JP6928526B2 - Manufacturing method of carbon nanotube wire rod, carbon nanotube wire rod connecting structure and carbon nanotube wire rod - Google Patents

Manufacturing method of carbon nanotube wire rod, carbon nanotube wire rod connecting structure and carbon nanotube wire rod Download PDF

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JP6928526B2
JP6928526B2 JP2017193222A JP2017193222A JP6928526B2 JP 6928526 B2 JP6928526 B2 JP 6928526B2 JP 2017193222 A JP2017193222 A JP 2017193222A JP 2017193222 A JP2017193222 A JP 2017193222A JP 6928526 B2 JP6928526 B2 JP 6928526B2
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英樹 會澤
英樹 會澤
山下 智
智 山下
三好 一富
一富 三好
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THE FURUKAW ELECTRIC CO., LTD.
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本発明は、複数のカーボンナノチューブを束ねてなるカーボンナノチューブ束の複数を撚り合わせて構成されるカーボンナノチューブ線材、カーボンナノチューブ線材と該線材に接続されるはんだ部とを備えるカーボンナノチューブ線材接続構造体、及びカーボンナノチューブ線材の製造方法に関する。 The present invention relates to a carbon nanotube wire rod formed by twisting a plurality of carbon nanotube bundles formed by bundling a plurality of carbon nanotubes, and a carbon nanotube wire rod connecting structure including a carbon nanotube wire rod and a solder portion connected to the wire rod. And a method for producing a carbon nanotube wire rod.

従来、自動車や産業機器などの様々な分野における電力線や信号線として、一又は複数の線材からなる芯線と、該芯線を被覆する絶縁被覆とからなる電線が用いられている。芯線を構成する線材の材料としては、通常、電気特性の観点から銅又は銅合金が使用されるが、近年、軽量化の観点からアルミニウム又はアルミニウム合金が提案されている。例えば、アルミニウムの比重は銅の比重の約1/3、アルミニウムの導電率は銅の導電率の約2/3(純銅を100%IACSの基準とした場合、純アルミニウムは約66%IACS)であり、アルミニウム線材に、銅線材と同じ電流を流すためには、アルミニウム線材の断面積を、銅の線材の断面積の約1.5倍と大きくする必要があるが、そのように断面積を大きくしたアルミニウム線材を用いたとしても、アルミニウム線材の質量は、純銅の線材の質量の半分程度であることから、アルミニウム線材を使用することは、軽量化の観点から有利である。 Conventionally, as a power line or a signal line in various fields such as automobiles and industrial equipment, an electric wire composed of a core wire made of one or more wire rods and an insulating coating covering the core wire has been used. As a material for a wire rod constituting a core wire, copper or a copper alloy is usually used from the viewpoint of electrical characteristics, but in recent years, aluminum or an aluminum alloy has been proposed from the viewpoint of weight reduction. For example, the specific gravity of aluminum is about 1/3 of the specific gravity of copper, and the conductivity of aluminum is about 2/3 of the conductivity of copper (when pure copper is used as the standard of 100% IACS, pure aluminum is about 66% IACS). In order to pass the same current as the copper wire through the aluminum wire, it is necessary to increase the cross-sectional area of the aluminum wire to about 1.5 times the cross-sectional area of the copper wire. Even if a large aluminum wire is used, the mass of the aluminum wire is about half the mass of the pure copper wire, so that the use of the aluminum wire is advantageous from the viewpoint of weight reduction.

上記のような背景のもと、昨今では、自動車、産業機器等の高性能化・高機能化が進められており、これに伴い、各種電気機器、制御機器などの配設数が増加するとともに、これら機器に使用される電気配線体の配線数も増加する傾向にある。また、その一方で、環境対応のために自動車等の移動体の燃費を向上させるため、線材の軽量化が強く望まれている。 Against the background described above, in recent years, the performance and functionality of automobiles, industrial equipment, etc. have been improved, and along with this, the number of arrangements of various electric equipment, control equipment, etc. has increased. , The number of wires of the electric wiring body used for these devices also tends to increase. On the other hand, in order to improve the fuel efficiency of moving objects such as automobiles for environmental friendliness, it is strongly desired to reduce the weight of wire rods.

こうした更なる軽量化を達成するための新たな手段の一つとして、カーボンナノチューブを線材として活用する技術が新たに提案されている。カーボンナノチューブは、六角形格子の網目構造を有する筒状体の単層、あるいは略同軸で配された多層で構成される3次元網目構造体であり、軽量であると共に、導電性、電流容量、弾性、機械的強度等の特性に優れるため、電力線や信号線に使用されている金属に代替する材料として注目されている。 As one of the new means for achieving such further weight reduction, a new technique for utilizing carbon nanotubes as a wire rod has been proposed. Carbon nanotubes are a three-dimensional network structure composed of a single layer of a tubular body having a hexagonal lattice network structure or multiple layers arranged substantially coaxially. Since it has excellent properties such as elasticity and mechanical strength, it is attracting attention as a material that replaces metals used in power lines and signal lines.

カーボンナノチューブの比重は、銅の比重の約1/5(アルミニウムの約1/2)であり、また、カーボンナノチューブ単体は、銅(抵抗率1.68×10−6Ω・cm)よりも高導電性を示す。したがって理論的には、複数のカーボンナノチューブを撚り合わせてカーボンナノチューブ集合体を形成すれば、更なる軽量化、高導電率の実現が可能となる。しかしながら、nm単位のカーボンナノチューブを撚り合わせて、μm〜mm単位のカーボンナノチューブ線材を作製した場合、構成単位となる1本当たりの外径が非常に小さいため、カーボンナノチューブ間の接触抵抗や内部欠陥形成が要因となり、線材全体の抵抗値が増大してしまうという問題があることから、カーボンナノチューブをそのまま線材として使用することが困難であった。また、接続の観点から、カーボンナノチューブ線材とはんだからなるカーボンナノチューブ接続構造体を作製する場合、カーボンナノチューブ線材とはんだの相性が悪く、接続強度や電気特性を確保することが困難であった。 The specific gravity of carbon nanotubes is about 1/5 of the specific gravity of copper (about 1/2 of aluminum), and carbon nanotubes alone are higher than copper (resistivity 1.68 × 10-6 Ω · cm). Shows conductivity. Therefore, theoretically, if a plurality of carbon nanotubes are twisted to form a carbon nanotube aggregate, further weight reduction and high conductivity can be realized. However, when carbon nanotubes in units of nm are twisted to produce carbon nanotube wires in units of μm to mm, the outer diameter of each carbon nanotube as a constituent unit is very small, so that contact resistance and internal defects between carbon nanotubes are observed. It has been difficult to use carbon nanotubes as they are as a wire rod because there is a problem that the resistance value of the entire wire rod increases due to the formation. Further, from the viewpoint of connection, when a carbon nanotube connection structure made of a carbon nanotube wire and a solder is produced, the compatibility between the carbon nanotube wire and the solder is poor, and it is difficult to secure the connection strength and the electrical characteristics.

カーボンナノチューブ撚線(線材)の端部でCVD(chemical vapor Deposition)等によってCNTを成長させ、当該端部から伸びた成長CNTを他のカーボンナノチューブ撚線或いはその成長CNTと接続することにより、カーボンナノチューブ撚線同士の接続強度や電気的特性を実現することが可能な製造方法が提案されている(特許文献1)。 By growing CNTs at the ends of carbon nanotube stranded wires (wires) by CVD (chemical vapor Deposition) or the like, and connecting the grown CNTs extending from the ends with other carbon nanotube stranded wires or their grown CNTs, carbon A manufacturing method capable of realizing connection strength and electrical characteristics between nanotube stranded wires has been proposed (Patent Document 1).

特開2013−47402号公報Japanese Unexamined Patent Publication No. 2013-47402

しかしながら、上記特許文献では、複数のカーボンナノチューブを撚り合わせてなるカーボンナノチューブ線材の端部同士を、成長CNTを介して接続することが開示されているにすぎない。特に、カーボンナノチューブ線材(炭素)とはんだは異種材料であり、接合部に異種材料の界面が形成されることから、カーボンナノチューブ線材とはんだを接合し難いという問題がある。 However, the above-mentioned patent document merely discloses that the ends of carbon nanotube wires formed by twisting a plurality of carbon nanotubes are connected to each other via a growth CNT. In particular, the carbon nanotube wire rod (carbon) and the solder are different materials, and since an interface between the different materials is formed at the joint portion, there is a problem that it is difficult to join the carbon nanotube wire rod and the solder.

本発明の目的は、カーボンナノチューブ線材とはんだの間の良好な接合強度を実現することができるカーボンナノチューブ線材、カーボンナノチューブ接続構造体及びカーボンナノチューブ線材の製造方法を提供することにある。 An object of the present invention is to provide a carbon nanotube wire rod, a carbon nanotube connection structure, and a method for manufacturing a carbon nanotube wire rod, which can realize good bonding strength between the carbon nanotube wire rod and the solder.

