KR20050007354A - 바스 수명이 연장된 조성물 - Google Patents
바스 수명이 연장된 조성물 Download PDFInfo
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- KR20050007354A KR20050007354A KR10-2004-7017477A KR20047017477A KR20050007354A KR 20050007354 A KR20050007354 A KR 20050007354A KR 20047017477 A KR20047017477 A KR 20047017477A KR 20050007354 A KR20050007354 A KR 20050007354A
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- 239000000203 mixture Substances 0.000 title claims abstract description 72
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims abstract description 141
- 150000001875 compounds Chemical class 0.000 claims abstract description 114
- 125000001931 aliphatic group Chemical group 0.000 claims abstract description 87
- 239000003054 catalyst Substances 0.000 claims abstract description 63
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 26
- 229910052751 metal Inorganic materials 0.000 claims abstract description 18
- 239000002184 metal Substances 0.000 claims abstract description 18
- -1 α-methylstyryl Chemical group 0.000 claims description 215
- 229920000642 polymer Polymers 0.000 claims description 99
- 125000004432 carbon atom Chemical group C* 0.000 claims description 56
- 239000004205 dimethyl polysiloxane Substances 0.000 claims description 56
- 235000013870 dimethyl polysiloxane Nutrition 0.000 claims description 56
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 claims description 56
- 238000006243 chemical reaction Methods 0.000 claims description 50
- 125000001183 hydrocarbyl group Chemical group 0.000 claims description 47
- 229920001577 copolymer Polymers 0.000 claims description 36
- 238000000576 coating method Methods 0.000 claims description 32
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 28
- 229920002554 vinyl polymer Polymers 0.000 claims description 28
- 125000000524 functional group Chemical group 0.000 claims description 27
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 26
- 238000006459 hydrosilylation reaction Methods 0.000 claims description 23
- 239000011248 coating agent Substances 0.000 claims description 22
- 239000003112 inhibitor Substances 0.000 claims description 22
- 238000000034 method Methods 0.000 claims description 21
- 125000005843 halogen group Chemical group 0.000 claims description 20
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 claims description 18
- 125000003545 alkoxy group Chemical group 0.000 claims description 16
- 125000002252 acyl group Chemical group 0.000 claims description 15
- 125000003342 alkenyl group Chemical group 0.000 claims description 14
- 125000003700 epoxy group Chemical group 0.000 claims description 14
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 claims description 14
- 239000000758 substrate Substances 0.000 claims description 14
- 125000003277 amino group Chemical group 0.000 claims description 13
- 125000001033 ether group Chemical group 0.000 claims description 13
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- 238000002156 mixing Methods 0.000 claims description 10
- 239000000654 additive Substances 0.000 claims description 9
- 125000000217 alkyl group Chemical group 0.000 claims description 9
- CWNOEVURTVLUNV-UHFFFAOYSA-N 2-(propoxymethyl)oxirane Chemical group CCCOCC1CO1 CWNOEVURTVLUNV-UHFFFAOYSA-N 0.000 claims description 8
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical group [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 8
- 229910052796 boron Inorganic materials 0.000 claims description 8
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- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 7
- 239000001301 oxygen Substances 0.000 claims description 7
- 229910052760 oxygen Inorganic materials 0.000 claims description 7
- 239000004606 Fillers/Extenders Substances 0.000 claims description 6
- 125000003118 aryl group Chemical group 0.000 claims description 6
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- 230000000996 additive effect Effects 0.000 claims description 5
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- 239000002243 precursor Substances 0.000 claims description 4
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 3
