JP5604770B2 - 現像液の濃度調節方法および調製装置 - Google Patents
現像液の濃度調節方法および調製装置 Download PDFInfo
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- JP5604770B2 JP5604770B2 JP2007308532A JP2007308532A JP5604770B2 JP 5604770 B2 JP5604770 B2 JP 5604770B2 JP 2007308532 A JP2007308532 A JP 2007308532A JP 2007308532 A JP2007308532 A JP 2007308532A JP 5604770 B2 JP5604770 B2 JP 5604770B2
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03D—APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
- G03D3/00—Liquid processing apparatus involving immersion; Washing apparatus involving immersion
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
- G03F7/3071—Process control means, e.g. for replenishing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Automation & Control Theory (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Description
[数1]
y=(2.33×10-6x2+6.36×10-4x+0.36c)/8.79+2.38
但し、xは炭酸塩濃度(ppm)、cは溶解樹脂濃度(abs)、
yはTMAH濃度(wt%)である。
[数2]
y=(2.33×10-6x2+6.36×10-4x+0.36c)/8.79+2.38
但し、xは炭酸塩濃度(ppm)、cは溶解樹脂濃度(abs)、
yはTMAH濃度(wt%)である。
2 :供給ライン
21:ポンプ
3 :回収ライン
4 :循環流路
41:ポンプ
5 :濃度計
6 :原液供給ライン
61:流量調整弁
7 :希釈水供給ライン
71:流量調整弁
8 :新液供給ライン
81:流量調整弁
9 :現像装置
A :原液供給機構
B :希釈水供給機構
C :新液供給機構
Claims (4)
- 現像液のアルカリ濃度、現像液中の炭酸塩濃度および溶解樹脂濃度を測定するに当たり、濃度計として、現像液における超音波伝播速度、現像液の電磁導電率および吸光度を計測し、予め作成された所定の温度、アルカリ濃度、炭酸塩濃度および溶解樹脂濃度における超音波伝播速度と電磁導電率と吸光度との関係に基づいて現像液のアルカリ濃度、現像液中の炭酸塩濃度および溶解樹脂濃度を検出可能な多成分濃度計を使用する請求項1に記載の現像液の濃度調節方法。
- フォトレジストの現像処理に使用されるアルカリ性の現像液を調製する調製装置であって、現像液のアルカリ成分がテトラメチルアンモニウムハイドロオキサイドであり、所定濃度の現像液を調製する調製槽と、調製された現像液を現像プロセスへ供給する供給ラインと、使用済現像液を前記調製槽に受け入れる回収ラインと、アルカリ濃度が基準濃度よりも高濃度の新たな現像液原液を前記調製槽に供給する原液供給ラインと、前記調製槽内の現像液のアルカリ濃度、現像液中の炭酸塩濃度および溶解樹脂濃度を検出する濃度計と、当該濃度計による検出濃度に基づいて前記原液供給ラインからの現像液原液の供給を制御する制御装置とが備えられ、当該制御装置は、前記濃度計によって測定された現像液のアルカリ濃度、現像液中の炭酸塩濃度および溶解樹脂濃度と、現像処理して得られるCD値が一定の値となる様な溶解能を発揮し得るアルカリ濃度と炭酸塩濃度と溶解樹脂濃度との予め作成された以下の近似式で表される関係とに基づき、現像液原液の供給を制御してアルカリ濃度を調節する機能を有していることを特徴とする現像液の調製装置。
- 濃度計が、現像液における超音波伝播速度、現像液の電磁導電率および吸光度を計測し、予め作成された所定の温度、アルカリ濃度、炭酸塩濃度および溶解樹脂濃度における超音波伝播速度と電磁導電率と吸光度との関係に基づいて現像液のアルカリ濃度、現像液中の炭酸塩濃度および溶解樹脂濃度を検出可能な多成分濃度計である請求項3に記載の現像液の調製装置。
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JP2007308532A JP5604770B2 (ja) | 2006-11-30 | 2007-11-29 | 現像液の濃度調節方法および調製装置 |
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JP2006322814 | 2006-11-30 | ||
JP2006322814 | 2006-11-30 | ||
