JPS5835579A - Manufacture of reflection type hologram - Google Patents
Manufacture of reflection type hologramInfo
- Publication number
- JPS5835579A JPS5835579A JP13498881A JP13498881A JPS5835579A JP S5835579 A JPS5835579 A JP S5835579A JP 13498881 A JP13498881 A JP 13498881A JP 13498881 A JP13498881 A JP 13498881A JP S5835579 A JPS5835579 A JP S5835579A
- Authority
- JP
- Japan
- Prior art keywords
- resin
- layer
- hologram
- curable resin
- sheet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 229920005989 resin Polymers 0.000 claims abstract description 33
- 239000011347 resin Substances 0.000 claims abstract description 33
- 230000001681 protective effect Effects 0.000 claims abstract description 16
- 239000000463 material Substances 0.000 claims description 15
- 238000000034 method Methods 0.000 claims description 10
- 239000010410 layer Substances 0.000 abstract description 22
- 239000010409 thin film Substances 0.000 abstract description 8
- 239000011241 protective layer Substances 0.000 abstract description 5
- 239000000178 monomer Substances 0.000 abstract description 4
- 239000004925 Acrylic resin Substances 0.000 abstract description 2
- 238000010521 absorption reaction Methods 0.000 abstract description 2
- 239000011521 glass Substances 0.000 abstract description 2
- 229920000915 polyvinyl chloride Polymers 0.000 abstract 1
- 239000004800 polyvinyl chloride Substances 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 229920003002 synthetic resin Polymers 0.000 description 3
- 239000000057 synthetic resin Substances 0.000 description 3
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 229910001111 Fine metal Inorganic materials 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 241000269821 Scombridae Species 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 235000020640 mackerel Nutrition 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- -1 polypropylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H1/024—Hologram nature or properties
- G03H1/0244—Surface relief holograms
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2250/00—Laminate comprising a hologram layer
- G03H2250/36—Conform enhancement layer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2250/00—Laminate comprising a hologram layer
- G03H2250/37—Enclosing the photosensitive material
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Holo Graphy (AREA)
Abstract
Description
【発明の詳細な説明】
本発明はホログラムの製造方法に関し、さらに詳しくは
光反射層を有する反射型ホログラムの製造方法に関する
ものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a hologram, and more particularly to a method for manufacturing a reflection hologram having a light reflective layer.
ホログラムは通常銀塩感材上に作られるが、ホログラム
パターンを凹凸で形成しても得られる、すなわち、フォ
トレジストを塗布した乾板にホログラム像を露光した後
、現像して乾板上に凹凸像を得る。しかるのち、この像
を形成している凹凸面上に銅を蒸着して導電性を付与す
る。続いてこの銅面な負極としてニッケルメッキを施ｆ
０取扱いに耐え得る厚さまでニッケル層を電着した後に
これを感光剤面より剥離し、次いで導電性を与えるため
に蒸着した銅を溶解して取り除き、ニッケルの面を露呈
させ、成形用の型が得られる。銅を除去した型の表面に
は前述の露光・現像により得られた凹凸面が凹凸逆にな
って複製されている。Holograms are usually made on silver salt sensitive materials, but they can also be obtained by forming a hologram pattern with unevenness.In other words, a hologram image is exposed to light on a dry plate coated with photoresist, and then developed to form an uneven image on the dry plate. obtain. Thereafter, copper is deposited on the uneven surface forming the image to impart conductivity. Next, nickel plating was applied to this copper surface as a negative electrode.
After electrodepositing a nickel layer to a thickness that can withstand handling, this is peeled off from the photosensitive material surface, and then the vapor-deposited copper to provide conductivity is melted and removed to expose the nickel surface, which is then molded into a mold. is obtained. On the surface of the mold from which the copper has been removed, the uneven surface obtained by the above-described exposure and development is duplicated with the unevenness reversed.
この面もホログラム像を形成することはもちろんである
。Of course, this surface also forms a hologram image.
