JPS56166935A - Apparatus for vapor growth under reduced pressure - Google Patents
Apparatus for vapor growth under reduced pressureInfo
- Publication number
- JPS56166935A JPS56166935A JP6923280A JP6923280A JPS56166935A JP S56166935 A JPS56166935 A JP S56166935A JP 6923280 A JP6923280 A JP 6923280A JP 6923280 A JP6923280 A JP 6923280A JP S56166935 A JPS56166935 A JP S56166935A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- plasma
- heat reaction
- vapor growth
- reaction part
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To form a uniform coating efficiently by providing a plasma generating apparatus between a heat reaction part of a reactor tube and a gas supply source to effectively carry out vapor growth.
CONSTITUTION: For example, a monosilane and nitrogen as a carrier gas are introduced from a gas introducing pipe 3. The introduced gas generates electric discharge between electrodes 11 prior to reaching to a heat reaction part having a wafer placed thereon and converted to a plasma condition. Succeedingly, the plasma gas generates heat reaction in the heat reaction part in a high temp. condition, and polycrystalline silicon coating is grown on the silicon wafer 8. Because the activity of the gas is enhanced by plasma generation, reaction is facilitated and a desired coating is grown efficiently.
COPYRIGHT: (C)1981,JPO&Japio
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6923280A JPS56166935A (en) | 1980-05-23 | 1980-05-23 | Apparatus for vapor growth under reduced pressure |
DE19813118848 DE3118848C2 (en) | 1980-05-12 | 1981-05-12 | Low pressure coating device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6923280A JPS56166935A (en) | 1980-05-23 | 1980-05-23 | Apparatus for vapor growth under reduced pressure |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56166935A true JPS56166935A (en) | 1981-12-22 |
JPS6128372B2 JPS6128372B2 (en) | 1986-06-30 |
Family
ID=13396775
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6923280A Granted JPS56166935A (en) | 1980-05-12 | 1980-05-23 | Apparatus for vapor growth under reduced pressure |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56166935A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6067673A (en) * | 1983-09-22 | 1985-04-18 | Semiconductor Energy Lab Co Ltd | Plasma gaseous phase reaction method |
US4657616A (en) * | 1985-05-17 | 1987-04-14 | Benzing Technologies, Inc. | In-situ CVD chamber cleaner |
US4786352A (en) * | 1986-09-12 | 1988-11-22 | Benzing Technologies, Inc. | Apparatus for in-situ chamber cleaning |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5628637A (en) * | 1979-08-16 | 1981-03-20 | Shunpei Yamazaki | Film making method |
-
1980
- 1980-05-23 JP JP6923280A patent/JPS56166935A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5628637A (en) * | 1979-08-16 | 1981-03-20 | Shunpei Yamazaki | Film making method |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6067673A (en) * | 1983-09-22 | 1985-04-18 | Semiconductor Energy Lab Co Ltd | Plasma gaseous phase reaction method |
JPH0344148B2 (en) * | 1983-09-22 | 1991-07-05 | Handotai Energy Kenkyusho | |
US4657616A (en) * | 1985-05-17 | 1987-04-14 | Benzing Technologies, Inc. | In-situ CVD chamber cleaner |
US4786352A (en) * | 1986-09-12 | 1988-11-22 | Benzing Technologies, Inc. | Apparatus for in-situ chamber cleaning |
Also Published As
Publication number | Publication date |
---|---|
JPS6128372B2 (en) | 1986-06-30 |
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