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JP2007106188 | 2007-04-13 | ||
JP2007308532A JP5604770B2 (ja) | 2006-11-30 | 2007-11-29 | 現像液の濃度調節方法および調製装置 |
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JP2008283162A JP2008283162A (ja) | 2008-11-20 |
JP5604770B2 true JP5604770B2 (ja) | 2014-10-15 |
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JP (1) | JP5604770B2 (ja) |
KR (1) | KR101446619B1 (ja) |
CN (2) | CN103852978B (ja) |
TW (1) | TWI453548B (ja) |
WO (1) | WO2008065755A1 (ja) |
Families Citing this family (26)
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JP5637676B2 (ja) * | 2009-11-16 | 2014-12-10 | 石原ケミカル株式会社 | 現像液中のフォトレジスト溶解量の測定方法 |
KR101332191B1 (ko) * | 2012-03-07 | 2013-11-22 | (주)에스지이앤티 | 포토레지스트를 포함한 현상액의 농도 산출 방법 및 농도 조절 장치 |
KR101395019B1 (ko) * | 2013-05-06 | 2014-05-14 | (주)세미로드 | 현상액의 농도 측정 및 조절 장치 |
JP6370567B2 (ja) * | 2014-03-13 | 2018-08-08 | エイブリック株式会社 | 現像装置 |
CN104777724A (zh) * | 2015-04-14 | 2015-07-15 | 广东成德电路股份有限公司 | 一种改性显影剂及其负载量量测方法 |
JP6713658B2 (ja) * | 2015-07-22 | 2020-06-24 | 株式会社平間理化研究所 | 現像液の成分濃度測定装置、成分濃度測定方法、現像液管理装置、及び現像液管理方法 |
JP6505534B2 (ja) * | 2015-07-22 | 2019-04-24 | 株式会社平間理化研究所 | 現像液の管理方法及び装置 |
JP6721157B2 (ja) * | 2015-07-22 | 2020-07-08 | 株式会社平間理化研究所 | 現像液の成分濃度測定方法及び装置、並びに、現像液管理方法及び装置 |
CN105116695B (zh) * | 2015-10-15 | 2019-09-17 | 京东方科技集团股份有限公司 | 显影装置及光刻设备 |
KR101864674B1 (ko) * | 2016-02-17 | 2018-06-05 | 한양대학교 산학협력단 | 외부자극응답성 연성 나노입자를 이용한 패턴화된 나노구조체 및 이의 제조방법 |
CN106200281B (zh) * | 2016-09-09 | 2019-11-22 | 武汉华星光电技术有限公司 | 一种图像显影过程中显影液浓度调配方法 |
CN106444304B (zh) * | 2016-11-18 | 2019-08-23 | 昆山国显光电有限公司 | 显影装置以及显影液活性度的补偿方法 |
JP2018120901A (ja) * | 2017-01-23 | 2018-08-02 | 株式会社平間理化研究所 | 現像装置 |
JP6763608B2 (ja) | 2017-01-23 | 2020-09-30 | 株式会社平間理化研究所 | 現像液の二酸化炭素濃度表示装置、及び現像液管理装置 |
JP2018120897A (ja) | 2017-01-23 | 2018-08-02 | 株式会社平間理化研究所 | 現像液の濃度監視装置、及び現像液管理装置 |
JP2018120893A (ja) * | 2017-01-23 | 2018-08-02 | 株式会社平間理化研究所 | 現像液の成分濃度測定装置、及び現像液管理装置 |
JP6712415B2 (ja) * | 2017-01-23 | 2020-06-24 | 株式会社平間理化研究所 | 現像液管理装置 |
JP2018120895A (ja) | 2017-01-23 | 2018-08-02 | 株式会社平間理化研究所 | 現像装置 |
JP6736087B2 (ja) * | 2017-01-23 | 2020-08-05 | 株式会社平間理化研究所 | 現像液の濃度監視装置、及び現像液管理装置 |
JP2018120898A (ja) | 2017-01-23 | 2018-08-02 | 株式会社平間理化研究所 | 現像装置 |
JP2018120900A (ja) | 2017-01-23 | 2018-08-02 | 株式会社平間理化研究所 | 現像液管理装置 |
