KR102348544B1 - 묘화 장치 및 묘화 방법 - Google Patents

묘화 장치 및 묘화 방법 Download PDF

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Publication number
KR102348544B1
KR102348544B1 KR1020197019194A KR20197019194A KR102348544B1 KR 102348544 B1 KR102348544 B1 KR 102348544B1 KR 1020197019194 A KR1020197019194 A KR 1020197019194A KR 20197019194 A KR20197019194 A KR 20197019194A KR 102348544 B1 KR102348544 B1 KR 102348544B1
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KR
South Korea
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KR1020197019194A
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English (en)
Korean (ko)
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KR20190088546A (ko
Inventor
다츠야 나가오
요시나오 노리미츠
가즈히로 나카이
기요시 기타무라
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가부시키가이샤 스크린 홀딩스
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Publication of KR20190088546A publication Critical patent/KR20190088546A/ko
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Publication of KR102348544B1 publication Critical patent/KR102348544B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70508—Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020197019194A 2017-03-24 2017-11-30 묘화 장치 및 묘화 방법 KR102348544B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2017-058912 2017-03-24
JP2017058912A JP6783172B2 (ja) 2017-03-24 2017-03-24 描画装置および描画方法
PCT/JP2017/043021 WO2018173371A1 (ja) 2017-03-24 2017-11-30 描画装置および描画方法

Publications (2)

Publication Number Publication Date
KR20190088546A KR20190088546A (ko) 2019-07-26
KR102348544B1 true KR102348544B1 (ko) 2022-01-06

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020197019194A KR102348544B1 (ko) 2017-03-24 2017-11-30 묘화 장치 및 묘화 방법

Country Status (5)

Country Link
JP (1) JP6783172B2 (ja)
KR (1) KR102348544B1 (ja)
CN (1) CN110249266B (ja)
TW (1) TWI648603B (ja)
WO (1) WO2018173371A1 (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7478029B2 (ja) * 2020-06-01 2024-05-02 住友重機械工業株式会社 画像データ生成装置及び画像データ生成方法
JP7458950B2 (ja) * 2020-09-23 2024-04-01 株式会社Ｓｃｒｅｅｎホールディングス 描画システム
JP7521988B2 (ja) * 2020-09-23 2024-07-24 株式会社Ｓｃｒｅｅｎホールディングス 基板位置検出方法、描画方法、基板位置検出装置および描画装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007079383A (ja) 2005-09-16 2007-03-29 Fujifilm Corp 描画データ取得方法および装置並びに描画方法および装置
JP2012209379A (ja) 2011-03-29 2012-10-25 Dainippon Screen Mfg Co Ltd パターン描画方法、パターン描画装置およびコンピュータプログラム
JP2015026738A (ja) * 2013-07-26 2015-02-05 株式会社Ｓｃｒｅｅｎホールディングス 位置決め装置、位置決め方法および描画装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1074261A (ja) * 1996-08-30 1998-03-17 Kokusai Gijutsu Kaihatsu Kk パターン欠陥検出装置
JP3350400B2 (ja) * 1997-06-02 2002-11-25 シャープ株式会社 投影露光装置
JP4020248B2 (ja) * 2002-06-06 2007-12-12 大日本スクリーン製造株式会社 光描画装置および光描画方法
US7143264B2 (en) * 2002-10-10 2006-11-28 Intel Corporation Apparatus and method for performing data access in accordance with memory access patterns
JP2005259863A (ja) * 2004-03-10 2005-09-22 Tokyo Seimitsu Co Ltd 電子線露光装置及び電子線露光方法
KR101391215B1 (ko) * 2005-09-30 2014-05-26 후지필름 가부시키가이샤 묘화 장치 및 화상 데이터의 작성 방법
JP2008089868A (ja) * 2006-09-29 2008-04-17 Fujifilm Corp 描画点データ取得方法および装置ならびに描画方法および装置
JP6190254B2 (ja) * 2013-12-04 2017-08-30 株式会社ニューフレアテクノロジー マルチ荷電粒子ビーム描画装置及びマルチ荷電粒子ビーム描画方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007079383A (ja) 2005-09-16 2007-03-29 Fujifilm Corp 描画データ取得方法および装置並びに描画方法および装置
JP2012209379A (ja) 2011-03-29 2012-10-25 Dainippon Screen Mfg Co Ltd パターン描画方法、パターン描画装置およびコンピュータプログラム
JP2015026738A (ja) * 2013-07-26 2015-02-05 株式会社Ｓｃｒｅｅｎホールディングス 位置決め装置、位置決め方法および描画装置

Also Published As

Publication number Publication date
TWI648603B (zh) 2019-01-21
CN110249266B (zh) 2021-08-27
JP6783172B2 (ja) 2020-11-11
TW201843530A (zh) 2018-12-16
WO2018173371A1 (ja) 2018-09-27
JP2018163202A (ja) 2018-10-18
KR20190088546A (ko) 2019-07-26
CN110249266A (zh) 2019-09-17

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