本発明の要旨構成は、以下の通りである。
[1]複数のカーボンナノチューブ束を撚り合わせて構成されるカーボンナノチューブ線材であって、前記カーボンナノチューブ線材の長手方向に沿って設けられ、前記カーボンナノチューブ線材の主として表層部に配されためっき部を備えることを特徴とするカーボンナノチューブ線材。
[2]前記カーボンナノチューブ線材の前記表層部に配された第1カーボンナノチューブ束群と、前記カーボンナノチューブ線材の内部に配された第2カーボンナノチューブ束群とを有し、
前記カーボンナノチューブ線材の長手方向に垂直な方向の断面視において、前記第1カーボンナノチューブ束群を構成する各カーボンナノチューブ束の表面全長に対する、当該カーボンナノチューブ束の表面に厚さ1μm以上のめっき部が形成された部分の長さの比が0.5以上であることを特徴とする、上記[1]記載のカーボンナノチューブ線材。
[3]前記めっき部は、銅(Cu)、銀(Ag)、金(Au)、スズ(Sn)、白金(Pt)、チタン(Ti)、鉄(Fe)、クロム(Cr)及びニッケル(Ni)からなる群から選択された1又は複数を主成分とする材料で形成されることを特徴とする、上記[1]又は[2]記載のカーボンナノチューブ線材。
[4]前記めっき部の下地を構成し、鉄(Fe)、ニッケル(Ni)及びコバルト(Co)またはこれらを主成分とする合金で形成された下地部を更に有することを特徴とする、上記[1]〜[3]のいずかに記載のカーボンナノチューブ線材。
[5]異種元素がドープされていることを特徴とする、上記[1]〜[4]のいずれかに記載のカーボンナノチューブ線材。
[6]前記カーボンナノチューブ線材を構成するカーボンナノチューブが、2層又は3層の層構造を有することを特徴とする、上記[1]〜[5]のいずれかに記載のカーボンナノチューブ線材。
[7]複数のカーボンナノチューブ束を撚り合わせて構成されるカーボンナノチューブ線材と、前記カーボンナノチューブ線材に接続されるはんだ部とを備えるカーボンナノチューブ線材接続構造体であって、
前記カーボンナノチューブ線材は、該カーボンナノチューブ線材の長手方向に沿って設けられ、前記カーボンナノチューブ線材の主として表層部に配されためっき部を備え、
前記はんだ部が、前記めっき部を介して前記カーボンナノチューブ線材と接続されていることを特徴とするカーボンナノチューブ線材接続構造体。
[8]複数のカーボンナノチューブ束で構成されるカーボンナノチューブ線材本体に無電界めっき処理を施して下地部を形成する工程と、
前記無電界めっき処理を施したカーボンナノチューブ線材本体に電界めっき処理を施して、前記カーボンナノチューブ線材本体の長手方向に沿って、該カーボンナノチューブ線材本体の主として表層部にめっき部を形成する工程と、
前記無電界めっきを施す工程の前か又は前記電界めっきを施す工程の後に、前記複数のカーボンナノチューブ束を撚り合わせる工程と、
を有することを特徴とする、カーボンナノチューブ線材の製造方法。
The gist structure of the present invention is as follows.
[1] A carbon nanotube wire rod formed by twisting a plurality of carbon nanotube bundles, and a plated portion provided along the longitudinal direction of the carbon nanotube wire rod and mainly arranged on a surface layer portion of the carbon nanotube wire rod. A carbon nanotube wire rod characterized by being provided.
[2] It has a first carbon nanotube bundle group arranged on the surface layer portion of the carbon nanotube wire rod and a second carbon nanotube bundle group arranged inside the carbon nanotube wire rod.
In a cross-sectional view in a direction perpendicular to the longitudinal direction of the carbon nanotube wire rod, a plated portion having a thickness of 1 μm or more is formed on the surface of the carbon nanotube bundle with respect to the total surface length of each carbon nanotube bundle constituting the first carbon nanotube bundle group. The carbon nanotube wire rod according to the above [1], wherein the ratio of the lengths of the formed portions is 0.5 or more.
[3] The plated portion includes copper (Cu), silver (Ag), gold (Au), tin (Sn), platinum (Pt), titanium (Ti), iron (Fe), chromium (Cr) and nickel ( The carbon nanotube wire rod according to the above [1] or [2], which is formed of a material containing one or more main components selected from the group consisting of Ni).
[4] The base portion of the plating portion is formed, and further has a base portion formed of iron (Fe), nickel (Ni), cobalt (Co), or an alloy containing these as main components. The carbon nanotube wire rod according to any one of [1] to [3].
[5] The carbon nanotube wire rod according to any one of [1] to [4] above, which is doped with a different element.
[6] The carbon nanotube wire rod according to any one of [1] to [5] above, wherein the carbon nanotubes constituting the carbon nanotube wire rod have a two-layer or three-layer structure.
[7] A carbon nanotube wire connecting structure including a carbon nanotube wire formed by twisting a plurality of carbon nanotube bundles and a solder portion connected to the carbon nanotube wire.
The carbon nanotube wire rod is provided along the longitudinal direction of the carbon nanotube wire rod, and includes a plated portion mainly arranged on the surface layer portion of the carbon nanotube wire rod.
A carbon nanotube wire rod connecting structure characterized in that the solder portion is connected to the carbon nanotube wire rod via the plating portion.
[8] A step of forming a base portion by subjecting a carbon nanotube wire rod main body composed of a plurality of carbon nanotube bundles to a fieldless plating treatment.
A step of subjecting the carbon nanotube wire rod main body subjected to the electric field plating treatment to an electric field plating treatment to form a plated portion mainly on the surface layer portion of the carbon nanotube wire rod main body along the longitudinal direction of the carbon nanotube wire rod main body.
A step of twisting the plurality of carbon nanotube bundles before or after the step of performing the electroless plating, and a step of twisting the plurality of carbon nanotube bundles.
A method for producing a carbon nanotube wire rod, which comprises.

本発明によれば、カーボンナノチューブ線材とはんだとの界面接続の良好な接合強度を実現することができる。 According to the present invention, it is possible to realize good bonding strength of the interface connection between the carbon nanotube wire rod and the solder.

また、カーボンナノチューブ線材が主として表層部にめっきを備えるので、カーボンナノチューブ線材における金属の含有割合を抑制することができ、良好な接合と軽量化の両立を実現することができる。 Further, since the carbon nanotube wire is mainly provided with plating on the surface layer portion, the metal content ratio in the carbon nanotube wire can be suppressed, and both good bonding and weight reduction can be realized.

本発明の実施形態に係るカーボンナノチューブ線材の構成の一例を示す模式図であり、(a)は斜視図、(b)は断面図である。It is a schematic diagram which shows an example of the structure of the carbon nanotube wire rod which concerns on embodiment of this invention, (a) is a perspective view, (b) is a sectional view. 本発明の実施形態に係るカーボンナノチューブ線材接続構造体の構成の一例を示す断面図である。It is sectional drawing which shows an example of the structure of the carbon nanotube wire rod connection structure which concerns on embodiment of this invention.

以下、本発明の実施形態を、図面を参照しながら詳細に説明する。 Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

<カーボンナノチューブ線材の構成>
図1は、本実施形態に係るカーボンナノチューブ線材の構成の一例を示す模式図であり、(a)は斜視図、(b)は断面図である。なお、図1におけるカーボンナノチューブ線材接続構造体は、その一例を示すものであり、本発明に係る各構成の形状、寸法等は、図1のものに限られないものとする。
<Structure of carbon nanotube wire>
1A and 1B are schematic views showing an example of the configuration of a carbon nanotube wire rod according to the present embodiment, where FIG. 1A is a perspective view and FIG. 1B is a cross-sectional view. The carbon nanotube wire rod connecting structure in FIG. 1 shows an example thereof, and the shape, dimensions, etc. of each configuration according to the present invention are not limited to those in FIG.

図1(a)及び(b)に示すように、カーボンナノチューブ線材1(以下、CNT線材ともいう)は、複数のカーボンナノチューブ束11,11,・・・を撚り合わせて構成されるCNT線材であって、CNT線材1の長手方向に沿って設けられ、CNT線材1の主として表層部1aに配されためっき部12を備える。 As shown in FIGS. 1 (a) and 1 (b), the carbon nanotube wire 1 (hereinafter, also referred to as CNT wire) is a CNT wire formed by twisting a plurality of carbon nanotube bundles 11, 11, ... Therefore, it is provided with a plating portion 12 provided along the longitudinal direction of the CNT wire rod 1 and arranged mainly on the surface layer portion 1a of the CNT wire rod 1.

CNT線材1は、具体的には、CNT線材1の表層部1aに配された第1カーボンナノチューブ束群11A(以下、第1CNT束群ともいう)と(図1(b))、CNT線材1の内部1bに配された第2カーボンナノチューブ束群(以下、第2CNT束群ともいう)とを有している。第1CNT束群11Aは、複数のCNT束11a,11a,・・・で構成され、複数のCNT束11a,11a,・・・がCNT線材1の断面において円環状に配置されている。図1の第1CNT束群11Aでは、CNT線材1の径方向或いは厚み方向に関して一のCNT束が配置されているが、二以上のCNT束が配置されてもよい。第2CNT束群11Bは、複数のCNT束11b,11b,・・・で構成され、複数のCNT束11b,11b,・・・が、第1CNT束群11Aの内方であって且つCNT線材1の断面において丸形状或いは楕円形状に配置されている。 Specifically, the CNT wire rod 1 includes a first carbon nanotube bundle group 11A (hereinafter, also referred to as a first CNT bundle group) arranged on the surface layer portion 1a of the CNT wire rod 1 (FIG. 1 (b)), and the CNT wire rod 1 It has a second carbon nanotube bundle group (hereinafter, also referred to as a second CNT bundle group) arranged in the inner 1b of the above. The first CNT bundle group 11A is composed of a plurality of CNT bundles 11a, 11a, ..., And the plurality of CNT bundles 11a, 11a, ... Are arranged in an annular shape in the cross section of the CNT wire rod 1. In the first CNT bundle group 11A of FIG. 1, one CNT bundle is arranged in the radial direction or the thickness direction of the CNT wire rod 1, but two or more CNT bundles may be arranged. The second CNT bundle group 11B is composed of a plurality of CNT bundles 11b, 11b, ..., And the plurality of CNT bundles 11b, 11b, ... Are inside the first CNT bundle group 11A and the CNT wire rod 1 It is arranged in a round shape or an elliptical shape in the cross section of.

