KR101019444B1 - 액 처리 장치 - Google Patents
액 처리 장치 Download PDFInfo
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- KR101019444B1 KR101019444B1 KR1020070037375A KR20070037375A KR101019444B1 KR 101019444 B1 KR101019444 B1 KR 101019444B1 KR 1020070037375 A KR1020070037375 A KR 1020070037375A KR 20070037375 A KR20070037375 A KR 20070037375A KR 101019444 B1 KR101019444 B1 KR 101019444B1
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- 239000007788 liquid Substances 0.000 title claims abstract description 176
- 239000000758 substrate Substances 0.000 claims abstract description 79
- 238000000034 method Methods 0.000 claims abstract description 23
- 238000007599 discharging Methods 0.000 claims description 6
- 239000003595 mist Substances 0.000 description 17
- 238000004381 surface treatment Methods 0.000 description 13
- 238000004140 cleaning Methods 0.000 description 7
- 230000002093 peripheral effect Effects 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 7
- 125000006850 spacer group Chemical group 0.000 description 7
- 239000002245 particle Substances 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- 230000002411 adverse Effects 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000000356 contaminant Substances 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 230000004308 accommodation Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
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- 238000009792 diffusion process Methods 0.000 description 1
- 230000003028 elevating effect Effects 0.000 description 1
- 238000002309 gasification Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68728—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of separate clamping members, e.g. clamping fingers
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Weting (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Coating Apparatus (AREA)
Abstract
Description
Claims (12)
- 기판을 수평으로 유지하고, 기판과 함께 회전 가능한 기판 유지부와,상기 기판 유지부에 유지된 기판을 둘러싸며, 기판과 함께 회전 가능한 회전 컵과,상기 회전 컵 및 상기 기판 유지부를 일체적으로 회전시키는 회전 기구와,기판에 처리액을 공급하는 액 공급 기구와,상기 회전 컵의 배기 및 배액을 행하는 배기·배액부를 포함하고, 상기 배기·배액부는, 기판으로부터 털어진 처리액을 받아서 배액하며 환형을 이루는 배액 컵과, 상기 배액 컵의 외측에 상기 배액 컵을 둘러싸도록 설치되고, 상기 회전 컵 및 그 주위로부터 기체 성분을 받아서 배기하는 배기 컵을 포함하며, 상기 배액 컵으로부터의 배액과 상기 배기 컵으로부터의 배기가 각각 독립적으로 행해지는 것인 액 처리 장치.
- 제1항에 있어서, 상기 기판 유지부상의 기판의 외측에, 상기 기판 유지부 및 상기 회전 컵과 함께 회전하도록 설치되고, 기판으로부터 털어진 처리액을 기판의 외측으로 유도하는 안내 부재를 더 포함하는 액 처리 장치.
- 제1항에 있어서, 상기 회전 컵은 기판으로부터 털어진 처리액을 수평 방향으로 배출하는 처리액 배출부를 포함하고, 상기 배액 컵은 상기 회전 컵의 외측을 둘러싸도록 설치되며, 수평 방향으로 배출된 배액을 받는 것인 액 처리 장치.
- 제1항에 있어서, 상기 회전 컵은 기판으로부터 털어진 처리액을 받아서 하방으로 안내하는 안내벽과, 받은 처리액을 하방으로 배출하는 개구부를 포함하고, 상기 배액 컵은 상기 개구부를 둘러싸도록 설치되며, 하방으로 배출된 배액을 받는 것인 액 처리 장치.
- 제1항에 있어서, 상기 배기 컵은, 상기 회전 컵의 위쪽에 원환형의 도입구가 형성되도록 배치되는 것인 액 처리 장치.
- 제1항에 있어서, 상기 배기 컵은 벽부에 주위의 분위기를 수집하는 유입구를 포함하고 있는 것인 액 처리 장치.
