CN108345183A - 显影液管理装置 - Google Patents

显影液管理装置 Download PDF

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Publication number
CN108345183A
CN108345183A CN201711232620.8A CN201711232620A CN108345183A CN 108345183 A CN108345183 A CN 108345183A CN 201711232620 A CN201711232620 A CN 201711232620A CN 108345183 A CN108345183 A CN 108345183A
Authority
CN
China
Prior art keywords
developer solution
concentration
value
carbon dioxide
managing device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201711232620.8A
Other languages
English (en)
Chinese (zh)
Inventor
中川俊元
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hirama Rika Kenkyusho Ltd
Hirama Laboratories Co Ltd
Original Assignee
Hirama Rika Kenkyusho Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=62962095&utm_source=***_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=CN108345183(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Hirama Rika Kenkyusho Ltd filed Critical Hirama Rika Kenkyusho Ltd
Publication of CN108345183A publication Critical patent/CN108345183A/zh
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/002—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor
    • G03F7/0022—Devices or apparatus
    • G03F7/0025—Devices or apparatus characterised by means for coating the developer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • G03F7/3071—Process control means, e.g. for replenishing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)
CN201711232620.8A 2017-01-23 2017-11-29 显影液管理装置 Pending CN108345183A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017009836A JP6712415B2 (ja) 2017-01-23 2017-01-23 現像液管理装置
JP2017-009836 2017-01-23

Publications (1)

Publication Number Publication Date
CN108345183A true CN108345183A (zh) 2018-07-31

Family

ID=62962095

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201711232620.8A Pending CN108345183A (zh) 2017-01-23 2017-11-29 显影液管理装置

Country Status (4)

Country Link
JP (1) JP6712415B2 (ja)
KR (1) KR20180087124A (ja)
CN (1) CN108345183A (ja)
TW (1) TW201827947A (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018120897A (ja) * 2017-01-23 2018-08-02 株式会社平間理化研究所 現像液の濃度監視装置、及び現像液管理装置
KR102262358B1 (ko) * 2020-04-08 2021-06-08 주식회사 에이치에스테크놀로지 다중 농도 측정 장치 및 가스 공급 장치를 구비한 현상액 농도 관리 장치

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004271974A (ja) * 2003-03-10 2004-09-30 Fuji Photo Film Co Ltd 感光性平版印刷版の現像液疲労度検出方法および現像液管理方法
CN1664706A (zh) * 2004-03-01 2005-09-07 西村保二 光阻用显影液浓度管理方法与管理装置
JP2011128455A (ja) * 2009-12-18 2011-06-30 Nagase & Co Ltd 炭酸系塩類濃度測定装置、アルカリ現像液管理システム、及び、炭酸系塩類濃度測定方法
TWI402634B (zh) * 2005-12-19 2013-07-21 Mitsubishi Chem Eng Corp The supply device for the developer
CN103852978A (zh) * 2006-11-30 2014-06-11 三菱化学工程株式会社 显影液的浓度调节方法、调制装置和显影液

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5890708A (ja) * 1981-11-25 1983-05-30 Tdk Corp チョークコイル
JPS6228128A (ja) * 1985-07-31 1987-02-06 Shimano & Co Ltd 楕円ギヤの製造法
JPS62186265A (ja) * 1986-02-12 1987-08-14 Canon Inc 現像装置
JPH067910B2 (ja) * 1987-02-10 1994-02-02 日立プラント建設株式会社 現像原液の希釈装置
JP2561578B2 (ja) 1991-08-07 1996-12-11 株式会社平間理化研究所 現像液管理装置
JP3686822B2 (ja) * 2000-05-19 2005-08-24 東京エレクトロン株式会社 現像処理装置および現像処理方法
JP4281439B2 (ja) * 2003-07-30 2009-06-17 三菱化学エンジニアリング株式会社 現像液の供給装置
JP4366490B2 (ja) * 2003-08-22 2009-11-18 長瀬産業株式会社 現像液供給方法及び装置
KR20160010259A (ko) * 2014-07-17 2016-01-27 가부시키가이샤 히라마 리카 켄큐쇼 고체입자 회수 제거장치, 액체 관리장치 및 에칭액 관리장치

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004271974A (ja) * 2003-03-10 2004-09-30 Fuji Photo Film Co Ltd 感光性平版印刷版の現像液疲労度検出方法および現像液管理方法
CN1664706A (zh) * 2004-03-01 2005-09-07 西村保二 光阻用显影液浓度管理方法与管理装置
TWI402634B (zh) * 2005-12-19 2013-07-21 Mitsubishi Chem Eng Corp The supply device for the developer
CN103852978A (zh) * 2006-11-30 2014-06-11 三菱化学工程株式会社 显影液的浓度调节方法、调制装置和显影液
JP2011128455A (ja) * 2009-12-18 2011-06-30 Nagase & Co Ltd 炭酸系塩類濃度測定装置、アルカリ現像液管理システム、及び、炭酸系塩類濃度測定方法

Also Published As

Publication number Publication date
JP2018120899A (ja) 2018-08-02
TW201827947A (zh) 2018-08-01
KR20180087124A (ko) 2018-08-01
JP6712415B2 (ja) 2020-06-24

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Application publication date: 20180731