KR102115858B1 (ko) * | 2017-04-17 | 2020-05-27 | 조명국 | 현상액 재생 장치 및 방법 |
WO2019208837A1 (ko) * | 2018-04-23 | 2019-10-31 | Cho Myung Kook | 현상액 재생 장치 및 방법 |
US11340205B2 (en) | 2019-01-24 | 2022-05-24 | Hong Kong Applied Science And Technology Research Institute Co., Ltd. | Systems and methods for determining concentrations of materials in solutions |
CN109923415B (zh) * | 2019-01-24 | 2021-06-22 | 香港应用科技研究院有限公司 | 用于确定溶液中物质浓度的***和方法 |
CN109632571A (zh) * | 2019-01-29 | 2019-04-16 | 深圳市华星光电半导体显示技术有限公司 | 显影液浓度测量装置及方法 |
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JP4026376B2 (ja) * | 2002-02-27 | 2007-12-26 | 三菱化学エンジニアリング株式会社 | 現像液の供給装置 |
JP2004101999A (ja) * | 2002-09-11 | 2004-04-02 | Mitsubishi Chemical Engineering Corp | 現像液のリサイクル供給装置 |
US7062202B2 (en) * | 2002-09-25 | 2006-06-13 | Seiko Epson Corporation | Image forming apparatus and method using liquid development under an image forming condition in which an adhesion amount of toner is substantially saturated |
JP3894104B2 (ja) * | 2002-11-15 | 2007-03-14 | 東京エレクトロン株式会社 | 現像方法及び現像装置及び現像液再生装置 |
JP4366490B2 (ja) * | 2003-08-22 | 2009-11-18 | 長瀬産業株式会社 | 現像液供給方法及び装置 |
JP2005164396A (ja) | 2003-12-02 | 2005-06-23 | Fuji Kogyo Kk | 洗浄液濃度測定装置 |
JP2005249818A (ja) * | 2004-03-01 | 2005-09-15 | Nishimura Yasuji | フォトレジスト用現像液管理方法、管理装置 |
JP2006189646A (ja) * | 2005-01-06 | 2006-07-20 | Nagase & Co Ltd | レジスト現像液中の炭酸塩の除去方法、除去装置、及びレジスト現像液の濃度管理方法 |
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- 2007-11-29 WO PCT/JP2007/001319 patent/WO2008065755A1/ja active Application Filing
- 2007-11-29 CN CN201410050204.6A patent/CN103852978B/zh active Active
- 2007-11-29 JP JP2007308532A patent/JP5604770B2/ja active Active
- 2007-11-29 KR KR1020097007043A patent/KR101446619B1/ko active IP Right Grant
- 2007-11-29 CN CNA2007800404889A patent/CN101563654A/zh active Pending
- 2007-11-30 TW TW096145699A patent/TWI453548B/zh active
Also Published As
Publication number | Publication date |
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CN103852978B (zh) | 2019-03-22 |
WO2008065755A1 (fr) | 2008-06-05 |
TW200837513A (en) | 2008-09-16 |
JP2008283162A (ja) | 2008-11-20 |
KR20090094217A (ko) | 2009-09-04 |
CN101563654A (zh) | 2009-10-21 |
TWI453548B (zh) | 2014-09-21 |
KR101446619B1 (ko) | 2014-10-01 |
CN103852978A (zh) | 2014-06-11 |
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