JPH0725684Y2 - Total reflection X-ray fluorescence analyzer - Google Patents
Total reflection X-ray fluorescence analyzerInfo
- Publication number
- JPH0725684Y2 JPH0725684Y2 JP1988122131U JP12213188U JPH0725684Y2 JP H0725684 Y2 JPH0725684 Y2 JP H0725684Y2 JP 1988122131 U JP1988122131 U JP 1988122131U JP 12213188 U JP12213188 U JP 12213188U JP H0725684 Y2 JPH0725684 Y2 JP H0725684Y2
- Authority
- JP
- Japan
- Prior art keywords
- ray
- base plate
- incident
- sample
- fluorescent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
Description
【考案の詳細な説明】 本考案は平面状の基台板に試料を薄く付着させて、その
基台板に全反射を生ずるような小さい角度をもって励起
Ｘ線を入射させることにより試料から発生する蛍光Ｘ線
を検出し、その波長によって試料の成分を分析する装置
の構造に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention is generated from a sample by thinly adhering the sample to a flat base plate and making excitation X-rays incident on the base plate at a small angle that causes total reflection. The present invention relates to the structure of an apparatus that detects fluorescent X-rays and analyzes the components of a sample according to the wavelength thereof.
この装置は基台板の表面に0.01〜0.1度の極めて小さい
角度で細いＸ線を入射させ、表面に付着した試料から発
生する蛍光Ｘ線を、これに対設したＸ線検出器で検出す
るものである。しかしＸ線の入射角が極めて小さいため
に基台板の表面の位置あるいは励起Ｘ線ビームの位置が
この表面に対して直角な方向へ僅かでも変動すると、上
記表面におけるＸ線の入射位置が著しく変動して表面の
薄い試料層から発生する蛍光Ｘ線が検出器の中央部に正
確に入射しなくなる。すなわち検出器の感度が実効的に
変化したことになるため、定量分析に際しては大きな誤
差を生ずる。本考案は従来の装置におけるこのような欠
点を防止しようとするものである。In this device, thin X-rays are incident on the surface of the base plate at an extremely small angle of 0.01 to 0.1 degree, and fluorescent X-rays generated from the sample attached to the surface are detected by an X-ray detector opposite to the fluorescent X-rays. It is a thing. However, since the incident angle of X-rays is extremely small, even if the position of the surface of the base plate or the position of the excited X-ray beam fluctuates even in a direction perpendicular to this surface, the incident position of X-rays on the surface becomes remarkable. The fluorescent X-rays that fluctuate and are generated from the thin sample layer cannot accurately enter the central portion of the detector. That is, since the sensitivity of the detector has effectively changed, a large error occurs in the quantitative analysis. The present invention seeks to prevent such drawbacks in conventional devices.
本考案は基台板の表面に任意の試料を薄く被着して、そ
の表面に微小の入射角で細い励起用Ｘ線を入射させると
共に上記基台板にＸ線検出器を対向させた全反射蛍光Ｘ
線分析装置において、前記検出器で基台板の蛍光Ｘ線を
検出すると同時に基台板自体をその表面に対して直角な
方向へ移動させるか、または細い励起用Ｘ線を形成する
スリットをこの励起用Ｘ線ビームに対して交差する方向
へ移動させるようにしたものである。第１図はその原理
を説明する線図で、基台板１の表面には図示してないが
分析しょうとする試料が薄く被着されている。この基台
板に0.1度以下の極めて小さい角度αをもって細いＸ線
２を入射させると、そのＸ線が基台板１の内部に侵入し
た軌跡上で、基台板の材質で定まる波長の蛍光Ｘ線が発
生する。その大部分は基台板に吸収されるが、一部は表
面から外部に放出されてＸ線検出器で検出される。この
検出器は紙面内において基台板１の表面と平行な方向に
例えば曲線Ｓ（ｘ）で示したような感度分布をもってい
る。ｘは紙面内において検出器３の中心から基台板１の
表面に平行な方向の距離である。試料からのＸ線強度は
その厚さが極めて小さいから試料の内部へ侵入した一次
Ｘ線による励起を考える必要はなく、このため一次Ｘ線
の入射点ｐが検出器の中心ｑにあるとき極大となる。ま
た検出器３で検出される基台板１からの蛍光Ｘ線強度は
前述のように一次Ｘ線がこの基台板１の内部に侵入して
その軌跡上で蛍光Ｘ線が発生し、このＸ線は基台板の材
質による吸収をうけるが、表面から放出されて検出器３
で検出される。従って基台板１の内部で発生し基台板の
表面から放射される蛍光Ｘ線の強度Ｉ（ｘ′）と前記検
出器の感度Ｓ（ｘ）との積を積分したものによって決ま
る。ｘ′は基台板の表面において一次Ｘ線が基台板表面
に入射した点ｐから基台板１の表面に平行な方向にとっ
た距離である。式で示すと検出器３で検出される基台板
１の材質からの蛍光Ｘ線の強度Ib（x0）は となる。Ib（x0）はx0の関数であり、これが極大となる
