JPS58132271A - Manufacture of hologram - Google Patents

Manufacture of hologram

Info

Publication number
JPS58132271A
JPS58132271A JP1456682A JP1456682A JPS58132271A JP S58132271 A JPS58132271 A JP S58132271A JP 1456682 A JP1456682 A JP 1456682A JP 1456682 A JP1456682 A JP 1456682A JP S58132271 A JPS58132271 A JP S58132271A
Authority
JP
Japan
Prior art keywords
hologram
substrate
electron beam
thin film
mold
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1456682A
Other languages
Japanese (ja)
Inventor
Tetsuji Yamazaki
哲司 山崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP1456682A priority Critical patent/JPS58132271A/en
Publication of JPS58132271A publication Critical patent/JPS58132271A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H1/0276—Replicating a master hologram without interference recording
    • G03H1/028—Replicating a master hologram without interference recording by embossing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H1/024—Hologram nature or properties
    • G03H1/0244—Surface relief holograms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/0402—Recording geometries or arrangements
    • G03H2001/0413—Recording geometries or arrangements for recording transmission holograms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/18—Particular processing of hologram record carriers, e.g. for obtaining blazed holograms
    • G03H2001/185—Applying a curing step
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/22—Processes or apparatus for obtaining an optical image from holograms
    • G03H1/2202—Reconstruction geometries or arrangements
    • G03H2001/2223—Particular relationship between light source, hologram and observer
    • G03H2001/2231—Reflection reconstruction
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2250/00—Laminate comprising a hologram layer
    • G03H2250/42—Reflective layer

Abstract

PURPOSE:To manufacture a reflected-light reproduction type hologram easily by coating a metallic thin film formed as a reflecting layer on a transparent substrate as a base with a compound which sets by electron beam irradiation, and irradiating from the substrate side with electron beams while a relief hologram metallic mold surface is brought into contacted with the substrate. CONSTITUTION:A metallic thin film 1b of Al, etc., vapor-deposited on the substrate such as glass and a high polymer film is coated with the compound 2 which sets by electron beam irradiation and the pattern surface of the relief hologram metallic mold 3 is brought into contacted with the substrate to irradiate the substrate with electron beams 4. This thin film 1b is formed to a 200-20,000Angstrom thickness to transmit electron beams and to set the layer 2. After the setting, the metallic mold 3 is removed, and consequently reflected-light reproduction type relief holograms with a fine pattern are mass-reproduced easily at low cost and in a relatively short time.

Description

【発明の詳細な説明】[Detailed description of the invention]

