KR20010030594A - 감광성 블랙 매트릭스 조성물 및 그것의 제조방법 - Google Patents
감광성 블랙 매트릭스 조성물 및 그것의 제조방법 Download PDFInfo
- Publication number
- KR20010030594A KR20010030594A KR1020007002648A KR20007002648A KR20010030594A KR 20010030594 A KR20010030594 A KR 20010030594A KR 1020007002648 A KR1020007002648 A KR 1020007002648A KR 20007002648 A KR20007002648 A KR 20007002648A KR 20010030594 A KR20010030594 A KR 20010030594A
- Authority
- KR
- South Korea
- Prior art keywords
- black matrix
- matrix composition
- solvent
- weight
- black
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Optical Filters (AREA)
- Paints Or Removers (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Materials For Photolithography (AREA)
Abstract
Description
Claims (26)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11514298A | 1998-07-14 | 1998-07-14 | |
US9/115,142 | 1998-07-14 | ||
US09/115,142 | 1998-07-14 | ||
PCT/US1999/015904 WO2000004421A1 (en) | 1998-07-14 | 1999-07-14 | Photosensitive black matrix composition and process of making it |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20010030594A true KR20010030594A (ko) | 2001-04-16 |
KR100664496B1 KR100664496B1 (ko) | 2007-01-03 |
Family
ID=22359536
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020007002648A KR100664496B1 (ko) | 1998-07-14 | 1999-07-14 | 감광성 블랙 매트릭스 조성물 및 그것의 제조방법 |
Country Status (8)
Country | Link |
---|---|
US (1) | US20020182522A1 (ko) |
EP (1) | EP1012671B1 (ko) |
JP (1) | JP2002520679A (ko) |
KR (1) | KR100664496B1 (ko) |
CN (1) | CN1274432A (ko) |
DE (1) | DE69911558T2 (ko) |
TW (1) | TW575799B (ko) |
WO (1) | WO2000004421A1 (ko) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20030051183A (ko) * | 2001-09-28 | 2003-06-25 | 후지 샤신 필름 가부시기가이샤 | 감광성 전사 재료, 포토마스크 재료, 포토마스크 및포토마스크의 제조방법 |
KR100860432B1 (ko) * | 2006-03-17 | 2008-09-25 | 도쿄 오카 고교 가부시키가이샤 | 흑색 감광성 조성물 |
KR101252321B1 (ko) * | 2005-06-30 | 2013-04-08 | 도레이 카부시키가이샤 | 감광성 수지 조성물 및 접착 개량제 |
KR20190058445A (ko) * | 2016-09-30 | 2019-05-29 | 도레이 카부시키가이샤 | 네가티브형 감광성 수지 조성물, 경화막, 경화막을 구비하는 소자 및 표시 장치, 및 그 제조 방법 |
Families Citing this family (32)
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EP1150165A1 (en) * | 2000-04-25 | 2001-10-31 | JSR Corporation | Radiation sensitive resin composition for forming barrier ribs for an el display element, barrier ribs and el display element |
JP2002047423A (ja) * | 2000-08-02 | 2002-02-12 | Toray Ind Inc | 黒色ペースト |
JP4831885B2 (ja) | 2001-04-27 | 2011-12-07 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
US20040259452A1 (en) * | 2001-11-08 | 2004-12-23 | Masahiro Matsumoto | Black paste and plasma display panel and method for preparation thereof |
TWI285298B (en) * | 2003-01-14 | 2007-08-11 | Sumitomo Chemical Co | Photosensitive resin composition |
JP4528548B2 (ja) * | 2003-04-18 | 2010-08-18 | 富士フイルム株式会社 | 表示装置用遮光膜 |
JP2004334181A (ja) * | 2003-04-18 | 2004-11-25 | Fuji Photo Film Co Ltd | 表示装置用遮光膜 |
JP4214005B2 (ja) * | 2003-06-17 | 2009-01-28 | 太陽インキ製造株式会社 | 光硬化性樹脂組成物及びプラズマディスプレイパネル用前面基板 |
US8334012B2 (en) * | 2004-12-20 | 2012-12-18 | Palo Alto Research Center Incorporated | Method for preprinting and/or reliquifying subpixels to achieve color uniformity in color filters |