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 claims description 3
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 claims description 3
- HMBNQNDUEFFFNZ-UHFFFAOYSA-N 4-ethenoxybutan-1-ol Chemical compound OCCCCOC=C HMBNQNDUEFFFNZ-UHFFFAOYSA-N 0.000 claims description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 claims description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 25
- 239000010703 silicon Substances 0.000 abstract description 23
- 229910052710 silicon Inorganic materials 0.000 abstract description 23
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 37
- 229910052697 platinum Inorganic materials 0.000 description 32
- 239000000463 material Substances 0.000 description 28
- GVTGUOINIMHIRT-WAYWQWQTSA-N bis(1-methoxypropan-2-yl) (z)-but-2-enedioate Chemical compound COCC(C)OC(=O)\C=C/C(=O)OC(C)COC GVTGUOINIMHIRT-WAYWQWQTSA-N 0.000 description 19
- 238000005481 NMR spectroscopy Methods 0.000 description 18
- 238000005227 gel permeation chromatography Methods 0.000 description 18
- 239000000523 sample Substances 0.000 description 18
- 238000001816 cooling Methods 0.000 description 17
- 238000007142 ring opening reaction Methods 0.000 description 16
- 230000000694 effects Effects 0.000 description 15
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 15
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- 230000001070 adhesive effect Effects 0.000 description 13
- 239000000853 adhesive Substances 0.000 description 12
- 150000001336 alkenes Chemical class 0.000 description 12
- 238000004448 titration Methods 0.000 description 12
- 239000008199 coating composition Substances 0.000 description 11
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- 239000007787 solid Substances 0.000 description 11
- 239000000126 substance Substances 0.000 description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 125000004122 cyclic group Chemical group 0.000 description 9
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- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 6
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 6
- 150000001993 dienes Chemical class 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 125000004356 hydroxy functional group Chemical group O* 0.000 description 6
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- FUSUHKVFWTUUBE-UHFFFAOYSA-N buten-2-one Chemical compound CC(=O)C=C FUSUHKVFWTUUBE-UHFFFAOYSA-N 0.000 description 4
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- 239000004615 ingredient Substances 0.000 description 4
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- 229920001084 poly(chloroprene) Polymers 0.000 description 4
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- 238000002360 preparation method Methods 0.000 description 4
- 239000000376 reactant Substances 0.000 description 4
- 150000004756 silanes Chemical class 0.000 description 4
- 238000004876 x-ray fluorescence Methods 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 3
- 125000006043 5-hexenyl group Chemical group 0.000 description 3
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical group OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 3
- 239000004971 Cross linker Substances 0.000 description 3
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 3
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 3
- 125000002947 alkylene group Chemical group 0.000 description 3
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 3
- 238000006482 condensation reaction Methods 0.000 description 3
- 238000004132 cross linking Methods 0.000 description 3
- GCSJLQSCSDMKTP-UHFFFAOYSA-N ethenyl(trimethyl)silane Chemical compound C[Si](C)(C)C=C GCSJLQSCSDMKTP-UHFFFAOYSA-N 0.000 description 3
- 239000011888 foil Substances 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 125000006038 hexenyl group Chemical group 0.000 description 3
- 150000002431 hydrogen Chemical class 0.000 description 3
- 230000000415 inactivating effect Effects 0.000 description 3
- 229960004592 isopropanol Drugs 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- 150000005673 monoalkenes Chemical class 0.000 description 3
