JP6986349B2 - n型超格子及びp型超格子を備える電子デバイス - Google Patents
n型超格子及びp型超格子を備える電子デバイス Download PDFInfo
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- JP6986349B2 JP6986349B2 JP2016569627A JP2016569627A JP6986349B2 JP 6986349 B2 JP6986349 B2 JP 6986349B2 JP 2016569627 A JP2016569627 A JP 2016569627A JP 2016569627 A JP2016569627 A JP 2016569627A JP 6986349 B2 JP6986349 B2 JP 6986349B2
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- 239000012535 impurity Substances 0.000 claims description 214
- 239000000463 material Substances 0.000 claims description 198
- 239000004065 semiconductor Substances 0.000 claims description 109
- 150000004767 nitrides Chemical class 0.000 claims description 79
- 229910052751 metal Inorganic materials 0.000 claims description 67
- 239000002184 metal Substances 0.000 claims description 67
- 238000000034 method Methods 0.000 claims description 66
- 239000000758 substrate Substances 0.000 claims description 56
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 39
- 230000008569 process Effects 0.000 claims description 36
- 239000011777 magnesium Substances 0.000 claims description 28
- 229910002601 GaN Inorganic materials 0.000 claims description 24
- 229910052757 nitrogen Inorganic materials 0.000 claims description 21
- 230000015572 biosynthetic process Effects 0.000 claims description 18
- 229910052710 silicon Inorganic materials 0.000 claims description 15
- 238000004519 manufacturing process Methods 0.000 claims description 12
- 238000006243 chemical reaction Methods 0.000 claims description 11
- 229910052749 magnesium Inorganic materials 0.000 claims description 11
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 9
- RNQKDQAVIXDKAG-UHFFFAOYSA-N aluminum gallium Chemical compound [Al].[Ga] RNQKDQAVIXDKAG-UHFFFAOYSA-N 0.000 claims description 9
- 238000001451 molecular beam epitaxy Methods 0.000 claims description 9
- 239000010703 silicon Substances 0.000 claims description 9
- 229910052799 carbon Inorganic materials 0.000 claims description 8
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical group [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 5
- 239000001257 hydrogen Substances 0.000 claims description 5
- 229910052739 hydrogen Inorganic materials 0.000 claims description 5
- 239000001301 oxygen Substances 0.000 claims description 5
- 229910052760 oxygen Inorganic materials 0.000 claims description 5
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 claims description 4
- 238000005019 vapor deposition process Methods 0.000 claims description 4
- 230000002950 deficient Effects 0.000 claims description 3
- 229910052732 germanium Inorganic materials 0.000 claims description 3
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical group [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 3
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 2
- 239000012808 vapor phase Substances 0.000 claims description 2
- AJGDITRVXRPLBY-UHFFFAOYSA-N aluminum indium Chemical compound [Al].[In] AJGDITRVXRPLBY-UHFFFAOYSA-N 0.000 claims 1
- NWAIGJYBQQYSPW-UHFFFAOYSA-N azanylidyneindigane Chemical compound [In]#N NWAIGJYBQQYSPW-UHFFFAOYSA-N 0.000 claims 1
- 239000010410 layer Substances 0.000 description 400
- 230000005428 wave function Effects 0.000 description 50