x0となるx0はＩ（ｘ−x0）の関数の形によっている。In the present invention, an arbitrary sample is thinly coated on the surface of a base plate, thin X-rays for excitation are made incident on the surface at a minute incident angle, and an X-ray detector is opposed to the base plate. Reflected fluorescence X
In the line analyzer, the detector detects the fluorescent X-rays of the base plate, and at the same time, the base plate itself is moved in a direction perpendicular to the surface thereof, or a slit for forming a thin X-ray for excitation is formed. The X-ray beam for excitation is moved in a direction intersecting with it. FIG. 1 is a diagram for explaining the principle, and a sample to be analyzed is thinly deposited on the surface of the base plate 1 although not shown. When a thin X-ray 2 is made incident on this base plate at an extremely small angle α of 0.1 degrees or less, fluorescence having a wavelength determined by the material of the base plate is detected on the locus where the X-ray enters the inside of the base plate 1. X-rays are generated. Most of it is absorbed by the base plate, but part of it is emitted to the outside from the surface and detected by the X-ray detector. This detector has a sensitivity distribution in the direction parallel to the surface of the base plate 1 within the plane of the drawing, for example, as shown by the curve S (x). x is the distance in the direction parallel to the surface of the base plate 1 from the center of the detector 3 in the plane of the drawing. Since the X-ray intensity from the sample is extremely small, it is not necessary to consider the excitation by the primary X-ray penetrating the inside of the sample. Therefore, when the incident point p of the primary X-ray is at the center q of the detector, it becomes a maximum. Becomes As described above, the intensity of the fluorescent X-rays from the base plate 1 detected by the detector 3 is such that the primary X-rays enter the inside of the base plate 1 to generate fluorescent X-rays on its locus. The X-rays are absorbed by the material of the base plate, but are emitted from the surface and the detector 3
Detected in. Therefore, it is determined by the product of the intensity I (x ') of the fluorescent X-rays generated inside the base plate 1 and emitted from the surface of the base plate and the sensitivity S (x) of the detector. x'is the distance taken in the direction parallel to the surface of the base plate 1 from the point p at which the primary X-rays are incident on the surface of the base plate on the surface of the base plate. According to the formula, the intensity Ib (x 0 ) of the fluorescent X-ray from the material of the base plate 1 detected by the detector 3 is Becomes Ib (x 0 ) is a function of x 0 , which is the maximum
x 0 , which is x 0, depends on the form of the function of I (x−x 0 ).
すなわち一次Ｘ線の基台板による吸収係数と基台板の材
質からの蛍光Ｘ線吸収係数と基台板材質の密度とによっ
て定まる値となる。このような値を理論的に算出するこ
とは、一次Ｘ線のエネルギ毎に吸収係数が変化すること
から簡単てはないが、これを求めることは可能である。That is, it is a value determined by the absorption coefficient of the primary X-ray by the base plate, the fluorescent X-ray absorption coefficient from the material of the base plate, and the density of the base plate material. It is not easy to theoretically calculate such a value because the absorption coefficient changes for each energy of the primary X-rays, but it is possible to obtain it.