表層部1aに配されたCNT束11aは、具体的には、以下のように定義することができる。CNT線材1の断面視において、めっき部12まで含めたCNT線材1の断面形状の重心をX、めっき部12を含まない各CNT束の断面形状の重心をYi、重心Xと重心Yiの双方を通る直線とCNT線材1の断面形状の外縁との交点をZiとしたとき、線分X−Yiの長さを線分X−Ziの長さで除した値が0.7以上であるCNT束を、表層部1aのCNT束11aとする。そして、線分X−Yiの長さを線分X−Ziの長さで除した値が0.7以上を満たすCNT束の集合体を、第1CNT束群11Aとすることができる。 Specifically, the CNT bundle 11a arranged on the surface layer portion 1a can be defined as follows. In the cross-sectional view of the CNT wire rod 1, the center of gravity of the cross-sectional shape of the CNT wire rod 1 including the plated portion 12 is X, the center of gravity of the cross-sectional shape of each CNT bundle not including the plated portion 12 is Yi, and both the center of gravity X and the center of gravity Yi are set. When the intersection of the straight line passing through and the outer edge of the cross-sectional shape of the CNT wire 1 is Zi, the value obtained by dividing the length of the line segment X-Yi by the length of the line segment X-Zi is 0.7 or more. Is the CNT bundle 11a of the surface layer portion 1a. Then, an aggregate of CNT bundles in which the value obtained by dividing the length of the line segment X-Yi by the length of the line segment X-Zi satisfies 0.7 or more can be defined as the first CNT bundle group 11A.

本実施形態では、第1CNT束群11Aにおいて、複数のCNT束11a,11a,・・・がCNT線材1の断面において円環状に配置され、複数のCNT束11b,11b,・・・が、CNT線材1の断面において略丸型に配置されているが、これに限られない。例えば、複数のCNT束11a,11a,・・・がCNT線材1の断面において環状に配置され、複数のCNT束11b,11b,・・・が、CNT線材1の断面において略多角形等の他の形状に配置されてもよい。 In the present embodiment, in the first CNT bundle group 11A, a plurality of CNT bundles 11a, 11a, ... Are arranged in an annular shape in the cross section of the CNT wire rod 1, and the plurality of CNT bundles 11b, 11b, ... Are CNTs. The wire rod 1 is arranged in a substantially round shape in the cross section, but the present invention is not limited to this. For example, a plurality of CNT bundles 11a, 11a, ... Are arranged in an annular shape in the cross section of the CNT wire rod 1, and the plurality of CNT bundles 11b, 11b, ... It may be arranged in the shape of.

めっき部12は表層部1aに配されており、めっき部12の一部が、上記第1CNT束群11Aを構成する各CNT束の外周面の一部又は全体にめっき層として配置されている。図1では、めっき部12は、複数のCNT束11a,11aの表面に別個に形成されているが、複数のCNT束11a,11a,・・・の表面に一体で形成されてもよい。また、めっき部12は、表層部1aのみに形成され、内部1bに形成されないのがより好ましい。 The plating portion 12 is arranged on the surface layer portion 1a, and a part of the plating portion 12 is arranged as a plating layer on a part or the whole of the outer peripheral surface of each CNT bundle constituting the first CNT bundle group 11A. In FIG. 1, the plating portion 12 is formed separately on the surfaces of the plurality of CNT bundles 11a, 11a, but may be integrally formed on the surfaces of the plurality of CNT bundles 11a, 11a, .... Further, it is more preferable that the plating portion 12 is formed only on the surface layer portion 1a and not on the inner portion 1b.

このめっき部12では、CNT線材1の長手方向に垂直な方向の断面において、第1CNT束群11Aを構成する各CNT束の外縁全長に対する、当該CNT束の外縁に厚さ1μm以上のめっき部が形成された部分の長さの比が0.5以上であるのが好ましく、0.65以上がより好ましく、0.8以上が更に好ましい。上記比が0.5未満であると、はんだ付けの際にはんだの濡れ性が悪くなり、好ましくない。また、CNT束の外縁に形成されるめっき部の厚さが1μm未満であると、はんだ付けの際にめっきが剥がれてCNTが露出し、接続抵抗が増加するため好ましくない。 In the plated portion 12, in the cross section in the direction perpendicular to the longitudinal direction of the CNT wire rod 1, a plated portion having a thickness of 1 μm or more is formed on the outer edge of the CNT bundle with respect to the overall length of the outer edge of each CNT bundle constituting the first CNT bundle group 11A. The ratio of the lengths of the formed portions is preferably 0.5 or more, more preferably 0.65 or more, still more preferably 0.8 or more. If the above ratio is less than 0.5, the wettability of the solder deteriorates during soldering, which is not preferable. Further, if the thickness of the plated portion formed on the outer edge of the CNT bundle is less than 1 μm, the plating is peeled off at the time of soldering, the CNT is exposed, and the connection resistance is increased, which is not preferable.

各CNT束の断面が円形であるか或いは円相当径が算出可能である場合、CNT線材の長手方向に垂直な方向の断面において、第1CNT束群11Aを構成する各CNT束の外周全長に対する、当該CNT束の外周に厚さ1μm以上のめっき層が形成された周部分の長さの比が0.5以上であるのが好ましく、0.65以上がより好ましく、0.8以上が更に好ましい。 When the cross section of each CNT bundle is circular or the equivalent circle diameter can be calculated, in the cross section in the direction perpendicular to the longitudinal direction of the CNT wire rod, with respect to the outer peripheral total length of each CNT bundle constituting the first CNT bundle group 11A. The ratio of the length of the peripheral portion in which the plating layer having a thickness of 1 μm or more is formed on the outer periphery of the CNT bundle is preferably 0.5 or more, more preferably 0.65 or more, still more preferably 0.8 or more. ..

めっき部12は、表層部1aに位置する、隣接する複数のCNT間、例えば隣接する2つのCNT束11a,11a間に形成されてもよい。また、めっき部12は、内部1bの一部、例えば内部1bのCNT束11bと表層部1aのCNT束11aとの間や、表層部1aの近傍に位置する、隣接するCNT束11b,11b間に形成されてもよい。但し、軽量化の観点から、めっき部12は、内部1bに形成されず、CNT線材1の表層部1aのみに形成されているのが好ましい。 The plating portion 12 may be formed between a plurality of adjacent CNTs located on the surface layer portion 1a, for example, between two adjacent CNT bundles 11a and 11a. Further, the plating portion 12 is formed between a part of the inner portion 1b, for example, between the CNT bundle 11b of the inner 1b and the CNT bundle 11a of the surface layer portion 1a, or between the adjacent CNT bundles 11b and 11b located near the surface layer portion 1a. May be formed in. However, from the viewpoint of weight reduction, it is preferable that the plating portion 12 is not formed in the inner portion 1b but is formed only in the surface layer portion 1a of the CNT wire rod 1.

めっき部12は、CNT線材1の長手方向の全長の一部に形成されてもよいし、CNT線材1の長手方向の全長に亘って形成されてもよい。このめっき部12では、第1CNT束群11Aを構成する各CNT束の外縁全長に対する、当該CNT束の外縁に厚さ1μm以上のめっき層が形成された部分の長さの比が、CNT線材1の長手方向に関してばらつきが小さいのが好ましい。例えば、1.0mのCNT線材を概ね10箇所で切断して各断面をSEMで観察し、上述の算出方法を用いて各CNT束の上記比を算出し、得られた複数の値を平均することで、めっき部12の長手方向における上記比の平均値を得ることができる。また、10箇所で得られた上記比の標準偏差を求めることで、CNT線材1の長手方向に関する上記比のばらつきを確認することができる。 The plated portion 12 may be formed on a part of the entire length of the CNT wire 1 in the longitudinal direction, or may be formed over the entire length of the CNT wire 1 in the longitudinal direction. In the plating portion 12, the ratio of the length of the portion where the plating layer having a thickness of 1 μm or more is formed on the outer edge of the CNT bundle to the overall length of the outer edge of each CNT bundle constituting the first CNT bundle group 11A is the CNT wire rod 1. It is preferable that the variation in the longitudinal direction of the plating is small. For example, a 1.0 m CNT wire is cut at approximately 10 points, each cross section is observed by SEM, the above ratio of each CNT bundle is calculated using the above calculation method, and the obtained plurality of values are averaged. As a result, the average value of the above ratios in the longitudinal direction of the plated portion 12 can be obtained. Further, by obtaining the standard deviation of the above ratio obtained at 10 points, it is possible to confirm the variation of the above ratio with respect to the longitudinal direction of the CNT wire rod 1.

めっき部12は、はんだとCNT線材1との相性の観点から、銅(Cu)、銀(Ag)、金(Au)、スズ(Sn)、白金(Pt)、チタン(Ti)、鉄(Fe)、クロム(Cr)及びニッケル(Ni)からなる群から選択された1又は複数を主成分とする合金で形成されているのが好ましい。 From the viewpoint of compatibility between the solder and the CNT wire rod 1, the plating portion 12 includes copper (Cu), silver (Ag), gold (Au), tin (Sn), platinum (Pt), titanium (Ti), and iron (Fe). ), Chromium (Cr) and nickel (Ni) are preferably formed of one or a plurality of alloys selected from the group.