本発明は表面に微細な凹凸膨軟を賦与して情報を記録す
るレリーフホログラムの量産に適した複製方法に関する
。 ホログラムは、一般に光の干渉のパターンを記録したも
のであ１３、三次元画像の記録Ｖけじめ、高密炭な情報
記録が可能である特性を和牛して光メモリー等多方面へ
の応用が期待されている。 ホログラムの記録材料としては、高解像力の銅塩感光材
料が一般に甲いられるが、この材料は高価であり、また
撮影あるいは複製も困難であるため、ホログラム製品は
高価格となり、また現像等の処理を必要とするため大量
生産には向かない欠点がある。 一方、レリーフホログラムの場合は、フォトレジスト等
にホログラム情報を凹凸のパターンで紀鋒した後、この
凹凸パターンをメッキ等によ６）型取６）シ、この金型
ｖ＃ｌｌ可塑性−ＰＩＦ１笠に型押しすることにより、
複製が作れるというものである。 しかし、かかる方すでは、熱可塑性−脂？加熱し型押し
した後熱臂型温度以下に冷却する必要があるため、ＷＩ
Ｉｔ型に時間を要する欠点を有する。 又、一般にホログラムの種類としては大別して透過光再
生型及び、反射光再生型のボログラムがあ６）、反射光
再生型ホログラムは、通常の物体？見ると同様に光源側
よｌ＋　ｌｊｉ　＠　％−することができるため、Ｉｌ
像の卿易さの点で透過光再生型ホログラムより優れてい
る。反射光再生型ホログラムは透過光再生型ホログラム
の裏面に反射＋１１Ｙ設ける事によＩ）比較的簡単に製
造しうるが、反射層を設ける方法としては、透過光再生
型ホログラム裏面に金属を蒸着する方法、反射材料？透
過光再生型ホログラム裏面に貼合せる方法等によればよ
いが、透過光再生型ホログラムト一旦作製後にこの様な
加工を施すことは、連続処理が雛しく、煩雑であり好ま
しくないものである。 本発明者は、この反射光再生型ホログラムを簡単、安価
にかつ比較的短時間に大雪に製造する方法として、支持
体として予め、金属薄膜からなる反射１１１ｖ有するも
のを使用し、電子線硬化性化合物と電子線を甲いれば可
能であることを見い出し、本発明に至った。 以下、本発明について詳細に説明する。 １８１図は本発明の製造方法を示すための模式的な断面
図である。 本発明に使用する、支持体１の基材１ａの材料としては
、ガラス、ポリエチレン、ポリプロピレン、ポリ塩化ビ
ニル、ポリ塩化ビニリデン、ポリビニルアルコール、ポ
リエチレンテレフタレート、ポリカーボネート、アクリ
ル−脂、ナイロン、ポリスチレン、エチレン酢酸ヒニル
共重合体、エチレンビニルアルコール共重合体、アイオ
ノマー、セルロースジアセテート及びセルローストリア
セテ−ＩＦの単独若しくは共重合体のフィルム若しくは
シート又は板状の材料及びそれらの複合材料を甲いるこ
とができる、又、反射層となる金属薄＄１ｂの材料とし
ては、表面の反射率が高い金属が好ましく、例えば、ア
ルミニウム、金、銀、錫等及び以上の金ｌＩｖ含む合金
を用いることができ、又、以上のような素材シ甲いて金
属＊暮を設ける方法としては公知の真空蒸着、スパッタ
リング、イオンブレーティング等の方法によって行ない
、蒸着金属層の厚みとしては２ｏｏ久から、２ｏ、ｏｎ
ｏＸが適当である。 又、金属薄膜の反射ＩＩｖ有する支持体の構造としては
、フィルム又はシート又は板等に前述の金ｌ１ｉｌｖ蒸
着したもの以外にも更に、樹脂を塗布したもの、他のフ
ィルム又はシート又はブレーＦ等ケ貼合せたもの等でも
使用できる。 次に以上のような、金属薄膜からなる反射層を有するフ
ィルム若しくはシート又は板状の支持体に電子線硬化性
化合物からなる場を塗設する。電子線硬化性化合物とし
ては米国特許３６６１７４４及び３７０８２９６並びに
「オリゴマーへンドブック」（化学工業日報社、昭和５
２年３月３１日発行）に記載されているとと舞、アクリ
レートモノマー若しくはそのオリゴマー、ポリエンとポ
ロオールの混合物、エポキシ化合物とルイス酸の混合物
等のうちから支持体との接着性、塗布適性を考慮し、適
宜調整して甲いる。 なお、電子線硬化性化合物Ｖ？布する面は支持体の金属
薄１１Ｖ有する面でも或いは有しない面でもよい。 支持体に電子線硬化性化合物を管布した後、塗布面にホ
ログラム金型３の金型面を密着させる。 ホログラム金型としては公知のものが使用でき、例えば
、フォトレジストに通常のホログラム記録方式によ・シ
レーデー光を甲いて被写体を撮影し、レーザー光の干渉
縞を記録し、現情ケ行なって干渉縞に応じた凹凸パター
ンを得、中に該凹凸パターン表面に蒸着等によ番】金職
薄勝シ設け、該金属薄１１ｖ電極として電鋳ｎによＯ金
Ｒ１１ｖ形成してなるものや、或いは又、−塊感光材料
Ｙ甲いて撮影？行なってホロゲラムシ得、該ホログラム
を介してフォトレジスト？重着露光した後Ｍ＠ｖ行なっ
て凹凸パターンヶ得、以下前記と同様にしてなるもの？
用いることができ、更に以上のような金型ＶＩＨ１法の
ｅｌ＋返しにより複製し、複数の金ＦＤｖ作成してもよ
い。 次に、支持体側よ曇）電子線シ照射し、前１章。 子線硬化性化合物The present invention relates to a reproduction method suitable for the mass production of relief holograms that record information by imparting minute unevenness to the surface. Holograms are generally records of light interference patterns13, and are expected to be used in many fields such as optical memory due to their ability to record three-dimensional images and record highly dense information. ing. High-resolution copper salt photosensitive materials are generally used as recording materials for holograms, but these materials are expensive and difficult to photograph or reproduce, making hologram products expensive and requiring processing such as development. It has the disadvantage that it is not suitable for mass production because it requires On the other hand, in the case of a relief hologram, after hologram information is imprinted on a photoresist or the like in an uneven pattern, this uneven pattern is molded by plating, etc. By embossing the
This means that copies can be made. However, in such cases, thermoplastic - fat? WI
The It type has the disadvantage of being time consuming. In general, the types of holograms can be roughly divided into transmitted light reproduction type and reflected light reproduction type holograms6).Reflected light reproduction type holograms are different from normal objects. If you look at it, you can also do l+ lji @ %- from the light source side, so Il
