KR102096961B1 - 표시 패널 제조 방법 - Google Patents

표시 패널 제조 방법 Download PDF

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Publication number
KR102096961B1
KR102096961B1 KR1020207004470A KR20207004470A KR102096961B1 KR 102096961 B1 KR102096961 B1 KR 102096961B1 KR 1020207004470 A KR1020207004470 A KR 1020207004470A KR 20207004470 A KR20207004470 A KR 20207004470A KR 102096961 B1 KR102096961 B1 KR 102096961B1
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KR
South Korea
Prior art keywords
mask
substrate
cylindrical
display panel
illumination
Prior art date
Application number
KR1020207004470A
Other languages
English (en)
Korean (ko)
Other versions
KR20200019782A (ko
Inventor
마사키 가토
Original Assignee
가부시키가이샤 니콘
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 가부시키가이샤 니콘 filed Critical 가부시키가이샤 니콘
Publication of KR20200019782A publication Critical patent/KR20200019782A/ko
Application granted granted Critical
Publication of KR102096961B1 publication Critical patent/KR102096961B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Liquid Crystal (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
KR1020207004470A 2013-04-30 2014-03-26 표시 패널 제조 방법 KR102096961B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2013-095647 2013-04-30
JP2013095647 2013-04-30
PCT/JP2014/058590 WO2014178244A1 (ja) 2013-04-30 2014-03-26 基板処理装置、デバイス製造方法及び円筒マスク

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020197025601A Division KR102079793B1 (ko) 2013-04-30 2014-03-26 주사 노광 방법

Publications (2)

Publication Number Publication Date
KR20200019782A KR20200019782A (ko) 2020-02-24
KR102096961B1 true KR102096961B1 (ko) 2020-04-03

Family

ID=51843379

Family Applications (5)

Application Number Title Priority Date Filing Date
KR1020207004470A KR102096961B1 (ko) 2013-04-30 2014-03-26 표시 패널 제조 방법
KR1020187034082A KR101979562B1 (ko) 2013-04-30 2014-03-26 원통 마스크
KR1020187034083A KR102019620B1 (ko) 2013-04-30 2014-03-26 원통 마스크
KR1020157033942A KR101924255B1 (ko) 2013-04-30 2014-03-26 기판 처리 장치, 디바이스 제조 방법 및 원통 마스크
KR1020197025601A KR102079793B1 (ko) 2013-04-30 2014-03-26 주사 노광 방법

Family Applications After (4)

Application Number Title Priority Date Filing Date
KR1020187034082A KR101979562B1 (ko) 2013-04-30 2014-03-26 원통 마스크
KR1020187034083A KR102019620B1 (ko) 2013-04-30 2014-03-26 원통 마스크
KR1020157033942A KR101924255B1 (ko) 2013-04-30 2014-03-26 기판 처리 장치, 디바이스 제조 방법 및 원통 마스크
KR1020197025601A KR102079793B1 (ko) 2013-04-30 2014-03-26 주사 노광 방법

Country Status (6)

Country Link
JP (5) JP6269660B2 (ja)
KR (5) KR102096961B1 (ja)
CN (4) CN108227408B (ja)
HK (3) HK1246405B (ja)
TW (5) TWI610143B (ja)
WO (1) WO2014178244A1 (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6269660B2 (ja) * 2013-04-30 2018-01-31 株式会社ニコン 基板処理装置、デバイス製造方法及び円筒マスク
KR102541913B1 (ko) * 2016-03-30 2023-06-13 가부시키가이샤 니콘 패턴 묘화 장치, 패턴 묘화 방법, 및 디바이스 제조 방법
WO2017199658A1 (ja) * 2016-05-19 2017-11-23 株式会社ニコン 基板支持装置、露光装置、および、パターニング装置
CN114096797B (zh) * 2020-01-31 2024-03-22 日本精工株式会社 旋转角度传感器、电动助力转向装置以及旋转角度传感器的制造方法

Citations (4)

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JP2011221536A (ja) 2010-04-13 2011-11-04 Nikon Corp マスク移動装置、露光装置、基板処理装置及びデバイス製造方法
JP2012252076A (ja) 2011-06-01 2012-12-20 Nikon Corp 露光装置
WO2013065429A1 (ja) 2011-11-04 2013-05-10 株式会社ニコン 基板処理装置、及び基板処理方法
WO2013105317A1 (ja) 2012-01-12 2013-07-18 株式会社ニコン 基板処理装置、基板処理方法、及び円筒状マスク

