KR101932769B1 - 염 및 착색 경화성 조성물 - Google Patents
염 및 착색 경화성 조성물 Download PDFInfo
- Publication number
- KR101932769B1 KR101932769B1 KR1020120066701A KR20120066701A KR101932769B1 KR 101932769 B1 KR101932769 B1 KR 101932769B1 KR 1020120066701 A KR1020120066701 A KR 1020120066701A KR 20120066701 A KR20120066701 A KR 20120066701A KR 101932769 B1 KR101932769 B1 KR 101932769B1
- Authority
- KR
- South Korea
- Prior art keywords
- parts
- formula
- group
- salt
- meth
- Prior art date
Links
- 0 CC(C)(CC1)c(cc2C(c(cccc3)c3C(*3C(CCCOCCOC)C3)=C)=C3C=C4C(C)(C)CC5)c6N1CCC(C)(C)c6c2OC3=C(C(C)(C)CC1)C4=CC1C5O Chemical compound CC(C)(CC1)c(cc2C(c(cccc3)c3C(*3C(CCCOCCOC)C3)=C)=C3C=C4C(C)(C)CC5)c6N1CCC(C)(C)c6c2OC3=C(C(C)(C)CC1)C4=CC1C5O 0.000 description 9
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C311/00—Amides of sulfonic acids, i.e. compounds having singly-bound oxygen atoms of sulfo groups replaced by nitrogen atoms, not being part of nitro or nitroso groups
- C07C311/01—Sulfonamides having sulfur atoms of sulfonamide groups bound to acyclic carbon atoms
- C07C311/02—Sulfonamides having sulfur atoms of sulfonamide groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton
- C07C311/09—Sulfonamides having sulfur atoms of sulfonamide groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton the carbon skeleton being further substituted by at least two halogen atoms
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B11/00—Diaryl- or thriarylmethane dyes
- C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
- C09B11/10—Amino derivatives of triarylmethanes
- C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D285/00—Heterocyclic compounds containing rings having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by groups C07D275/00 - C07D283/00
- C07D285/15—Six-membered rings
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B49/00—Sulfur dyes
- C09B49/12—Sulfur dyes from other compounds, e.g. other heterocyclic compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B69/00—Dyes not provided for by a single group of this subclass
- C09B69/02—Dyestuff salts, e.g. salts of acid dyes with basic dyes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K19/00—Liquid crystal materials
- C09K19/52—Liquid crystal materials characterised by components which are not liquid crystals, e.g. additives with special physical aspect: solvents, solid particles
- C09K19/58—Dopants or charge transfer agents
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
- G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Structural Engineering (AREA)
- Optics & Photonics (AREA)
- Optical Filters (AREA)
- Materials For Photolithography (AREA)
- Pyrane Compounds (AREA)
- Plural Heterocyclic Compounds (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
Applications Claiming Priority (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2011-140335 | 2011-06-24 | ||
JP2011140335 | 2011-06-24 | ||
JPJP-P-2011-162918 | 2011-07-26 | ||
JP2011162918 | 2011-07-26 | ||
JPJP-P-2011-169888 | 2011-08-03 | ||
JP2011169888 | 2011-08-03 | ||
JP2011195701 | 2011-09-08 | ||
JPJP-P-2011-195701 | 2011-09-08 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20130001146A KR20130001146A (ko) | 2013-01-03 |
KR101932769B1 true KR101932769B1 (ko) | 2018-12-27 |
Family
ID=47366338