- 기판을 수평으로 유지하고, 기판과 함께 회전 가능한 기판 유지부와,상기 기판 유지부에 유지된 기판을 둘러싸며, 기판과 함께 회전 가능한 회전 컵과,상기 회전 컵 및 상기 기판 유지부를 일체적으로 회전시키는 회전 기구와,기판의 표면에 처리액을 공급하는 표면 액 공급 기구와,기판의 이면에 처리액을 공급하는 이면 액 공급 기구와,상기 회전 컵의 배기 및 배액을 행하는 배기·배액부를 포함하고, 상기 배기·배액부는, 기판으로부터 털어진 처리액을 받아서 배액하며 환형을 이루는 배액 컵과, 상기 배액 컵의 외측에 상기 배액 컵을 둘러싸도록 설치되며, 상기 회전 컵 및 그 주위로부터 기체 성분을 받아서 배기하는 배기 컵을 포함하고, 상기 배액 컵으로부터의 배액과 상기 배기 컵으로부터의 배기가 각각 독립적으로 행해지는 것인 액 처리 장치.
- 제7항에 있어서, 상기 기판 유지부상의 기판의 외측에, 상기 기판 유지부 및 상기 회전 컵과 함께 회전하도록 설치되고, 기판으로부터 털어진 처리액을 기판의 외측으로 유도하는 안내 부재를 더 포함하는 액 처리 장치.
- 제7항에 있어서, 상기 회전 컵은 기판으로부터 털어진 처리액을 수평 방향으로 배출하는 처리액 배출부를 포함하고, 상기 배액 컵은 상기 회전 컵의 외측을 둘러싸도록 설치되며, 수평 방향으로 배출된 배액을 받는 것인 액 처리 장치.
- 제7항에 있어서, 상기 회전 컵은 기판으로부터 털어진 처리액을 받아서 하방으로 안내하는 안내벽과, 받은 처리액을 하방으로 배출하는 개구부를 포함하고, 상기 배액 컵은 상기 개구부를 둘러싸도록 설치되며, 하방으로 배출된 배액을 받는 것인 액 처리 장치.
- 제7항에 있어서, 상기 배기 컵은, 상기 회전 컵의 위쪽에 원환형의 도입구가 형성되도록 배치되는 것인 액 처리 장치.
- 제7항에 있어서, 상기 배기 컵은, 벽부에 주위의 분위기를 수집하는 유입구를 포함하고 있는 것인 액 처리 장치.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2006-00114959 | 2006-04-18 | ||
JP2006114959 | 2006-04-18 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20070103310A KR20070103310A (ko) | 2007-10-23 |
KR101019444B1 true KR101019444B1 (ko) | 2011-03-07 |
Family
ID=38121611
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020070037375A KR101019444B1 (ko) | 2006-04-18 | 2007-04-17 | 액 처리 장치 |
Country Status (8)
Country | Link |
---|---|
US (1) | US7793610B2 (ko) |
EP (1) | EP1848024B1 (ko) |
JP (1) | JP5156114B2 (ko) |
KR (1) | KR101019444B1 (ko) |
CN (1) | CN101060069B (ko) |
AT (1) | ATE445229T1 (ko) |
DE (1) | DE602007002660D1 (ko) |
TW (1) | TW200802563A (ko) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5312856B2 (ja) * | 2008-06-27 | 2013-10-09 | 大日本スクリーン製造株式会社 | 基板処理装置 |
CN101992165B (zh) * | 2009-08-27 | 2012-10-24 | 沈阳芯源微电子设备有限公司 | 一种用于圆形薄片状物体进行化学液喷洒处理的装置 |
US8541309B2 (en) | 2010-12-03 | 2013-09-24 | Applied Materials, Inc. | Processing assembly for semiconductor workpiece and methods of processing same |
US9799537B2 (en) * | 2010-12-03 | 2017-10-24 | Applied Materials, Inc. | Processing assembly for semiconductor workpiece and methods of processing same |
JP5472169B2 (ja) * | 2011-03-16 | 2014-04-16 | 東京エレクトロン株式会社 | 液処理装置、液処理方法および記憶媒体 |
JP5387636B2 (ja) * | 2011-08-31 | 2014-01-15 | 東京エレクトロン株式会社 | 液処理装置 |
JP5596071B2 (ja) * | 2012-03-09 | 2014-09-24 | 東京エレクトロン株式会社 | 液処理装置 |
JP6057624B2 (ja) | 2012-09-03 | 2017-01-11 | 株式会社Screenセミコンダクターソリューションズ | カップおよび基板処理装置 |
JP6281161B2 (ja) * | 2013-09-27 | 2018-02-21 | 東京エレクトロン株式会社 | 液処理装置 |
TWI569349B (zh) | 2013-09-27 | 2017-02-01 | 斯克林集團公司 | 基板處理裝置及基板處理方法 |
JP6090113B2 (ja) * | 2013-10-30 | 2017-03-08 | 東京エレクトロン株式会社 | 液処理装置 |
CN103567175A (zh) * | 2013-10-30 | 2014-02-12 | 广西钦州天山微电子有限公司 | 铬板清洗机 |