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JPH01128069A (ja) * 1987-11-12 1989-05-19 Dainippon Screen Mfg Co Ltd スリット走査露光式複写カメラの試写像露光装置
JPH01175730A (ja) * 1987-12-29 1989-07-12 Matsushita Electric Ind Co Ltd 露光装置
US5640227A (en) 1993-12-06 1997-06-17 Nikon Corporation Exposure apparatus and exposure method for minimizing defocusing of the transferred pattern
US6018383A (en) * 1997-08-20 2000-01-25 Anvik Corporation Very large area patterning system for flexible substrates
JP2000035677A (ja) * 1998-07-17 2000-02-02 Adtec Engineeng:Kk 露光装置
US6411362B2 (en) * 1999-01-04 2002-06-25 International Business Machines Corporation Rotational mask scanning exposure method and apparatus
AU2003211404A1 (en) * 2002-02-28 2003-09-09 Fujitsu Limited Dynamic pressure bearing manufacturing method, dynamic pressure bearing, and dynamic pressure bearing manufacturing device
JP2007227438A (ja) * 2006-02-21 2007-09-06 Nikon Corp 露光装置及び方法並びに光露光用マスク
JP4984631B2 (ja) 2006-04-28 2012-07-25 株式会社ニコン 露光装置及び方法、露光用マスク、並びにデバイス製造方法
TWI457723B (zh) * 2006-09-08 2014-10-21 尼康股份有限公司 A mask, an exposure device, and an element manufacturing method
JP2009026933A (ja) * 2007-07-19 2009-02-05 Konica Minolta Holdings Inc 電磁波遮蔽フィルムの製造方法及び電磁波遮蔽フィルム
JP2009237305A (ja) * 2008-03-27 2009-10-15 Mitsubishi Paper Mills Ltd マスクパターンフィルムの巻き付け機構及び露光装置
US20130027684A1 (en) * 2010-04-13 2013-01-31 Tohru Kiuchi Exposure apparatus, substrate processing apparatus, and device manufacturing method
JP5724564B2 (ja) * 2010-04-13 2015-05-27 株式会社ニコン マスクケース、マスクユニット、露光装置、基板処理装置及びデバイス製造方法
WO2013035489A1 (ja) * 2011-09-06 2013-03-14 株式会社ニコン 基板処理装置
WO2013035661A1 (ja) * 2011-09-07 2013-03-14 株式会社ニコン 基板処理装置
JP5594328B2 (ja) * 2012-07-19 2014-09-24 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法。
KR101405251B1 (ko) * 2012-09-10 2014-06-17 경북대학교 산학협력단 노광 장치 및 이를 사용한 기판 처리 장치
JP6269660B2 (ja) * 2013-04-30 2018-01-31 株式会社ニコン 基板処理装置、デバイス製造方法及び円筒マスク

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011221536A (ja) 2010-04-13 2011-11-04 Nikon Corp マスク移動装置、露光装置、基板処理装置及びデバイス製造方法
JP2012252076A (ja) 2011-06-01 2012-12-20 Nikon Corp 露光装置
WO2013065429A1 (ja) 2011-11-04 2013-05-10 株式会社ニコン 基板処理装置、及び基板処理方法
WO2013105317A1 (ja) 2012-01-12 2013-07-18 株式会社ニコン 基板処理装置、基板処理方法、及び円筒状マスク

Also Published As

Publication number Publication date
KR102019620B1 (ko) 2019-09-06
HK1245419B (zh) 2019-11-29
HK1215308A1 (zh) 2016-08-19
JP2019074769A (ja) 2019-05-16
CN108227408A (zh) 2018-06-29
TW202014807A (zh) 2020-04-16
JP6638835B2 (ja) 2020-01-29
TWI646407B (zh) 2019-01-01
JP6816814B2 (ja) 2021-01-20
CN105359040B (zh) 2018-01-19
KR101979562B1 (ko) 2019-05-16
CN107390480A (zh) 2017-11-24
HK1246405B (zh) 2020-05-15
TW201809909A (zh) 2018-03-16
JP2020064317A (ja) 2020-04-23
JPWO2014178244A1 (ja) 2017-02-23
CN105359040A (zh) 2016-02-24
TWI681263B (zh) 2020-01-01
JP2019070840A (ja) 2019-05-09
TWI610143B (zh) 2018-01-01
JP6269660B2 (ja) 2018-01-31
CN107390480B (zh) 2019-08-13
TWI717946B (zh) 2021-02-01
KR20180128520A (ko) 2018-12-03
CN107255910B (zh) 2019-04-02
KR20200019782A (ko) 2020-02-24
KR20160003181A (ko) 2016-01-08
CN107255910A (zh) 2017-10-17
KR102079793B1 (ko) 2020-02-21
JP2018081320A (ja) 2018-05-24
TWI677767B (zh) 2019-11-21
WO2014178244A1 (ja) 2014-11-06
JP6662473B2 (ja) 2020-03-11
KR20190104256A (ko) 2019-09-06
KR20180128521A (ko) 2018-12-03
KR101924255B1 (ko) 2018-11-30
CN108227408B (zh) 2020-02-14
TW201445262A (zh) 2014-12-01
JP6485535B2 (ja) 2019-03-20
TW201907244A (zh) 2019-02-16
TW201908880A (zh) 2019-03-01

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