JPH0371662U - - Google Patents

Info

Publication number
JPH0371662U
JPH0371662U JP13270789U JP13270789U JPH0371662U JP H0371662 U JPH0371662 U JP H0371662U JP 13270789 U JP13270789 U JP 13270789U JP 13270789 U JP13270789 U JP 13270789U JP H0371662 U JPH0371662 U JP H0371662U
Authority
JP
Japan
Prior art keywords
integrated circuit
light
semiconductor
semiconductor integrated
conductivity type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13270789U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP13270789U priority Critical patent/JPH0371662U/ja
Publication of JPH0371662U publication Critical patent/JPH0371662U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図Aは本考案の半導体集積回路の平面図、
第1図Bは、第1図AのX−X′線における断面
図、第2図は従来の半導体集積回路の断面図であ
る。
FIG. 1A is a plan view of the semiconductor integrated circuit of the present invention;
FIG. 1B is a sectional view taken along line XX' in FIG. 1A, and FIG. 2 is a sectional view of a conventional semiconductor integrated circuit.

Claims (1)

【実用新案登録請求の範囲】 (1) 光を電気信号に変換する受光領域とこの電
気信号を処理する半導体素子領域とを一つの半導
体層内に形成した半導体集積回路において、 前記受光領域はシヨツトキーバリアーダイオー
ドにより構成され、このシヨツトキーバリアーダ
イオードのアノード電極は櫛歯あるいは格子状の
アルミニウムよりなることを特徴とした半導体集
積回路。 (2) 前記受光領域以外は、前記カソード電極と
実質的に同一材料の遮光膜が形成されていること
を特徴とした請求項第1項記載の半導体集積回路
。 (3) 一導電型の半導体基板上に形成された逆導
電型のエピタキシヤル層と、 このエピタキシヤル層を複数のアイランドに分
割する一導電型の分離領域と、 このアイランドに形成された半導体素子と、 他のアイランドに形成されたシヨツトキーバリ
アーダイオードとを備え、 前記シヨツトキーバリアーダイオードのアノー
ド電極は、前記半導体素子に形成される電極と実
質的に同一材料の櫛歯あるいは格子状のアルミニ
ウム電極よりなることを特徴とした半導体集積回
路。
[Claims for Utility Model Registration] (1) In a semiconductor integrated circuit in which a light-receiving region that converts light into an electrical signal and a semiconductor element region that processes this electrical signal are formed in one semiconductor layer, the light-receiving region is a silicon A semiconductor integrated circuit comprising a Yottoky barrier diode, the anode electrode of which is made of comb-teeth or lattice-shaped aluminum. (2) The semiconductor integrated circuit according to claim 1, wherein a light shielding film made of substantially the same material as the cathode electrode is formed in areas other than the light receiving area. (3) an epitaxial layer of an opposite conductivity type formed on a semiconductor substrate of one conductivity type, an isolation region of one conductivity type that divides this epitaxial layer into a plurality of islands, and a semiconductor element formed on this island. and a shot key barrier diode formed on another island, wherein the anode electrode of the shot key barrier diode is a comb-like or lattice-shaped anode made of substantially the same material as the electrode formed on the semiconductor element. A semiconductor integrated circuit characterized by being made of aluminum electrodes.
JP13270789U 1989-11-15 1989-11-15 Pending JPH0371662U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13270789U JPH0371662U (en) 1989-11-15 1989-11-15

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13270789U JPH0371662U (en) 1989-11-15 1989-11-15

Publications (1)

Publication Number Publication Date
JPH0371662U true JPH0371662U (en) 1991-07-19

Family

ID=31680152

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13270789U Pending JPH0371662U (en) 1989-11-15 1989-11-15

Country Status (1)

Country Link
JP (1) JPH0371662U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000017941A1 (en) * 1998-09-18 2000-03-30 Mitsubishi Cable Industries, Ltd. Semiconductor photodetector

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000017941A1 (en) * 1998-09-18 2000-03-30 Mitsubishi Cable Industries, Ltd. Semiconductor photodetector

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