JPS5830648A - Semiconductor gas sensor - Google Patents

Semiconductor gas sensor

Info

Publication number
JPS5830648A
JPS5830648A JP12781281A JP12781281A JPS5830648A JP S5830648 A JPS5830648 A JP S5830648A JP 12781281 A JP12781281 A JP 12781281A JP 12781281 A JP12781281 A JP 12781281A JP S5830648 A JPS5830648 A JP S5830648A
Authority
JP
Japan
Prior art keywords
gas
alcohol
semiconductor material
gas sensor
powder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12781281A
Other languages
Japanese (ja)
Inventor
Takanobu Noro
野呂 孝信
Hideo Arima
有馬 英夫
Shoichi Iwanaga
昭一 岩永
Akiyoshi Kaneyasu
兼安 晶美
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP12781281A priority Critical patent/JPS5830648A/en
Publication of JPS5830648A publication Critical patent/JPS5830648A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N33/00Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
    • G01N33/0004Gaseous mixtures, e.g. polluted air
    • G01N33/0009General constructional details of gas analysers, e.g. portable test equipment
    • G01N33/0027General constructional details of gas analysers, e.g. portable test equipment concerning the detector
    • G01N33/0031General constructional details of gas analysers, e.g. portable test equipment concerning the detector comprising two or more sensors, e.g. a sensor array

Abstract

PURPOSE:To eliminate the influence of alcohol vapor, by combining in series a P type semiconductor material, which increases an electric conductivity through contact with alcohol vapor, and an N type semiconductor material which reduces an electric conductivity through contact with town gas, propane gas. CONSTITUTION:By the use of paste using LaNiO2 powder, which is increased in electric conductivity through contact with alcohol and does not react to town gas, propane gas, such as H2, CH4, C3H3, i-C4H10, at all, and paste using SnO3 powder which is reduced in resistance value by alcohol, film sensors, in which LaNiO2 3 and SnO2 3' are placed on the same chip by a thick film technic, are connected in series through a Pt intermediate conductor 10 to detect gas between electrodes 2, 2. This constitution permits the prevention of the occurrence of an erroneous detection due to alcohol.

Description

【発明の詳細な説明】 本発明は、都市ガス、プロパンガスなど【検知するため
のガスセンtに関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a gas sensor for detecting city gas, propane gas, etc.

従来、都市ガス、プロパンガスなどを検知するガスセン
すは、8nO,、ZnO,Fe2O,などの材料を使用
したものが主流である。
Conventionally, gas sensors for detecting city gas, propane gas, etc. have mainly been made of materials such as 8nO, ZnO, and Fe2O.

しかし、これらガスセンサは、都市ガスの主成分である
CH,、H,、i−C,Hl、やプロパンガスを感応す
るが、同時にアルコール(C,H,OH)蒸気にも強く
感応する。このため、ガスの漏えいの有無にかかわらず
、料理用、軟料用などに日常に用いるアルコール蒸気に
触れただけで、あたかもガスを検知した如き誤検知、誤
動作がある。
However, although these gas sensors are sensitive to CH, H, i-C, Hl, which are the main components of city gas, and propane gas, they are also strongly sensitive to alcohol (C, H, OH) vapor. For this reason, regardless of whether there is a gas leak or not, even if the device comes into contact with alcohol vapor that is used daily for cooking, softening, etc., erroneous detection or malfunction may occur as if gas was detected.

本発明は、上記の欠点をなくシ、アルコール蒸気がガス
センサに触れても、誤検知しないガスセンサrt提供す
るにある。
The present invention eliminates the above-mentioned drawbacks and provides a gas sensor rt that does not cause false detection even when alcohol vapor comes into contact with the gas sensor.