CNT線材1は、めっき部12以外の他の金属部を有していてもよい。例えば、CNT線材1は、銅(Cu)、銀(Ag)、金(Au)、スズ(Sn)、白金(Pt)、チタン(Ti)、鉄(Fe)、クロム(Cr)及びニッケル(Ni)からなる群から選択された1又は複数を主成分とする合金で形成されためっき部と、該めっき部の下地を構成し、鉄(Fe)、ニッケル(Ni)及びコバルト(Co)から選択された1又は複数を主成分とする合金で形成された下地部とを備えてもよい。下地部は、好ましくはめっきで形成されており、この場合、上記めっき部とは異なる他のめっき部を構成する。また、CNT線材1にめっき部及び下地部の双方が形成される場合、下地部の一部が、CNT束11aの外表面に形成され、めっき部の一部が、下地部の外表面に形成されるのが好ましい。このとき、CNT束11aの重心を基準としてCNT束の内側に位置する下地部を第1層、外側に位置するめっき部を第2層とすることができる。更に、CNT線材1にめっき部及び下地部の双方が形成される場合、上記下地部の複層が形成されてもよいし、上記めっき部の複層が形成されてもよい。CNT線材1或いはCNT束11aに下地部が設けられることで、下地部とめっきとの濡れ性が向上し、接着強度を向上することができる。 The CNT wire rod 1 may have a metal portion other than the plating portion 12. For example, the CNT wire rod 1 includes copper (Cu), silver (Ag), gold (Au), tin (Sn), platinum (Pt), titanium (Ti), iron (Fe), chromium (Cr) and nickel (Ni). ) And a plating portion formed of an alloy containing one or more of the main components selected from the group consisting of) and a base of the plating portion are formed and selected from iron (Fe), nickel (Ni) and cobalt (Co). It may be provided with a base portion formed of an alloy containing one or more of the above. The base portion is preferably formed by plating, and in this case, forms another plating portion different from the plating portion. When both the plated portion and the base portion are formed on the CNT wire rod 1, a part of the base portion is formed on the outer surface of the CNT bundle 11a, and a part of the plated portion is formed on the outer surface of the base portion. It is preferable to be plated. At this time, based on the center of gravity of the CNT bundle 11a, the base portion located inside the CNT bundle can be used as the first layer, and the plated portion located outside can be used as the second layer. Further, when both the plated portion and the base portion are formed on the CNT wire rod 1, a plurality of layers of the base portion may be formed, or a plurality of layers of the plated portion may be formed. By providing the base portion on the CNT wire rod 1 or the CNT bundle 11a, the wettability between the base portion and the plating can be improved, and the adhesive strength can be improved.

めっき部12の厚さは、母材の保護及びコスト等を考慮し、0.3μm〜3.0μmである。めっき部と下地部の双方が形成される場合、めっき部と下地部の合計厚さは、0.3μm〜3.0μmである。このとき、CNT束の1層目に相当する下地部の材料は、CNT束との密着力に優れた金属、2層目に相当するめっき部の材料は、電気伝導の優れた金属であることが好ましい。 The thickness of the plated portion 12 is 0.3 μm to 3.0 μm in consideration of protection of the base material, cost, and the like. When both the plated portion and the base portion are formed, the total thickness of the plated portion and the base portion is 0.3 μm to 3.0 μm. At this time, the material of the base portion corresponding to the first layer of the CNT bundle is a metal having excellent adhesion to the CNT bundle, and the material of the plating portion corresponding to the second layer is a metal having excellent electrical conductivity. Is preferable.

CNT線材1は、1層以上の層構造を有するCNTの複数が束ねられてなるCNT束同士を撚り合わせて構成されている。CNT線材1の外径は、例えば0.01mm〜5mmである。
CNT束11は、複数のCNTが纏められた束状体となっている。CNT線材1は、異種元素がドープされていてもよい。この場合、CNT束11に異種元素がドープされてなるカーボンナノチューブ複合体の複数を撚り合わせて構成されてもよい。
The CNT wire rod 1 is formed by twisting CNT bundles formed by bundling a plurality of CNTs having one or more layer structures. The outer diameter of the CNT wire rod 1 is, for example, 0.01 mm to 5 mm.
The CNT bundle 11 is a bundle-like body in which a plurality of CNTs are bundled. The CNT wire rod 1 may be doped with a different element. In this case, a plurality of carbon nanotube composites obtained by doping the CNT bundle 11 with different elements may be twisted together.

CNT線材1を構成するCNTは、単層構造又は複層構造を有する筒状体であり、それぞれSWNT(single-walled nanotube)、MWNT(multi-walled nanotube)と呼ばれる。例えば、2層構造を有するCNTは、六角形格子の網目構造を有する2つの筒状体が略同軸で配された3次元網目構造体となっており、DWNT(Double-walled nanotube)と呼ばれる。構成単位である六角形格子は、その頂点に炭素原子が配された六員環であり、他の六員環と隣接してこれらが連続的に結合している。 The CNTs constituting the CNT wire rod 1 are tubular bodies having a single-walled structure or a multi-walled structure, and are called SWNTs (single-walled nanotubes) and MWNTs (multi-walled nanotubes), respectively. For example, a CNT having a two-walled structure is a three-dimensional network structure in which two tubular bodies having a network structure of a hexagonal lattice are arranged substantially coaxially, and is called a DWNT (Double-walled nanotube). The hexagonal lattice, which is a constituent unit, is a six-membered ring in which carbon atoms are arranged at its vertices, and these are continuously bonded adjacent to other six-membered rings.

CNTの性質は、上記のような筒状体のカイラリティ(chirality)に依存する。カイラリティは、アームチェア型、ジグザグ型、及びそれ以外のカイラル型に大別され、アームチェア型は金属性、カイラル型は半導体性、ジグザグ型はその中間の挙動を示す。よってCNTの導電性はいずれのカイラリティを有するかによって大きく異なり、CNT集合体の導電性を向上させるには、金属性の挙動を示すアームチェア型のCNTの割合を増大させることが重要とされてきた。一方、半導体性を有するカイラル型のCNTに電子供与性もしくは電子受容性を持つ物質(異種元素)をドープすることにより、金属的挙動を示すことが分かっている。また、一般的な金属では、異種元素をドープすることによって金属内部での伝導電子の散乱が起こって導電性が低下するが、これと同様に、金属性CNTに異種元素をドープした場合には、導電性の低下を引き起こす。 The properties of CNT depend on the chirality of the tubular body as described above. Chirality is roughly classified into armchair type, zigzag type, and other chiral types. The armchair type is metallic, the chiral type is semiconducting, and the zigzag type is intermediate. Therefore, the conductivity of CNTs varies greatly depending on which chirality they have, and in order to improve the conductivity of CNT aggregates, it has been important to increase the proportion of armchair-type CNTs that exhibit metallic behavior. rice field. On the other hand, it is known that a chiral type CNT having a semiconductor property is doped with a substance (dissimilar element) having an electron donating property or an electron accepting property to exhibit metallic behavior. Further, in a general metal, by doping a dissimilar element, conduction electrons are scattered inside the metal and the conductivity is lowered. Similarly, when a dissimilar element is doped in a metallic CNT, the dissimilar element is doped. , Causes a decrease in conductivity.

このように、金属性CNT及び半導体性CNTへのドーピング効果は、導電性の観点からはトレードオフの関係にあると言えることから、理論的には金属性CNTと半導体性CNTとを別個に作製し、半導体性CNTにのみドーピング処理を施した後、これらを組み合わせることが望ましい。しかし、現状の製法技術では金属性CNTと半導体性CNTとを選択的に作り分けることは困難であり、金属性CNTと半導体性CNTが混在した状態で作製される。このため、金属性CNTと半導体性CNTの混合物からなるCNT線材の導電性を向上させるには、異種元素・分子によるドーピング処理が効果的となるCNT構造を選択することが好ましい。 As described above, since it can be said that the doping effect on the metallic CNT and the semiconductor CNT has a trade-off relationship from the viewpoint of conductivity, the metallic CNT and the semiconductor CNT are theoretically manufactured separately. However, it is desirable to combine these after doping the semiconductor CNTs only. However, it is difficult to selectively produce metallic CNTs and semiconducting CNTs with the current manufacturing method technology, and metallic CNTs and semiconducting CNTs are produced in a mixed state. Therefore, in order to improve the conductivity of the CNT wire rod composed of a mixture of metallic CNT and semiconductor CNT, it is preferable to select a CNT structure in which doping treatment with different elements / molecules is effective.

