JP7005364B2 - 投影光学系、露光装置、物品の製造方法及び調整方法 - Google Patents

投影光学系、露光装置、物品の製造方法及び調整方法 Download PDF

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Publication number
JP7005364B2
JP7005364B2 JP2018012947A JP2018012947A JP7005364B2 JP 7005364 B2 JP7005364 B2 JP 7005364B2 JP 2018012947 A JP2018012947 A JP 2018012947A JP 2018012947 A JP2018012947 A JP 2018012947A JP 7005364 B2 JP7005364 B2 JP 7005364B2
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Japan
Prior art keywords
optical system
lens
projection optical
magnification
mirror
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JP2018012947A
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English (en)
Japanese (ja)
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JP2019132907A5 (ja
JP2019132907A (ja
Inventor
尚司 池本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2018012947A priority Critical patent/JP7005364B2/ja
Priority to TW107143822A priority patent/TWI710792B/zh
Priority to KR1020190007383A priority patent/KR102372650B1/ko
Priority to CN201910065482.1A priority patent/CN110095946B/zh
Publication of JP2019132907A publication Critical patent/JP2019132907A/ja
Publication of JP2019132907A5 publication Critical patent/JP2019132907A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B15/00—Optical objectives with means for varying the magnification
    • G02B15/14—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0626—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using three curved mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2018012947A 2018-01-29 2018-01-29 投影光学系、露光装置、物品の製造方法及び調整方法 Active JP7005364B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2018012947A JP7005364B2 (ja) 2018-01-29 2018-01-29 投影光学系、露光装置、物品の製造方法及び調整方法
TW107143822A TWI710792B (zh) 2018-01-29 2018-12-06 投影光學系統、曝光裝置及物品之製造方法
KR1020190007383A KR102372650B1 (ko) 2018-01-29 2019-01-21 투영 광학계, 노광 장치, 물품의 제조 방법, 및 조정 방법
CN201910065482.1A CN110095946B (zh) 2018-01-29 2019-01-24 投影光学***、曝光装置以及物品的制造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2018012947A JP7005364B2 (ja) 2018-01-29 2018-01-29 投影光学系、露光装置、物品の製造方法及び調整方法

Publications (3)

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JP2019132907A JP2019132907A (ja) 2019-08-08
JP2019132907A5 JP2019132907A5 (ja) 2021-02-12
JP7005364B2 true JP7005364B2 (ja) 2022-01-21

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JP2018012947A Active JP7005364B2 (ja) 2018-01-29 2018-01-29 投影光学系、露光装置、物品の製造方法及び調整方法

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JP (1) JP7005364B2 (zh)
KR (1) KR102372650B1 (zh)
CN (1) CN110095946B (zh)
TW (1) TWI710792B (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112859543B (zh) * 2021-02-02 2021-12-14 北京理工大学 一种折反式深紫外光刻物镜***设计方法
WO2023081041A1 (en) * 2021-11-02 2023-05-11 Corning Incorporated Magnification adjustable projection system using movable lens plates

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002033276A (ja) 2001-05-31 2002-01-31 Nikon Corp 投影露光装置、露光方法、半導体の製造方法及び投影光学系の調整方法
JP2009038152A (ja) 2007-07-31 2009-02-19 Canon Inc 光学系、露光装置及びデバイス製造方法
US20120293861A1 (en) 2011-05-18 2012-11-22 Elbit Systems Of America, Llc System and Method for Correcting Astigmatism Caused by an Aircraft Canopy
JP2014103171A (ja) 2012-11-16 2014-06-05 Canon Inc 投影光学系、露光装置および物品の製造方法
JP5595001B2 (ja) 2009-10-06 2014-09-24 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6411426B1 (en) 2000-04-25 2002-06-25 Asml, Us, Inc. Apparatus, system, and method for active compensation of aberrations in an optical system
JP2011039172A (ja) * 2009-08-07 2011-02-24 Canon Inc 露光装置およびデバイス製造方法
JP5595015B2 (ja) * 2009-11-16 2014-09-24 キヤノン株式会社 投影光学系、露光装置およびデバイス製造方法
JP5782336B2 (ja) * 2011-08-24 2015-09-24 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法
JP6748482B2 (ja) * 2016-05-25 2020-09-02 キヤノン株式会社 露光装置、および、物品の製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002033276A (ja) 2001-05-31 2002-01-31 Nikon Corp 投影露光装置、露光方法、半導体の製造方法及び投影光学系の調整方法
JP2009038152A (ja) 2007-07-31 2009-02-19 Canon Inc 光学系、露光装置及びデバイス製造方法
JP5595001B2 (ja) 2009-10-06 2014-09-24 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法
US20120293861A1 (en) 2011-05-18 2012-11-22 Elbit Systems Of America, Llc System and Method for Correcting Astigmatism Caused by an Aircraft Canopy
JP2014103171A (ja) 2012-11-16 2014-06-05 Canon Inc 投影光学系、露光装置および物品の製造方法

Also Published As

Publication number Publication date
TWI710792B (zh) 2020-11-21
TW201932906A (zh) 2019-08-16
CN110095946A (zh) 2019-08-06
KR102372650B1 (ko) 2022-03-10
CN110095946B (zh) 2022-03-25
KR20190092275A (ko) 2019-08-07
JP2019132907A (ja) 2019-08-08

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