このように改曽したガスセンfを用いれば、プロパンガ
ス、都市ガスなどのガス検知精度やアルコールによるI
I勅作ななくすことができるi本発明の要点は、Iス検
知な防書するアルコール蒸気に対し、アルコール蒸気に
触れれば電気導電率を増す、一般式ABO,(但し、式
中ムはLa、pr、 Nd、8m、Gd、 DFe−1
rのうちカラ選ばれた一種類の希土類元素%BはMn、
F・。
If you use Gassen f, which has been renamed in this way, you can improve the detection accuracy of gases such as propane gas and city gas, and the I
The main point of the present invention is that the general formula ABO increases the electrical conductivity when it comes into contact with the alcohol vapor that protects the book from being detected. La, pr, Nd, 8m, Gd, DFe-1
Among r, one kind of rare earth element %B is Mn,
F.

Co、Niのうちから遥ばれた一種類の元素)で表わさ
れるpH半導体物質もしくは一般式ム1−x−8rxe
oO,(但し、式中ムはL a e P r @ Nd
 e &n*Qd、Dy、I?frのうちから選ばれた
一種類の希土類元素であり、!””(Ll〜α4である
)で表わされるP型半導体物質(具体的にはL a N
 i Osなどが挙げられる)に、ガスの成分であるC
H4,H,。
A pH semiconductor material represented by a type of element separated from Co, Ni or the general formula 1-x-8rxe
oO, (However, in the formula, M is L a e P r @ Nd
e &n*Qd, Dy, I? It is one type of rare earth element selected from fr. P-type semiconductor material (specifically L a N
iOs, etc.), and C, which is a gas component.
H4, H,.

1−C,H,、やプロパンガスに触れれば電気導電率が
減る8110! 、 Zoo、 Fe@0@のうちから
選ばれた一種数のN@牛牛体体物質直列に組会せる。
1-Electric conductivity decreases when exposed to C, H, or propane gas 8110! , Zoo, and Fe@0@ are assembled in series.

これによりて、アルコール蒸気による影響が情夫される
ことを基本的特徴としている。
As a result, the basic feature is that the influence of alcohol vapor is reduced.

そして、半導体ガス令ンサ位上記のPffi半導体物質
よりなるセンナと、上記のNil半導体物質よりなるセ
ンサを夫々直列につなぎ、・これ管−個のセンサとみな
しても良いが、上記のPII牛導体物質、上記のNil
半導体物質な厚膜技術を用いて同一基板上に形成するな
どして使N目的に合また方法で半導体ガスセンサとする
Then, the sensor made of the above Pffi semiconductor material and the sensor made of the above Nil semiconductor material are connected in series, and the sensor made of the above Pffi semiconductor material is connected in series. Substance, Nil above
Semiconductor gas sensors can be fabricated on the same substrate using thick film technology to create semiconductor gas sensors in a manner that suits the purpose of use.

この際、上記の二つの異なった機能を有するセンサある
いは材料は近接して、直列に組合曽ることが膳ましい・ 以下、本発明を実施例で説明する・ 実施例言 まず、LaNi0.粉末、8sO,粉末t−以以下ノウ
にして作製した・ (II)LaNi0.粉末の作製法 LaNi0.の化学量論的組成となるように、Laおよ
びNiの酌酸埴veiM取し、これ【純水に連節する0
・次に、これを四−メリーエパlレーIの減圧下で濃縮
、乾固し、この乾燥物rt60G℃の空気中で2h加熱
分解する。
At this time, it is preferable to combine the above two sensors or materials having different functions in series in close proximity.The present invention will be explained below with reference to examples.First, LaNi0. (II) LaNi0. Powder preparation method LaNi0. A stoichiometric composition of La and Ni is taken, and this is connected to pure water.
- Next, this is concentrated to dryness under reduced pressure in a four-merry evaporator I, and the dried product is thermally decomposed in air at an rt of 60 G°C for 2 hours.