- KJFMBFZCATUALV-UHFFFAOYSA-N phenolphthalein Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)C2=CC=CC=C2C(=O)O1 KJFMBFZCATUALV-UHFFFAOYSA-N 0.000 description 3
- 229910000077 silane Inorganic materials 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- QYLFHLNFIHBCPR-UHFFFAOYSA-N 1-ethynylcyclohexan-1-ol Chemical compound C#CC1(O)CCCCC1 QYLFHLNFIHBCPR-UHFFFAOYSA-N 0.000 description 2
- KWKAKUADMBZCLK-UHFFFAOYSA-N 1-octene Chemical compound CCCCCCC=C KWKAKUADMBZCLK-UHFFFAOYSA-N 0.000 description 2
- KUIZKZHDMPERHR-UHFFFAOYSA-N 1-phenylprop-2-en-1-one Chemical compound C=CC(=O)C1=CC=CC=C1 KUIZKZHDMPERHR-UHFFFAOYSA-N 0.000 description 2
- HFDVRLIODXPAHB-UHFFFAOYSA-N 1-tetradecene Chemical compound CCCCCCCCCCCCC=C HFDVRLIODXPAHB-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- NECRQCBKTGZNMH-UHFFFAOYSA-N 3,5-dimethylhex-1-yn-3-ol Chemical compound CC(C)CC(C)(O)C#C NECRQCBKTGZNMH-UHFFFAOYSA-N 0.000 description 2
- 125000004975 3-butenyl group Chemical group C(CC=C)* 0.000 description 2
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
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- 230000000052 comparative effect Effects 0.000 description 2
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- DZSAIHPGHBMBKJ-UTCJRWHESA-N (z)-2-(1-methoxypropan-2-yl)but-2-enedioic acid Chemical compound COCC(C)C(\C(O)=O)=C\C(O)=O DZSAIHPGHBMBKJ-UTCJRWHESA-N 0.000 description 1
- IQBLWPLYPNOTJC-FPLPWBNLSA-N (z)-4-(2-ethylhexoxy)-4-oxobut-2-enoic acid Chemical compound CCCCC(CC)COC(=O)\C=C/C(O)=O IQBLWPLYPNOTJC-FPLPWBNLSA-N 0.000 description 1
- FDNBQVCBHKEDOJ-FPLPWBNLSA-N (z)-4-(6-methylheptoxy)-4-oxobut-2-enoic acid Chemical compound CC(C)CCCCCOC(=O)\C=C/C(O)=O FDNBQVCBHKEDOJ-FPLPWBNLSA-N 0.000 description 1
- PRBHEGAFLDMLAL-UHFFFAOYSA-N 1,5-Hexadiene Natural products CC=CCC=C PRBHEGAFLDMLAL-UHFFFAOYSA-N 0.000 description 1
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- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- JNRUXZIXAXHXTN-UHFFFAOYSA-N trimethyl(2-methylbut-3-yn-2-yloxy)silane Chemical compound C#CC(C)(C)O[Si](C)(C)C JNRUXZIXAXHXTN-UHFFFAOYSA-N 0.000 description 1
- ZGBHPZUKKNSAOS-UHFFFAOYSA-N tris(ethenyl)borane Chemical compound C=CB(C=C)C=C ZGBHPZUKKNSAOS-UHFFFAOYSA-N 0.000 description 1
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 1
- 239000003039 volatile agent Substances 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 229940074411 xylene Drugs 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
- 125000006839 xylylene group Chemical group 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
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- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
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Abstract
Description
Claims (22)
- 하나 이상의 지방족 불포화를 갖는 하나 이상의 화합물(A), 분자당 하나 이상의 규소 결합된 수소원자를 함유하는 하나 이상의 화학식 III의 오가노하이드로겐실리콘 화합물(B) 및 백금족 금속 함유 촉매(C)를 포함하는 조성물.화학식 III위의 화학식 III에서,R은 각각 수소원자 및 지방족 불포화가 없는 탄소수 1 내지 20의 1가 탄화수소 그룹으로부터 독립적으로 선택되고,a는 1 내지 18의 정수이고,b는 1 내지 19의 정수이고,a + b는 3 내지 20의 정수이고,X는 각각 할로겐 원자, 에테르 그룹, 알콕시 그룹, 알콕시에테르 그룹, 아실 그룹, 에폭시 그룹, 아미노 그룹, 실릴 그룹 및 -Z-R4그룹[여기서, Z는 각각 산소 및 탄소수 2 내지 20의 2가 탄화수소 그룹으로부터 독립적으로 선택되고, R4그룹은 각각 -BRuY2-u, -SiRvY3-v{여기서, B는 붕소이고, R은 각각 위에서 정의한 바와 같고, u는 0 내지 2의 정수이고, v는 0 내지 3의 정수이고, Y는 각각 할로겐 원자, 에테르 그룹, 알콕시 그룹, 알콕시에테르 그룹, 아실 그룹, 에폭시 그룹, 아미노 그룹, 실릴 그룹 및 -Z-G 그룹(여기서, Z는 위에서 정의한 바와 같고, G는 각각 화학식 V의 사이클로실록산이다)으로부터 독립적으로 선택된 작용기이다} 또는 화학식 IV의 그룹으로부터 독립적으로 선택된다]으로부터 독립적으로 선택된 작용기이다.화학식 IV위의 화학식 IV에서,R은 각각 위에서 정의한 바와 같고,c + d + e + f + g + h + i + j의 합은 2 이상이고,n은 0 내지 3의 정수이고,o는 0 내지 2의 정수이고,p는 0 내지 1의 정수이고,q는 0 내지 1의 정수이고,r은 0 내지 2의 정수이고,s는 0 내지 2의 정수이고,t는 0 내지 3의 정수이고,Y는 각각 위에서 정의한 바와 같고,Y 그룹 중의 하나가 Z 그룹으로 대체되는 경우, R4그룹을 화학식 III의 사이클로실록산에 결합시키고, 추가로 g + h + i + j > 0인 경우, c + d + e + f > 0이다.화학식 V위의 화학식 V에서,R 및 X는 위에서 정의한 바와 같고,k는 0 내지 18의 정수이고,m은 0 내지 18의 정수이고,k + m은 2 내지 20의 정수이다.
- 제1항에 있어서, b가 2 내지 19의 정수이고, c가 0 내지 50의 정수이고, d가 0 내지 5,000의 정수이고, e가 0 내지 48의 정수이고, f가 0 내지 24의 정수이고, g가 0 내지 50의 정수이고, h가 0 내지 50의 정수이고, i가 0 내지 50의 정수이고, j가 0 내지 50의 정수인 조성물.
- 제1항 또는 제2항에 있어서, c가 2 내지 15의 정수이고, d가 0 내지 1,000의 정수이고, e가 0 내지 13의 정수이고, f가 0 내지 6의 정수이고, g가 0 내지 20의 정수이고, h가 0 내지 20의 정수이고, i가 0 내지 20의 정수이고, j가 0 내지 15의 정수인 조성물.