JP2006317910A (ja) * | 2005-04-15 | 2006-11-24 | Fujifilm Holdings Corp | カラーフィルタの製造方法、カラーフィルタ、及びそれを有する表示装置 |
JP2006330695A (ja) * | 2005-04-26 | 2006-12-07 | Fujifilm Holdings Corp | 濃色離画壁及びその製造方法、その濃色離画壁を有するカラーフィルタ及びその製造方法、並びに、それを有する表示装置 |
JP2006330690A (ja) * | 2005-04-26 | 2006-12-07 | Fujifilm Holdings Corp | カラーフィルタの製造方法、カラーフィルタ、及びそれを有する表示装置 |
TW200725174A (en) * | 2005-09-16 | 2007-07-01 | Fujifilm Corp | Photosensitive composition, transfer material, light shielding film and production method thereof, color filter for display device, substrate for display device, and display device |
KR100911889B1 (ko) * | 2007-07-16 | 2009-08-11 | 한국전기연구원 | 유무기 하이브리드 감광성 수지 조성물 및 이의 경화체를이용한 액정표시소자 |
KR100907255B1 (ko) * | 2007-09-18 | 2009-07-10 | 한국전자통신연구원 | 유기 박막 트랜지스터를 구비하는 표시 장치 |
KR20090108781A (ko) * | 2008-04-14 | 2009-10-19 | 주식회사 동진쎄미켐 | 흑색 도전성 페이스트 조성물, 이를 포함하는 전자파차폐용 필터 및 표시 장치 |
KR101298464B1 (ko) * | 2008-12-24 | 2013-08-23 | 엘지디스플레이 주식회사 | 레지스트 용액 및 이를 이용한 패턴 형성방법 |
KR20120079088A (ko) * | 2009-09-08 | 2012-07-11 | 썬 케미칼 비.브이. | 광개시제 조성물 |
CN101870788B (zh) * | 2010-06-17 | 2013-04-03 | 东南大学 | 基于分子印迹纳米球的传感介质膜及其制备方法和应用 |
JP6111021B2 (ja) * | 2011-06-08 | 2017-04-05 | 大日精化工業株式会社 | カラーフィルター、黒色顔料の製造方法、及びカラーディスプレー |
JP5819693B2 (ja) * | 2011-09-26 | 2015-11-24 | 東京応化工業株式会社 | 着色感光性樹脂組成物、カラーフィルタ及び表示装置 |
KR20140031737A (ko) | 2012-09-05 | 2014-03-13 | 삼성디스플레이 주식회사 | 포토레지스트 조성물 및 이를 이용한 블랙 매트릭스의 형성 방법 |
DE102014218300B3 (de) * | 2014-09-12 | 2016-01-07 | Evonik Degussa Gmbh | Verfahren zur Herstellung strukturierter Beschichtungen, strukturierte Beschichtung und ihre Verwendung |
DE102014218292A1 (de) * | 2014-09-12 | 2016-03-17 | Evonik Degussa Gmbh | Flüssige Beschichtungszusammensetzungen, Verfahren zu ihrer Herstellung und ihre Verwendung |
JPWO2017208771A1 (ja) * | 2016-05-31 | 2019-03-28 | 富士フイルム株式会社 | 組成物、硬化膜、カラーフィルタ、遮光膜、固体撮像装置及び画像表示装置 |
JP2016213202A (ja) * | 2016-08-24 | 2016-12-15 | 株式会社半導体エネルギー研究所 | 発光装置 |
KR102007149B1 (ko) | 2016-11-24 | 2019-08-05 | 주식회사 삼양사 | 흑색 아조-금속 착물, 이를 포함하는 감광성 수지 조성물 및 이를 이용하여 제조된 경화막 |
GB2572796A (en) * | 2018-04-11 | 2019-10-16 | Performance Masterbatches Ltd | Composition for darkening the colour of polymers |
EP3824024A1 (en) * | 2018-07-19 | 2021-05-26 | Basf Se | Black-colored polyamide composition, production thereof and use |
CN109254445B (zh) * | 2018-10-15 | 2020-12-25 | 深圳市华星光电技术有限公司 | 一种黑色矩阵分散液及其制备方法、显示面板 |
KR102660174B1 (ko) * | 2020-03-04 | 2024-04-24 | 주식회사 엘지화학 | 광학 필름 및 이를 포함하는 디스플레이 장치 |
CN118235086A (zh) * | 2021-10-11 | 2024-06-21 | 埃斯普投资有限公司 | 包含金属或类金属化合物的组合的辐射敏感组合物 |
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US5176971A (en) * | 1985-02-05 | 1993-01-05 | Kyodo Printing Co., Ltd. | Color filter |
US5489621A (en) * | 1993-05-12 | 1996-02-06 | Fuji Photo Film Co., Ltd. | Process for forming colored partial picture element and light-shielding light-sensitive resin composition used therefor |
JPH0727912A (ja) * | 1993-07-09 | 1995-01-31 | Sumitomo Osaka Cement Co Ltd | 遮光性薄膜形成用樹脂 |