次に、これを1000℃の空気中で焼成すると、LaN
l0.の組成である多結晶固形物ができる・これを、ラ
イカイ機で10h粉砕すると、LaNi01の黒色の微
粉末ができる。この微粉末は100℃附近で強い還元性
ガス、たとえばアルフールなどにふれるとLaNi0.
中の酸素が奪われ、M−O−Mの3次元ネットワークが
切断され、電気伝導度が増す0また、アルコール蒸気な
除去すると、再び元゛の酸化物組成比をとるため、元の
導電率を回復する。この原理によってアルコールな検知
することができる。
Next, when this is fired in air at 1000°C, LaN
l0. A polycrystalline solid having the composition is produced. When this is ground for 10 hours in a Laikai machine, a black fine powder of LaNi01 is produced. When this fine powder comes into contact with a strong reducing gas such as alfur at around 100°C, it becomes LaNi0.
The oxygen inside is taken away, the three-dimensional M-O-M network is cut, and the electrical conductivity increases.Also, when alcohol vapor is removed, the original oxide composition ratio is restored, so the original electrical conductivity is restored. recover. Alcohol can be detected using this principle.

さらに、上記の黒色の微粉末の特徴は、アルコール蒸気
のみに上記の現象が起り、H,、OH4゜C,H,、i
−C,H,。などのガス種に対しては、全く応答を示さ
ない。
Furthermore, the characteristic of the above black fine powder is that the above phenomenon occurs only with alcohol vapor, and H,,OH4°C,H,,i
-C,H,. It shows no response at all to gas species such as.

(ロ) 8nO,粉末の作製法 まず、8 n (99,99%)の金属スズをconc
 。
(b) Method for producing 8nO powder First, 8nO (99,99%) metal tin is conc.
.

HNO,でJ611する。これによって金属スズは白色
のスズ酸となる。次に、これ管水洗(デカンテーシ謬ン
)して、余分なHNO,を除去する。
HNO, J611. This turns the metal tin into white stannic acid. Next, the tube is washed with water (decanted) to remove excess HNO.

次に、このスズ酸の白色沈澱物をエアバス中で蒸発乾固
し、軽く乳鉢でwIまりをこわしたのち廂・700”C
ノ空気中で2b@mしa n iJ@ m * f: 
n 6 。
Next, this white precipitate of stannic acid was evaporated to dryness in an air bath, and after being lightly crushed in a mortar, it was heated to 700"C.
2b@m and an iJ@m*f in the air:
n6.

次に、この8 n O,粉末に1 % tD pd@$
 E混合するため、PdC1,の水溶液を加え、シイカ
イ機で約6h混合したのち600℃の空気中で1h加熱
した。この時pdel、はpa+ct、↑に分解し、8
 n Os粉末の表面にPdの微粉末が均一に分散した
粉末ができる。
Next, add 1% tD pd@$ to this 8 n O powder.
For E-mixing, an aqueous solution of PdC1 was added, and the mixture was mixed for about 6 hours using a shiikai machine, and then heated in air at 600° C. for 1 hour. At this time, pdel is decomposed into pa+ct, ↑, and 8
A powder is formed in which fine Pd powder is uniformly dispersed on the surface of the nOs powder.

以上によりて得たLaN[0,の微粉末と8nO。The fine powder of LaN[0, obtained above and 8nO.

粉末を用い、先ずLaNi0.厚膜ガスセンサ、8nO
,厚膜ガスセンサを作製した。
Using powder, first LaNi0. Thick film gas sensor, 8nO
, we fabricated a thick film gas sensor.

(1)  LaNi0.厚膜ガスセンサの作製前述のL
aNkO,微粉末10gに、エテルセルリースとα−テ
ルピネオールから成る有機ベヒクルf; 6cC加え、
さらに8i−Pd−Zn−Ti系の結晶化ガラスを約1
0wt%加えて、6h1ライカイ*”c”混練し、La
Nl0@ぺ−X)e作27e@このペーストを用いて厚
膜技術により第1図(a)、伽)のLaN10.厚膜ガ
スセンサを作製した。
(1) LaNi0. Preparation of thick film gas sensor
To 10 g of aNkO fine powder, add 6 cC, an organic vehicle f consisting of ether cellulose and α-terpineol,
Furthermore, about 1 8i-Pd-Zn-Ti crystallized glass
Add 0wt% and knead 6h1 Laikai*"c", La
LaN10.Nl0@Pe-X) e made 27e@Using this paste, LaN10. A thick film gas sensor was fabricated.