CN103639089A (zh) * | 2013-11-14 | 2014-03-19 | 上海和辉光电有限公司 | 显影剂喷涂装置及方法 |
CN103691631B (zh) * | 2013-12-16 | 2016-01-27 | 南通大学 | 带保护结构的匀胶机托盘 |
JP6287750B2 (ja) * | 2013-12-27 | 2018-03-07 | 東京エレクトロン株式会社 | 基板液処理装置 |
CN108155133B (zh) | 2014-02-27 | 2022-04-15 | 斯克林集团公司 | 基板处理装置 |
KR102277539B1 (ko) * | 2014-09-17 | 2021-07-15 | 세메스 주식회사 | 기판 처리 장치 및 컵 유닛 |
JP6797526B2 (ja) * | 2014-11-11 | 2020-12-09 | 株式会社荏原製作所 | 基板洗浄装置 |
CN105161442B (zh) * | 2015-07-21 | 2018-02-23 | 北京七星华创电子股份有限公司 | 一种清洗液体收集装置 |
CN112053970A (zh) * | 2019-06-05 | 2020-12-08 | 东京毅力科创株式会社 | 基板处理装置 |
CN111069219B (zh) * | 2019-12-27 | 2022-06-07 | 上海至纯洁净***科技股份有限公司 | 一种排液罩以及半导体清洗设备 |
TWI800064B (zh) * | 2021-10-29 | 2023-04-21 | 弘塑科技股份有限公司 | 單晶圓濕處理設備 |
CN117153740B (zh) * | 2023-10-31 | 2024-02-09 | 宁波润华全芯微电子设备有限公司 | 一种晶圆加工装置 |
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JP2002170804A (ja) | 2000-12-04 | 2002-06-14 | Dainippon Screen Mfg Co Ltd | 基板処理装置及び基板処理方法 |
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2007
- 2007-04-17 KR KR1020070037375A patent/KR101019444B1/ko active IP Right Grant
- 2007-04-17 DE DE602007002660T patent/DE602007002660D1/de active Active
- 2007-04-17 TW TW096113507A patent/TW200802563A/zh unknown
- 2007-04-17 US US11/785,352 patent/US7793610B2/en active Active
- 2007-04-17 EP EP07007785A patent/EP1848024B1/en not_active Expired - Fee Related
- 2007-04-17 AT AT07007785T patent/ATE445229T1/de active
- 2007-04-18 CN CN2007100961846A patent/CN101060069B/zh active Active
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2011
- 2011-08-09 JP JP2011173580A patent/JP5156114B2/ja active Active
Patent Citations (4)
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US5997653A (en) | 1996-10-07 | 1999-12-07 | Tokyo Electron Limited | Method for washing and drying substrates |
JP2002170804A (ja) | 2000-12-04 | 2002-06-14 | Dainippon Screen Mfg Co Ltd | 基板処理装置及び基板処理方法 |
EP1335412A2 (en) | 2002-01-30 | 2003-08-13 | Dainippon Screen Mfg. Co., Ltd. | Substrate treatment apparatus and substrate treatment method |
US20040180141A1 (en) * | 2003-03-10 | 2004-09-16 | Shinji Kobayashi | Coating and processing apparatus and method |
Also Published As
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US20070240638A1 (en) | 2007-10-18 |
JP5156114B2 (ja) | 2013-03-06 |
ATE445229T1 (de) | 2009-10-15 |
DE602007002660D1 (de) | 2009-11-19 |
EP1848024B1 (en) | 2009-10-07 |
CN101060069A (zh) | 2007-10-24 |
TWI353632B (ko) | 2011-12-01 |
KR20070103310A (ko) | 2007-10-23 |
TW200802563A (en) | 2008-01-01 |
CN101060069B (zh) | 2010-11-03 |
EP1848024A1 (en) | 2007-10-24 |
JP2011238967A (ja) | 2011-11-24 |
US7793610B2 (en) | 2010-09-14 |
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