CNT線材1を構成するCNTは、2層又は3層の層構造を有するのが好ましい。具体的には、CNT線材1を構成するCNT束11において、複数のCNTの個数に対する、2層構造又は3層構造を有するCNTの個数の和の比率が50%以上であるのが好ましく、75%以上であるのがより好ましい。すなわち、一のCNT束を構成する全CNTの総数をNTOTAL、上記全CNTのうち2層構造を有するCNT(2)の数の和をNCNT(2)、上記全CNTのうち3層構造を有するCNT(3)の数の和をNCNT(3)としたとき、下記式(1)で表すことができる。
(NCNT(2)+NCNT(3))/NTOTAL×100(%)≧50(%) ・・・(1)
The CNT constituting the CNT wire rod 1 preferably has a two-layer or three-layer structure. Specifically, in the CNT bundle 11 constituting the CNT wire rod 1, the ratio of the sum of the number of CNTs having a two-layer structure or a three-layer structure to the number of a plurality of CNTs is preferably 50% or more, and is 75. More preferably, it is% or more. That is, the total number of all CNTs constituting one CNT bundle is N TOTAL , the sum of the number of CNTs (2) having a two-layer structure among all the CNTs is N CNT (2) , and the three-walled structure among all the CNTs. When the sum of the numbers of CNTs (3) having is N CNT (3) , it can be expressed by the following equation (1).
(N CNT (2) + N CNT (3) ) / N TOTAL × 100 (%) ≧ 50 (%) ・ ・ ・ (1)

2層構造又は3層構造のような層数が少ないCNTは、それより層数の多いCNTよりも比較的導電性が高い。また、ドーパントは、CNTの最内層の内部、もしくは複数のCNTで形成されるCNT間の隙間に導入される。CNTの層間距離はグラファイトの層間距離である0.335nmと同等であり、多層CNTの場合その層間にドーパントが入り込むことはサイズ的に困難である。このことからドーピング効果はCNTの内部および外部にドーパントが導入されることで発現するが、多層CNTの場合は最外層および最内層に接していない内部に位置するチューブのドープ効果が発現しにくくなる。以上のような理由により、複層構造のCNTにそれぞれドーピング処理を施した際には、2層構造又は3層構造を有するCNTでのドーピング効果が最も高い。また、ドーパントは、強い求電子性もしくは求核性を示す、反応性の高い試薬であることが多い。単層構造のCNTは多層よりも剛性が弱く、耐薬品性に劣るためにドーピング処理を施すと、CNT自体の構造が破壊されてしまうことがある。よって本発明ではCNT集合体に含まれる2層構造又は3層構造を有するCNTの個数に着目する。また、2層又は3層構造のCNTの個数の和の比率が50%未満であると、単層構造或いは4層以上の複層構造を有するCNTの比率が高くなり、CNT集合体全体としてドーピング効果が小さくなり、高導電率が得にくくなる。よって、2層又は3層構造のCNTの個数の和の比率を上記範囲内の値とする。 A CNT with a small number of layers, such as a two-layer structure or a three-layer structure, is relatively more conductive than a CNT with a larger number of layers. Further, the dopant is introduced inside the innermost layer of the CNT or in the gap between the CNTs formed by the plurality of CNTs. The interlayer distance of CNTs is equivalent to 0.335 nm, which is the interlayer distance of graphite, and in the case of multi-walled CNTs, it is difficult for the dopant to enter between the interlayers in terms of size. From this, the doping effect is exhibited by introducing the dopant inside and outside the CNT, but in the case of the multi-walled CNT, the doping effect of the tube located inside not in contact with the outermost layer and the innermost layer is less likely to be exhibited. .. For the above reasons, when each CNT having a multi-layer structure is subjected to a doping treatment, the doping effect of the CNT having a two-layer structure or a three-layer structure is the highest. In addition, the dopant is often a highly reactive reagent that exhibits strong electrophilicity or nucleophilicity. A CNT having a single-layer structure has weaker rigidity than a multi-layer structure and is inferior in chemical resistance. Therefore, when doping treatment is performed, the structure of the CNT itself may be destroyed. Therefore, in the present invention, attention is paid to the number of CNTs having a two-layer structure or a three-layer structure contained in the CNT aggregate. Further, when the ratio of the sum of the number of CNTs having a two-layer or three-layer structure is less than 50%, the ratio of CNTs having a single-layer structure or a multi-layer structure having four or more layers becomes high, and the CNT aggregate as a whole is doped. The effect is reduced and it becomes difficult to obtain high conductivity. Therefore, the ratio of the sum of the number of CNTs having a two-layer or three-layer structure is set as a value within the above range.

CNTにドープされるドーパントは、導電性が向上すれば特に限定はないが、例えば硝酸、硫酸、ヨウ素、臭素、カリウム、ナトリウム、ホウ素及び窒素からなる群から選択される1つ以上の異種元素もしくは分子である。 The dopant doped into CNT is not particularly limited as long as the conductivity is improved, and is, for example, one or more dissimilar elements selected from the group consisting of nitric acid, sulfuric acid, iodine, bromine, potassium, sodium, boron and nitrogen. It is a molecule.

また、CNT束11を構成するCNTの最外層の外径は5.0nm以下であるのが好ましい。CNT束11を構成するCNTの最外層の外径が5.0nmを超えると、CNT間および最内層の隙間に起因する空孔率が大きくなり、導電性が低下してしまうため、好ましくない。 Further, the outer diameter of the outermost layer of the CNTs constituting the CNT bundle 11 is preferably 5.0 nm or less. If the outer diameter of the outermost layer of the CNTs constituting the CNT bundle 11 exceeds 5.0 nm, the porosity due to the gap between the CNTs and the innermost layer increases and the conductivity decreases, which is not preferable.

CNT線材1は、線材全体の強度及び導電性の観点から、その当該線材に分散配置された他の金属部材を有していてもよい。他の金属部材は、例えば長尺状の線材或いは粒子であり、このような形状を有する他の金属部材がCNTに混合されている。上記他の金属部材の金属は、例えば銅、銅合金、アルミニウム、アルミニウム合金を主成分とする材料である。 The CNT wire rod 1 may have other metal members dispersed and arranged on the wire rod from the viewpoint of the strength and conductivity of the entire wire rod. Other metal members are, for example, long wire rods or particles, and other metal members having such a shape are mixed with CNT. The metal of the other metal member is, for example, a material containing copper, a copper alloy, aluminum, or an aluminum alloy as a main component.

<カーボンナノチューブ線材の製造方法>
本実施形態に係るCNT線材の製造方法は、複数のカーボンナノチューブ束で構成されるカーボンナノチューブ線材本体に無電界めっき処理を施す工程と、上記無電界めっき処理を施したカーボンナノチューブ線材本体に電界めっき処理を施して、上記カーボンナノチューブ線材本体の長手方向に沿って、該カーボンナノチューブ線材本体の主として表層部にめっき部を形成する工程と、上記無電界めっきを施す工程の前か又は上記電界めっきを施す工程の後に、上記複数のカーボンナノチューブ束を撚り合わせる工程と、を有する。
<Manufacturing method of carbon nanotube wire>
The method for manufacturing the CNT wire rod according to the present embodiment includes a step of subjecting the carbon nanotube wire rod main body composed of a plurality of carbon nanotube bundles to a fieldless plating treatment and an electroplating on the carbon nanotube wire rod main body subjected to the above electric field plating treatment. The step of forming a plating portion mainly on the surface layer portion of the carbon nanotube wire rod main body along the longitudinal direction of the carbon nanotube wire rod main body by performing the treatment, and before the step of performing the electric field-free plating or the electric field plating. After the step of applying, there is a step of twisting the plurality of carbon nanotube bundles.

具体的には、先ず、複数のCNT束で構成されるCNT線材本体を準備し、鉄(Fe)、ニッケル(Ni)及びコバルト(Co)から選択された1又は複数を主成分とする合金を含有するめっき浴に所定時間浸漬して、CNT線材本体にめっき部の下地となる下地部を形成する。CNT線材本体に下地部を形成することで、CNT線材本体とめっき部との接着性を向上することができる点で優れている。 Specifically, first, a CNT wire rod main body composed of a plurality of CNT bundles is prepared, and an alloy containing one or more selected from iron (Fe), nickel (Ni) and cobalt (Co) as a main component is prepared. Immerse in the contained plating bath for a predetermined time to form a base portion to be a base of the plating portion on the CNT wire rod main body. By forming the base portion on the CNT wire rod main body, it is excellent in that the adhesiveness between the CNT wire rod main body and the plated portion can be improved.

次に、下地部が形成されたCNT線材本体を、銅(Cu)、銀(Ag)、金(Au)、スズ(Sn)、白金(Pt)、チタン(Ti)、鉄(Fe)、クロム(Cr)及びニッケル(Ni)からなる群から選択された1又は複数を主成分とする合金を含有するめっき浴に所定時間浸漬して、CNT線材本体にめっき部を形成する。これにより、CNT線材の表層部に配された第1CNT束群を構成する各CNT束の外周面にめっき部が形成される。本電界めっき処理により、主として表層部にめっき部が形成されたCNT線材を得る。 Next, the CNT wire rod main body on which the base portion is formed is subjected to copper (Cu), silver (Ag), gold (Au), tin (Sn), platinum (Pt), titanium (Ti), iron (Fe), and chromium. A plated portion is formed on the CNT wire rod main body by immersing it in a plating bath containing an alloy containing one or more of the main components selected from the group consisting of (Cr) and nickel (Ni) for a predetermined time. As a result, a plating portion is formed on the outer peripheral surface of each CNT bundle constituting the first CNT bundle group arranged on the surface layer portion of the CNT wire rod. By this electric field plating treatment, a CNT wire rod having a plated portion formed mainly on the surface layer portion is obtained.