第1図において、1はアルミナ基板、2はP1電極、墨
はLaNiOs感ガス部、4はPt加熱用ヒー、タであ
る。このとき、印刷スクリーンは525mesh のも
のな用い、焼成は空気中で900℃で行なった・ このようにして得たLaNi0.の厚膜ガスセンサの各
種ガスに対する応答特性(加熱用と−タ電圧4 V (
350℃))は第2図のようであったb但し、第2図に
おいて5はアルコールの応答特性、6はH,、C)l、
 、 C,H,、1−C4H,、の応答特性、7はai
rレベルである。
In FIG. 1, 1 is an alumina substrate, 2 is a P1 electrode, black is a LaNiOs gas sensitive part, and 4 is a Pt heater. At this time, a 525 mesh printing screen was used, and the firing was performed in air at 900°C.The LaNi0. Response characteristics of the thick film gas sensor to various gases (heating and voltage 4 V (
350℃)) was as shown in Figure 2b However, in Figure 2, 5 is the response characteristic of alcohol, 6 is H, C) l,
, C,H,,1-C4H,, response characteristics, 7 is ai
It is r level.

(2)  8 n O,厚膜ガスセンサの作製8nO,
粉末を用いた以外は、上記(1)と同様にして8nO,
ペーストを作った。次にこのペーストを用い、上記(1
)と同様にして第51i!j(a)、Φ)の8nO,厚
膜ガス竜ンtを作製した。第51ilJにおいて2′は
Pt上部電極、3′は8nO,感ガス部8はP電  下
部電極である。
(2) 8nO, production of thick film gas sensor 8nO,
8nO, in the same manner as in (1) above except that powder was used.
I made a paste. Next, use this paste and apply the above (1)
) in the same way as No. 51i! An 8nO thick film gas tank t of j(a), Φ) was fabricated. In the 51st ilJ, 2' is a Pt upper electrode, 3' is 8nO, and the gas sensing part 8 is a Pt lower electrode.

このようにして得た8nO,厚膜ガス七ンサの各種ガス
の応答特性は第4mの通りであり、アルコールにも感応
した。なお第4図において、9幡ガス(H,、OR,、
CHHHi −C4H1@) 、アルコール共存時の応
答曲線である。
The response characteristics of the 8nO thick film gas sensor thus obtained to various gases were as shown in the 4th m, and it was also sensitive to alcohol. In addition, in Fig. 4, 9 Hata gas (H,, OR,,
CHHHi -C4H1@) is a response curve in the presence of alcohol.

以上のようにして得た2つの機能の興る厚膜ガス七ンサ
の出力部の一方を接近して結合し、これを一つのガスセ
ンサとして用いた。このときの各種ガスに対する応答特
性を第5VIliに示したO このように、アルコールに対する二つの4%−た応答特
性【示す厚膜ガス七ンサを組合せることによって、アル
コールの影響をきわめて少くすることができる。
One of the output parts of the thick film gas sensor having two functions obtained as described above was closely connected and used as one gas sensor. The response characteristics to various gases at this time are shown in VIli. In this way, the influence of alcohol can be minimized by combining the two 4%-response characteristics to alcohol. I can do it.

すなわち、LaNi01ではアルコールに対して抵抗値
が増し、これとiマ反対に8nO,ではアルコールに対
して抵抗値が減する。このため、両者の応答の総量とし
てはアルコールの応答値が打ち消されるため、その影響
が消去される。
That is, in LaNi01, the resistance value increases with respect to alcohol, and on the contrary, with 8nO, the resistance value decreases with respect to alcohol. Therefore, since the response value of alcohol is canceled out as the total amount of responses of both, its influence is eliminated.

