JPS6062121A - Discharger for photo-resist - Google Patents
Discharger for photo-resistInfo
- Publication number
- JPS6062121A JPS6062121A JP17077183A JP17077183A JPS6062121A JP S6062121 A JPS6062121 A JP S6062121A JP 17077183 A JP17077183 A JP 17077183A JP 17077183 A JP17077183 A JP 17077183A JP S6062121 A JPS6062121 A JP S6062121A
- Authority
- JP
- Japan
- Prior art keywords
- photoresist
- resist
- photo
- valve
- discharge port
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Coating Apparatus (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は半導体素子製造工程における半導体基板（以下
ウェハと呼ぶ）にフォトレジストを塗布処理をするフォ
トレジスト塗布装置内のフォトレジスト吐出装置に関す
るものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a photoresist discharging device included in a photoresist coating device that applies photoresist to a semiconductor substrate (hereinafter referred to as a wafer) in a semiconductor device manufacturing process.
フォトレジスト吐出装置はウェハ上に一定量の粘度の均
一な塵埃を含まないフォトレジストを吐出する条件を必
要とする。A photoresist discharging apparatus requires conditions for discharging a uniform amount of dust-free photoresist of a certain viscosity onto a wafer.
一般的に前記条件のうち粘度の均一性を保つ上でフォト
レジスト吐出口の先端からの溶剤の揮発を低く押さえ、
かつフォトレジスト吐出口先端の溜り量の垂れ落ちを防
止するため、フォトレジスト吐出後、若干量のフォトレ
ジストを引き戻す方法が採用されている。このフォトレ
ジストの引き戻し量は適正量に調整された後、常に安定
していなければ、前記フォトレジスト吐出装置の条件を
満足できない。Generally, among the above conditions, in order to maintain uniformity of viscosity, volatilization of the solvent from the tip of the photoresist discharge port is kept low;
In addition, in order to prevent the accumulated amount of photoresist from dripping at the tip of the photoresist discharge port, a method is adopted in which a certain amount of photoresist is pulled back after the photoresist is discharged. The conditions of the photoresist discharging apparatus cannot be satisfied unless the amount of photoresist pullback is always stable after being adjusted to an appropriate amount.
又、近年フォトリソグラフィによるレジストパターンは
よシ一層の微細化を要求されており、ウェハ上に形成さ
れるフォトレジストは均一なものが必要となっている。Further, in recent years, resist patterns formed by photolithography are required to be made even finer, and the photoresist formed on the wafer needs to be uniform.
そのため、フォトレジスト内の塵埃及び一部粘度が高く
膠化したフォトレジストを除去しなければならない。前
記フォトレジスト内の異物を除去する方法としてフォト
レジスト吐出時、フィルターを通過させることが行われ
ておシ、このフィルターの組み込み位置として、吐出口
末端に近い方が好ましいことは説明するまでもない。Therefore, it is necessary to remove dust within the photoresist and some of the photoresist that has a high viscosity and has become agglomerated. As a method of removing foreign matter from the photoresist, it is used to pass the photoresist through a filter when discharging it, and it goes without saying that it is preferable to install this filter near the end of the discharge port. .
従来のフォトレジスト吐出装置には、前記したフォトレ
ジスト引き戻し方法として、ベローズ又はピストン・シ
リンダー構造による吐出手段の吐出動作終了後の吸引動
作時に吐出口側からもフォトレジストを若干量吸引する
方法、又は吐出手段以外にこれと同様に定量機能をもっ
た引き戻し手段を備え、該引き戻し手段でフォトレジス
トを吸引して引き戻す方法が採用されているが、いずれ
の場合も吐出口末端近くにフィルターのように容積の大
きな部品を設けることにより安定した引き戻し量を確保
することは困難である。Conventional photoresist dispensing devices have a method of pulling back the photoresist as described above, including a method in which a small amount of photoresist is also sucked from the discharge port side during a suction operation after the discharging operation of the discharging means with a bellows or piston-cylinder structure is completed; In addition to the discharge means, a pull-back means having a quantitative function is also provided, and the pull-back means sucks the photoresist and pulls it back. It is difficult to ensure a stable amount of pullback by providing parts with large volumes.
