JPS5586116A - Drier - Google Patents

Drier

Info

Publication number
JPS5586116A
JPS5586116A JP15854478A JP15854478A JPS5586116A JP S5586116 A JPS5586116 A JP S5586116A JP 15854478 A JP15854478 A JP 15854478A JP 15854478 A JP15854478 A JP 15854478A JP S5586116 A JPS5586116 A JP S5586116A
Authority
JP
Japan
Prior art keywords
drying
wafer
pusher
cup
washing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15854478A
Other languages
Japanese (ja)
Inventor
Hiroto Nagatomo
Hisao Seki
Tetsuya Takagaki
Shiro Terasaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP15854478A priority Critical patent/JPS5586116A/en
Priority to US06/061,049 priority patent/US4282825A/en
Priority to DE19792931308 priority patent/DE2931308A1/en
Publication of JPS5586116A publication Critical patent/JPS5586116A/en
Pending legal-status Critical Current

Links

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PURPOSE: To carry out drying in a short time without deteriorating cleanliness by providing a rotary mechanism to rotate products, a forced exhaust mechanism, and a dry accelerating mechanism to blow a drying gas in a drying room provided on a path through which to convey products after washing.
CONSTITUTION: After washing through pure water in a rinsing tank 10, a wafer 11 to treat is fed to a rotary disc 20 in a drying room formed with a cup 32 and a cover 36 from a supply guide 17 through a pusher 12. A drying gas is blown through a feed pipe 37 of the cover 36, and exhausted forcedly through an exhaust port provided on the cup 32. A rotary table 20 runs at high speed to shake off water content on the surface of the wafer 11 through centrifugal force. Then, the drying gas is blown onto the surface of the wafer 11, therefore drying is accelerated. Next, the wafer 11 is fed on a conveying guide 18 by the pusher 26, passes further through a blast drying oven and thus has the water content staying residual on the wafer 11 evaporated thoroughly to dryness.
COPYRIGHT: (C)1980,JPO&Japio
JP15854478A 1978-08-02 1978-12-25 Drier Pending JPS5586116A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP15854478A JPS5586116A (en) 1978-12-25 1978-12-25 Drier
US06/061,049 US4282825A (en) 1978-08-02 1979-07-26 Surface treatment device
DE19792931308 DE2931308A1 (en) 1978-08-02 1979-08-01 SURFACE TREATMENT DEVICE

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15854478A JPS5586116A (en) 1978-12-25 1978-12-25 Drier

Publications (1)

Publication Number Publication Date
JPS5586116A true JPS5586116A (en) 1980-06-28

Family

ID=15674018

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15854478A Pending JPS5586116A (en) 1978-08-02 1978-12-25 Drier

Country Status (1)

Country Link
JP (1) JPS5586116A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57154835A (en) * 1981-03-20 1982-09-24 Hitachi Ltd Method and apparatus for drying tabular material
JPS581630U (en) * 1981-06-29 1983-01-07 三菱重工業株式会社 High pressure gate structure
JPS6030140A (en) * 1983-07-28 1985-02-15 Fujitsu Ltd Spin drier
JPS6064436A (en) * 1983-09-19 1985-04-13 Fujitsu Ltd Spin drier
JPS6373626A (en) * 1986-09-17 1988-04-04 Hitachi Ltd Treating device
EP1571694A1 (en) * 2002-12-10 2005-09-07 Nikon Corporation Exposure apparatus and method for manufacturing device
US10566217B2 (en) 2018-03-27 2020-02-18 Global Unichip Corporation Drying apparatus

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5377460A (en) * 1976-12-21 1978-07-08 Sony Corp Washing unit of semiconductor wafer
JPS53138278A (en) * 1977-05-10 1978-12-02 Toshiba Corp Drier for wafer

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5377460A (en) * 1976-12-21 1978-07-08 Sony Corp Washing unit of semiconductor wafer
JPS53138278A (en) * 1977-05-10 1978-12-02 Toshiba Corp Drier for wafer

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57154835A (en) * 1981-03-20 1982-09-24 Hitachi Ltd Method and apparatus for drying tabular material
JPS581630U (en) * 1981-06-29 1983-01-07 三菱重工業株式会社 High pressure gate structure
JPS6030140A (en) * 1983-07-28 1985-02-15 Fujitsu Ltd Spin drier
JPS6064436A (en) * 1983-09-19 1985-04-13 Fujitsu Ltd Spin drier
JPS6373626A (en) * 1986-09-17 1988-04-04 Hitachi Ltd Treating device
EP1571694A1 (en) * 2002-12-10 2005-09-07 Nikon Corporation Exposure apparatus and method for manufacturing device
EP1571694A4 (en) * 2002-12-10 2008-10-15 Nikon Corp Exposure apparatus and method for manufacturing device
US8034539B2 (en) 2002-12-10 2011-10-11 Nikon Corporation Exposure apparatus and method for producing device
US10566217B2 (en) 2018-03-27 2020-02-18 Global Unichip Corporation Drying apparatus

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