このような原理によって、本発明はアルコール蒸気の影
響を受けず、ガス成分のみに(CH。
Based on this principle, the present invention is not affected by alcohol vapor, and only gas components (CH.

H,、C,H・、 i −C,Hl、などの混合瞼)感
応する厚膜ガスセンサを作ることができる・ 実施例2 先に述べた二種類の粉末を用いて作つたLaN1p、ペ
ーストと8 n O,ペーストを用い、厚膜技術により
第6図L a N i Osと8no、を同一チップ上
に搭載した厚膜ガスセンサを作つた0但し、第4Wiに
おいて10はPt中間導体である。
It is possible to make a thick film gas sensor that is sensitive to mixtures of H, C, H, i-C, Hl, etc. Example 2 LaN1p made using the two types of powders mentioned above, paste and A thick film gas sensor was fabricated using thick film technology using 8 n O paste and mounting L a Ni Os and 8 on the same chip. However, in the 4th Wi, 10 is a Pt intermediate conductor.

このガス)ンサの1aN10..8n01(Dガス応答
特性を別個に測定したら次表のとうりでありたO 表LaN10.,8nO,のガス応答特性らに両者混合
物に対するガス応答特性を第7図に示す@ このように本発明によれば、アルコールのみ場合にはほ
とんど応答な示さず、ガス成分のみの場合に応答し、ま
たガス成分とアルコールの共存時における応答量の増幅
(第2図の曲415)作用も無くすことができる・ このため、本発明によるガスセンナはアルコールによる
誤検知、しいてはガス漏れ警報器の誤動作をも無くすこ
とかでき葛。
This gas) sensor is 1aN10. .. 8n01 (D) When the gas response characteristics were measured separately, the results were as shown in the following table. Table 7 shows the gas response characteristics of LaN10., 8nO, and a mixture of both. According to the method, there is almost no response in the case of only alcohol, but there is a response in the case of only gas component, and it is also possible to eliminate the effect of amplifying the amount of response (track 415 in Figure 2) when gas component and alcohol coexist. Therefore, the gas senna according to the present invention can eliminate false detections caused by alcohol and even malfunction of gas leak alarms.

【図面の簡単な説明】[Brief explanation of the drawing]

t/s1図、第3図、第6図厚膜ガスセンナの構造図、
第2図、第4図、第5図、第7図は厚膜ガスセンサのガ
ス応答曲線である。 5 = LaNiOs a61ガス部、s’−−−8n
o、 IC!ガス部。 T 1 図 代理人弁理士 薄 1)利 串 第2図 カース11度 (7,> 才 3 図 (2) 才4図 vz t> 51tXI  /A ) 才 5 図 ガスヅ1度 (f”fmxto’) 才乙図 甘 7 図 ゲスS度 (洛)
t/s1 diagram, Figure 3, Figure 6 structural diagram of thick film gas sensor,
2, 4, 5, and 7 are gas response curves of thick film gas sensors. 5 = LaNiOs a61 gas part, s'---8n
o, IC! Gas department. T 1 figure agent patent attorney Bo 1) Li Kushi figure 2 curse 11 degrees (7,> 3 figure (2) age 4 figure vz t> 51t Saitozu sweet 7 figure guess S degree (Raku)

Claims (1)

