JP6156509B2 - 半導体素子の製造方法 - Google Patents
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- 239000004065 semiconductor Substances 0.000 title claims description 34
- 238000004519 manufacturing process Methods 0.000 title claims description 23
- 238000005520 cutting process Methods 0.000 claims description 25
- 238000001179 sorption measurement Methods 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 11
- 230000002093 peripheral effect Effects 0.000 claims description 6
- 230000001681 protective effect Effects 0.000 claims description 5
- 230000000052 comparative effect Effects 0.000 description 14
- 239000000463 material Substances 0.000 description 5
- 239000002699 waste material Substances 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000000428 dust Substances 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 230000007423 decrease Effects 0.000 description 2
- 239000013307 optical fiber Substances 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
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- 238000005468 ion implantation Methods 0.000 description 1
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- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
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- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68721—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by edge clamping, e.g. clamping ring
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
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- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
- H01L2221/68336—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding involving stretching of the auxiliary support post dicing
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- Microelectronics & Electronic Packaging (AREA)
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- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Dicing (AREA)
- Laser Beam Processing (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Description
本発明の実施の形態1に係る半導体素子の製造方法について説明する。図1は、第1面10aと、第1面10aと反対の面である第2面10bとを有するウエハの断面図である。ウエハ10は、中央部10Aとリング部10Bを有している。中央部10Aは第1面10a側が研削されて例えば100μm以下の厚さとなっている。中央部10Aの第2面10b側にはデバイスの表面構造として例えばトランジスタなどの素子が形成されている。
図18は、本発明の実施の形態2に係るウエハマウント装置のカット部を示す図である。カット部を用いたカット工程では、まず、第2面10bに水溶性の保護膜400を形成する。その後、レーザ光16aでウエハ10からリング部10Bを切り離す。保護膜400により、レーザカット屑402がウエハ10に付着することを防止できる。
図19は、本発明の実施の形態3に係るウエハマウント装置のカット部を示す図である。カット部を用いたカット工程では、まず、ゴムリング410と防塵カバー412で第2面10bの中央部を覆う。その後、レーザ光16aでウエハ10からリング部10Bを切り離す。ゴムリング410と防塵カバー412によりレーザカット屑402がウエハ10に付着することを防止できる。この方法は、第2面10bに水溶性の保護膜を形成するよりは少ない工程で実現できる。
図20は、本発明の実施の形態4に係るウエハマウント装置のカット部を示す図である。カット部を用いたカット工程では、まず、ゴムリング410と防塵カバー412で第2面10bの中央部を覆う。その後、ゴムリング410と防塵カバー412を覆うように気流生成装置420をセットする。気流生成装置420の中には、矢印方向の気流が流れる空洞420aがある。気流生成装置420は、空洞420aを経由して第2面10bの中央部から外周部へ向かう気流422を生じさせるものである。そして、気流422を生じさせつつ、レーザ光16aでウエハ10からリング部10Bを切り離す。この方法によれば、レーザカット屑402がウエハ10のエッジに付着することを防止できる。
図21は、本発明の実施の形態5に係るウエハマウント装置のカット部を示す図である。カット部は高水圧ポンプ450を備えている。高水圧ポンプ450には配管452が接続されている。配管452にはノズル454が接続されている。このカット部は、高水圧ポンプ450から放出された水が、配管452及びノズル454を経由して、ウエハ10に噴きつけられるように構成されている。ノズル454から噴出する水柱458の直径は例えば数10μmである。
Claims (6)
- 外周に中央部より厚いリング部が形成され、第1面と、前記第1面と反対の面である第2面とを有するウエハの前記第1面を吸着ステージに吸着させつつ、レーザ光で前記ウエハから前記リング部を切り離すことで、平坦ウエハを形成するカット工程と、
前記平坦ウエハの前記第2面を吸着ハンドに吸着させつつ、前記平坦ウエハを前記吸着ステージから離し、前記第1面をダイシングテープに貼り付ける貼り付け工程と、
前記ダイシングテープに貼り付けられた前記平坦ウエハをダイシングするダイシング工程と、を備え、
前記カット工程では、ゴムリングと防塵カバーで前記第2面の中央部を覆った後に、前記ウエハから前記リング部を切り離すことを特徴とする半導体素子の製造方法。 - 外周に中央部より厚いリング部が形成され、第1面と、前記第1面と反対の面である第2面とを有するウエハの前記第1面を吸着ステージに吸着させつつ、レーザ光で前記ウエハから前記リング部を切り離すことで、平坦ウエハを形成するカット工程と、
前記平坦ウエハの前記第2面を吸着ハンドに吸着させつつ、前記平坦ウエハを前記吸着ステージから離し、前記第1面をダイシングテープに貼り付ける貼り付け工程と、
前記ダイシングテープに貼り付けられた前記平坦ウエハをダイシングするダイシング工程と、を備え、
前記カット工程では、前記第2面の中央部から外周部に向かう気流を生じさせつつ、前記ウエハから前記リング部を切り離すことを特徴とする半導体素子の製造方法。 - 前記カット工程では、YAGレーザを用いることを特徴とする請求項1又は2に記載の半導体素子の製造方法。
- 前記カット工程では、前記第2面に水溶性の保護膜を形成した後に、前記ウエハから前記リング部を切り離すことを特徴とする請求項2に記載の半導体素子の製造方法。
- 前記カット工程では、前記レーザ光の照射部分に水を噴きつけることを特徴とする請求項1〜4のいずれか1項に記載の半導体素子の製造方法。
- 前記カット工程では、前記中央部と前記リング部の境界に前記レーザ光を照射することを特徴とする請求項1〜5のいずれか1項に記載の半導体素子の製造方法。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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PCT/JP2013/077989 WO2015056303A1 (ja) | 2013-10-15 | 2013-10-15 | 半導体素子の製造方法、ウエハマウント装置 |
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JPWO2015056303A1 JPWO2015056303A1 (ja) | 2017-03-09 |
JP6156509B2 true JP6156509B2 (ja) | 2017-07-05 |
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US (1) | US9659808B2 (ja) |
JP (1) | JP6156509B2 (ja) |
KR (1) | KR101787926B1 (ja) |
CN (1) | CN105637618B (ja) |
DE (1) | DE112013007505B4 (ja) |
TW (1) | TWI609418B (ja) |
WO (1) | WO2015056303A1 (ja) |
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DE102016110378B4 (de) * | 2016-06-06 | 2023-10-26 | Infineon Technologies Ag | Entfernen eines Verstärkungsrings von einem Wafer |
DE102016111629B4 (de) * | 2016-06-24 | 2022-10-27 | Infineon Technologies Ag | Verfahren zum Herstellen einer Halbleitervorrichtung |
US10504767B2 (en) * | 2016-11-23 | 2019-12-10 | Rohinni, LLC | Direct transfer apparatus for a pattern array of semiconductor device die |
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TWI609418B (zh) | 2017-12-21 |
WO2015056303A1 (ja) | 2015-04-23 |
US20160155656A1 (en) | 2016-06-02 |
DE112013007505T5 (de) | 2016-07-14 |
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CN105637618B (zh) | 2020-07-24 |
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US9659808B2 (en) | 2017-05-23 |
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