It is superior to transmitted light reproduction type holograms in terms of image visibility. A reflected light reproduction type hologram can be manufactured relatively easily by providing reflection +11Y on the back surface of a transmitted light reproduction type hologram, but the method for providing a reflective layer is to deposit metal on the back surface of a transmitted light reproduction type hologram. How, reflective material? Although a method such as bonding it to the back surface of the transmitted light reproduction type hologram may be used, it is not preferable to perform such processing after the transmitted light reproduction type hologram has been produced, as it requires continuous processing and is complicated. The present inventor has developed a method for manufacturing this reflected light reproduction type hologram simply, inexpensively, and in a relatively short time by using a support made of a metal thin film having a reflection rate of 111V, and using an electron beam curable material. We have discovered that this is possible by using a compound and an electron beam, and have arrived at the present invention. The present invention will be explained in detail below. FIG. 181 is a schematic cross-sectional view showing the manufacturing method of the present invention. Materials for the base material 1a of the support 1 used in the present invention include glass, polyethylene, polypropylene, polyvinyl chloride, polyvinylidene chloride, polyvinyl alcohol, polyethylene terephthalate, polycarbonate, acrylic resin, nylon, polystyrene, and ethylene acetic acid. Films, sheets, or plate-like materials of vinyl copolymers, ethylene vinyl alcohol copolymers, ionomers, cellulose diacetate, and cellulose triacetate-IF alone or copolymers, and composite materials thereof can be used. In addition, as the material of the metal thin $1b serving as the reflective layer, a metal with a high surface reflectance is preferable, and for example, aluminum, gold, silver, tin, etc., and alloys containing the above gold lIv can be used, and The method for forming the metal layer on the material described above is performed by known methods such as vacuum evaporation, sputtering, ion blating, etc., and the thickness of the evaporated metal layer ranges from 200 mm to 200 mm.
oX is appropriate. In addition to the structure of the support having reflection IIv of metal thin film, in addition to the above-described gold l1ilv vapor-deposited film, sheet, or plate, there are also supports coated with resin, other films, sheets, bra F, etc. It can also be used in a laminated form. Next, a field made of an electron beam curable compound is coated on the film, sheet, or plate-shaped support having a reflective layer made of a metal thin film as described above. As electron beam curable compounds, US Pat.
The adhesion to the support and coating suitability are determined from among the following: acrylate monomers or their oligomers, mixtures of polyenes and polyols, mixtures of epoxy compounds and Lewis acids, etc. Please take this into consideration and make adjustments as appropriate. In addition, electron beam curable compound V? The surface to be covered may be the surface of the support with or without the metal thin 11V. After applying the electron beam curable compound to the support, the mold surface of the hologram mold 3 is brought into close contact with the coated surface. A publicly known hologram mold can be used.For example, by using the normal hologram recording method on a photoresist, photographing the subject with a laser beam, recording the interference fringes of the laser beam, and then performing the actual interference. A concavo-convex pattern corresponding to the stripes is obtained, a thin gold plate is provided by vapor deposition or the like on the surface of the concave-convex pattern, and the metal thin 11V electrode is formed by electroforming O gold R11V, Or, - Shooting with block photosensitive material? Did you get the hologram through photoresist? After heavy exposure, perform M@v to obtain a concavo-convex pattern, and then proceed in the same manner as above?
Furthermore, a plurality of gold FDv may be created by duplicating the metal mold VIH1 method using el+turning as described above. Next, the support side was irradiated with an electron beam (see Chapter 1 above). radiation curable compound