- 239000010408 film Substances 0.000 description 29
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 25
- 239000013078 crystal Substances 0.000 description 24
- 239000002356 single layer Substances 0.000 description 24
- 125000004429 atom Chemical group 0.000 description 20
- 238000010586 diagram Methods 0.000 description 19
- 229910052782 aluminium Inorganic materials 0.000 description 15
- 230000003287 optical effect Effects 0.000 description 14
- 239000002019 doping agent Substances 0.000 description 12
- 150000002602 lanthanoids Chemical class 0.000 description 12
- 230000000737 periodic effect Effects 0.000 description 12
- 238000013461 design Methods 0.000 description 11
- 230000006798 recombination Effects 0.000 description 10
- 238000005215 recombination Methods 0.000 description 10
- 229910052747 lanthanoid Inorganic materials 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 7
- 238000010521 absorption reaction Methods 0.000 description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 7
- 230000031700 light absorption Effects 0.000 description 7
- 230000010287 polarization Effects 0.000 description 7
- 239000010409 thin film Substances 0.000 description 7
- ZUXNHFFVQWADJL-UHFFFAOYSA-N 3,4,5-trimethoxy-n-(2-methoxyethyl)-n-(4-phenyl-1,3-thiazol-2-yl)benzamide Chemical compound N=1C(C=2C=CC=CC=2)=CSC=1N(CCOC)C(=O)C1=CC(OC)=C(OC)C(OC)=C1 ZUXNHFFVQWADJL-UHFFFAOYSA-N 0.000 description 6
- -1 germanium aluminum Chemical compound 0.000 description 6
- 229910052738 indium Inorganic materials 0.000 description 6
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 6
- 239000000395 magnesium oxide Substances 0.000 description 6
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 6
- 239000012528 membrane Substances 0.000 description 6
- 229910052594 sapphire Inorganic materials 0.000 description 6
- 239000010980 sapphire Substances 0.000 description 6
- 230000004913 activation Effects 0.000 description 5
- 238000005090 crystal field Methods 0.000 description 5
- 229910044991 metal oxide Inorganic materials 0.000 description 5
- 150000004706 metal oxides Chemical class 0.000 description 5
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 230000006835 compression Effects 0.000 description 4
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- 229910021419 crystalline silicon Inorganic materials 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 238000000605 extraction Methods 0.000 description 4
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 4
- 229910010271 silicon carbide Inorganic materials 0.000 description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 4
- 239000011701 zinc Substances 0.000 description 4
- 229910052984 zinc sulfide Inorganic materials 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 3
- 239000000969 carrier Substances 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 230000000415 inactivating effect Effects 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 229910052761 rare earth metal Inorganic materials 0.000 description 3
- 150000002910 rare earth metals Chemical class 0.000 description 3
- 239000007845 reactive nitrogen species Substances 0.000 description 3
- 229910021428 silicene Inorganic materials 0.000 description 3