したがって、従来のフォトレジスト吐出装置では一般的
にその吐出手段の吸引側にフィルターを設は使用されて
いるが、その吐出手段の吐出動作による塵埃発生が比較
的多く、好ましい状態で使用されていないのが実情であ
る。Therefore, in conventional photoresist dispensing devices, a filter is generally installed on the suction side of the dispensing means, but the discharging operation of the dispensing means generates a relatively large amount of dust, making it difficult to use the device in desirable conditions. That is the reality.
本発明は前記問題点を解消し、安定した引き戻し量を確
保し、かつ吐出口末端近くへフィルターを設けることを
可能としたフォトレジスト吐出装置である。The present invention is a photoresist dispensing device that solves the above-mentioned problems, ensures a stable pullback amount, and makes it possible to provide a filter near the end of the discharging port.
以下に、本発明の一実施例を図により説明する。An embodiment of the present invention will be described below with reference to the drawings.
図において、フォトレジスト吐出口１に空気作動弁等よ
りなる第１の開閉弁２及びフォトレジスト用フィルター
３を介して、エアシリンダーとベローズ等による定量機
能をもったフォトレジストの主吐出手段４を配、管接続
し、フォトレジスト用フィルター３に空気作動弁等より
なる第２の開閉弁５を介して、エアシリンダーとベロー
ズ等による定量機能をもった引き戻し手段６を配管接続
する。さらに第１の逆止弁７を介して第１の開閉弁２と
フォトレジスト吐出口１との中間にフォトレジストの引
き戻し手段６を主吐出手段４と並列に配管接続し、また
、主吐出手段４に第２の逆止弁８を介してフォトレジス
ト吸引口９を設け、該吸引口９をフォトレジスト貯蔵容
器１０に接続する。In the figure, a photoresist main discharging means 4 having a quantitative function such as an air cylinder and bellows is connected to a photoresist discharging port 1 via a first on-off valve 2 such as an air-operated valve and a photoresist filter 3. A pull-back means 6 having a metering function such as an air cylinder and bellows is connected to the photoresist filter 3 via a second on-off valve 5 such as an air-operated valve. Further, a photoresist pull-back means 6 is pipe-connected in parallel with the main discharge means 4 between the first on-off valve 2 and the photoresist discharge port 1 via the first check valve 7. 4 is provided with a photoresist suction port 9 via a second check valve 8, and the suction port 9 is connected to a photoresist storage container 10.
本発明によるフォトレジスト吐出装置の動作について説
明する。まず、主吐出手段４と引き戻し手段６の吐出動
作及び第１の開閉弁２と第２の開閉弁５の開動作を同時
に行い、主吐出手段４からフォトレジストをフィルター
３を通してフォトレジスト吐出口１に供給する。次に、
一定時間経過後又は主吐出手段４及び引き腐し手段６の
復帰行程動作の終了後、主吐出手段４の吸引動作及び第
１の開閉弁２と第２の開閉弁５の閉動作を同時に行い、
主吐出手段４により容器１０よりフォトレジストを吸い
上ける。一定時間経過後又は主吐出手段４の吸引行程動
作の終了後、引き戻し手段６の吸引動作を行い第１の開
閉弁２からフォトレジスト吐出口１までの小さく閉ざさ
れた空間内のフォトレジストを逆止弁７を介して引き戻
すものである。The operation of the photoresist discharging apparatus according to the present invention will be explained. First, the main discharge means 4 and the pull-back means 6 perform the discharge operation and the first on-off valve 2 and the second on-off valve 5 open the photoresist from the main discharge means 4 through the filter 3 to the photoresist discharge port 1. supply to. next,
After a certain period of time has elapsed or after the return stroke operation of the main discharge means 4 and the rotting means 6 is completed, the suction operation of the main discharge means 4 and the closing operation of the first on-off valve 2 and the second on-off valve 5 are performed simultaneously. ,
The photoresist is sucked up from the container 10 by the main discharge means 4. After a certain period of time has elapsed or after the suction stroke operation of the main discharge means 4 is completed, the pull-back means 6 performs the suction operation to reverse the photoresist in the small closed space from the first on-off valve 2 to the photoresist discharge port 1. It is pulled back via the stop valve 7.
