JPH0173953U - - Google Patents
Info
- Publication number
- JPH0173953U JPH0173953U JP1987169601U JP16960187U JPH0173953U JP H0173953 U JPH0173953 U JP H0173953U JP 1987169601 U JP1987169601 U JP 1987169601U JP 16960187 U JP16960187 U JP 16960187U JP H0173953 U JPH0173953 U JP H0173953U
- Authority
- JP
- Japan
- Prior art keywords
- receiving element
- level
- photo
- integrated light
- integrated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010586 diagram Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
- H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
- H01L31/111—Devices sensitive to infrared, visible or ultraviolet radiation characterised by at least three potential barriers, e.g. photothyristors
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Thyristors (AREA)
Description
第1図は本考案に係わる集積化受光素子の電気
回路図、第2図はその1チツプ化デバイス構造を
示す断面図、第3図は他の1チツプ化したデバイ
ス構造を示す断面図、第4図は従来の集積化受光
素子の電気回路図および第5図はその1チツプ化
したデバイス構造の断面図である。 1…フオト・ダイオード、9…P形シリコン基
板、10…n+埋込み層、11…n−エピタキシ
ヤル層、12…P形ベース拡散領域、13…n+
エミツタ領域、14…酸化膜、15…Al配線、
16…フオト・サイリスタ、17…インピーダン
ス変換器、18…PNPトランジスタ、19…N
PNトランジスタ、23…ポリSi―pinフオ
ト・ダイオード。
回路図、第2図はその1チツプ化デバイス構造を
示す断面図、第3図は他の1チツプ化したデバイ
ス構造を示す断面図、第4図は従来の集積化受光
素子の電気回路図および第5図はその1チツプ化
したデバイス構造の断面図である。 1…フオト・ダイオード、9…P形シリコン基
板、10…n+埋込み層、11…n−エピタキシ
ヤル層、12…P形ベース拡散領域、13…n+
エミツタ領域、14…酸化膜、15…Al配線、
16…フオト・サイリスタ、17…インピーダン
ス変換器、18…PNPトランジスタ、19…N
PNトランジスタ、23…ポリSi―pinフオ
ト・ダイオード。
Claims (1)
- 【実用新案登録請求の範囲】 1チツプ上に集積して形成されたフオト・ダイ
オードと該フオト・ダイオードと直列接続された
フオト・サイリスタとからなり、 上記フオト・サイリスタのトリガレベルにより
オンレベルが設定され、かつ保持電流によりオフ
レベルが設定されていることを特徴とする集積化
受光素子。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1987169601U JPH0173953U (ja) | 1987-11-05 | 1987-11-05 | |
US07/267,946 US5013904A (en) | 1987-11-05 | 1988-11-07 | Integrated photodetector with hysteresis |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1987169601U JPH0173953U (ja) | 1987-11-05 | 1987-11-05 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0173953U true JPH0173953U (ja) | 1989-05-18 |
Family
ID=15889517
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1987169601U Pending JPH0173953U (ja) | 1987-11-05 | 1987-11-05 |
Country Status (2)
Country | Link |
---|---|
US (1) | US5013904A (ja) |
JP (1) | JPH0173953U (ja) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2651881B1 (fr) * | 1989-09-12 | 1994-01-07 | Sgs Thomson Microelectronics Sa | Circuit de detection de seuil de temperature. |
US5280335A (en) * | 1992-05-26 | 1994-01-18 | The United States Of America As Represented By The Secretary Of The Navy | Fiber-optical testing system having a detection circuit |
US5296697A (en) * | 1992-08-10 | 1994-03-22 | Parkervision, Inc. | Detection circuit for maintaining constant signal transfer characteristics of a light-sensitive detector |
KR100304813B1 (ko) * | 1992-12-28 | 2001-11-22 | 사와무라 시코 | 부성저항회로와이를사용한슈미트트리거회로 |
EP1128170A1 (en) * | 2000-02-25 | 2001-08-29 | Telefonaktiebolaget L M Ericsson (Publ) | Photodiode bias circuit |
EP1209447B2 (en) † | 2000-11-27 | 2009-09-16 | Omron Corporation | Light detector and light detecting IC therefor |
US6654215B2 (en) * | 2001-08-10 | 2003-11-25 | The Boeing Company | Photodetector circuit with avalanche photodiode |
US7002231B2 (en) * | 2004-02-02 | 2006-02-21 | Micron Technology, Inc. | Barrier regions for image sensors |
US7902624B2 (en) * | 2004-02-02 | 2011-03-08 | Aptina Imaging Corporation | Barrier regions for image sensors |
US7920185B2 (en) * | 2004-06-30 | 2011-04-05 | Micron Technology, Inc. | Shielding black reference pixels in image sensors |
CA2529766C (en) | 2004-12-13 | 2011-09-20 | Hubbell Incorporated | Photo controller for switching a load in a hazardous environment |
KR101330817B1 (ko) * | 2006-06-30 | 2013-11-15 | 엘지디스플레이 주식회사 | 액정표시장치 및 이의 구동방법 |
DE102017122038A1 (de) * | 2017-09-22 | 2019-03-28 | Osram Opto Semiconductors Gmbh | Sensor und Betriebsverfahren |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3704376A (en) * | 1971-05-24 | 1972-11-28 | Inventors & Investors Inc | Photo-electric junction field-effect sensors |
US3717770A (en) * | 1971-08-02 | 1973-02-20 | Fairchild Camera Instr Co | High-density linear photosensor array |
US3770968A (en) * | 1972-02-24 | 1973-11-06 | Ibm | Field effect transistor detector amplifier cell and circuit for low level light signals |
US3770967A (en) * | 1972-02-24 | 1973-11-06 | Ibm | Field effect transistor detector amplifier cell and circuit providing a digital output and/or independent of background |
JPS58143224A (ja) * | 1982-02-22 | 1983-08-25 | Fuji Electric Co Ltd | フオトセンサの受光強度測定回路 |
US4658129A (en) * | 1985-07-25 | 1987-04-14 | Fan Jenn Kang | Photoelectric control device which detects changes in light intensity |
JPS6290967A (ja) * | 1985-10-17 | 1987-04-25 | Nissan Motor Co Ltd | 受光用半導体集積回路 |
-
1987
- 1987-11-05 JP JP1987169601U patent/JPH0173953U/ja active Pending
-
1988
- 1988-11-07 US US07/267,946 patent/US5013904A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US5013904A (en) | 1991-05-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
GB1330790A (en) | Semiconductor devices | |
JPH0173953U (ja) | ||
JPS5674959A (en) | Semiconductor memroy | |
JPS55125663A (en) | Semiconductor integrated circuit | |
JPH0173954U (ja) | ||
JPS6230703B2 (ja) | ||
JPS6328503B2 (ja) | ||
JPS6223098Y2 (ja) | ||
JPS5687360A (en) | Transistor device | |
JPH0244354U (ja) | ||
JPS5661160A (en) | Semiconductor device | |
JPS5575261A (en) | Semiconductor device | |
JPS5562762A (en) | Semiconductor device | |
JPH069505Y2 (ja) | パルス発生回路装置 | |
JPS54152467A (en) | Semiconductor device | |
JPS6435951A (en) | Semiconductor device | |
JPS5632763A (en) | Semiconductor device | |
JPH0263556U (ja) | ||
JPH0263555U (ja) | ||
JPH06163825A (ja) | 半導体集積回路 | |
JPS63177066U (ja) | ||
JPS54142080A (en) | Semiconductor device | |
JPS56115546A (en) | Semiconductor device | |
JPS6461940A (en) | Semiconductor element | |
JPS6424862U (ja) |