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 2
- 229910000611 Zinc aluminium Inorganic materials 0.000 description 2
- LEVVHYCKPQWKOP-UHFFFAOYSA-N [Si].[Ge] Chemical compound [Si].[Ge] LEVVHYCKPQWKOP-UHFFFAOYSA-N 0.000 description 2
- HXFVOUUOTHJFPX-UHFFFAOYSA-N alumane;zinc Chemical compound [AlH3].[Zn] HXFVOUUOTHJFPX-UHFFFAOYSA-N 0.000 description 2
- SNAAJJQQZSMGQD-UHFFFAOYSA-N aluminum magnesium Chemical compound [Mg].[Al] SNAAJJQQZSMGQD-UHFFFAOYSA-N 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- FLATXDRVRRDFBZ-UHFFFAOYSA-N azanylidynegadolinium Chemical compound [Gd]#N FLATXDRVRRDFBZ-UHFFFAOYSA-N 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052733 gallium Inorganic materials 0.000 description 2
- BIXHRBFZLLFBFL-UHFFFAOYSA-N germanium nitride Chemical compound N#[Ge]N([Ge]#N)[Ge]#N BIXHRBFZLLFBFL-UHFFFAOYSA-N 0.000 description 2
- 229910021389 graphene Inorganic materials 0.000 description 2
- 238000010348 incorporation Methods 0.000 description 2
- 239000003607 modifier Substances 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- AKJVMGQSGCSQBU-UHFFFAOYSA-N zinc azanidylidenezinc Chemical compound [Zn++].[N-]=[Zn].[N-]=[Zn] AKJVMGQSGCSQBU-UHFFFAOYSA-N 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- 229910008072 Si-N-Si Inorganic materials 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000013590 bulk material Substances 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000002800 charge carrier Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
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- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000003574 free electron Substances 0.000 description 1
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
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- 230000004048 modification Effects 0.000 description 1
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- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000005121 nitriding Methods 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 230000003071 parasitic effect Effects 0.000 description 1
- 238000005036 potential barrier Methods 0.000 description 1
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- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000001947 vapour-phase growth Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0062—Processes for devices with an active region comprising only III-V compounds
- H01L33/0075—Processes for devices with an active region comprising only III-V compounds comprising nitride compounds
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- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
- H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
- H01L31/102—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier
- H01L31/105—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier the potential barrier being of the PIN type
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- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/16—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic Table
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- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/16—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic Table
