JPS62120355U - - Google Patents

Info

Publication number
JPS62120355U
JPS62120355U JP811886U JP811886U JPS62120355U JP S62120355 U JPS62120355 U JP S62120355U JP 811886 U JP811886 U JP 811886U JP 811886 U JP811886 U JP 811886U JP S62120355 U JPS62120355 U JP S62120355U
Authority
JP
Japan
Prior art keywords
semiconductor device
wiring
radius
utility
scope
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP811886U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP811886U priority Critical patent/JPS62120355U/ja
Publication of JPS62120355U publication Critical patent/JPS62120355U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本考案にかかる配線のコーナー部を示
す図、第2図は半導体チツプの部分平面図、第3
図a,bは従来の配線のコーナー部を示す図であ
る。 図において、1は電源配線、2は信号配線、1
1は従来の配線、12は絶縁膜、21は本考案に
かかる配線、を示している。
FIG. 1 is a diagram showing a corner part of the wiring according to the present invention, FIG. 2 is a partial plan view of a semiconductor chip, and FIG.
Figures a and b are diagrams showing corner portions of conventional wiring. In the figure, 1 is a power supply wiring, 2 is a signal wiring, 1
1 is a conventional wiring, 12 is an insulating film, and 21 is a wiring according to the present invention.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 半導体装置の上面に設けた内部配線がコーナー
部で半径0.5μm以上の曲面を有していること
を特徴とする半導体装置。
A semiconductor device characterized in that internal wiring provided on an upper surface of the semiconductor device has a curved surface with a radius of 0.5 μm or more at a corner portion.
JP811886U 1986-01-22 1986-01-22 Pending JPS62120355U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP811886U JPS62120355U (en) 1986-01-22 1986-01-22

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP811886U JPS62120355U (en) 1986-01-22 1986-01-22

Publications (1)

Publication Number Publication Date
JPS62120355U true JPS62120355U (en) 1987-07-30

Family

ID=30792202

Family Applications (1)

Application Number Title Priority Date Filing Date
JP811886U Pending JPS62120355U (en) 1986-01-22 1986-01-22

Country Status (1)

Country Link
JP (1) JPS62120355U (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005533367A (en) * 2001-11-21 2005-11-04 ゼネラル セミコンダクター,インク. Integrated circuit that prevents the generation of cracks in the passivation layer
JP2016174021A (en) * 2015-03-16 2016-09-29 株式会社東芝 Semiconductor device
JP2016195286A (en) * 2010-01-15 2016-11-17 ローム株式会社 Semiconductor device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5389688A (en) * 1977-01-19 1978-08-07 Hitachi Ltd Semiconductor device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5389688A (en) * 1977-01-19 1978-08-07 Hitachi Ltd Semiconductor device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005533367A (en) * 2001-11-21 2005-11-04 ゼネラル セミコンダクター,インク. Integrated circuit that prevents the generation of cracks in the passivation layer
JP2010147498A (en) * 2001-11-21 2010-07-01 General Semiconductor Inc Method of manufacturing integrated circuit resistant to formation of crack in passivation layer
JP2016195286A (en) * 2010-01-15 2016-11-17 ローム株式会社 Semiconductor device
JP2016174021A (en) * 2015-03-16 2016-09-29 株式会社東芝 Semiconductor device
US9899346B2 (en) 2015-03-16 2018-02-20 Kabushiki Kaisha Toshiba Semiconductor device

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