JP7472512B2 - 分析装置および分析装置の制御方法 - Google Patents

分析装置および分析装置の制御方法 Download PDF

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JP7472512B2
JP7472512B2 JP2020014344A JP2020014344A JP7472512B2 JP 7472512 B2 JP7472512 B2 JP 7472512B2 JP 2020014344 A JP2020014344 A JP 2020014344A JP 2020014344 A JP2020014344 A JP 2020014344A JP 7472512 B2 JP7472512 B2 JP 7472512B2
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JP2021120660A (ja
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浩 坂前
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Shimadzu Corp
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Shimadzu Corp
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Priority to JP2020014344A priority Critical patent/JP7472512B2/ja
Priority to CN202110083416.4A priority patent/CN113203765A/zh
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
    • G01N23/2252—Measuring emitted X-rays, e.g. electron probe microanalysis [EPMA]
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/20091—Measuring the energy-dispersion spectrum [EDS] of diffracted radiation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2020014344A 2020-01-31 2020-01-31 分析装置および分析装置の制御方法 Active JP7472512B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2020014344A JP7472512B2 (ja) 2020-01-31 2020-01-31 分析装置および分析装置の制御方法
CN202110083416.4A CN113203765A (zh) 2020-01-31 2021-01-21 分析装置以及分析装置的控制方法

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JP2020014344A JP7472512B2 (ja) 2020-01-31 2020-01-31 分析装置および分析装置の制御方法

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JP2021120660A JP2021120660A (ja) 2021-08-19
JP7472512B2 true JP7472512B2 (ja) 2024-04-23

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003007244A (ja) 2001-06-25 2003-01-10 Jeol Ltd 荷電粒子線装置における像の表示方法および荷電粒子線装置、並びに分析装置における像の表示方法及び分析装置
JP2003098129A (ja) 2001-09-20 2003-04-03 Horiba Ltd エネルギー分散型マイクロアナライザ
WO2015181961A1 (ja) 2014-05-30 2015-12-03 株式会社日立製作所 荷電粒子線分析装置および分析方法
JP2018179862A (ja) 2017-04-19 2018-11-15 株式会社島津製作所 Ｘ線画像表示装置、ｘ線画像表示方法及びｘ線画像表示プログラム

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000304712A (ja) * 1999-04-22 2000-11-02 Canon Inc 電子線分析・観察装置および電子線マイクロアナライザ
JP5248759B2 (ja) * 2006-09-26 2013-07-31 株式会社島津製作所 粒子線分析装置
JP5067269B2 (ja) * 2008-06-12 2012-11-07 株式会社島津製作所 マッピング分析装置
WO2010084860A1 (ja) * 2009-01-22 2010-07-29 株式会社日立ハイテクノロジーズ 電子顕微鏡
JP2018106832A (ja) * 2016-12-22 2018-07-05 株式会社日立ハイテクサイエンス 荷電粒子ビーム装置、及び制御方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003007244A (ja) 2001-06-25 2003-01-10 Jeol Ltd 荷電粒子線装置における像の表示方法および荷電粒子線装置、並びに分析装置における像の表示方法及び分析装置
JP2003098129A (ja) 2001-09-20 2003-04-03 Horiba Ltd エネルギー分散型マイクロアナライザ
WO2015181961A1 (ja) 2014-05-30 2015-12-03 株式会社日立製作所 荷電粒子線分析装置および分析方法
JP2018179862A (ja) 2017-04-19 2018-11-15 株式会社島津製作所 Ｘ線画像表示装置、ｘ線画像表示方法及びｘ線画像表示プログラム

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JP2021120660A (ja) 2021-08-19

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