JPS56130923A - Developing apparatus for semiconductor substrate - Google Patents
Developing apparatus for semiconductor substrateInfo
- Publication number
- JPS56130923A JPS56130923A JP3444780A JP3444780A JPS56130923A JP S56130923 A JPS56130923 A JP S56130923A JP 3444780 A JP3444780 A JP 3444780A JP 3444780 A JP3444780 A JP 3444780A JP S56130923 A JPS56130923 A JP S56130923A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- wafer
- developer
- semiconductor substrate
- rinsing liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To form a stable and uniform developing state on the entire surface of a wafer by providing automatic conveying-in and -out means, rotatable vacuum chuck, developer discharging means, rinsing liquid injecting means and drying means in an apparatus for developing a semiconductor substrate. CONSTITUTION:A semiconductor substrate 7 is placed by automatic conveying-in means having a supply elevator 1, a supply carrier 2 and a wafer conveying unit 3 on a rotatable vacuum chuck 6 connected to a motor 5, developer is dropped to develop from a developer discharging nozzle 8 on the substrate while rotating at an extremely low speed, rinsing liquid is then injected from rinsing liquid injecting nozzles 9, 9' while rotating the substrate, dry gas is injected from a nozzle 10, the substrate is rotated at a high speed to dry the substrate, and the substrate 7 is subsequently fed out of a wafer conveying-out unit 11. Thus, since fresh developer can be supplied to the entire surface of the wafer, it can be uniformly developed.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3444780A JPS56130923A (en) | 1980-03-18 | 1980-03-18 | Developing apparatus for semiconductor substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3444780A JPS56130923A (en) | 1980-03-18 | 1980-03-18 | Developing apparatus for semiconductor substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS56130923A true JPS56130923A (en) | 1981-10-14 |
Family
ID=12414496
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3444780A Pending JPS56130923A (en) | 1980-03-18 | 1980-03-18 | Developing apparatus for semiconductor substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56130923A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0223237A2 (en) * | 1985-11-18 | 1987-05-27 | Kabushiki Kaisha Toshiba | Automatic developing apparatus |
-
1980
- 1980-03-18 JP JP3444780A patent/JPS56130923A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0223237A2 (en) * | 1985-11-18 | 1987-05-27 | Kabushiki Kaisha Toshiba | Automatic developing apparatus |
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