以上の観点から、実験によって基台板に試料を被着させ
ない場合におけるその蛍光Ｘ線強度が極大となる（x0）
ｂを求め、次に試験的に充分検出し得るだけの試料を被
着させた試料からの蛍光Ｘ線強度が極大となる（x0）Ｓ
を予め求めてそれらの差を得た後、この値を変化させる
には必要なｚ方向の値dz0を予め算出して、未知の試料
の測定時には基台板をｚ方向に移動させることにより、
基台板１の材質からの蛍光Ｘ線強度が極大となる位置を
求め、これより更にdZ0だけ変位させた位置に基台板の
表面を設定することにより、あるいはスリット５を移動
させることにより、基台１の材質からの蛍光Ｘ線強度が
極大となる点を求めて、更にdZ0に相当する値だけスリ
ット５を移動させることにより、その入射点ｐをx,zが
共に０となる原点ｑに一致させることができる。この状
態では、基台板１の表面に被着した試料の蛍光Ｘ線が最
大でしかも一定の感度をもって検出器３で検出される。
従って本考案の装置は常に正確で高感度の定量分析を行
い得る作用効果がある。From the above viewpoint, the fluorescent X-ray intensity becomes maximum when the sample is not adhered to the base plate by experiment (x 0 ).
b, and then the fluorescent X-ray intensity from the sample coated with a sample that can be sufficiently detected experimentally becomes the maximum (x 0 ) S
After obtaining the difference and obtaining the difference between them, the value dz 0 in the z direction necessary for changing this value is calculated in advance, and the base plate is moved in the z direction when measuring an unknown sample. ,
By finding the position where the fluorescent X-ray intensity from the material of the base plate 1 becomes maximum and setting the surface of the base plate at a position further displaced by dZ 0 from this, or by moving the slit 5. , Finding the point where the fluorescent X-ray intensity from the material of the base 1 becomes maximum and further moving the slit 5 by a value corresponding to dZ 0 , so that both x and z of the incident point p become 0. The origin q can be matched. In this state, the fluorescent X-ray of the sample adhered to the surface of the base plate 1 is detected by the detector 3 with the maximum and constant sensitivity.
Therefore, the device of the present invention has the effect of always performing accurate and highly sensitive quantitative analysis.
第２図は本考案実施例の構成を示した図で、基台板１の
表面は未知の汚染物質または被着された試料４で覆われ
ているが、この試料にＸ線検出器３を対向させると共に
スリット５で励起Ｘ線２を細く絞って前述のように極め
て小さい角度αで試料面に入射させてある。従って試料
４をＸ線２で励起して、その蛍光Ｘ線６を検出器３で検
出することができる。このような装置の設定に際して前
述のように検出器３で基台板１の蛍光Ｘ線を検出すると
共にその基台板１を矢印ｅのようにこれと直角な方向駆
動して位置調整を行う駆動装置７に上記検出器３の出力
を加えて、この出力が前述のように極大または多少小さ
い一定割合の値となるように基台板１の位置の自動調整
を行う。FIG. 2 is a diagram showing the configuration of the embodiment of the present invention, in which the surface of the base plate 1 is covered with an unknown pollutant or a sample 4 attached thereto, and the X-ray detector 3 is attached to this sample. The excitation X-rays 2 are narrowed by the slits 5 while facing each other, and are made incident on the sample surface at an extremely small angle α as described above. Therefore, the sample 4 can be excited by the X-ray 2 and the fluorescent X-ray 6 can be detected by the detector 3. When setting up such an apparatus, the detector 3 detects the fluorescent X-rays of the base plate 1 as described above, and the base plate 1 is driven in a direction perpendicular to the direction as indicated by arrow e to adjust the position. The output of the detector 3 is added to the driving device 7, and the position of the base plate 1 is automatically adjusted so that the output becomes a maximum or a slightly small constant ratio value as described above.