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- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/028—Inorganic materials including, apart from doping material or other impurities, only elements of Group IV of the Periodic Table
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- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/0304—Inorganic materials including, apart from doping materials or other impurities, only AIIIBV compounds
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- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/0304—Inorganic materials including, apart from doping materials or other impurities, only AIIIBV compounds
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- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/0304—Inorganic materials including, apart from doping materials or other impurities, only AIIIBV compounds
- H01L31/03046—Inorganic materials including, apart from doping materials or other impurities, only AIIIBV compounds including ternary or quaternary compounds, e.g. GaAlAs, InGaAs, InGaAsP
- H01L31/03048—Inorganic materials including, apart from doping materials or other impurities, only AIIIBV compounds including ternary or quaternary compounds, e.g. GaAlAs, InGaAs, InGaAsP comprising a nitride compounds, e.g. InGaN
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- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0352—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
- H01L31/035236—Superlattices; Multiple quantum well structures
- H01L31/035263—Doping superlattices, e.g. nipi superlattices
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- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/184—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof the active layers comprising only AIIIBV compounds, e.g. GaAs, InP
- H01L31/1844—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof the active layers comprising only AIIIBV compounds, e.g. GaAs, InP comprising ternary or quaternary compounds, e.g. Ga Al As, In Ga As P
- H01L31/1848—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof the active layers comprising only AIIIBV compounds, e.g. GaAs, InP comprising ternary or quaternary compounds, e.g. Ga Al As, In Ga As P comprising nitride compounds, e.g. InGaN, InGaAlN
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Description
本出願は、「Electronic Devices Comprising N−type and P−type Superlattices」と題する2014年5月27日出願のオーストラリア仮特許出願第2014902010号、及び「N−type and P−type Superlattices and Fabrication Thereof」と題する2014年5月27日出願のオーストラリア仮特許出願第2014902009号の優先権を主張するものであり、これらの仮特許出願は参照によりその全体が本明細書中に組み込まれている。
ホスト層は、半導体材料から実質的になり、
不純物層は、対応するドナー材料またはアクセプタ材料から実質的になる。
好ましくは、複数の不純物層は、ドナー材料から実質的になるドナー不純物層であり、複数の不純物層は、アクセプタ材料から実質的になるアクセプタ不純物層である。
n型導電性を提供するn型超格子と、
p型導電性を提供するp型超格子と、を備える電子デバイスに存在し、
n型超格子は、ホスト層とドナー不純物層を交互に備え、
ホスト層は、III族窒化金属半導体材料から実質的になり、
ドナー不純物層は、対応するドナー材料から実質的になり、
p型超格子は、ホスト層とアクセプタ不純物層を交互に備え、
ホスト層は、III族窒化金属半導体材料から実質的になり、
アクセプタ不純物層は、対応するアクセプタ材料から実質的になる。
好ましくは、n型超格子及びp型超格子はPN接合を形成する。
好ましくは、真性領域は、1種または複数種のIII族窒化金属半導体材料から実質的になる。
好ましくは、真性領域は、純粋なIII族窒化金属半導体材料;水素(H)、酸素(O)、炭素(C)、希土類またはランタノイド金属の少なくとも1種から選択される結晶構造改質剤を含むIII族窒化金属半導体材料;及び意図的にドープされない(not−intentionally doped:(NID))III族窒化金属半導体材料の少なくとも1種を含む。
好ましくは、バッファ領域は、10nm〜約1μmの厚さ、または、より好ましくは100nm〜500nmの厚さを有する。