このようにして得られた型のパターンを例えば熱可塑性
合成樹脂或は熱硬化性合成樹脂等の合成樹脂に転写成型
することにより透過型のホログラムを得ることができる
。A transmission type hologram can be obtained by transfer-molding the mold pattern thus obtained onto a synthetic resin such as a thermoplastic synthetic resin or a thermosetting synthetic resin.
このような透過光にて鑑賞する透過型ホログラムのパタ
ーン面に真空蒸着、スパッタリング等の方法によって金
属薄膜を形成すれば、この金属薄膜が光反射層となって
反射型ホログラムが得られることになる。If a thin metal film is formed by vacuum deposition, sputtering, or other methods on the patterned surface of a transmission hologram that is viewed using transmitted light, this thin metal film will become a light-reflecting layer and a reflection hologram will be obtained. .
従来の反射型ホログラムはこの金属薄膜が露出しており
、従ってスクラッチキズに弱く、一旦キズをつけてしま
うと商品としての効果はゼロに等しくなってしまうため
、その取扱いに多大の注意を要するものである。このよ
うなキズを防止するためパターン面である金属薄膜上に
保護層を設けることによりその取扱いのむずかしさは一
挙に解消するのである。Conventional reflective holograms have exposed metal thin films, and are therefore susceptible to scratches, and once they are scratched, their effectiveness as a product is reduced to zero, so they must be handled with great care. It is. In order to prevent such scratches, by providing a protective layer on the metal thin film, which is the pattern surface, the difficulty of handling it can be solved at once.
本発明はこのような視点に基づいてなさｊたもので、光
反射層である金属薄膜を良好に保護するとともに両面か
らの鑑賞を可能とする反射型ホログラムの製造方法を提
供するものである。The present invention was made based on this viewpoint, and provides a method for manufacturing a reflection hologram that can protect the metal thin film that is the light reflection layer well and enable viewing from both sides.
以下に本発明を図面の実施例に基づき詳細に説明する。The present invention will be explained in detail below based on embodiments of the drawings.
第１図は本発明方法の模式的説明図であり、第２図は本
発明方法により製造されたホログラムの断面を表す説明
図である。FIG. 1 is a schematic explanatory diagram of the method of the present invention, and FIG. 2 is an explanatory diagram showing a cross section of a hologram manufactured by the method of the present invention.
第１図に於いて、（１）は保護層が設けらｔていない従
来の反射型ホログラムであり、これは片面罠パターンが
形成されてなる基層（２）及びこの基層（２）のパター
ン形成面に設けられた金属薄膜よりなる光反射層（３）
とから構成されている。In FIG. 1, (1) is a conventional reflection hologram that is not provided with a protective layer. Light reflecting layer (3) made of a thin metal film provided on the surface
It is composed of.
このような反射型ホログラム（１）の光反射層（３）と
紫外線透過ガラス等よりなる対振（１１１上の保護材シ
ー ） （４）との間に紫外線硬化型樹脂（５）を置く
。An ultraviolet curable resin (5) is placed between the light reflection layer (3) of such a reflection hologram (1) and the anti-oscillator (protective material sheet on 111) (4) made of ultraviolet transmitting glass or the like.
この保護材シートは硬化される紫外線硬化型樹脂との接
着が良く、かつ紫外線吸収の少ない材質例えば塩化ビニ
ル樹脂、アクリル樹脂等が適しており、更に加えて硬化
した樹脂層とほぼ等しい屈折率をもっているものである
ことが好ましい。なお、保護材シートについては、紫外
線を透過させることが前提となるが、着色してあっても
差支えない。この場合、特殊な効果を求めることもでき
る。This protective material sheet is suitably made of a material that has good adhesion to the UV-curable resin to be cured and has low UV absorption, such as vinyl chloride resin or acrylic resin, and also has a refractive index almost equal to that of the cured resin layer. It is preferable that the Note that the protective material sheet is required to transmit ultraviolet rays, but it may be colored. In this case, it is also possible to obtain special effects.