【硬化させると共に賦型シ行なった後
、金型を離脱させ、金型の彫状Ｖ章子線硬化性化合物が
硬化した硬化体の表面に転写する。 使用する電子線としては、コックロフトヮルトン型、バ
ンプグラフ型、共振変圧器型、絶−コア変圧器型、直線
型、ダイナミドロン型、高周波型等の各挿画子線加速機
から放出され、５０〜１０００　ＫｅＶ、好ましくは１
００〜５００ＫｅＶの範囲のエネルギーを持つ電子線が
用いられる。 以上の本発明の方決はフレネルホログラム、フーリエ変
換ホログラム、フラウンホーファーホログラム等のホロ
グラムのいずれにも心事で傘、これらホログラムの形式
ヶ利用したイメージホログラム、レインボーホログラム
、ホログラフィックステレオグラム暮、及び一般の回折
格子類に適用できる。 以上の本発明によれば、反射層として金属薄ＳＶ有する
支持体を甲いるが、かかる支持体は、連続蒸着等によＩ
）作製が可能であるため、効率良く安価に大量に得るこ
とができる。又この場合の反射層としての金属薄膜は赤
外光、可視光、紫外光等の光が通過しないため、このよ
うな光で硬化する樹脂液を硬化させることは難しいが、
本発明では、電子線を甲いることによ・）、電子線は蒸
着金属薄１１Ｖはとんど透過するため樹脂液を硬化させ
ることが可能となる。 したがって、本発明によれば反射光再生型レリーフホロ
グラムが簡単、安価かつ比較的短時間に大量複製するこ
とが可能である。 以下Ｗ１＃、例を甲いて本発明Ｖ更に具体的に説。 明する。 実施例 厚み１００μ票のポリエステルフィルムにア／Ｉ。 ミニラムｖ７００Ｘの厚みで真空蒸着した反射１１ｖ有
する支持体を作製した。 次に輯２図に示すとと＾配置のアルゴンレーザー５、ビ
ームスプリッタ−６、ミ→−７レンズ８ａ及びＢｂｙ甲
いて、フォトレジスト９（シフレ−社製、ＡＺ−１３５
０Ｊ　）　ｖガラス基板１０に厚み２５μ帽：塗布して
なる乾板１１に被写体１２Ｖフレネルホログラムとして
撮影しｔ後、所定の現像＃（シプレー社製、ＡＺデベロ
ッパー）によ畳】現貴し、レリーフホログラム化した後
、ホログラム面に鏝を甲いて厚みがＡｏ。 えとなるよう蒸着し、更に＃蒸着嗅を電極として厚みが
１■になるようニッケル？めっきし、剥離してレリーフ
ホログラムの逆型形秋の金型を作製した。 次に、前述の支持体１の上に、電子線硬化樹脂液として ＣＨ２コ０Ｈ−０００−ＣＨ２−ＯＨ２−ＯＣＯ＜シー
Ｃ！ＯＯＨ１部ＣＨ２＝ＣＨ−ＣＯＯ（−ＯＨ２０Ｈ２
−ＯＣＯ＋Ｃ！００丑０Ｈ２ＣＨ２−ｏｏｃ−ｃＨ２＝
ｃａ２　　　　　　　　　　　１部の混合物を厚み５０
μに塗布し、その上に前述のレリーフホログラム金型を
重ね合せた。 更に一対の加圧ロール間を通して密着の向上を行なった
後、支持体側より電子線４ｖ照射して塗料ｌ１ｉＩ２ｖ
硬化させて賦型し、しかる後、金型Ｖ＊脱したところ反
射光再生型レリーフホロゲラムシ得た、[After curing and shaping, the mold is removed and the carved V-shape line-curing compound of the mold is transferred to the surface of the cured product. The electron beams used are emitted from various interpolator beam accelerators such as Cockroft-Walton type, bump graph type, resonant transformer type, absolute core transformer type, linear type, dynamidron type, and high frequency type. 50-1000 KeV, preferably 1
An electron beam with an energy in the range of 00 to 500 KeV is used. The above solution of the present invention can be applied to any of holograms such as Fresnel holograms, Fourier transform holograms, Fraunhofer holograms, image holograms, rainbow holograms, holographic stereograms, etc. that utilize these hologram formats, and general Applicable to diffraction gratings. According to the present invention described above, a support having a metal thin SV is used as a reflective layer, and such a support can be formed by continuous vapor deposition or the like.
) can be produced efficiently and in large quantities at low cost. In addition, since the metal thin film used as the reflective layer in this case does not allow light such as infrared light, visible light, or ultraviolet light to pass through, it is difficult to cure the resin liquid that is cured by such light.
In the present invention, by applying an electron beam, it is possible to harden the resin liquid because the electron beam mostly passes through the vapor-deposited metal thin layer 11V. Therefore, according to the present invention, a reflected light reproduction type relief hologram can be easily and inexpensively reproduced in large quantities in a relatively short time. The present invention V will be explained in more detail below with reference to W1# and examples. I will clarify. Example A/I on a polyester film with a thickness of 100μ. A vacuum-deposited support having a reflection of 11V was prepared with a thickness of Miniram V700X. Next, as shown in Figure 2, the argon laser 5, the beam splitter 6, the Mi→-7 lens 8a and the Bby A, and the photoresist 9 (manufactured by Schifre, AZ-135) are placed.
0J) The subject is photographed as a 12V Fresnel hologram on a dry plate 11 coated with a glass substrate 10 having a thickness of 25 μm. After that, it is developed using a prescribed development # (manufactured by Shipley, AZ Developer) and is then developed into a relief hologram. After forming, the hologram surface was troweled to a thickness of Ao. Then, use #evaporation as an electrode and add nickel to a thickness of 1cm. A reverse mold for the relief hologram was created by plating and peeling. Next, on the above-mentioned support 1, CH2CO0H-000-CH2-OH2-OCO<C!C! OOH1 part CH2=CH-COO(-OH20H2
-OCO+C! 00 ox 0H2CH2-ooc-cH2=
ca2 1 part mixture to a thickness of 50
μ was coated, and the relief hologram mold described above was superimposed on it. Furthermore, after improving adhesion by passing between a pair of pressure rolls, 4V electron beam was irradiated from the support side to form the paint l1iI2v.
After curing and molding, when removed from the mold V*, a reflected light reproduction type relief hologram was obtained.

