JPS54100260A - Development and etching device - Google Patents

Development and etching device

Info

Publication number
JPS54100260A
JPS54100260A JP620478A JP620478A JPS54100260A JP S54100260 A JPS54100260 A JP S54100260A JP 620478 A JP620478 A JP 620478A JP 620478 A JP620478 A JP 620478A JP S54100260 A JPS54100260 A JP S54100260A
Authority
JP
Japan
Prior art keywords
valve
tank
opened
fixed
solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP620478A
Other languages
Japanese (ja)
Inventor
Yoshiharu Mori
Nobuo Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP620478A priority Critical patent/JPS54100260A/en
Publication of JPS54100260A publication Critical patent/JPS54100260A/en
Pending legal-status Critical Current

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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To prevent sticking of the dust and to ensure an automatic and immediate exfoliation process by unifying the processes relating the development and etching of the photo resist.
CONSTITUTION: Photo mask 21 is fixed to tank 4, and electromagnetic valve 11 and 25 are controlled to secure the automatic injection of the developer up to the fixed level of the solution. Then circulating filtering 15 is given via pump 14. After a fixed time, electromagnetic valve 16 is opened to exhaust the solution, and the pure water is supplied from tank 3 up to the fixed level to then carry out circulating filtering 15 through valve 25. After a fixed time, valve 16 is opened to exhaust the water. Then valve 16 and 25 are closed and valve 17 and 24 are opened, and then N2 is filtered and introduced (19) to be then exhausted from the bottom to the upper part of tank 4 via valve 24. The temperature of N2 is controlled by heater 18. Then the etching process is started to carry out the same procedure after drying and burning processes. In such way, one unit of the process tank suffices and omitting the carrier part, and filtered necessary process solution can be supplied and exhausted in passage of time. Thus, the photo mask can be produced under the clean state.
COPYRIGHT: (C)1979,JPO&Japio
JP620478A 1978-01-25 1978-01-25 Development and etching device Pending JPS54100260A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP620478A JPS54100260A (en) 1978-01-25 1978-01-25 Development and etching device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP620478A JPS54100260A (en) 1978-01-25 1978-01-25 Development and etching device

Publications (1)

Publication Number Publication Date
JPS54100260A true JPS54100260A (en) 1979-08-07

Family

ID=11631997

Family Applications (1)

Application Number Title Priority Date Filing Date
JP620478A Pending JPS54100260A (en) 1978-01-25 1978-01-25 Development and etching device

Country Status (1)

Country Link
JP (1) JPS54100260A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5727028A (en) * 1980-07-25 1982-02-13 Nippon Telegr & Teleph Corp <Ntt> Formation of pattern

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5727028A (en) * 1980-07-25 1982-02-13 Nippon Telegr & Teleph Corp <Ntt> Formation of pattern

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