次に紫外線硬化型樹脂について説明すると、その構成は
、ラジカル重合性の不飽和基を有するプレポリマーとエ
チレン性の不飽和基をもつモノマーを主成分とし、それ
に若干の重合開始剤と助剤を加えた構成で２５０〜３８
０ｎｍの領域、特に３６０ｎｒｒ）付近の紫外光を照射
することによりモノマーが線状ポリマー間を架橋して三
次元の網目構造を形成するものである。このようなプレ
ポリマーとしては、例えばエポキシアクリレート、ウレ
タンアクリレート等があり、モノマーの例としては、ｎ
−ブチルアクリレート、ｎ−ブチルメタアクリレート等
がある。Next, we will explain about ultraviolet curable resin. Its composition is mainly composed of a prepolymer having a radically polymerizable unsaturated group and a monomer having an ethylenically unsaturated group, and some polymerization initiators and auxiliaries. 250-38 with added configuration
By irradiating ultraviolet light in the 0 nm region, especially around 360 nrr), the monomer crosslinks the linear polymers to form a three-dimensional network structure. Examples of such prepolymers include epoxy acrylate, urethane acrylate, etc., and examples of monomers include n
-butyl acrylate, n-butyl methacrylate, etc.
この様な紫外線硬化型樹脂を第１図に示す様に配置し、
反射型ホログラム（１）を下降又は対振αυ及び保護材
シート（４）を上昇させつつ、反射型ホログラム（１）
と保護材シート（４）の間に紫外線硬化型樹脂（５）を
はさみつける形で押圧する。流動性の高い紫外線硬化型
樹脂（５）は保護材シート上面に拡がってうずく延ばさ
れると同時に、上側の反射型ホログラム（１）ツバター
ン面（５）に満たされてい（。Arrange such ultraviolet curable resin as shown in Figure 1,
While lowering the reflective hologram (1) or raising the anti-vibration αυ and protective material sheet (4), the reflective hologram (1)
The ultraviolet curable resin (5) is sandwiched and pressed between the protective material sheet (4) and the protective material sheet (4). The highly fluid ultraviolet curable resin (5) spreads and undulates on the upper surface of the protective material sheet, and at the same time fills the brim-turning surface (5) of the upper reflective hologram (1).
紫外線硬化型樹脂が十分に薄く拡がった時点で、対振（
１１１の下側に配設した超高圧水銀灯等の紫外線ランプ
αのより紫外光を照射する。紫外線硬化型樹脂層の厚み
は１〜７１μｍとし、好ましくは２５μｍ以下である。When the ultraviolet curable resin has spread sufficiently thinly, the anti-oscillation (
Ultraviolet light is irradiated from an ultraviolet lamp α such as an ultra-high-pressure mercury lamp arranged below 111. The thickness of the ultraviolet curable resin layer is 1 to 71 μm, preferably 25 μm or less.
これは単に樹脂の節約だけでなく、より本質的には成形
後の変形を避けるためであり、又、紫外光の照射時間、
言い換えれば樹脂層の硬化時間が長くならないようにす
る為でもある。紫外光の照射は２ＫＷの超高圧水銀灯で
照射距離２５ｃｍの場合、２〜５秒で良く、より強力な
紫外光であれば１秒又はそれ以下にすることも可能であ
る。This is not only to save resin, but also to avoid deformation after molding, and also to reduce the irradiation time of ultraviolet light.
In other words, this is to prevent the curing time of the resin layer from becoming too long. Irradiation of ultraviolet light can be done for 2 to 5 seconds using a 2KW ultra-high pressure mercury lamp at an irradiation distance of 25 cm, and can be irradiated for 1 second or less if the ultraviolet light is more powerful.
紫外線硬化型樹脂が完全に硬化した時点で対置ａＩｌ上
から取り出すことにより第２図に示されるような金属薄
膜よりなる光反射層（３）を中心に、その両側に基層（
２）、紫外−硬化型樹脂層（５）及び保護材シート層（
４）が配された反射型ホログラムを得ることができる。When the ultraviolet curable resin is completely cured, it is taken out from the opposite aIl, and a base layer (
2), UV-curable resin layer (5) and protective sheet layer (
4) can be obtained.
