液の濃度監視装置、及び現像液管理装置 |
KR102262358B1 (ko) * | 2020-04-08 | 2021-06-08 | 주식회사 에이치에스테크놀로지 | 다중 농도 측정 장치 및 가스 공급 장치를 구비한 현상액 농도 관리 장치 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004271974A (ja) * | 2003-03-10 | 2004-09-30 | Fuji Photo Film Co Ltd | 感光性平版印刷版の現像液疲労度検出方法および現像液管理方法 |
CN1664706A (zh) * | 2004-03-01 | 2005-09-07 | 西村保二 | 光阻用显影液浓度管理方法与管理装置 |
JP2011128455A (ja) * | 2009-12-18 | 2011-06-30 | Nagase & Co Ltd | 炭酸系塩類濃度測定装置、アルカリ現像液管理システム、及び、炭酸系塩類濃度測定方法 |
TWI402634B (zh) * | 2005-12-19 | 2013-07-21 | Mitsubishi Chem Eng Corp | The supply device for the developer |
CN103852978A (zh) * | 2006-11-30 | 2014-06-11 | 三菱化学工程株式会社 | 显影液的浓度调节方法、调制装置和显影液 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5890708A (ja) * | 1981-11-25 | 1983-05-30 | Tdk Corp | チョークコイル |
JPS6228128A (ja) * | 1985-07-31 | 1987-02-06 | Shimano & Co Ltd | 楕円ギヤの製造法 |
JPS62186265A (ja) * | 1986-02-12 | 1987-08-14 | Canon Inc | 現像装置 |
JPH067910B2 (ja) * | 1987-02-10 | 1994-02-02 | 日立プラント建設株式会社 | 現像原液の希釈装置 |
JP2561578B2 (ja) | 1991-08-07 | 1996-12-11 | 株式会社平間理化研究所 | 現像液管理装置 |
JP3686822B2 (ja) * | 2000-05-19 | 2005-08-24 | 東京エレクトロン株式会社 | 現像処理装置および現像処理方法 |
JP4281439B2 (ja) * | 2003-07-30 | 2009-06-17 | 三菱化学エンジニアリング株式会社 | 現像液の供給装置 |
JP4366490B2 (ja) * | 2003-08-22 | 2009-11-18 | 長瀬産業株式会社 | 現像液供給方法及び装置 |
KR20160010259A (ko) * | 2014-07-17 | 2016-01-27 | 가부시키가이샤 히라마 리카 켄큐쇼 | 고체입자 회수 제거장치, 액체 관리장치 및 에칭액 관리장치 |
-
2017
- 2017-01-23 JP JP2017009836A patent/JP6712415B2/ja not_active Expired - Fee Related
- 2017-11-29 CN CN201711232620.8A patent/CN108345183A/zh active Pending
- 2017-11-29 KR KR1020170161409A patent/KR20180087124A/ko not_active Application Discontinuation
- 2017-11-30 TW TW106141776A patent/TW201827947A/zh unknown
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004271974A (ja) * | 2003-03-10 | 2004-09-30 | Fuji Photo Film Co Ltd | 感光性平版印刷版の現像液疲労度検出方法および現像液管理方法 |
CN1664706A (zh) * | 2004-03-01 | 2005-09-07 | 西村保二 | 光阻用显影液浓度管理方法与管理装置 |
TWI402634B (zh) * | 2005-12-19 | 2013-07-21 | Mitsubishi Chem Eng Corp | The supply device for the developer |
CN103852978A (zh) * | 2006-11-30 | 2014-06-11 | 三菱化学工程株式会社 | 显影液的浓度调节方法、调制装置和显影液 |
JP2011128455A (ja) * | 2009-12-18 | 2011-06-30 | Nagase & Co Ltd | 炭酸系塩類濃度測定装置、アルカリ現像液管理システム、及び、炭酸系塩類濃度測定方法 |
Also Published As
Publication number | Publication date |
---|---|
JP2018120899A (ja) | 2018-08-02 |
TW201827947A (zh) | 2018-08-01 |
KR20180087124A (ko) | 2018-08-01 |
JP6712415B2 (ja) | 2020-06-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
WD01 | Invention patent application deemed withdrawn after publication | ||
WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20180731 |