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020120066701A KR101932769B1 (ko) | 2011-06-24 | 2012-06-21 | 염 및 착색 경화성 조성물 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5993626B2 (zh) |
KR (1) | KR101932769B1 (zh) |
CN (1) | CN102838578B (zh) |
TW (1) | TWI534209B (zh) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5807568B2 (ja) * | 2011-02-14 | 2015-11-10 | 住友化学株式会社 | 着色感光性樹脂組成物及び化合物 |
KR101992867B1 (ko) * | 2013-03-29 | 2019-06-25 | 동우 화인켐 주식회사 | 착색 감광성 수지 조성물 |
WO2014196661A1 (ja) * | 2013-06-07 | 2014-12-11 | 住友化学株式会社 | 着色硬化性樹脂組成物 |
JP6152074B2 (ja) * | 2013-07-05 | 2017-06-21 | 富士フイルム株式会社 | 色素多量体、着色組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子および画像表示装置 |
JP6333604B2 (ja) * | 2013-07-09 | 2018-05-30 | 富士フイルム株式会社 | 着色組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子、および画像表示装置 |
JP6453493B2 (ja) * | 2013-07-09 | 2019-01-16 | 富士フイルム株式会社 | 着色組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子、および画像表示装置 |
JP6018984B2 (ja) | 2013-07-31 | 2016-11-02 | 富士フイルム株式会社 | 着色組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子および画像表示装置 |
JP6496350B2 (ja) * | 2013-09-06 | 2019-04-03 | 富士フイルム株式会社 | 着色組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子、画像表示装置、ポリマー、キサンテン色素 |
CN104516200B (zh) * | 2013-10-07 | 2019-10-18 | 东友精细化工有限公司 | 着色固化性树脂组合物 |
TW201525077A (zh) * | 2013-12-19 | 2015-07-01 | Fujifilm Corp | 著色組成物、著色組成物的製造方法、硬化膜、彩色濾光片、彩色濾光片的製造方法、固體攝像元件及液晶顯示裝置 |
KR102423136B1 (ko) * | 2014-11-11 | 2022-07-20 | 스미또모 가가꾸 가부시키가이샤 | 착색 경화성 수지 조성물 |
EP3235876A4 (en) * | 2014-12-18 | 2018-09-12 | FUJIFILM Wako Pure Chemical Corporation | Quencher |
KR101856051B1 (ko) * | 2015-10-14 | 2018-05-09 | 삼성에스디아이 주식회사 | 감광성 수지 조성물, 이를 이용한 감광성 수지막 및 컬러필터 |
JP6722442B2 (ja) * | 2015-12-21 | 2020-07-15 | 東友ファインケム株式会社Dongwoo Fine−Chem Co., Ltd. | 化合物、着色硬化性樹脂組成物、カラーフィルタ及び液晶表示装置 |
JP6889543B2 (ja) * | 2016-01-14 | 2021-06-18 | 東友ファインケム株式会社Dongwoo Fine−Chem Co., Ltd. | 染料溶解液の製造方法 |
KR102378450B1 (ko) * | 2016-03-31 | 2022-03-23 | 스미또모 가가꾸 가부시끼가이샤 | 착색 경화성 수지 조성물 |
US11565146B2 (en) | 2019-11-21 | 2023-01-31 | Lg Electronics Inc. | Treadmill having adjustable inclination |
US11559041B2 (en) | 2019-11-22 | 2023-01-24 | Lg Electronics Inc. | Treadmill having sensors |
US11576352B2 (en) | 2019-11-21 | 2023-02-14 | Lg Electronics Inc. | Treadmill having sterilizer |
US11576351B2 (en) | 2019-11-21 | 2023-02-14 | Lg Electronics Inc. | Treadmill |
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JP2007503477A (ja) * | 2003-08-21 | 2007-02-22 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフトング | シアノホウ酸塩、フルオロアルキルリン酸塩、フルオロアルキルホウ酸塩またはイミド染料 |
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-
2012
- 2012-06-18 JP JP2012136587A patent/JP5993626B2/ja active Active
- 2012-06-21 KR KR1020120066701A patent/KR101932769B1/ko active IP Right Grant
- 2012-06-21 CN CN201210212238.1A patent/CN102838578B/zh active Active
- 2012-06-22 TW TW101122481A patent/TWI534209B/zh active
Patent Citations (1)
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JP2007503477A (ja) * | 2003-08-21 | 2007-02-22 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフトング | シアノホウ酸塩、フルオロアルキルリン酸塩、フルオロアルキルホウ酸塩またはイミド染料 |
Also Published As
Publication number | Publication date |
---|---|
TWI534209B (zh) | 2016-05-21 |
TW201311831A (zh) | 2013-03-16 |
KR20130001146A (ko) | 2013-01-03 |
JP5993626B2 (ja) | 2016-09-14 |
CN102838578A (zh) | 2012-12-26 |
JP2013067776A (ja) | 2013-04-18 |
CN102838578B (zh) | 2016-03-16 |
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