上記無電界めっき或いは電界めっき処理によって形成されるめっき部の深さ方向の割合、すなわちCNT線材の外縁から重心までの長さに対するめっき部の厚さの比は、複数のCNT束の撚り度によって制御することができる。めっき部の深さ方向の割合を好ましい範囲内の値にするには、上記無電界めっきを施す工程の前に、複数のCNT束を撚り合わせる工程を行うのが好ましい。例えば、CNT線材本体の撚り度を強くすることで、めっき浴のめっきがCNT線材本体に浸透する量が少なくなり、CNT線材の表層部に配されたCNT束に選択的にめっき部を形成することができる。例えば、直径100μmのCNT束12本でCNT線材を作製する場合、CNT線材の単位長さ当たりの巻き数を表す撚り度を100T/m以上とすることで、CNT線材の表層部に配されたCNT束に選択的にめっきをすることができる。 The ratio in the depth direction of the plated portion formed by the above-mentioned electroless plating or electroplating treatment, that is, the ratio of the thickness of the plated portion to the length from the outer edge of the CNT wire to the center of gravity depends on the twist degree of the plurality of CNT bundles. Can be controlled. In order to set the ratio of the plated portion in the depth direction to a value within a preferable range, it is preferable to perform a step of twisting a plurality of CNT bundles before the step of performing the electroless plating. For example, by increasing the twist degree of the CNT wire rod main body, the amount of plating in the plating bath permeating into the CNT wire rod main body is reduced, and the plating portion is selectively formed on the CNT bundle arranged on the surface layer portion of the CNT wire rod. be able to. For example, when a CNT wire rod is produced from 12 CNT bundles having a diameter of 100 μm, the twist degree representing the number of turns per unit length of the CNT wire rod is set to 100 T / m or more so that the CNT wire rod is arranged on the surface layer portion of the CNT wire rod. The CNT bundle can be selectively plated.

次いで、下地部及びめっき部が形成された複数のカーボンナノチューブ束を撚り合わせる。これにより、主として表層部1aに配されためっき部12を備えるCNT線材1が得られる。 Next, a plurality of carbon nanotube bundles in which the base portion and the plating portion are formed are twisted together. As a result, the CNT wire rod 1 having the plating portion 12 mainly arranged on the surface layer portion 1a can be obtained.

<カーボンナノチューブ線材接続構造体の構成>
図2は、本実施形態に係るカーボンナノチューブ線材接続構造体の構成の一例を示す断面図である。なお、図2におけるカーボンナノチューブ線材接続構造体は、その一例を示すものであり、本発明に係る各構成の形状、寸法等は、図2のものに限られないものとする。
図2に示すように、カーボンナノチューブ線材接続構造体10(以下、CNT線材接続構造体ともいう)は、複数のCNT束11,11,・・・を撚り合わせて構成されるCNT線材1と、CNT線材1に接続されるはんだ部2とを備える。はんだ部2は、めっき部12を介してCNT線材1と接続されると共に、銅板などの被接続部材20と接続されている。
<Structure of carbon nanotube wire connection structure>
FIG. 2 is a cross-sectional view showing an example of the configuration of the carbon nanotube wire rod connecting structure according to the present embodiment. The carbon nanotube wire rod connecting structure in FIG. 2 shows an example thereof, and the shape, dimensions, etc. of each configuration according to the present invention are not limited to those in FIG.
As shown in FIG. 2, the carbon nanotube wire connecting structure 10 (hereinafter, also referred to as a CNT wire connecting structure) includes a CNT wire 1 formed by twisting a plurality of CNT bundles 11, 11, ... It includes a solder portion 2 connected to the CNT wire rod 1. The solder portion 2 is connected to the CNT wire rod 1 via the plating portion 12 and is also connected to the connected member 20 such as a copper plate.

はんだ部2は、例えば、銅(Cu)、スズ(Sn)、鉛(Zn)、銀(Ag)、ニッケル(Ni)、クロム(Cr)から選択された1又は複数を主成分とする合金で形成されている。はんだ部2は、例えばリフロー方式や、糸状はんだとはんだごてを用いた方法で形成することができる。 The solder portion 2 is, for example, an alloy containing one or more main components selected from copper (Cu), tin (Sn), lead (Zn), silver (Ag), nickel (Ni), and chromium (Cr). It is formed. The solder portion 2 can be formed by, for example, a reflow method or a method using a thread-like solder and a soldering iron.

はんだ部2は、めっき部12と同様、CNT線材の長手方向に沿って設けられるのが好ましい。このはんだ部2は、CNT線材1の表層部1aに配されためっき部12と接合されており、めっき部12は、CNT線材1、特にCNT線材1の表層部1aに配されたCNT束11aと接合されている。これにより、はんだ部2とめっき部12が良好に接着し、はんだ部2とCNT線材1との機械的接続及び電気的接続が確保される。 Like the plating portion 12, the solder portion 2 is preferably provided along the longitudinal direction of the CNT wire rod. The solder portion 2 is joined to a plating portion 12 arranged on the surface layer portion 1a of the CNT wire rod 1, and the plating portion 12 is a CNT bundle 11a arranged on the surface layer portion 1a of the CNT wire rod 1, particularly the CNT wire rod 1. Is joined with. As a result, the solder portion 2 and the plating portion 12 are well adhered to each other, and the mechanical connection and the electrical connection between the solder portion 2 and the CNT wire rod 1 are secured.

図1では、はんだ部2は、CNT線材1の長手方向に垂直な方向の断面視において、CNT線材1の表層部1aに配されためっき部12の表面全体に形成されているが、CNT線材1との良好な接続性が確保できる範囲で、めっき部12の一部に形成されていてもよい。また、はんだ部2は、CNT線材1の表層部1aの表面全体に形成されているが、CNT線材1との良好な接続性が確保できる範囲で、CNT線材1の表層部1aの一部に形成されていてもよい。 In FIG. 1, the solder portion 2 is formed on the entire surface of the plating portion 12 arranged on the surface layer portion 1a of the CNT wire rod 1 in a cross-sectional view in a direction perpendicular to the longitudinal direction of the CNT wire rod 1. It may be formed in a part of the plating portion 12 as long as good connectivity with 1 can be ensured. Further, although the solder portion 2 is formed on the entire surface of the surface layer portion 1a of the CNT wire rod 1, it is formed on a part of the surface layer portion 1a of the CNT wire rod 1 as long as good connectivity with the CNT wire rod 1 can be ensured. It may be formed.

上述したように、本実施形態によれば、CNT線材1は、該CNT線材の長手方向に沿って設けられ、且つCNT線材1の主として表層部1aに配されためっき部12を備えるので、CNT線材1とはんだとの界面接続の良好な接合強度を実現することができる。
また、CNT線材1が主として表層部1aにめっき部12を備えるので、CNT線材1の内部1bにめっき部が実質的に形成されていない構成とすることができ、CNT線材1における金属の含有割合を抑制することができ、良好な接合と軽量化の両立を実現することができる。
As described above, according to the present embodiment, the CNT wire rod 1 includes a plating portion 12 provided along the longitudinal direction of the CNT wire rod and mainly arranged on the surface layer portion 1a of the CNT wire rod 1, and thus the CNT wire rod 1. It is possible to realize good bonding strength of the interface connection between the wire rod 1 and the solder.
Further, since the CNT wire 1 mainly includes the plating portion 12 on the surface layer portion 1a, it is possible to have a configuration in which the plating portion is not substantially formed inside the CNT wire 1 and the metal content ratio in the CNT wire 1. It is possible to achieve both good bonding and weight reduction.

また、CNT線材接続構造体10が、複数のCNT束11,11,・・・を撚り合わせて構成されるCNT線材1と、CNT線材1に接続されるはんだ部2とを備え、はんだ部2が、めっき部12を介してCNT線材1と接続されているので、CNT線材1とはんだ部2との界面接続の良好な接合強度を実現することができ、これにより、CNT線材1と被接続部材20との良好な接続を実現することが可能となる。 Further, the CNT wire connecting structure 10 includes a CNT wire 1 formed by twisting a plurality of CNT bundles 11, 11, ..., And a solder portion 2 connected to the CNT wire 1, and the solder portion 2 is provided. However, since it is connected to the CNT wire 1 via the plating portion 12, it is possible to realize a good joint strength of the interface connection between the CNT wire 1 and the solder portion 2, thereby connecting the CNT wire 1 and the solder portion 2. It is possible to realize a good connection with the member 20.

以上、本発明の実施形態に係るCNT線材、CNT接続構造体およびその製造方法について述べたが、本発明は記述の実施形態に限定されるものではなく、本発明の技術思想に基づいて各種の変形および変更が可能である。 Although the CNT wire rod, the CNT connection structure and the manufacturing method thereof according to the embodiment of the present invention have been described above, the present invention is not limited to the described embodiment, and various types are based on the technical idea of the present invention. It can be transformed and changed.

以下、本発明の実施例を説明する。 Hereinafter, examples of the present invention will be described.

