KR100966190B1 - 투영 광학계 및 노광장치 - Google Patents
투영 광학계 및 노광장치 Download PDFInfo
- Publication number
- KR100966190B1 KR100966190B1 KR1020080044230A KR20080044230A KR100966190B1 KR 100966190 B1 KR100966190 B1 KR 100966190B1 KR 1020080044230 A KR1020080044230 A KR 1020080044230A KR 20080044230 A KR20080044230 A KR 20080044230A KR 100966190 B1 KR100966190 B1 KR 100966190B1
- Authority
- KR
- South Korea
- Prior art keywords
- concave
- reflection surface
- optical system
- projection optical
- reflecting surface
- Prior art date
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Images
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70325—Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lenses or solid immersion lenses
- G03F7/70333—Focus drilling, i.e. increase in depth of focus for exposure by modulating focus during exposure [FLEX]
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007129797A JP5196869B2 (ja) | 2007-05-15 | 2007-05-15 | 投影光学系、露光装置及びデバイス製造方法 |
JPJP-P-2007-00129797 | 2007-05-15 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20080101695A KR20080101695A (ko) | 2008-11-21 |
KR100966190B1 true KR100966190B1 (ko) | 2010-06-25 |
Family
ID=40146698
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020080044230A KR100966190B1 (ko) | 2007-05-15 | 2008-05-14 | 투영 광학계 및 노광장치 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP5196869B2 (ja) |
KR (1) | KR100966190B1 (ja) |
TW (1) | TWI440988B (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6635904B2 (ja) | 2016-10-14 | 2020-01-29 | キヤノン株式会社 | 投影光学系、露光装置及び物品の製造方法 |
JP6882053B2 (ja) * | 2016-12-05 | 2021-06-02 | キヤノン株式会社 | カタディオプトリック光学系、照明光学系、露光装置および物品製造方法 |
JP7167417B2 (ja) * | 2017-03-30 | 2022-11-09 | 株式会社ニデック | 眼底撮影装置および眼科装置 |
JP7357488B2 (ja) | 2019-09-04 | 2023-10-06 | キヤノン株式会社 | 露光装置、および物品製造方法 |
JP7332415B2 (ja) * | 2019-10-01 | 2023-08-23 | キヤノン株式会社 | 投影光学系、走査露光装置および物品製造方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09180985A (ja) * | 1995-12-25 | 1997-07-11 | Nikon Corp | 投影露光装置 |
JP2006078592A (ja) | 2004-09-07 | 2006-03-23 | Canon Inc | 投影光学系及びそれを有する露光装置 |
US7158215B2 (en) | 2003-06-30 | 2007-01-02 | Asml Holding N.V. | Large field of view protection optical system with aberration correctability for flat panel displays |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1103498A (en) * | 1977-02-11 | 1981-06-23 | Abe Offner | Wide annulus unit power optical system |
JPS5890610A (ja) * | 1981-11-24 | 1983-05-30 | Matsushita Electric Ind Co Ltd | カタデイオプトリツク光学系 |
JPS60168116A (ja) * | 1984-02-13 | 1985-08-31 | Canon Inc | 反射光学系 |
JPS60201316A (ja) * | 1984-03-26 | 1985-10-11 | Canon Inc | 反射光学系 |
JPH0553057A (ja) * | 1991-08-26 | 1993-03-05 | Nikon Corp | 反射光学系 |
US6229595B1 (en) * | 1995-05-12 | 2001-05-08 | The B. F. Goodrich Company | Lithography system and method with mask image enlargement |
JP2008089832A (ja) * | 2006-09-29 | 2008-04-17 | Canon Inc | 露光装置 |
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2007
- 2007-05-15 JP JP2007129797A patent/JP5196869B2/ja active Active
-
2008
- 2008-05-06 TW TW097116652A patent/TWI440988B/zh active
- 2008-05-14 KR KR1020080044230A patent/KR100966190B1/ko active IP Right Grant
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09180985A (ja) * | 1995-12-25 | 1997-07-11 | Nikon Corp | 投影露光装置 |
US7158215B2 (en) | 2003-06-30 | 2007-01-02 | Asml Holding N.V. | Large field of view protection optical system with aberration correctability for flat panel displays |
JP2006078592A (ja) | 2004-09-07 | 2006-03-23 | Canon Inc | 投影光学系及びそれを有する露光装置 |
Also Published As
Publication number | Publication date |
---|---|
TW200903187A (en) | 2009-01-16 |
KR20080101695A (ko) | 2008-11-21 |
TWI440988B (zh) | 2014-06-11 |
JP5196869B2 (ja) | 2013-05-15 |
JP2008286888A (ja) | 2008-11-27 |
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