JP7472512B2 - 分析装置および分析装置の制御方法 - Google Patents
分析装置および分析装置の制御方法 Download PDFInfo
- Publication number
- JP7472512B2 JP7472512B2 JP2020014344A JP2020014344A JP7472512B2 JP 7472512 B2 JP7472512 B2 JP 7472512B2 JP 2020014344 A JP2020014344 A JP 2020014344A JP 2020014344 A JP2020014344 A JP 2020014344A JP 7472512 B2 JP7472512 B2 JP 7472512B2
- Authority
- JP
- Japan
- Prior art keywords
- observation
- types
- conditions
- observation images
- condition data
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title claims description 31
- 238000010894 electron beam technology Methods 0.000 claims description 49
- 238000004458 analytical method Methods 0.000 claims description 34
- 238000001514 detection method Methods 0.000 claims description 26
- 230000003595 spectral effect Effects 0.000 claims 3
- 230000001678 irradiating effect Effects 0.000 claims 2
- 238000005286 illumination Methods 0.000 claims 1
- 239000000523 sample Substances 0.000 description 74
- 238000012545 processing Methods 0.000 description 15
- 230000008569 process Effects 0.000 description 12
- 239000013078 crystal Substances 0.000 description 9
- 238000010586 diagram Methods 0.000 description 8
- 238000004891 communication Methods 0.000 description 5
- 238000005259 measurement Methods 0.000 description 4
- 230000001133 acceleration Effects 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 238000000921 elemental analysis Methods 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 238000005211 surface analysis Methods 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 238000002083 X-ray spectrum Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000004452 microanalysis Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
- G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
- G01N23/2252—Measuring emitted X-rays, e.g. electron probe microanalysis [EPMA]
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/20091—Measuring the energy-dispersion spectrum [EDS] of diffracted radiation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
- G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020014344A JP7472512B2 (ja) | 2020-01-31 | 2020-01-31 | 分析装置および分析装置の制御方法 |
CN202110083416.4A CN113203765A (zh) | 2020-01-31 | 2021-01-21 | 分析装置以及分析装置的控制方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020014344A JP7472512B2 (ja) | 2020-01-31 | 2020-01-31 | 分析装置および分析装置の制御方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2021120660A JP2021120660A (ja) | 2021-08-19 |
JP7472512B2 true JP7472512B2 (ja) | 2024-04-23 |
Family
ID=77025154
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020014344A Active JP7472512B2 (ja) | 2020-01-31 | 2020-01-31 | 分析装置および分析装置の制御方法 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP7472512B2 (zh) |
CN (1) | CN113203765A (zh) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003007244A (ja) | 2001-06-25 | 2003-01-10 | Jeol Ltd | 荷電粒子線装置における像の表示方法および荷電粒子線装置、並びに分析装置における像の表示方法及び分析装置 |
JP2003098129A (ja) | 2001-09-20 | 2003-04-03 | Horiba Ltd | エネルギー分散型マイクロアナライザ |
WO2015181961A1 (ja) | 2014-05-30 | 2015-12-03 | 株式会社日立製作所 | 荷電粒子線分析装置および分析方法 |
JP2018179862A (ja) | 2017-04-19 | 2018-11-15 | 株式会社島津製作所 | X線画像表示装置、x線画像表示方法及びx線画像表示プログラム |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000304712A (ja) * | 1999-04-22 | 2000-11-02 | Canon Inc | 電子線分析・観察装置および電子線マイクロアナライザ |
JP5248759B2 (ja) * | 2006-09-26 | 2013-07-31 | 株式会社島津製作所 | 粒子線分析装置 |
JP5067269B2 (ja) * | 2008-06-12 | 2012-11-07 | 株式会社島津製作所 | マッピング分析装置 |
WO2010084860A1 (ja) * | 2009-01-22 | 2010-07-29 | 株式会社日立ハイテクノロジーズ | 電子顕微鏡 |
JP2018106832A (ja) * | 2016-12-22 | 2018-07-05 | 株式会社日立ハイテクサイエンス | 荷電粒子ビーム装置、及び制御方法 |
-
2020
- 2020-01-31 JP JP2020014344A patent/JP7472512B2/ja active Active
-
2021
- 2021-01-21 CN CN202110083416.4A patent/CN113203765A/zh active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003007244A (ja) | 2001-06-25 | 2003-01-10 | Jeol Ltd | 荷電粒子線装置における像の表示方法および荷電粒子線装置、並びに分析装置における像の表示方法及び分析装置 |
JP2003098129A (ja) | 2001-09-20 | 2003-04-03 | Horiba Ltd | エネルギー分散型マイクロアナライザ |
WO2015181961A1 (ja) | 2014-05-30 | 2015-12-03 | 株式会社日立製作所 | 荷電粒子線分析装置および分析方法 |
JP2018179862A (ja) | 2017-04-19 | 2018-11-15 | 株式会社島津製作所 | X線画像表示装置、x線画像表示方法及びx線画像表示プログラム |
Also Published As
Publication number | Publication date |
---|---|
CN113203765A (zh) | 2021-08-03 |
JP2021120660A (ja) | 2021-08-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN110873725B (zh) | X射线分析装置 | |
JP3888980B2 (ja) | 物質同定システム | |
JP3687541B2 (ja) | 元素マッピング装置、走査透過型電子顕微鏡および元素マッピング方法 | |
US6933501B2 (en) | Ultimate analyzer, scanning transmission electron microscope and ultimate analysis method | |
JP3980856B2 (ja) | 電子顕微鏡における分析方法 | |
US8279225B2 (en) | Element mapping apparatus and element mapping image display method | |
JP2001307672A (ja) | 元素分析装置及び走査透過型電子顕微鏡並びに元素分析方法 | |
JP7472512B2 (ja) | 分析装置および分析装置の制御方法 | |
JP6010547B2 (ja) | X線分析装置 | |
US20230083479A1 (en) | Scatter Diagram Display Device, Scatter Diagram Display Method, and Analyzer | |
JP2021018222A (ja) | 分析装置 | |
JP2020204483A (ja) | X線分析システム及びx線分析方法 | |
JP7442488B2 (ja) | 相分析装置、試料分析装置、および分析方法 | |
CN112394079A (zh) | 电子束微区分析仪 | |
JPH07190965A (ja) | X線マイクロアナライザ | |
JP2021131412A (ja) | 表示システム、分析装置、制御方法、および制御プログラム | |
JP2004265879A (ja) | 元素マッピング装置,走査透過型電子顕微鏡および元素マッピング方法 | |
JP7215177B2 (ja) | 分析装置および画像処理方法 | |
JP7173277B2 (ja) | 分析装置 | |
JP7521471B2 (ja) | X線像の表示方法およびx線分析装置 | |
JP2020149878A (ja) | 分析装置および画像処理方法 | |
US20230251135A1 (en) | Infrared raman microscope | |
JP2024066835A (ja) | 分析方法および分析装置 | |
JP5359681B2 (ja) | X線スペクトル表示処理装置 | |
JP2008082753A (ja) | フォトルミネッセンス測定装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20220517 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20221228 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20230110 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20230309 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20230620 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20230808 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20231031 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20231219 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20240312 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20240325 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7472512 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |