KR100966190B1 - 투영 광학계 및 노광장치 - Google Patents

투영 광학계 및 노광장치 Download PDF

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Publication number
KR100966190B1
KR100966190B1 KR1020080044230A KR20080044230A KR100966190B1 KR 100966190 B1 KR100966190 B1 KR 100966190B1 KR 1020080044230 A KR1020080044230 A KR 1020080044230A KR 20080044230 A KR20080044230 A KR 20080044230A KR 100966190 B1 KR100966190 B1 KR 100966190B1
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KR
South Korea
Prior art keywords
concave
reflection surface
optical system
projection optical
reflecting surface
Prior art date
Application number
KR1020080044230A
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English (en)
Korean (ko)
Other versions
KR20080101695A (ko
Inventor
료우스케 후쿠오카
Original Assignee
캐논 가부시끼가이샤
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Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20080101695A publication Critical patent/KR20080101695A/ko
Application granted granted Critical
Publication of KR100966190B1 publication Critical patent/KR100966190B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70325—Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lenses or solid immersion lenses
    • G03F7/70333—Focus drilling, i.e. increase in depth of focus for exposure by modulating focus during exposure [FLEX]

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020080044230A 2007-05-15 2008-05-14 투영 광학계 및 노광장치 KR100966190B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007129797A JP5196869B2 (ja) 2007-05-15 2007-05-15 投影光学系、露光装置及びデバイス製造方法
JPJP-P-2007-00129797 2007-05-15

Publications (2)

Publication Number Publication Date
KR20080101695A KR20080101695A (ko) 2008-11-21
KR100966190B1 true KR100966190B1 (ko) 2010-06-25

Family

ID=40146698

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020080044230A KR100966190B1 (ko) 2007-05-15 2008-05-14 투영 광학계 및 노광장치

Country Status (3)

Country Link
JP (1) JP5196869B2 (ja)
KR (1) KR100966190B1 (ja)
TW (1) TWI440988B (ja)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6635904B2 (ja) 2016-10-14 2020-01-29 キヤノン株式会社 投影光学系、露光装置及び物品の製造方法
JP6882053B2 (ja) * 2016-12-05 2021-06-02 キヤノン株式会社 カタディオプトリック光学系、照明光学系、露光装置および物品製造方法
JP7167417B2 (ja) * 2017-03-30 2022-11-09 株式会社ニデック 眼底撮影装置および眼科装置
JP7357488B2 (ja) 2019-09-04 2023-10-06 キヤノン株式会社 露光装置、および物品製造方法
JP7332415B2 (ja) * 2019-10-01 2023-08-23 キヤノン株式会社 投影光学系、走査露光装置および物品製造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09180985A (ja) * 1995-12-25 1997-07-11 Nikon Corp 投影露光装置
JP2006078592A (ja) 2004-09-07 2006-03-23 Canon Inc 投影光学系及びそれを有する露光装置
US7158215B2 (en) 2003-06-30 2007-01-02 Asml Holding N.V. Large field of view protection optical system with aberration correctability for flat panel displays

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1103498A (en) * 1977-02-11 1981-06-23 Abe Offner Wide annulus unit power optical system
JPS5890610A (ja) * 1981-11-24 1983-05-30 Matsushita Electric Ind Co Ltd カタデイオプトリツク光学系
JPS60168116A (ja) * 1984-02-13 1985-08-31 Canon Inc 反射光学系
JPS60201316A (ja) * 1984-03-26 1985-10-11 Canon Inc 反射光学系
JPH0553057A (ja) * 1991-08-26 1993-03-05 Nikon Corp 反射光学系
US6229595B1 (en) * 1995-05-12 2001-05-08 The B. F. Goodrich Company Lithography system and method with mask image enlargement
JP2008089832A (ja) * 2006-09-29 2008-04-17 Canon Inc 露光装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09180985A (ja) * 1995-12-25 1997-07-11 Nikon Corp 投影露光装置
US7158215B2 (en) 2003-06-30 2007-01-02 Asml Holding N.V. Large field of view protection optical system with aberration correctability for flat panel displays
JP2006078592A (ja) 2004-09-07 2006-03-23 Canon Inc 投影光学系及びそれを有する露光装置

Also Published As

Publication number Publication date
TW200903187A (en) 2009-01-16
KR20080101695A (ko) 2008-11-21
TWI440988B (zh) 2014-06-11
JP5196869B2 (ja) 2013-05-15
JP2008286888A (ja) 2008-11-27

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