(実施例1及び比較例1、2)
先ず、浮遊触媒気相成長(FCCVD)法を用い、電気炉によって1300℃に加熱された、内径φ60mm、長さ1600mmのアルミナ管内部に、炭素源であるデカヒドロナフタレン、触媒であるフェロセン、及び反応促進剤であるチオフェンを、体積比率にてそれぞれ100:4:1で含む原料溶液Lを、スプレー噴霧により供給した。キャリアガスは、水素を9.5L/minで供給した。得られたCNTを回収機にて回収した。得られたCNT線材を、大気下において500℃に加熱し、さらに酸処理を施すことによって高純度化を行った。
得られたCNT50mgとコール酸ナトリウム450mgを24.5gの水に加え超音波攪拌装置を用いて30分攪拌した後、超音波ホモジナイザーを用いて分散液とした。続いて、内径1mmの注入ノズルを介して、前記CNT分散液をイソプロピルアルコール中に注入し、糸状に凝集させ、さらに乾燥させることで、直径が50μmのCNTからなる3mの素線を得た。同様の操作で38本の素線を作製した。
続いて38本の素線を200T/mで撚り、直径が356μmのCNT線材本体を得た。
(Example 1 and Comparative Examples 1 and 2)
First, using the floating catalytic vapor phase growth (FCCVD) method, decahydronaphthalene as a carbon source, ferrocene as a catalyst, and ferrocene as a catalyst are inside an alumina tube having an inner diameter of φ60 mm and a length of 1600 mm heated to 1300 ° C. by an electric furnace. A raw material solution L containing thiophene, which is a reaction accelerator, in a volume ratio of 100: 4: 1 was supplied by spray spraying. As the carrier gas, hydrogen was supplied at 9.5 L / min. The obtained CNT was recovered by a recovery machine. The obtained CNT wire rod was heated to 500 ° C. in the atmosphere and further subjected to acid treatment to purify it.
50 mg of the obtained CNT and 450 mg of sodium cholic acid were added to 24.5 g of water and stirred for 30 minutes using an ultrasonic stirrer, and then a dispersion was prepared using an ultrasonic homogenizer. Subsequently, the CNT dispersion liquid was injected into isopropyl alcohol via an injection nozzle having an inner diameter of 1 mm, aggregated into a thread, and further dried to obtain a 3 m strand of CNT having a diameter of 50 μm. 38 strands were prepared by the same operation.
Subsequently, 38 strands were twisted at 200 T / m to obtain a CNT wire rod body having a diameter of 356 μm.

CNT線材本体を硫酸銅、ホルマリン、ロシェル塩からなるめっき液に浸漬し、無電解銅めっきした。
その後、硫酸銅と硫酸の水溶液からなるめっき液にCNT線材本体を浸漬し、1Aで40分電解めっきすることで、当該CNT線材本体に電界めっき処理が施されたCNT線材を作製した。
The main body of the CNT wire was immersed in a plating solution composed of copper sulfate, formalin, and Rochelle salt, and electroless copper plating was performed.
Then, the CNT wire rod main body was immersed in a plating solution composed of an aqueous solution of copper sulfate and sulfuric acid, and electrolytic plating was performed at 1 A for 40 minutes to prepare a CNT wire rod main body subjected to an electric field plating treatment.

(比較例1)
実施例1と同じ方法で、直径が50μmのCNTからなる素線を38本得た。続いて、38本の素線を200T/mで撚り、直径が356μmの撚り線であるCNT線材を得た。続いて実施例1と同様の方法で、CNT線材本体を硫酸銅、ホルマリン、ロシェル塩からなるめっき液に浸漬し、無電解銅めっきした。
その後、硫酸銅と硫酸の水溶液からなるめっき液にCNT線材本体を浸漬し、1Aで8分電解めっきすることで、当該CNT線材本体に電界めっき処理が施されたCNT線材を作製した。
(比較例2)
実施例1と同じ方法で、直径が50μmのCNTからなる素線を38本得た。続いて、これを実施例1と同じ方法で無電解銅めっきした。その後、硫酸銅と硫酸の水溶液からなるめっき液にCNT線材本体を浸漬し、1Aで160分電解めっきすることで、38本の素線を電解めっきした。続いて、めっきした38本の素線を200T/mで撚り、撚り線であるCNT線材を得た。
(Comparative Example 1)
By the same method as in Example 1, 38 strands made of CNT having a diameter of 50 μm were obtained. Subsequently, 38 strands were twisted at 200 T / m to obtain a CNT wire rod having a diameter of 356 μm. Subsequently, the CNT wire rod main body was immersed in a plating solution composed of copper sulfate, formalin, and Rochelle salt in the same manner as in Example 1, and electroless copper plating was performed.
Then, the CNT wire rod main body was immersed in a plating solution composed of an aqueous solution of copper sulfate and sulfuric acid, and electrolytic plating was performed at 1 A for 8 minutes to prepare a CNT wire rod main body subjected to an electric field plating treatment.
(Comparative Example 2)
By the same method as in Example 1, 38 strands made of CNT having a diameter of 50 μm were obtained. Subsequently, this was electroless copper plated by the same method as in Example 1. Then, the main body of the CNT wire was immersed in a plating solution consisting of an aqueous solution of copper sulfate and sulfuric acid, and electroplated at 1A for 160 minutes to electroplat 38 strands. Subsequently, 38 plated wires were twisted at 200 T / m to obtain a CNT wire rod which is a stranded wire.

(a)めっき割合の測定
(CNT線材の表層部における素線本数の測定)
1.0mのCNT撚り線を長手方向に10cm毎に測定した断面写真において、めっき部まで含めたCNT撚り線の断面形状の重心を求めこれをXとした。続いて、各素線ごとに、めっき部を含まない素線の断面形状から、各素線の重心を求めこれをYiとした。続いて、重心Xと重心Yiを通る直線を引き、この直線とCNT撚り線の断面形状の外縁との交点をZiとした。線分X−Yiの長さ及び線分X−Ziの長さを測定し、線分X−Yiの長さを線分X−Ziの長さで除した値が0.7以上である素線を表層部素線とし、各断面におけるその本数の平均を求めた。
(表層部における、めっき部が形成された素線(CNT束)本数の測定)
1.0mのCNT撚り線(CNT線材)を長手方向に10cm毎に垂直な面で切断し、イオンミリングによって断面を研磨した。つづいてSEM観察を行った。CNT線材の表層部に配された各素線の表面の全長を求めこれをAとした。つづいて、当該素線の表面のうちめっきされている部分の長さをBとした。B/Aが0.5以上の素線を、めっき部が形成されている素線とし、その本数を求めた。
上記にて求めためっき部が形成された素線の本数を表層部の素線の総数で除した値の比率を、CNT線材の断面におけるめっき割合(%)とした。めっき割合が60%以上である場合を良好であるとした。
(A) Measurement of plating ratio (Measurement of the number of strands on the surface layer of CNT wire)
In a cross-sectional photograph of a 1.0 m CNT stranded wire measured every 10 cm in the longitudinal direction, the center of gravity of the cross-sectional shape of the CNT stranded wire including the plated portion was obtained and designated as X. Subsequently, for each strand, the center of gravity of each strand was obtained from the cross-sectional shape of the strand not including the plated portion, and this was designated as Yi. Subsequently, a straight line passing through the center of gravity X and the center of gravity Yi was drawn, and the intersection of this straight line with the outer edge of the cross-sectional shape of the CNT stranded wire was defined as Zi. The length of the line segment X-Yi and the length of the line segment X-Zi are measured, and the value obtained by dividing the length of the line segment X-Yi by the length of the line segment X-Zi is 0.7 or more. The line segment was used as the surface segment wire, and the average number of lines in each cross section was calculated.
(Measurement of the number of strands (CNT bundles) on which the plated portion is formed on the surface layer)
A 1.0 m CNT stranded wire (CNT wire) was cut in a vertical plane every 10 cm in the longitudinal direction, and the cross section was polished by ion milling. Subsequently, SEM observation was performed. The total length of the surface of each wire arranged on the surface layer of the CNT wire was obtained and designated as A. Subsequently, the length of the plated portion of the surface of the wire was defined as B. The strands having a B / A of 0.5 or more were defined as the strands on which the plated portion was formed, and the number thereof was determined.
The ratio of the value obtained by dividing the number of strands on which the plated portion was formed by the total number of strands in the surface layer portion was defined as the plating ratio (%) in the cross section of the CNT wire rod. A case where the plating ratio was 60% or more was regarded as good.

(b)はんだとの接合性
CNT撚り線の末端と銅板をはんだにて接続して、はんだ部が形成されたCNT接続構造体を作製し、銅板とCNT撚り線の間の接続抵抗を測定した。接続抵抗が10mΩ以下である場合を良好であるとした。
(B) Bondability with Solder The end of the CNT stranded wire and the copper plate were connected with solder to prepare a CNT connection structure in which the solder portion was formed, and the connection resistance between the copper plate and the CNT stranded wire was measured. .. The case where the connection resistance is 10 mΩ or less is regarded as good.

(c)CNT撚り線の密度
密度勾配管を用いて、上記CNT撚り線の密度を測定した。長手方向の長さが2cmのサンプルを用いた。CNT撚り線の密度は、アルミの密度と同等の2.7g/cm未満である場合を、軽量電線として良好であるとした。
(C) Density of CNT stranded wire The density of the CNT stranded wire was measured using a density gradient tube. A sample having a length of 2 cm in the longitudinal direction was used. When the density of the CNT stranded wire is less than 2.7 g / cm 3, which is equivalent to the density of aluminum, it is considered to be good as a lightweight electric wire.

上記実施例1及び比較例1の測定、評価結果を表1に示す。 Table 1 shows the measurement and evaluation results of Example 1 and Comparative Example 1.

Figure 0006928526
Figure 0006928526

表1に示すように、実施例1では、CNT線材の主として表層部にめっき部が設けられており、表層部において、該表層部に配された素線の総数に対する、めっきされている素線の本数の割合が83%であり、めっき割合が良好であった。また、はんだとの接合性及びCNT撚り線の密度のいずれも、良好であることが分かった。 As shown in Table 1, in the first embodiment, the plated portion is mainly provided on the surface layer portion of the CNT wire rod, and in the surface layer portion, the plated strands relative to the total number of strands arranged on the surface layer portion. The ratio of the number of pieces was 83%, and the plating ratio was good. Further, it was found that both the bondability with the solder and the density of the CNT stranded wire were good.