【図面の簡単な説明】[Brief explanation of the drawing]

鴫１図は本発明の製造方法を示すための各材料の模式的
な断面図、第２図は金型製作時の光学系を示す模式図で
ある。 １・・・・・・・・・・・・支持体（１ａ・・・・・・
基材、１ｂ・・・・・・金属薄膜）２・・・・・・・・
・・・・電子線硬化性化合物からなる稠３・・・・・・
・・・・・・ホログラム金型４・・・・・・・・・・・
・電子線 ５・・・・・・・・・・・・アルゴンレーサー６・・・
・・・・・・・・・ビームスプリッ９−７・・・・・・
・・・・・・ミラー Ｆ３ａ、８ｂ　　・・・レンズ ９・・・・・・・・・・・・フォトレジスト１０　　・
・・・・・・・・ガラス基板１１　　・・・・・・・・
・乾　板 １２　　・・・・・・・・・被写体 特許出願人　大日木印刷株式会社Figure 1 is a schematic cross-sectional view of each material to illustrate the manufacturing method of the present invention, and Figure 2 is a schematic diagram showing the optical system during mold manufacturing. 1......Support (1a...
Base material, 1b...metal thin film) 2...
...Contains 3 consisting of an electron beam curable compound...
・・・・・・Hologram mold 4・・・・・・・・・・・・
・Electron beam 5...Argon racer 6...
・・・・・・・・・Beam split 9-7・・・・・・
...Mirror F3a, 8b ...Lens 9 ...Photoresist 10 ・
......Glass substrate 11 ......
・Dry plate 12 ......Subject patent applicant Dainichi Printing Co., Ltd.

Claims (1)

【特許請求の範囲】[Claims] 金属薄韓からなる反射層を有するフィルム若しくはシー
ト又は板状の支持体に電子線硬化性化合物？塗布し、該
塗布面にレリーフホログラム金型の金型面を密着させ、
しかる後支持体を通して電子線ｗ’ＨＡ射し、前記電子
線硬化性化合物？硬化させると共に賦型することを特徴
とする反射光再生型レリーフホログラムの卿造方沖。An electron beam curable compound on a film, sheet or plate-shaped support having a reflective layer made of thin metal? and bring the mold surface of the relief hologram mold into close contact with the coated surface,
Thereafter, an electron beam w'HA is irradiated through the support, and the electron beam curable compound ? Oki Kyozokata is a relief hologram that reproduces reflected light, which is characterized by being hardened and shaped.
JP1456682A 1982-02-01 1982-02-01 Manufacture of hologram Pending JPS58132271A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1456682A JPS58132271A (en) 1982-02-01 1982-02-01 Manufacture of hologram

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1456682A JPS58132271A (en) 1982-02-01 1982-02-01 Manufacture of hologram

Publications (1)

Publication Number Publication Date
JPS58132271A true JPS58132271A (en) 1983-08-06

