JP6281283B2 - 高分子薄膜構造体及び有機膜の深さ方向の分析方法 - Google Patents

高分子薄膜構造体及び有機膜の深さ方向の分析方法 Download PDF

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JP6281283B2
JP6281283B2 JP2013539703A JP2013539703A JP6281283B2 JP 6281283 B2 JP6281283 B2 JP 6281283B2 JP 2013539703 A JP2013539703 A JP 2013539703A JP 2013539703 A JP2013539703 A JP 2013539703A JP 6281283 B2 JP6281283 B2 JP 6281283B2
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thin film
polymer
analysis method
depth direction
polymer thin
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JPWO2013058364A1 (ja
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美那 松尾
美那 松尾
雄貴 野原
雄貴 野原
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Nissan Chemical Corp
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Nissan Chemical Corp
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • G01N23/2255—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident ion beams, e.g. proton beams
    • G01N23/2258—Measuring secondary ion emission, e.g. secondary ion mass spectrometry [SIMS]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H01J49/14—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers
    • H01J49/142—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers using a solid target which is not previously vapourised
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/60—Specific applications or type of materials
    • G01N2223/61—Specific applications or type of materials thin films, coatings
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/60—Specific applications or type of materials
    • G01N2223/633—Specific applications or type of materials thickness, density, surface weight (unit area)

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Molecular Biology (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
JP2013539703A 2011-10-21 2012-10-19 高分子薄膜構造体及び有機膜の深さ方向の分析方法 Active JP6281283B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2011231655 2011-10-21
JP2011231663 2011-10-21
JP2011231655 2011-10-21
JP2011231663 2011-10-21
PCT/JP2012/077109 WO2013058364A1 (ja) 2011-10-21 2012-10-19 高分子薄膜構造体及び有機膜の深さ方向の分析方法

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JPWO2013058364A1 JPWO2013058364A1 (ja) 2015-04-02
JP6281283B2 true JP6281283B2 (ja) 2018-02-21

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JP (1) JP6281283B2 (ko)
KR (1) KR102006348B1 (ko)
TW (1) TWI640769B (ko)
WO (1) WO2013058364A1 (ko)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3587482A1 (en) * 2018-06-25 2020-01-01 INTA, Instituto Nacional de Technica Aeroespacial Isotopically labelled materials for degradation detection
CN115235861A (zh) * 2022-08-25 2022-10-25 胜科纳米(苏州)股份有限公司 一种用于飞行时间二次离子质谱分析的超薄有机膜层的制样及分析方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06249805A (ja) * 1993-03-01 1994-09-09 Nissin Electric Co Ltd 表面分析方法
JP2004219261A (ja) 2003-01-15 2004-08-05 Fuji Photo Film Co Ltd 薄膜の解析方法
EP1688246B1 (en) * 2003-11-27 2015-09-16 Mitsubishi Plastics, Inc. Gas barrier film
JP3790539B2 (ja) * 2003-11-27 2006-06-28 三菱樹脂株式会社 ガスバリア性フィルム
JP5142580B2 (ja) * 2006-06-29 2013-02-13 キヤノン株式会社 表面解析方法および表面解析装置

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KR102006348B1 (ko) 2019-08-01
KR20140090207A (ko) 2014-07-16
WO2013058364A1 (ja) 2013-04-25
TW201331579A (zh) 2013-08-01
JPWO2013058364A1 (ja) 2015-04-02
TWI640769B (zh) 2018-11-11

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