一方、比較例1では、CNT線材のめっき割合が不十分であり、CNT撚り線のはんだとの接合性が不良であることが分かった。比較例2では、はんだとの接続抵抗は実施例1と同等であるものの、めっきが表層部以外の内部にも形成されており、密度が3.7g/cmと大きく、重量の観点から電線として不良であることが分かった。 On the other hand, in Comparative Example 1, it was found that the plating ratio of the CNT wire was insufficient and the bondability of the CNT stranded wire to the solder was poor. In Comparative Example 2, although the connection resistance with the solder is the same as that in Example 1, the plating is formed inside other than the surface layer portion, the density is as large as 3.7 g / cm 3, and the electric wire is increased in weight. It turned out to be bad.

1 カーボンナノチューブ線材(CNT線材)
1a 表層部
1b 内部
2 はんだ部
10 カーボンナノチューブ線材接続構造体(CNT線材接続構造体)
11 カーボンナノチューブ束(CNT束)
11A 第1カーボンナノチューブ束群(第1CNT束群)
11a カーボンナノチューブ束(CNT束)
11B 第2カーボンナノチューブ束群(第2CNT束群)
11b カーボンナノチューブ束(CNT束)
12 めっき部
20 被接続部材
1 Carbon nanotube wire (CNT wire)
1a Surface layer 1b Inside 2 Solder part 10 Carbon nanotube wire connection structure (CNT wire connection structure)
11 Carbon nanotube bundle (CNT bundle)
11A 1st carbon nanotube bundle group (1st CNT bundle group)
11a Carbon nanotube bundle (CNT bundle)
11B 2nd carbon nanotube bundle group (2nd CNT bundle group)
11b Carbon nanotube bundle (CNT bundle)
12 Plating part 20 Connected member

Claims (8)

複数のカーボンナノチューブ束を撚り合わせて構成されるカーボンナノチューブ線材であって、
前記カーボンナノチューブ線材の長手方向に沿って設けられ、前記カーボンナノチューブ線材の主として表層部に配されためっき部を備え、
前記カーボンナノチューブ線材の前記表層部に配された第1カーボンナノチューブ束群と、前記カーボンナノチューブ線材の内部に配された第2カーボンナノチューブ束群とを有し、
前記カーボンナノチューブ線材の長手方向に垂直な方向の断面視において、前記第1カーボンナノチューブ束群を構成する各カーボンナノチューブ束の表面全長に対する、当該カーボンナノチューブ束の表面に厚さ1μm以上のめっき部が形成された部分の長さの比が0.5以上であることを特徴とするカーボンナノチューブ線材。
It is a carbon nanotube wire rod composed by twisting a plurality of carbon nanotube bundles.
Wherein provided along the longitudinal direction of the carbon nanotube wire, Bei give a plating unit mainly arranged in the surface portion of the carbon nanotube wire,
It has a first carbon nanotube bundle group arranged on the surface layer portion of the carbon nanotube wire rod and a second carbon nanotube bundle group arranged inside the carbon nanotube wire rod.
In a cross-sectional view in a direction perpendicular to the longitudinal direction of the carbon nanotube wire rod, a plated portion having a thickness of 1 μm or more is formed on the surface of the carbon nanotube bundle with respect to the total surface length of each carbon nanotube bundle constituting the first carbon nanotube bundle group. A carbon nanotube wire rod having a length ratio of formed portions of 0.5 or more.
前記第1カーボンナノチューブ束群が、前記カーボンナノチューブ線材の断面視において、前記めっき部まで含めた前記カーボンナノチューブ線材の断面形状の重心をX、前記めっき部を含まない前記カーボンナノチューブ束の断面形状の重心をYi、重心Xと重心Yiの双方を通る直線と前記カーボンナノチューブ線材の断面形状の外縁との交点をZiとしたとき、線分X−Yiの長さを線分X−Ziの長さで除した値が0.7以上である前記カーボンナノチューブ束の集合体であることを特徴とする、請求項1記載のカーボンナノチューブ線材。In the cross-sectional view of the carbon nanotube wire rod, the first carbon nanotube bundle group has the center of gravity of the cross-sectional shape of the carbon nanotube wire rod including the plated portion as X, and the cross-sectional shape of the carbon nanotube bundle not including the plated portion. When the center of gravity is Yi and the intersection of the straight line passing through both the center of gravity X and the center of gravity Yi and the outer edge of the cross-sectional shape of the carbon nanotube wire is Zi, the length of the line segment X-Yi is the length of the line segment X-Zi. The carbon nanotube wire rod according to claim 1, wherein the carbon nanotube wire segment is an aggregate of the carbon nanotube bundles having a value divided by 0.7 or more. 前記めっき部は、銅(Cu)、銀(Ag)、金(Au)、スズ(Sn)、白金(Pt)、チタン(Ti)、鉄(Fe)、クロム(Cr)及びニッケル(Ni)からなる群から選択された1又は複数を主成分とする材料で形成されることを特徴とする、請求項1又は2記載のカーボンナノチューブ線材。 The plated portion is made of copper (Cu), silver (Ag), gold (Au), tin (Sn), platinum (Pt), titanium (Ti), iron (Fe), chromium (Cr) and nickel (Ni). The carbon nanotube wire rod according to claim 1 or 2, wherein the carbon nanotube wire rod is formed of a material containing one or more of the main components selected from the group. 前記めっき部の下地を構成し、鉄(Fe)、ニッケル(Ni)及びコバルト(Co)またはこれらを主成分とする合金で形成された下地部を更に有することを特徴とする、請求項1〜3のいずか1項に記載のカーボンナノチューブ線材。 Claims 1 to 1, wherein the base portion of the plating portion is formed, and further has a base portion formed of iron (Fe), nickel (Ni), cobalt (Co), or an alloy containing these as main components. 3, whichever is the carbon nanotube wire according to (1). 異種元素がドープされていることを特徴とする、請求項1〜4のいずれか1項に記載のカーボンナノチューブ線材。 The carbon nanotube wire rod according to any one of claims 1 to 4, wherein the carbon nanotube wire rod is doped with a different element. 前記カーボンナノチューブ線材を構成するカーボンナノチューブが、2層又は3層の層構造を有することを特徴とする、請求項1〜5のいずれか1項に記載のカーボンナノチューブ線材。 The carbon nanotube wire rod according to any one of claims 1 to 5, wherein the carbon nanotubes constituting the carbon nanotube wire rod have a two-layer or three-layer structure. 複数のカーボンナノチューブ束を撚り合わせて構成されるカーボンナノチューブ線材と、前記カーボンナノチューブ線材に接続されるはんだ部とを備えるカーボンナノチューブ線材接続構造体であって、
前記カーボンナノチューブ線材は、該カーボンナノチューブ線材の長手方向に沿って設けられ、前記カーボンナノチューブ線材の主として表層部に配されためっき部を備え、
前記カーボンナノチューブ線材の前記表層部に配された第1カーボンナノチューブ束群と、前記カーボンナノチューブ線材の内部に配された第2カーボンナノチューブ束群とを有し、
前記カーボンナノチューブ線材の長手方向に垂直な方向の断面視において、前記第1カーボンナノチューブ束群を構成する各カーボンナノチューブ束の表面全長に対する、当該カーボンナノチューブ束の表面に厚さ1μm以上のめっき部が形成された部分の長さの比が0.5以上であり、
前記はんだ部が、前記めっき部を介して前記カーボンナノチューブ線材と接続されていることを特徴とするカーボンナノチューブ線材接続構造体。
A carbon nanotube wire connecting structure including a carbon nanotube wire formed by twisting a plurality of carbon nanotube bundles and a solder portion connected to the carbon nanotube wire.
The carbon nanotube wire rod is provided along the longitudinal direction of the carbon nanotube wire rod, and includes a plated portion mainly arranged on the surface layer portion of the carbon nanotube wire rod.
It has a first carbon nanotube bundle group arranged on the surface layer portion of the carbon nanotube wire rod and a second carbon nanotube bundle group arranged inside the carbon nanotube wire rod.
In a cross-sectional view in a direction perpendicular to the longitudinal direction of the carbon nanotube wire rod, a plated portion having a thickness of 1 μm or more is formed on the surface of the carbon nanotube bundle with respect to the total surface length of each carbon nanotube bundle constituting the first carbon nanotube bundle group. The ratio of the lengths of the formed portions is 0.5 or more,
A carbon nanotube wire rod connecting structure characterized in that the solder portion is connected to the carbon nanotube wire rod via the plating portion.
複数のカーボンナノチューブ束で構成されるカーボンナノチューブ線材本体に無電界めっき処理を施して下地部を形成する工程と、
前記無電界めっき処理を施したカーボンナノチューブ線材本体に電界めっき処理を施して、前記カーボンナノチューブ線材本体の長手方向に沿って、該カーボンナノチューブ線材本体の主として表層部にめっき部を形成する工程と、
前記無電界めっきを施す工程の前か又は前記電界めっきを施す工程の後に、前記複数のカーボンナノチューブ束を撚り合わせる工程と、
を有することを特徴とする、カーボンナノチューブ線材の製造方法。
A process of forming a base portion by subjecting a carbon nanotube wire rod body composed of a plurality of carbon nanotube bundles to a fieldless plating process.
A step of subjecting the carbon nanotube wire rod main body subjected to the electric field plating treatment to an electric field plating treatment to form a plated portion mainly on the surface layer portion of the carbon nanotube wire rod main body along the longitudinal direction of the carbon nanotube wire rod main body.
A step of twisting the plurality of carbon nanotube bundles before or after the step of performing the electroless plating, and a step of twisting the plurality of carbon nanotube bundles.
A method for producing a carbon nanotube wire rod, which comprises.
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