好ましくは、基材の材料は、AlN若しくはGaNなどの天然のIII族金属窒化物材料、サファイア、酸化マグネシウム(MgO)若しくは酸化亜鉛(ZnO)などの金属酸化物材料、シリコン(Si)、炭化ケイ素(SiC)、フッ化カルシウム(CaF2)、アモルファスガラス上の結晶性薄膜半導体、または金属上の薄膜結晶性半導体の1種から選択される。
好ましくは、電子デバイスは、p型超格子と基材との間にバッファ領域を備える。
好ましくは、p型接点は、1つまたは複数の窓または開口を備えて、電子デバイスから光が出ることを可能にする。
好ましくは、基材及びオーミック接点層は、1つまたは複数の以上の窓または開口を備えて、電子デバイスから光が出ることを可能にする。
好ましくは、p型超格子の周期及び/またはn型超格子の周期は不均一である。
a.反応室に基材を装填するステップと、
b.基材を膜形成温度にまで加熱するステップと、
c.III族窒化金属半導体材料から実質的になるホスト層を基材の上に形成するステップと、
d.第1の窒素終端表面をホスト層の上に形成するステップと、
e.第1の窒素終端表面に、対応するドナー材料またはアクセプタ材料から実質的になる不純物層を形成するステップと、
f.不純物層の上に窒素層を形成して、第2の窒素終端表面を形成するステップと、
g.第2の窒素終端表面に、III族窒化金属半導体材料から実質的になるホスト層を形成するステップと、
h.超格子が所望の厚さに到達するかまたは所望の層数を備えるまで、ステップ(d)〜(g)を繰り返すステップと、を含む方法に属する。
好ましくは、膜形成温度は、約500℃〜約850℃の間である。
好ましくは、反応室は、超格子の電子的性質または構造的性質に影響を与えないように、水素(H)、酸素(O)及び炭素(C)の種が十分に欠乏している。
好ましくは、所定の結晶極性は、成長方向に沿った実質的に金属極の極性または窒素極性である。
好ましくは、ホスト層はそれぞれ、単一層の少なくとも半分及び最大10層の単一層の厚さを有する。
好ましくは、不純物層はそれぞれ、単一層の少なくとも半分及び最大5層未満の単一層の厚さを有する。
好ましくは、不純物層の面内のドナー材料またはアクセプタ材料の原子間の平均間隔は1nm未満である。
一態様によれば、本発明は、p型導電性またはn型導電性を提供する超格子に属する。超格子は、ホスト層と不純物層を交互に備える。ホスト層は半導体材料から実質的になり、不純物層は、対応するドナー材料またはアクセプタ材料から実質的になる。例えば、ホスト層は、意図的にドープされない(not intentionally doped:NID)半導体材料によって形成され、不純物層は、1種または複数種の対応するドナー材料またはアクセプタ材料によって形成される。超格子は、図4及び4Aに関してさらに後述するように膜形成プロセスを介して形成することができる。好ましい実施形態では、超格子は、層状の単結晶構造として形成される。好ましい実施形態では、超格子は、短周期超格子である。
超格子の作製方法
別の態様によれば、本発明の実施形態は、膜形成プロセスを介した超格子の作製方法に関する。好ましい実施形態では、超格子は、p型超格子またはn型超格子であり、実質的に2次元の薄膜形成プロセスを介して作製される。しかしながら、本方法は、本明細書に記載された超格子(例えば、p型領域及びn型領域、ならびに場合によっては真性領域を有する電子デバイスに用いられる超格子)のいずれかを作製するのに使用することもできる。膜形成プロセスは、例えば、真空蒸着プロセス、分子線エピタキシ(molecular beam epitaxy:MBE)プロセス、気相蒸着プロセス、化学蒸着プロセス、または0.1nm〜100nmの範囲の所与の厚さの層を正確に形成可能な他の任意の形成プロセスとすることができる。
別の態様によれば、本発明は、n型導電性を提供するn型超格子及びp型導電性を提供するp型超格子を備えた電子デバイスに属する。例えば、電子デバイスは、UV LEDまたはUV光検出器とすることができる。特に、電子デバイスは、150nm〜280nmの光波長範囲、より好ましくは190nm〜250nmの光波長範囲で動作するUV LEDとすることができる。
Claims (13)
- 膜形成プロセスによるp型超格子またはn型超格子の作製方法であって、
a.反応室に基材を装填するステップと、
b.前記基材を膜形成温度にまで加熱するステップと、
c.III族窒化金属半導体材料から実質的になるホスト層を前記基材の上に形成するステップと、
d.第1の窒素終端表面を前記ホスト層の上に形成するステップと、
e.前記第1の窒素終端表面に、対応する単一種類のドナー原子または単一種類のアクセプタ原子の1層からなる層からなる不純物層を形成するステップと、
f.前記不純物層の上に、第2の窒素終端表面を形成するステップと、
g.前記第2の窒素終端表面に、前記III族窒化金属半導体材料から実質的になるホスト層を形成するステップと、
h.前記超格子が所望の厚さに到達するかまたは所望の層数を備えるまで、ステップ(d)〜(g)を繰り返すステップと、を含む前記方法。 - 前記半導体材料が、
窒化アルミニウム(AlN)、
窒化アルミニウムガリウム(AlxGa1−xN)(式中、0<x<1)、
窒化アルミニウムインジウム(AlxIn1−xN)(式中、0<x<1)、及び
窒化アルミニウムガリウムインジウム(AlxGayIn1−x−yN)(式中、0<x<1、0<y<1かつx+y<1)の少なくとも1種から選択される、請求項1に記載の方法。 - 前記ドナー原子がシリコン(Si)である、請求項1に記載の方法。
- 前記ドナー原子がゲルマニウム(Ge)である、請求項1に記載の方法。
- 前記アクセプタ原子がマグネシウム(Mg)である、請求項1に記載の方法。
- 前記アクセプタ原子が、亜鉛(Zn)および炭素(C)の少なくとも1種から選択される、請求項1に記載の方法。
- ステップ(d)〜(g)を繰り返す前記ステップが、前記超格子が前記所望の層数に到達するまで行われ、
前記所望の層数が、少なくとも10層のホスト層及び少なくとも10層の不純物層である、請求項1に記載の方法。 - 前記膜形成プロセスが、真空蒸着プロセス、分子線エピタキシプロセスまたは気相蒸着プロセスである、請求項1に記載の方法。
- 前記膜形成温度が、約500℃〜約850℃である、請求項1に記載の方法。
- 前記所望の厚さが、約50nm〜約5μmの間である、請求項1に記載の方法。
- 前記反応室は、前記超格子の電子的性質または構造的性質に影響を与えないように、水素(H)、酸素(O)及び炭素(C)の種が十分に欠乏している、請求項1に記載の方法。
- 励起された分子状窒素種を用いて窒素終端表面を調製するために成長を中断させることを含む、請求項1に記載の方法。
- 前記ホスト層及び前記不純物層が、成長方向に沿った実質的に金属極の極性または前記成長方向に沿った窒素極性を有する、請求項1に記載の方法。
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US9685587B2 (en) | 2017-06-20 |
US10475954B2 (en) | 2019-11-12 |
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CN106415854B (zh) | 2019-10-01 |
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