したがって、本発明によれば、フォトレジストは主吐出
手段４より吐出された後にフィルター３を通過してフォ
トレジスト吐出口に供給されるから、塵埃を含まない清
浄なレジストを供給できる。Therefore, according to the present invention, since the photoresist is discharged from the main discharge means 4, passes through the filter 3, and is supplied to the photoresist discharge port, a clean resist containing no dust can be supplied.
一方、第１の開閉弁２を閉じることにより形成される第
１の開閉弁２から吐出口１までの小さく閉ざされた空間
より逆止弁７を介し引き戻し手段６によシフオドレジス
トの引き戻しを行うため、安定した引き戻し量が確保で
きる。On the other hand, the shifted resist is pulled back by the pull-back means 6 via the check valve 7 from the small closed space formed by closing the first on-off valve 2 and the discharge port 1. As a result, a stable amount of pullback can be ensured.
以上説明したように、本発明にょシ良好なフォトレジス
ト吐出装置を提供でき、半導体素子製造工程に多大な効
果をもたらすものである。As explained above, the present invention can provide a highly satisfactory photoresist discharging apparatus, which brings great effects to the semiconductor device manufacturing process.
図は本発明の一実施例を示す構成図である。 The figure is a configuration diagram showing an embodiment of the present invention.
Claims (1)
ォトレジストの主吐出手段を配管接続するとともに、該
フォトレジスト吐出口に第１の逆止弁を介してフォトレ
ジストの引き戻し手段を主吐出手段と並列に配管接続し
、主吐出手段に第２の逆止弁を介してフォトレジスト吸
引口を設け、さらに主吐出手段と第１の開閉弁との中間
にフォトレジスト用フィルターを設置し、かつ第２の開
閉弁を介して該フィルターに引き戻し手段を配管接続し
たことを特徴とするフォトレジスト吐出装置。(1) A main photoresist discharging means is connected to the photoresist discharge port via a first on-off valve, and a main photoresist pulling means is connected to the photoresist discharge port via a first check valve. A photoresist suction port is connected to the main discharge means via a second check valve, and a photoresist filter is installed between the main discharge means and the first on-off valve. A photoresist dispensing apparatus characterized in that a pull-back means is connected to the filter via a second on-off valve.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17077183A JPS6062121A (en) | 1983-09-16 | 1983-09-16 | Discharger for photo-resist |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17077183A JPS6062121A (en) | 1983-09-16 | 1983-09-16 | Discharger for photo-resist |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6062121A true JPS6062121A (en) | 1985-04-10 |
| JPH0145974B2 JPH0145974B2 (en) | 1989-10-05 |
Family
ID=15911067
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17077183A Granted JPS6062121A (en) | 1983-09-16 | 1983-09-16 | Discharger for photo-resist |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6062121A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1988002281A1 (en) * | 1986-10-03 | 1988-04-07 | Nordson Corporation | Method and apparatus for precisely discharging small quantities of liquid |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4935435A (en) * | 1972-08-09 | 1974-04-02 | ||
| JPS5898641U (en) * | 1981-12-25 | 1983-07-05 | 凸版印刷株式会社 | resist supply device |
-
1983
- 1983-09-16 JP JP17077183A patent/JPS6062121A/en active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4935435A (en) * | 1972-08-09 | 1974-04-02 | ||
| JPS5898641U (en) * | 1981-12-25 | 1983-07-05 | 凸版印刷株式会社 | resist supply device |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1988002281A1 (en) * | 1986-10-03 | 1988-04-07 | Nordson Corporation | Method and apparatus for precisely discharging small quantities of liquid |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0145974B2 (en) | 1989-10-05 |
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