JPS5358761A - Vapor phase growth apparatus - Google Patents
Vapor phase growth apparatusInfo
- Publication number
- JPS5358761A JPS5358761A JP13509876A JP13509876A JPS5358761A JP S5358761 A JPS5358761 A JP S5358761A JP 13509876 A JP13509876 A JP 13509876A JP 13509876 A JP13509876 A JP 13509876A JP S5358761 A JPS5358761 A JP S5358761A
- Authority
- JP
- Japan
- Prior art keywords
- vapor phase
- phase growth
- growth apparatus
- vapor
- substances
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: The evenness of the thicknesses of vapor-grown substances is improved by changing the relative rotating speeds of a reaction gas supplying means and the substances to be vapor grown.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13509876A JPS5358761A (en) | 1976-11-08 | 1976-11-08 | Vapor phase growth apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13509876A JPS5358761A (en) | 1976-11-08 | 1976-11-08 | Vapor phase growth apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5358761A true JPS5358761A (en) | 1978-05-26 |
JPS5744010B2 JPS5744010B2 (en) | 1982-09-18 |
Family
ID=15143778
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13509876A Granted JPS5358761A (en) | 1976-11-08 | 1976-11-08 | Vapor phase growth apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5358761A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58193362A (en) * | 1982-04-30 | 1983-11-11 | Shimadzu Corp | Plasma chemical vapor deposition apparatus |
JPS60122795A (en) * | 1983-12-07 | 1985-07-01 | Mitsubishi Metal Corp | Low pressure synthesis device for diamond |
JPS60126833A (en) * | 1983-11-24 | 1985-07-06 | Mitsubishi Electric Corp | Plasma etching device |
JPS62241336A (en) * | 1986-04-11 | 1987-10-22 | Nec Kyushu Ltd | Plasma etching device |
JPS62279862A (en) * | 1986-05-28 | 1987-12-04 | Anelva Corp | Apparatus for forming membrane |
-
1976
- 1976-11-08 JP JP13509876A patent/JPS5358761A/en active Granted
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58193362A (en) * | 1982-04-30 | 1983-11-11 | Shimadzu Corp | Plasma chemical vapor deposition apparatus |
JPS60126833A (en) * | 1983-11-24 | 1985-07-06 | Mitsubishi Electric Corp | Plasma etching device |
JPH0354457B2 (en) * | 1983-11-24 | 1991-08-20 | ||
JPS60122795A (en) * | 1983-12-07 | 1985-07-01 | Mitsubishi Metal Corp | Low pressure synthesis device for diamond |
JPS62241336A (en) * | 1986-04-11 | 1987-10-22 | Nec Kyushu Ltd | Plasma etching device |
JPS62279862A (en) * | 1986-05-28 | 1987-12-04 | Anelva Corp | Apparatus for forming membrane |
Also Published As
Publication number | Publication date |
---|---|
JPS5744010B2 (en) | 1982-09-18 |
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