このように光反射層（３）の両面に樹脂層が配されるこ
とにより光反射層（３）を良好に保護でき、また表裏ど
ちら側からでも鑑賞可能となる。By disposing the resin layer on both sides of the light-reflecting layer (3) in this manner, the light-reflecting layer (3) can be well protected and can be viewed from either the front or the back.
以上に述べたように、本発明によれば露出している金属
薄膜（光反射層）面に紫外線硬化型樹脂を配し、紫外線
を照射するだけでの極めて短時間で金属薄膜を被覆した
反射型ホログラムを得ることができ、また保護材シート
を用いたことにより比較的高価な紫外線硬化型樹脂を必
要最小限におさえることができ、コスト的にも十分見合
うものである。さらに紫外線硬化型樹脂は１１０１当り
１０００〜６０００本という様な極微細な金属薄膜面に
もよくなじみ、成型ムラが生じることはなく、従って鑑
賞時にパターンの乱れ等の不備が生じることもない。As described above, according to the present invention, an ultraviolet curable resin is placed on the exposed metal thin film (light reflective layer) surface, and the metal thin film can be coated and reflected in an extremely short time by simply irradiating ultraviolet rays. It is possible to obtain a type hologram, and by using a protective sheet, the use of relatively expensive ultraviolet curable resin can be kept to the minimum necessary, and it is well worth the cost. Furthermore, the ultraviolet curable resin is well adapted to the surface of an extremely fine metal thin film with 1,000 to 6,000 lines per 1,101 parts, and does not cause uneven molding, so that defects such as pattern disturbances do not occur during viewing.
なお、上記実施例では保画材シートは硬化した紫外線硬
化型樹脂と密着の良いものを選んだが、硬化した紫外線
硬化型樹脂から容易に剥離するような材質、例えばポリ
エステル、ポリプロピレン。In the above embodiments, the image retention material sheet was selected to have good adhesion to the cured ultraviolet curable resin, but it should also be made of a material that easily peels off from the cured ultraviolet curable resin, such as polyester or polypropylene.
等を使用した場合には、硬化後これを剥離することによ
り紫外線硬化型樹脂単体からなる保護層とすることも可
能である。When a UV-curable resin is used, it is possible to obtain a protective layer made of a single UV-curable resin by peeling it off after curing.
なお、本方法により保護層を設ける際の基材配置構成は
前述の構成と全く逆にしてもよいことはもちろんである
。この場合、紫外線照射は上側からとなる。It goes without saying that the arrangement of the base materials when providing the protective layer by this method may be completely reversed from the above-mentioned arrangement. In this case, the ultraviolet rays are irradiated from above.
図面は本発明の一実施例を示すものであり、第１図は本
発明方法の模式的説明図、第２図は本発明方法により得
られた反射型ホログラムの断面を示す説明図である。
（１）・・・反射型ホログラム （２）・・・基層 （
３）・・・光反射層 （４）・・・保護材シート（５）
・・・紫外線硬化型樹脂（１１１・・・対語 鰺・・・
紫外光源特許出願人
凸版印刷株式会社The drawings show one embodiment of the present invention, and FIG. 1 is a schematic explanatory diagram of the method of the present invention, and FIG. 2 is an explanatory diagram showing a cross section of a reflection hologram obtained by the method of the present invention. (1)...Reflection hologram (2)...Base layer (
3)...Light reflective layer (4)...Protective material sheet (5)
...Ultraviolet curable resin (111...Antonym for mackerel...
Ultraviolet light source patent applicant Toppan Printing Co., Ltd.
