JPS54116925A - Development of photoresist - Google Patents

Development of photoresist

Info

Publication number
JPS54116925A
JPS54116925A JP2347078A JP2347078A JPS54116925A JP S54116925 A JPS54116925 A JP S54116925A JP 2347078 A JP2347078 A JP 2347078A JP 2347078 A JP2347078 A JP 2347078A JP S54116925 A JPS54116925 A JP S54116925A
Authority
JP
Japan
Prior art keywords
aqueous solution
rinsing
developing
photoresist
unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2347078A
Other languages
Japanese (ja)
Inventor
Toshihiko Oota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP2347078A priority Critical patent/JPS54116925A/en
Publication of JPS54116925A publication Critical patent/JPS54116925A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)

Abstract

PURPOSE:To make it possible to remove the residual of the photoresist, which is left on a print plate while being insufficiently disolved, by using an aqueous solution of such a substance in the rinsing operation after development as has affinity with an aqueous solution of a surface active agent or a developing liquid. CONSTITUTION:An aqueous solution, to which 1% of such dioxane as can be dissolved in water and as has affinity with a developing liquid is added, is poured into the bath 5 of a developing device 1 and is sufficiently stirred. The bath 5 is connected through a tube 8 to a rinsing unit so that the aqueous solution is circulated through a pump 6 and a filter 7. The print plate has its resist dissolved and removed at the developing unit 2, and then the residual of the resist is rinsed and removed by the water which is injected at the rinsing unit 3 from a rinsing nozzle 4.
JP2347078A 1978-03-03 1978-03-03 Development of photoresist Pending JPS54116925A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2347078A JPS54116925A (en) 1978-03-03 1978-03-03 Development of photoresist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2347078A JPS54116925A (en) 1978-03-03 1978-03-03 Development of photoresist

Publications (1)

Publication Number Publication Date
JPS54116925A true JPS54116925A (en) 1979-09-11

Family

ID=12111406

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2347078A Pending JPS54116925A (en) 1978-03-03 1978-03-03 Development of photoresist

Country Status (1)

Country Link
JP (1) JPS54116925A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54141128A (en) * 1978-04-25 1979-11-02 Fuji Photo Film Co Ltd Processing method of picture image forming material
JPS55134847A (en) * 1979-04-06 1980-10-21 Nec Corp Manufacture of resist image
JPS5962854A (en) * 1982-10-04 1984-04-10 Matsushita Electronics Corp Production of photomask
JPS5997139A (en) * 1982-11-27 1984-06-04 Toshiba Corp Manufacture of photomask
US4688918A (en) * 1985-06-05 1987-08-25 Mitsubishi Denki Kabushiki Kaisha Negative type photoresist developing apparatus

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4853680A (en) * 1971-11-06 1973-07-27
JPS4949702A (en) * 1972-09-14 1974-05-14
JPS5146205A (en) * 1974-10-17 1976-04-20 Unitika Ltd Kankosono genzohoho
JPS5190602A (en) * 1975-02-06 1976-08-09 Jiazo ps ofusetsutoinsatsubanyogenzoeki

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4853680A (en) * 1971-11-06 1973-07-27
JPS4949702A (en) * 1972-09-14 1974-05-14
JPS5146205A (en) * 1974-10-17 1976-04-20 Unitika Ltd Kankosono genzohoho
JPS5190602A (en) * 1975-02-06 1976-08-09 Jiazo ps ofusetsutoinsatsubanyogenzoeki

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54141128A (en) * 1978-04-25 1979-11-02 Fuji Photo Film Co Ltd Processing method of picture image forming material
JPS6127735B2 (en) * 1978-04-25 1986-06-26 Fuji Photo Film Co Ltd
JPS55134847A (en) * 1979-04-06 1980-10-21 Nec Corp Manufacture of resist image
JPS5962854A (en) * 1982-10-04 1984-04-10 Matsushita Electronics Corp Production of photomask
JPS5997139A (en) * 1982-11-27 1984-06-04 Toshiba Corp Manufacture of photomask
US4688918A (en) * 1985-06-05 1987-08-25 Mitsubishi Denki Kabushiki Kaisha Negative type photoresist developing apparatus

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