JPS57202736A - Rotary drying method and device therefor - Google Patents
Rotary drying method and device thereforInfo
- Publication number
- JPS57202736A JPS57202736A JP8695781A JP8695781A JPS57202736A JP S57202736 A JPS57202736 A JP S57202736A JP 8695781 A JP8695781 A JP 8695781A JP 8695781 A JP8695781 A JP 8695781A JP S57202736 A JPS57202736 A JP S57202736A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- tank
- water
- drying
- rotary
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Drying Of Solid Materials (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
PURPOSE:To prevent the sticking of dust by a method wherein an article is washed in liquid and is locked to a rotary mechanism and pulled up to the outside of the liquid for immediate centrifugal drying. CONSTITUTION:An Si substrate 1 after alkali cleaning is washed in pure water 11 during the transfer 8 along the groove 7 of a washing tank 6 and is accommodated in the gap 15 of a rotary plate 14 after transferring the substrate 1 through the water in a tank 9. Water level exceeds the groove 7 of the tank 6 and the rotary plate 14 of the tank 9. Therefore, the substrate will not touch the air. A gate 13 is immediately closed and a pin is inserted in a hole 17 to prevent breakaway. After finally washing the substrate 1 by supplying 18 pure water from the bottom section of the tank 9, water wupply is stopped for drainage 121 and the rotary plate 14 is simultaneously started to perform centrifugal drying. The dried substrate 1 is taken out of the gap 15. In this composition, time exposing the substrate 1 to the air until drying after final washing is remarkably shortened and no recontamination by rebound of liquid occurs during rotary drying.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8695781A JPS57202736A (en) | 1981-06-08 | 1981-06-08 | Rotary drying method and device therefor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8695781A JPS57202736A (en) | 1981-06-08 | 1981-06-08 | Rotary drying method and device therefor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS57202736A true JPS57202736A (en) | 1982-12-11 |
Family
ID=13901348
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8695781A Pending JPS57202736A (en) | 1981-06-08 | 1981-06-08 | Rotary drying method and device therefor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57202736A (en) |
-
1981
- 1981-06-08 JP JP8695781A patent/JPS57202736A/en active Pending
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