また第２図の駆動装置８は本考案の他の実施例で、上記
駆動装置７を設けることなく、検出器３の出力を鎖線の
ように上記駆動装置８に加えて、スリット５の位置を矢
印ｆのようにＸ線２と交差する方向へ移動させることに
より、この入射Ｘ線の位置調整を行うものである。すな
わちこのような構成によってもＸ線２の入射点が検出器
３の中心と対向するように自動調整を行うことができ
る。The driving device 8 of FIG. 2 is another embodiment of the present invention, and the output of the detector 3 is added to the driving device 8 as shown by a chain line and the position of the slit 5 is changed without providing the driving device 7. The position of this incident X-ray is adjusted by moving it in the direction intersecting the X-ray 2 as indicated by arrow f. That is, even with such a configuration, automatic adjustment can be performed so that the incident point of the X-ray 2 faces the center of the detector 3.
第１図は本考案の作用を説明する線図、第２図は本考案
実施例の構成を示した図である。 なお図において、１は基台板、２はＸ線、３はＸ線検出
器、４は試料、５はスリット、６は蛍光Ｘ線である。FIG. 1 is a diagram for explaining the operation of the present invention, and FIG. 2 is a diagram showing a configuration of an embodiment of the present invention. In the figure, 1 is a base plate, 2 is an X-ray, 3 is an X-ray detector, 4 is a sample, 5 is a slit, and 6 is a fluorescent X-ray.
Claims (2)
に微小の入射角をもって細いＸ線を入射させると共に、
その入射部に対設して前記試料の蛍光Ｘ線を検出するた
めのＸ線検出器に入射する前記基台板の蛍光Ｘ線が極大
値となる位置から、あらかじめ求めた前記Ｘ線検出器に
入射する前記試料の蛍光Ｘ線が極大値となる位置との差
だけ、前記基台板をその表面に対して直角な方向へ移動
させる機構を設けた全反射蛍光Ｘ線分析装置1. A thin X-ray is incident on a flat base plate having a sample thinly adhered to the surface thereof at a small incident angle, and
The X-ray detector obtained in advance from the position at which the fluorescent X-rays of the base plate incident on the X-ray detector for detecting the fluorescent X-rays of the sample opposite to the incident portion have a maximum value. Total reflection X-ray fluorescence analyzer provided with a mechanism for moving the base plate in a direction perpendicular to the surface of the sample by the difference from the position where the X-ray fluorescence of the sample incident on
に微小の入射角をもって細いＸ線を入射させると共に、
その入射部に対設して前記試料の蛍光Ｘ線を検出するた
めのＸ線検出器に入射する前記基台板の蛍光Ｘ線が極大
値となる位置から、あらかじめ求めた前記Ｘ線検出器に
入射する前記試料の蛍光Ｘ線が極大値となる位置との差
だけ、前記細いＸ線を形成するスリットの位置をこのス
リットを通るＸ線と交叉する方向へ移動させる機構を設
けた全反射蛍光Ｘ線分析装置2. A thin X-ray is incident on a flat base plate having a sample thinly adhered to the surface thereof at a minute incident angle, and
The X-ray detector obtained in advance from the position at which the fluorescent X-rays of the base plate incident on the X-ray detector for detecting the fluorescent X-rays of the sample opposite to the incident portion have a maximum value. Total reflection with a mechanism for moving the position of the slit forming the thin X-ray in the direction intersecting with the X-ray passing through the slit by the difference from the position where the fluorescent X-ray of the sample incident on X-ray fluorescence analyzer
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988122131U JPH0725684Y2 (en) | 1988-09-20 | 1988-09-20 | Total reflection X-ray fluorescence analyzer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988122131U JPH0725684Y2 (en) | 1988-09-20 | 1988-09-20 | Total reflection X-ray fluorescence analyzer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0245447U JPH0245447U (en) | 1990-03-28 |
| JPH0725684Y2 true JPH0725684Y2 (en) | 1995-06-07 |
Family
ID=31369771
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1988122131U Expired - Lifetime JPH0725684Y2 (en) | 1988-09-20 | 1988-09-20 | Total reflection X-ray fluorescence analyzer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0725684Y2 (en) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3542003A1 (en) * | 1985-11-28 | 1987-06-04 | Geesthacht Gkss Forschung | METHOD FOR NON-DESTRUCTIVE ANALYSIS OF THE SURFACE LAYER OF SAMPLES |
-
1988
- 1988-09-20 JP JP1988122131U patent/JPH0725684Y2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0245447U (en) | 1990-03-28 |
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