KR102491215B1 - 착색 스페이서 형성용 감광성 착색 조성물, 경화물, 착색 스페이서, 화상 표시 장치 - Google Patents

착색 스페이서 형성용 감광성 착색 조성물, 경화물, 착색 스페이서, 화상 표시 장치 Download PDF

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KR102491215B1
KR102491215B1 KR1020177025400A KR20177025400A KR102491215B1 KR 102491215 B1 KR102491215 B1 KR 102491215B1 KR 1020177025400 A KR1020177025400 A KR 1020177025400A KR 20177025400 A KR20177025400 A KR 20177025400A KR 102491215 B1 KR102491215 B1 KR 102491215B1
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mass
coloring composition
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KR20170126912A (ko
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아츠야 이토
요시히데 오가와
다케시 오츠
리화 페이
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미쯔비시 케미컬 주식회사
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/44Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B57/00Other synthetic dyes of known constitution
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09CTREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/44Carbon
    • C09C1/48Carbon black
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1339Gaskets; Spacers; Sealing of cells
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1339Gaskets; Spacers; Sealing of cells
    • G02F1/13398Spacer materials; Spacer properties
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
  • Paints Or Removers (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Pyrane Compounds (AREA)
  • Indole Compounds (AREA)
KR1020177025400A 2015-03-11 2016-03-10 착색 스페이서 형성용 감광성 착색 조성물, 경화물, 착색 스페이서, 화상 표시 장치 KR102491215B1 (ko)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JPJP-P-2015-048577 2015-03-11
JP2015048577 2015-03-11
JPJP-P-2015-048578 2015-03-11
JP2015048578 2015-03-11
JP2015157456 2015-08-07
JPJP-P-2015-157456 2015-08-07
PCT/JP2016/057678 WO2016143878A1 (ja) 2015-03-11 2016-03-10 着色スペーサー形成用感光性着色組成物、硬化物、着色スペーサー、画像表示装置

Publications (2)

Publication Number Publication Date
KR20170126912A KR20170126912A (ko) 2017-11-20
KR102491215B1 true KR102491215B1 (ko) 2023-01-20

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KR1020177025400A KR102491215B1 (ko) 2015-03-11 2016-03-10 착색 스페이서 형성용 감광성 착색 조성물, 경화물, 착색 스페이서, 화상 표시 장치

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JP (3) JP7131907B2 (ja)
KR (1) KR102491215B1 (ja)
CN (2) CN113608408A (ja)
TW (2) TWI776205B (ja)
WO (1) WO2016143878A1 (ja)

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TWI717193B (zh) * 2015-03-30 2021-01-21 日商富士軟片股份有限公司 著色感光性組成物、硬化膜、圖案形成方法、帶遮光膜的紅外線截止濾光片、固體攝像元件、圖像顯示裝置及紅外感測器
KR102363104B1 (ko) * 2015-08-31 2022-02-15 후지필름 가부시키가이샤 착색 감광성 조성물, 경화막, 컬러 필터, 차광막, 고체 촬상 소자, 화상 표시 장치, 및 경화막의 제조 방법
KR20190062374A (ko) * 2016-10-14 2019-06-05 미쯔비시 케미컬 주식회사 감광성 착색 조성물, 경화물, 착색 스페이서, 화상 표시 장치
KR102080235B1 (ko) * 2016-10-28 2020-02-21 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용한 흑색 감광성 수지막 및 컬러필터
KR101980062B1 (ko) * 2017-02-15 2019-05-17 미쯔비시 케미컬 주식회사 감광성 착색 조성물, 경화물, 착색 스페이서, 화상 표시 장치
JP7396786B2 (ja) * 2017-02-24 2023-12-12 日鉄ケミカル&マテリアル株式会社 遮光膜用の感光性樹脂組成物、遮光膜、液晶表示装置、スペーサー機能を有する遮光膜の製造方法、および液晶表示装置の製造方法
KR102300328B1 (ko) * 2017-03-29 2021-09-09 동우 화인켐 주식회사 흑색 감광성 수지 조성물, 이를 이용하여 제조된 표시 장치
JP2018205605A (ja) * 2017-06-07 2018-12-27 三菱ケミカル株式会社 着色感光性樹脂組成物、硬化物、有機電界発光素子、画像表示装置及び照明
JP7351221B2 (ja) * 2017-06-30 2023-09-27 三菱ケミカル株式会社 感光性着色組成物、硬化物、着色スペーサー、及び画像表示装置
JP7051321B2 (ja) * 2017-07-21 2022-04-11 東京応化工業株式会社 感光性組成物、パターン形成方法、硬化物、及び表示装置
JP7079581B2 (ja) * 2017-08-31 2022-06-02 東京応化工業株式会社 感光性組成物、硬化物形成方法、硬化物、画像表示装置用パネル、及び画像表示装置
JP6374595B1 (ja) * 2017-09-26 2018-08-15 東京応化工業株式会社 感光性樹脂組成物、硬化膜、表示装置、及びパターン形成方法
KR101923832B1 (ko) * 2017-11-20 2019-02-27 동우 화인켐 주식회사 착색 감광성 수지 조성물 및 이로부터 형성되는 패턴층, 이를 포함하는 컬러필터 및 이를 포함하는 액정 디스플레이 장치
JP7095989B2 (ja) * 2017-12-28 2022-07-05 東京応化工業株式会社 感光性組成物、硬化物、硬化物形成方法、カラーフィルター、及び画像表示装置
KR102509789B1 (ko) 2018-03-29 2023-03-20 동우 화인켐 주식회사 착색 감광성 수지 조성물, 컬러 필터 및 이를 구비한 화상 표시 장치
JP7360798B2 (ja) * 2019-02-21 2023-10-13 サカタインクス株式会社 着色組成物、及び、それを含有する着色レジスト組成物
JP7263153B2 (ja) * 2019-06-27 2023-04-24 東京応化工業株式会社 感光性組成物、硬化物、ブラックマトリクス、ブラックバンク、カラーフィルター、画像表示装置、及びパターン化された硬化膜の製造方法
KR102615366B1 (ko) * 2019-09-06 2023-12-19 미쯔비시 케미컬 주식회사 화상 표시 장치용의 안료 분산액
JP7439530B2 (ja) 2020-01-23 2024-02-28 Toppanホールディングス株式会社 光モジュール及び表示装置
KR20220095288A (ko) 2020-12-29 2022-07-07 삼성디스플레이 주식회사 표시 장치 및 이를 포함하는 타일형 표시 장치
CN113372757A (zh) * 2021-07-29 2021-09-10 业成科技(成都)有限公司 紫外光固化油墨

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JP2014237809A (ja) 2013-05-10 2014-12-18 富士フイルム株式会社 着色組成物、着色硬化膜、カラーフィルタ、固体撮像素子および画像表示装置

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