Family

ID=11864696

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1456682A Pending JPS58132271A (en) 1982-02-01 1982-02-01 Manufacture of hologram

Country Status (1)

Country Link
JP (1) JPS58132271A (en)

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60254174A (en) * 1984-05-31 1985-12-14 Dainippon Printing Co Ltd Duplicating method of hologram
JPS60254175A (en) * 1984-05-31 1985-12-14 Dainippon Printing Co Ltd Hologram transfer sheet and its production
JPS619681A (en) * 1984-06-25 1986-01-17 Dainippon Printing Co Ltd Hologram seal
EP0201323A2 (en) * 1985-05-07 1986-11-12 Dai Nippon Insatsu Kabushiki Kaisha Article incorporating a transparent hologramm
JPH02111989A (en) * 1988-10-21 1990-04-24 Toppan Printing Co Ltd Duplicating pattern for hologram and production of hologram
JPH02111988A (en) * 1988-10-21 1990-04-24 Toppan Printing Co Ltd Duplicating pattern for hologram, its production, and production of hologram
JPH02111991A (en) * 1988-10-21 1990-04-24 Toppan Printing Co Ltd Duplicating pattern for hologram, its production, and production of hologram
JPH02111990A (en) * 1988-10-21 1990-04-24 Toppan Printing Co Ltd Duplicating pattern for hologram and production of hologram
US5013494A (en) * 1988-08-03 1991-05-07 Sharp Kabushiki Kaisha Process for preparing blazed holograms
US5071597A (en) * 1989-06-02 1991-12-10 American Bank Note Holographics, Inc. Plastic molding of articles including a hologram or other microstructure
US5164847A (en) * 1990-06-21 1992-11-17 British Telecommunications Plc Holographic element
US5227897A (en) * 1990-05-04 1993-07-13 Fohrman Scott R Reproduction of holograms
WO1999054871A1 (en) * 1998-04-20 1999-10-28 Atop Innovation S.P.A. Optical support for the non-volatile memorisation of data and processes for its manufacturing
EP0495755B2 (en) † 1991-01-11 2001-12-19 Alcan Technology & Management AG Aluminium rolled products
WO2008076785A1 (en) * 2006-12-14 2008-06-26 Colgate-Palmolive Company A hologram appearing package image

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60254175A (en) * 1984-05-31 1985-12-14 Dainippon Printing Co Ltd Hologram transfer sheet and its production
JPS60254174A (en) * 1984-05-31 1985-12-14 Dainippon Printing Co Ltd Duplicating method of hologram
JPS619681A (en) * 1984-06-25 1986-01-17 Dainippon Printing Co Ltd Hologram seal
EP0201323A2 (en) * 1985-05-07 1986-11-12 Dai Nippon Insatsu Kabushiki Kaisha Article incorporating a transparent hologramm
US5013494A (en) * 1988-08-03 1991-05-07 Sharp Kabushiki Kaisha Process for preparing blazed holograms
JPH02111989A (en) * 1988-10-21 1990-04-24 Toppan Printing Co Ltd Duplicating pattern for hologram and production of hologram
JPH02111991A (en) * 1988-10-21 1990-04-24 Toppan Printing Co Ltd Duplicating pattern for hologram, its production, and production of hologram
JPH02111990A (en) * 1988-10-21 1990-04-24 Toppan Printing Co Ltd Duplicating pattern for hologram and production of hologram
JPH02111988A (en) * 1988-10-21 1990-04-24 Toppan Printing Co Ltd Duplicating pattern for hologram, its production, and production of hologram
US5071597A (en) * 1989-06-02 1991-12-10 American Bank Note Holographics, Inc. Plastic molding of articles including a hologram or other microstructure
US5227897A (en) * 1990-05-04 1993-07-13 Fohrman Scott R Reproduction of holograms
US5164847A (en) * 1990-06-21 1992-11-17 British Telecommunications Plc Holographic element
EP0495755B2 (en) † 1991-01-11 2001-12-19 Alcan Technology & Management AG Aluminium rolled products
WO1999054871A1 (en) * 1998-04-20 1999-10-28 Atop Innovation S.P.A. Optical support for the non-volatile memorisation of data and processes for its manufacturing
WO2008076785A1 (en) * 2006-12-14 2008-06-26 Colgate-Palmolive Company A hologram appearing package image
JP2010513955A (en) * 2006-12-14 2010-04-30 コルゲート・パーモリブ・カンパニー Package image where hologram appears

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