Claims (1)
ラムと保護材シートの間に紫外線硬化型樹脂を置き、前
記反射型ホログラムの光反射層を保護材シートに対面せ
しめて前記反射型ホログラムと基材シートとを近接せし
め、紫外線硬化型樹脂をはさみつけつつ両面から押圧し
、光反射層と保護材シートの間に紫外線硬化型樹脂が十
分に拡がった時点で保護材シートを通して紫外線を照射
して紫外線硬化型樹脂を硬化せしめてなる反射型ホログ
ラムの製造方法。An ultraviolet curable resin is placed between a reflective hologram in which a light reflective layer having a concavo-convex pattern is exposed and a protective sheet, and the light reflective layer of the reflective hologram is made to face the protective sheet so that the reflective hologram and the base material Place the sheets close together and press them from both sides while sandwiching the UV curable resin. When the UV curable resin has sufficiently spread between the light reflective layer and the protective sheet, irradiate the UV rays through the protective sheet to remove the UV curable resin. A method for manufacturing a reflection hologram by curing a curable resin.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13498881A JPS5835579A (en) | 1981-08-28 | 1981-08-28 | Manufacture of reflection type hologram |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13498881A JPS5835579A (en) | 1981-08-28 | 1981-08-28 | Manufacture of reflection type hologram |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5835579A true JPS5835579A (en) | 1983-03-02 |
Family
ID=15141299
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13498881A Pending JPS5835579A (en) | 1981-08-28 | 1981-08-28 | Manufacture of reflection type hologram |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5835579A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0145481A2 (en) * | 1983-12-12 | 1985-06-19 | E.I. Du Pont De Nemours And Company | Improved holographic image transfer process |
| JPS6171195A (en) * | 1984-09-13 | 1986-04-12 | Nippon Steel Corp | Manufacture of heat treated steel tube |
| US4758296A (en) * | 1983-06-20 | 1988-07-19 | Mcgrew Stephen P | Method of fabricating surface relief holograms |
| US4906315A (en) * | 1983-06-20 | 1990-03-06 | Mcgrew Stephen P | Surface relief holograms and holographic hot-stamping foils, and method of fabricating same |
| JPH03111949U (en) * | 1990-03-02 | 1991-11-15 | ||
| WO1994018609A1 (en) * | 1991-09-30 | 1994-08-18 | Matthiesen, Gerda | Process, printing material and device for reproducing holographic fine structures and other diffraction grids on print products |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5040050A (en) * | 1973-07-19 | 1975-04-12 | ||
| JPS5122403A (en) * | 1974-08-17 | 1976-02-23 | Teac Corp | |
| JPS5436566A (en) * | 1977-08-25 | 1979-03-17 | Matsushita Electric Ind Co Ltd | Method of making tipptype conductive element |
-
1981
- 1981-08-28 JP JP13498881A patent/JPS5835579A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5040050A (en) * | 1973-07-19 | 1975-04-12 | ||
| JPS5122403A (en) * | 1974-08-17 | 1976-02-23 | Teac Corp | |
| JPS5436566A (en) * | 1977-08-25 | 1979-03-17 | Matsushita Electric Ind Co Ltd | Method of making tipptype conductive element |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4758296A (en) * | 1983-06-20 | 1988-07-19 | Mcgrew Stephen P | Method of fabricating surface relief holograms |
| US4906315A (en) * | 1983-06-20 | 1990-03-06 | Mcgrew Stephen P | Surface relief holograms and holographic hot-stamping foils, and method of fabricating same |
| US5948199A (en) * | 1983-06-20 | 1999-09-07 | Mcgrew; Stephen Paul | Surface relief holograms and holographic hot-stamping foils, and method of fabricating same |
| EP0145481A2 (en) * | 1983-12-12 | 1985-06-19 | E.I. Du Pont De Nemours And Company | Improved holographic image transfer process |
| JPS6171195A (en) * | 1984-09-13 | 1986-04-12 | Nippon Steel Corp | Manufacture of heat treated steel tube |
| JPH03111949U (en) * | 1990-03-02 | 1991-11-15 | ||
| WO1994018609A1 (en) * | 1991-09-30 | 1994-08-18 | Matthiesen, Gerda | Process, printing material and device for reproducing holographic fine structures and other diffraction grids on print products |
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