- 제1항 내지 제3항 중의 어느 한 항에 있어서, R 그룹이 각각 수소원자, 탄소수 1 내지 8의 알킬 그룹 및 탄소수 6 내지 9의 아릴 그룹으로부터 독립적으로 선택되고, X가 각각 -Z-R4그룹[여기서, Z는 2가 탄화수소 그룹이고, R4는 -R2SiO(R2SiO)dSiR2-Z-G, -R2SiOSiR3, -R2SiOSiR2-Y 및 -RSi(OSiR3)2(여기서, d는 1 내지 50의 정수이고, Z, G 및 R은 위에서 정의한 바와 같다)으로부터 선택된다]이거나, 클로로; 메톡시; 이소프로폭시; 및 하이드록시부틸비닐 에테르, 비닐사이클로헥실에폭사이드 및 알릴글리시딜에테르로부터의 알케닐 그룹을 실록산 전구체로부터의 SiH를 사용하여 화학식 III 또는 화학식 V로 하이드로실릴화함으로써 유도된 그룹으로부터 독립적으로 선택되는 조성물.
- 제1항 내지 제4항 중의 어느 한 항에 있어서, R 그룹이 각각 수소, 메틸, α-메틸스티릴, 3,3,3-트리플루오로프로필 및 노나플루오로부틸에틸로부터 독립적으로 선택되는 조성물.
- 제1항 내지 제5항 중의 어느 한 항에 있어서, R이 메틸이고, d가 평균 8인 조성물.
- 제1항 내지 제3항 중의 어느 한 항에 있어서, 성분(B)이 화학식,,,,,,,,및의 화합물(여기서, Me는 메틸이고, d1+ d2= d, x는 1 내지 100의 범위이다)로부터 선택되는 조성물.
- 제1항 내지 제7항 중의 어느 한 항에 있어서, 성분(B)이 화학식의 화합물(여기서, Me는 메틸이고, d는 평균 8이고, x는 1 내지 15의 정수이다)인 조성물.
- 제7항 또는 제8항에 있어서, 성분(B)이, SiH 결합의 5 내지 70%가 탄화수소, 옥시탄화수소 또는 작용기로 대체되는 화합물인 조성물.
- 제7항 또는 제8항에 있어서, 성분(B)이, SiH 결합의 5 내지 50%가 알릴글리시딜에테르(프로필글리시딜에테르 그룹) 또는 비닐사이클로헥실에폭사이드, 알킬그룹 또는 알케닐 그룹을 하이드로실릴화함으로써 유도된 작용기로 대체되는 화합물인 조성물.
- 제7항 또는 제8항에 있어서, 성분(B)이, SiH 결합의 10 내지 30%가 알릴글리시딜에테르(프로필글리시딜에테르 그룹)를 하이드로실릴화함으로써 유도된 작용기로 대체되는 화합물인 조성물.
- 제1항 내지 제11항 중의 어느 한 항에 있어서, 오가노하이드로겐실리콘 화합물이 분자당 2개 이상의 규소 결합된 수소원자를 포함하는 조성물.
- 제1항 내지 제11항 중의 어느 한 항에 있어서, 오가노하이드로겐실리콘 화합물이 분자당 3개 이상의 규소 결합된 수소원자를 포함하는 조성물.
- 제1항 내지 제13항 중의 어느 한 항에 있어서, 화합물들의 점도가 5 내지 50,000mPa.s인 조성물.