US5593802A (en) * | 1993-10-07 | 1997-01-14 | Fuji Photo Film Co., Ltd. | Method of forming a spacer for use in a liquid crystal panel |
JPH0834923A (ja) * | 1994-07-21 | 1996-02-06 | Sekisui Chem Co Ltd | 黒色感光性樹脂組成物及びブラックマトリクスの製造法 |
JPH0836257A (ja) * | 1994-07-21 | 1996-02-06 | Sekisui Chem Co Ltd | 着色レジスト組成物 |
JP2874091B2 (ja) * | 1995-07-27 | 1999-03-24 | 株式会社アイテス | 着色感光性組成物およびカラーフィルタ |
JP3230794B2 (ja) * | 1995-08-18 | 2001-11-19 | 日本化薬株式会社 | 高抵抗黒色感放射線性樹脂組成物及び黒色硬化膜並びにその黒色画像形成方法 |
JP3594392B2 (ja) * | 1995-12-09 | 2004-11-24 | 東京応化工業株式会社 | 遮光膜形成用感光性樹脂組成物、これを用いたブラックマトリックス及びその製造方法 |
JP3347934B2 (ja) * | 1996-02-28 | 2002-11-20 | 大日精化工業株式会社 | ブラックマトリックス用着色組成物、ブラックマトリックスの製造方法及び遮光性ブラックマトリックスを付した発光型フラットパネルディスプレイパネル |
JPH09263654A (ja) * | 1996-03-27 | 1997-10-07 | Dainippon Printing Co Ltd | 非導電性遮光層用組成物、非導電性遮光層及びカラーフィルター |
JPH1090512A (ja) * | 1996-09-13 | 1998-04-10 | Dainippon Printing Co Ltd | 非導電性遮光層用組成物、非導電性遮光層及びカラーフイルター |
JPH1090511A (ja) * | 1996-09-13 | 1998-04-10 | Dainippon Printing Co Ltd | 非導電性遮光層用組成物、非導電性遮光層及びカラーフイルター |
JPH10133370A (ja) * | 1996-11-01 | 1998-05-22 | Mitsubishi Chem Corp | カラーフィルター用レジスト組成物及びカラーフィルター |
JPH10142794A (ja) * | 1996-11-14 | 1998-05-29 | Hitachi Chem Co Ltd | 着色画像形成用感光液、これを用いたカラーフィルターの製造法及びカラーフィルター |
JPH10160926A (ja) * | 1996-11-26 | 1998-06-19 | Fuji Photo Film Co Ltd | 感光性樹脂組成物、感光性多層シート及び遮光性多色画像シートの製造方法 |
JP3921730B2 (ja) * | 1997-04-08 | 2007-05-30 | 三菱化学株式会社 | カラーフィルター用光重合性組成物 |
JPH1138226A (ja) * | 1997-07-17 | 1999-02-12 | Jsr Corp | カラーフィルタ用感放射線性組成物 |
-
1999
- 1999-07-14 JP JP2000560487A patent/JP2002520679A/ja active Pending
- 1999-07-14 EP EP99954589A patent/EP1012671B1/en not_active Expired - Lifetime
- 1999-07-14 TW TW88112034A patent/TW575799B/zh active
- 1999-07-14 WO PCT/US1999/015904 patent/WO2000004421A1/en active IP Right Grant
- 1999-07-14 DE DE69911558T patent/DE69911558T2/de not_active Expired - Lifetime
- 1999-07-14 CN CN99801142A patent/CN1274432A/zh active Pending
- 1999-07-14 KR KR1020007002648A patent/KR100664496B1/ko not_active IP Right Cessation
-
2001
- 2001-09-05 US US10/178,165 patent/US20020182522A1/en not_active Abandoned
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20030051183A (ko) * | 2001-09-28 | 2003-06-25 | 후지 샤신 필름 가부시기가이샤 | 감광성 전사 재료, 포토마스크 재료, 포토마스크 및포토마스크의 제조방법 |
KR100923697B1 (ko) * | 2001-09-28 | 2009-10-27 | 후지필름 가부시키가이샤 | 포토마스크 재료 및 포토마스크의 제조방법 |
KR101252321B1 (ko) * | 2005-06-30 | 2013-04-08 | 도레이 카부시키가이샤 | 감광성 수지 조성물 및 접착 개량제 |
KR100860432B1 (ko) * | 2006-03-17 | 2008-09-25 | 도쿄 오카 고교 가부시키가이샤 | 흑색 감광성 조성물 |
KR20190058445A (ko) * | 2016-09-30 | 2019-05-29 | 도레이 카부시키가이샤 | 네가티브형 감광성 수지 조성물, 경화막, 경화막을 구비하는 소자 및 표시 장치, 및 그 제조 방법 |
Also Published As
Publication number | Publication date |
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JP2002520679A (ja) | 2002-07-09 |
DE69911558D1 (de) | 2003-10-30 |
TW575799B (en) | 2004-02-11 |
EP1012671B1 (en) | 2003-09-24 |
EP1012671A1 (en) | 2000-06-28 |
WO2000004421A1 (en) | 2000-01-27 |
KR100664496B1 (ko) | 2007-01-03 |
EP1012671A4 (en) | 2000-12-06 |
US20020182522A1 (en) | 2002-12-05 |
DE69911558T2 (de) | 2004-06-24 |
CN1274432A (zh) | 2000-11-22 |
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