【特許請求の範囲】 t  pg半導体物質と、Nil半導体物質を組合せた
ことを特徴とする半導体ガスセンサ。 z  pm半導体物質が一般式ムBO,(但し、式中人
はLm、 Pr、 Nd、 8m、 Qd、 Dy、 
1r(Dうちから選ばれた一種類の希土類元素、BはM
n、Fe、Co、Ns  のうちから運ばれた一種類の
元素である)で表わされるもの、もしくは一般式A、z
8rxcoo、(但し、式中AはLm、Pr、Nd、a
m、Gd、Dy、Br(F)5ちから選ばれた一種類の
希土類元素であり、3(xα1〜14である)で表わさ
れたちのてあり、N[半導体物質fil 8nO,、Z
nO,?@瀧0.)うちから遣ばれた一種類の金属酸化
物であることな特徴とする特許請求範囲第1項記戦の半
導体ガスセンナ。 L  Pl[半導体物質がLaNlOsテTo’)、N
I[半導体物質が8nO,であることを特徴とする特許
請求の範囲第1項記載の半導体ガス゛七ン賃。
[Claims] A semiconductor gas sensor characterized by combining a tpg semiconductor material and a Nil semiconductor material. z pm Semiconductor material has the general formula MBO, (however, the characters in the formula are Lm, Pr, Nd, 8m, Qd, Dy,
1r (one type of rare earth element selected from D, B is M
n, Fe, Co, Ns) or the general formula A, z
8rxcoo, (wherein A is Lm, Pr, Nd, a
It is a kind of rare earth element selected from m, Gd, Dy, Br (F), and is represented by 3 (xα1 to 14), and N[semiconductor material fil 8nO,,Z
nO,? @Taki0. ) The semiconductor gas senna according to claim 1, characterized in that it is one kind of metal oxide sent from Japan. L Pl [semiconductor material is LaNlOsteTo'), N
The semiconductor gas mixture according to claim 1, characterized in that the semiconductor substance is 8nO.
JP12781281A 1981-08-17 1981-08-17 Semiconductor gas sensor Pending JPS5830648A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12781281A JPS5830648A (en) 1981-08-17 1981-08-17 Semiconductor gas sensor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12781281A JPS5830648A (en) 1981-08-17 1981-08-17 Semiconductor gas sensor

Publications (1)

Publication Number Publication Date
JPS5830648A true JPS5830648A (en) 1983-02-23

Family

ID=14969275

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12781281A Pending JPS5830648A (en) 1981-08-17 1981-08-17 Semiconductor gas sensor

Country Status (1)

Country Link
JP (1) JPS5830648A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4580439A (en) * 1983-02-07 1986-04-08 Ricoh Seiki Co., Ltd. Low power gas detector
JPS61260152A (en) * 1985-05-15 1986-11-18 Hiroaki Yanagida Humidity sensor
JPH03287057A (en) * 1990-04-04 1991-12-17 Fuji Electric Co Ltd Production of gas sensor
WO1993014396A1 (en) * 1992-01-10 1993-07-22 Mikuni Corporation Gas sensor and its manufacture
JP2018031685A (en) * 2016-08-25 2018-03-01 フィガロ技研株式会社 Mems gas sensor and gas detector
JPWO2021070705A1 (en) * 2019-10-11 2021-04-15

Cited By (10)

* Cited by examiner, † Cited by third party
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US4580439A (en) * 1983-02-07 1986-04-08 Ricoh Seiki Co., Ltd. Low power gas detector
JPS61260152A (en) * 1985-05-15 1986-11-18 Hiroaki Yanagida Humidity sensor
JPH03287057A (en) * 1990-04-04 1991-12-17 Fuji Electric Co Ltd Production of gas sensor
WO1993014396A1 (en) * 1992-01-10 1993-07-22 Mikuni Corporation Gas sensor and its manufacture
US5618496A (en) * 1992-01-10 1997-04-08 Hiroaki Yanagida Gas sensors and their manufacturing methods
EP0928964A2 (en) * 1992-01-10 1999-07-14 Mikuni Corporation Gas sensors and their manufacturing methods
EP0928964A3 (en) * 1992-01-10 2003-05-21 Mikuni Corporation Gas sensors and their manufacturing methods
JP2018031685A (en) * 2016-08-25 2018-03-01 フィガロ技研株式会社 Mems gas sensor and gas detector
JPWO2021070705A1 (en) * 2019-10-11 2021-04-15
WO2021070705A1 (en) * 2019-10-11 2021-04-15 アルプスアルパイン株式会社 Gas concentration measurement device

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