- 제1항 내지 제14항 중의 어느 한 항에 있어서, 성분(A)이 트리메틸실록시-말단 폴리디메틸실록산-폴리메틸비닐실록산 공중합체, 비닐디메틸실록시-말단 폴리디메틸실록산-폴리메틸비닐실록산 공중합체, 트리메틸실록시-말단 폴리디메틸실록산-폴리메틸헥세닐실록산 공중합체, 헥세닐디메틸실록시-말단 폴리디메틸실록산-폴리메틸헥세닐실록산 공중합체, 비닐디메틸실록시-말단 폴리디메틸실록산-폴리메틸헥세닐실록산 공중합체, 트리메틸실록시-말단 폴리메틸비닐실록산 중합체, 트리메틸실록시-말단 폴리메틸헥세닐실록산 중합체, 비닐디메틸실록시-말단 폴리디메틸실록산 중합체, 및 헥세닐디메틸실록시-말단 폴리디메틸실록산 중합체, 비닐디메틸실록시 말단 폴리(디메틸실록산-모노메틸실세스퀴옥산) 중합체, 비닐디메틸실록시 말단 폴리(디메틸실록산-비닐메틸실록산-메틸실세스퀴옥산) 공중합체; 트리메틸실록시 말단 폴리(디메틸실록산-비닐메틸실록산-메틸실세스퀴옥산) 중합체, 헥세닐디메틸실록시 말단 폴리(디메틸실록산-모노메틸실세스퀴옥산) 중합체, 헥세닐디메틸실록시 말단 폴리(디메틸실록산-헥세닐메틸실록산-메틸실세스퀴옥산) 공중합체; 트리메틸실록시 말단 폴리(디메틸실록산-헥세닐메틸실록산-메틸실세스퀴옥산) 중합체, 비닐디메틸실록시 말단 폴리(디메틸실록산-실리케이트) 공중합체, 헥세닐디메틸실록시-말단 폴리(디메틸실록산-실리케이트) 공중합체, 트리메틸실록시 말단 폴리(디메틸실록산-비닐메틸실록산-실리케이트) 공중합체 및 트리메틸실록시 말단 폴리(디메틸실록산-헥세닐메틸실록산-실리케이트) 공중합체, 비닐실록시 또는 헥세닐실록시 말단 폴리(디메틸실록산-하이드로카빌 공중합체), 비닐실록시 말단 또는 헥세닐실록시 말단 폴리(디메틸실록산-폴리옥시알킬렌) 블럭 공중합체, 알케닐옥시디메틸실록시 말단 폴리이소부틸렌 및 알케닐옥시디메틸실록시 말단 폴리디메틸실록산-폴리이소부틸렌 블럭 공중합체로부터 선택되는 조성물.
- 제1항 내지 제15항 중의 어느 한 항에 있어서, 억제제(D)를 추가로 포함하는조성물.
- 제1항 내지 제16항 중의 어느 한 항에 있어서, 바스 수명 연장제(E)를 추가로 포함하는 조성물.
- 제1항 내지 제17항 중의 어느 한 항에 있어서, 방출 첨가제(E)를 추가로 포함하는 조성물.
- 제1항 내지 제18항 중의 어느 한 항에 있어서, 성분(A)이 둘 이상의 지방족 불포화를 갖는 하나 이상의 화합물을 포함하는 조성물.
- 제15항 또는 제19항의 둘 이상의 지방족 불포화를 갖는 하나 이상의 화합물(A),제13항의 분자당 3개 이상의 규소 결합된 수소원자를 함유하는 하나 이상의 오가노하이드로겐실리콘 화합물(B) 및반응을 촉매하기에 충분한 양으로 존재하는 백금족 금속 함유 촉매(C)를 혼합하는 단계(I),단계(I)로부터의 혼합물을 기판 표면 위에 피복시키는 단계(II) 및피복물과 기판을 피복물을 경화시키기에 충분한 양으로 열(i) 및 화학선(ii)으로부터 선택된 에너지 공급원에 노출시키는 단계(III)를 포함하는, 경화 피복물의 제조방법.
- 제20항에 있어서, 감압성 접착제를, 단계(III) 후에 피복물 위에 도포시키는 단계(IV)를 추가로 포함하는 방법.
- 제20항 또는 제21항의 방법에 의해 제조된 경화 피복물.
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- 2003-04-29 CN CNB038125072A patent/CN100354372C/zh not_active Expired - Lifetime
- 2003-04-29 KR KR1020047017477A patent/KR100949448B1/ko active IP Right Grant
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- 2003-04-29 JP JP2004501507A patent/JP4744139B2/ja not_active Expired - Fee Related
- 2003-04-29 AU AU2003231175A patent/AU2003231175A1/en not_active Abandoned
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DE60314127D1 (de) | 2007-07-12 |
JP2010285628A (ja) | 2010-12-24 |
JP5612387B2 (ja) | 2014-10-22 |
JP2005529989A (ja) | 2005-10-06 |
EP1499679A1 (en) | 2005-01-26 |
US7378482B2 (en) | 2008-05-27 |
MY129814A (en) | 2007-05-31 |
DE60314127T2 (de) | 2008-01-24 |
JP4744139B2 (ja) | 2011-08-10 |
KR100949448B1 (ko) | 2010-03-29 |
WO2003093369A1 (en) | 2003-11-13 |
EP1499679B1 (en) | 2007-05-30 |
AU2003231175A1 (en) | 2003-11-17 |
CN1656174A (zh) | 2005-08-17 |
US20060111491A1 (en) | 2006-05-25 |
ATE363518T1 (de) | 2007-06-15 |
CN100354372C (zh) | 2007-12-12 |
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