JPS54100260A - Development and etching device - Google Patents
Development and etching deviceInfo
- Publication number
- JPS54100260A JPS54100260A JP620478A JP620478A JPS54100260A JP S54100260 A JPS54100260 A JP S54100260A JP 620478 A JP620478 A JP 620478A JP 620478 A JP620478 A JP 620478A JP S54100260 A JPS54100260 A JP S54100260A
- Authority
- JP
- Japan
- Prior art keywords
- valve
- tank
- opened
- fixed
- solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To prevent sticking of the dust and to ensure an automatic and immediate exfoliation process by unifying the processes relating the development and etching of the photo resist.
CONSTITUTION: Photo mask 21 is fixed to tank 4, and electromagnetic valve 11 and 25 are controlled to secure the automatic injection of the developer up to the fixed level of the solution. Then circulating filtering 15 is given via pump 14. After a fixed time, electromagnetic valve 16 is opened to exhaust the solution, and the pure water is supplied from tank 3 up to the fixed level to then carry out circulating filtering 15 through valve 25. After a fixed time, valve 16 is opened to exhaust the water. Then valve 16 and 25 are closed and valve 17 and 24 are opened, and then N2 is filtered and introduced (19) to be then exhausted from the bottom to the upper part of tank 4 via valve 24. The temperature of N2 is controlled by heater 18. Then the etching process is started to carry out the same procedure after drying and burning processes. In such way, one unit of the process tank suffices and omitting the carrier part, and filtered necessary process solution can be supplied and exhausted in passage of time. Thus, the photo mask can be produced under the clean state.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP620478A JPS54100260A (en) | 1978-01-25 | 1978-01-25 | Development and etching device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP620478A JPS54100260A (en) | 1978-01-25 | 1978-01-25 | Development and etching device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS54100260A true JPS54100260A (en) | 1979-08-07 |
Family
ID=11631997
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP620478A Pending JPS54100260A (en) | 1978-01-25 | 1978-01-25 | Development and etching device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54100260A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5727028A (en) * | 1980-07-25 | 1982-02-13 | Nippon Telegr & Teleph Corp <Ntt> | Formation of pattern |
-
1978
- 1978-01-25 JP JP620478A patent/JPS54100260A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5727028A (en) * | 1980-07-25 | 1982-02-13 | Nippon Telegr & Teleph Corp <Ntt> | Formation of pattern |
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