JP5011294B2 - シリコーン組成物、製造方法およびシリコーン組成物から形成された物品 - Google Patents
シリコーン組成物、製造方法およびシリコーン組成物から形成された物品 Download PDFInfo
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- JP5011294B2 JP5011294B2 JP2008525146A JP2008525146A JP5011294B2 JP 5011294 B2 JP5011294 B2 JP 5011294B2 JP 2008525146 A JP2008525146 A JP 2008525146A JP 2008525146 A JP2008525146 A JP 2008525146A JP 5011294 B2 JP5011294 B2 JP 5011294B2
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- grip
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- silicone
- organopolysiloxane
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Description
本出願は、2005年8月2日出願の米国特許仮出願第60/704,640号および2005年8月3日出願の米国特許仮出願第60/704,982号の優先権を主張する。これらの出願は、参照によってともに全体として本明細書に組み込まれる。
MaDbTcQd
によって表される。式中、下添字のa、b、cおよびdは、ゼロまたは正の整数であり、下添字aとbとがともゼロに等しければ下添字cは2以上であるという限定を受け、Mは、式R3SiO1/2を有し、Dは、式R2SiO2/2を有し、Tは、式RSiO3/2を有し、Qは、式SiO4/2を有する。式中、各R基は、独立に、水素、末端置換C1〜6アルケニル基、1から40、詳しくは、1から6の炭素原子をそれぞれ有する置換および非置換一価炭化水素基を表し、R基の少なくとも2つはアルケニルR基であるという制限を受ける。適当なアルケニルR基の例は、ビニル、アリル、1−ブテニル、1−ペンテニルおよび1−ヘキセニルであり、ビニルが特に有用である。アルケニル基は、分子鎖末端、分子鎖側鎖位置、または両方に結合してよい。
M′aD′bT′cQ′d
によって表される。式中、下添字a、b、cおよびdは、ゼロまたは正の整数であり、下添字aおよびbがともにゼロなら下添字cは2以上であるという限定を受け、M′は、式R3SiO1/2を有し、D′は、式R2SiO2/2を有し、T′は、式RSiO3/2を有し、Q′は、式SiO4/2を有する。式中、各R基は、独立に、水素、1から40、詳しくは1から6の炭素原子をそれぞれ有する置換および非置換一価炭化水素基を表し、R基の少なくとも2つは水素であるという限定を受ける。詳しくは、分子あたり少なくとも2つのケイ素結合水素原子を有するオルガノポリシロキサンのR基のそれぞれは、独立に、水素、メチル、エチル、プロピル、ブチル、ペンチル、ヘキシル、アリール、フェニル、トリル、キシリル、アラルキル、ベンジル、フェネチル、ハロゲン化アルキル、3−クロロプロピル、3,3,3−トリフルオロプロピル、および前記の少なくとも1つを含む組み合わせから選択される。メチルおよびフェニルが特に好ましい。
M″aD″bT″cQ″d
によって表すことができる。式中、下添字a、b、cおよびdは、ゼロまたは正の整数であり、下添字aとbとがともにゼロなら下添字cは2以上であるという限定を受け、M″は、式R3SiO1/2を有し、D″は、式R2SiO2/2を有し、T″は、式RSiO3/2を有し、Q″は、式SiO4/2を有する。式中、各R基は、独立に、水素、アルケニル基、1から40、詳しくは1から10の炭素原子をそれぞれ有する置換および非置換一価炭化水素基を表し、シリコーン中に存在するあらゆるアルケニル基および/または反応性水素化物基に加えて、R基の1つ以上は反応性有機基であるという限定を受ける。適当な反応性基は、例えば、アクリラート、メタクリラートおよびエポキシ基を含む。
によって表されるエポキシシランである。式中、R1、R2およびR3は、独立に、水素またはC1〜10炭化水素基であり、R4およびR5は、独立に、C1〜10アルキレンまたはC1〜10アルキリデン基であり、R6、R7およびR8は、独立に、C1〜10炭化水素基である。炭化水素基は、詳しくは、1から約6の炭素原子、より詳しくは約1から約4の炭素原子を含む。これらの炭化水素基は、詳しくは、アルキルである。アルキレン基またはアルキリデン基R4およびR5は、詳しくは1から約6の炭素原子、より詳しくは1から約4の炭素原子、より詳しく1または2の炭素原子を含む。アルキレン基およびアルキリデン基は、メチレン、エチレン、プロピレンおよび類似基であってよい。
によって表される(メタ)アクリルシランでもあってよい。式中、R9、R10およびR11は、独立に、水素またはC1〜10炭化水素基であり、R12は、C1〜10アルキレン基またはC2〜10アルキリデン基であり、R13、R14およびR15は、独立に、C1〜10炭化水素基である。炭化水素基は、詳しくは、1から約6の炭素原子、より詳しくは1から約4の炭素原子を含む。これらの炭化水素基は、詳しくは、アルキル(例えばメチル、エチル、プロピルおよび類似基)である。アルキレン基およびアルキリデン基は、詳しくは、1から約6の炭素原子、より詳しくは1から約4の炭素原子を含む。アルキレン基は、メチレン、エチレン、プロピレンおよび類似基を含む。
実施例1〜3は、すべて、メリーランド州ピッツフィールドのGEシリコーンズから商標名LIM6040−D2で入手可能であり、硬化後に40のショアAを有する層を作り出す2剤オルガノポリシロキサン調合物を用いて調合した。実施例1は、65wt%のLIM6040−D2と、35wt%の、GEシリコーンズから商標名LIM6010で入手可能な2剤オルガノポリシロキサン調合物(硬化後、30のショアA硬度を有する層を作り出す)とを組み合わせて調合した。実施例2は、65wt%のLIM6040−D2と、35wt%の、ダウコーニングから商標名3−4241ダイエレクトリックタフゲルで入手可能な2剤オルガノポリシロキサン調合物(粘度=430cp、ショアOO硬度=60(硬化後))とを組み合わせて調合した。実施例3は、65wt%のLIM6040−D2と、35wt%の、ダウコーニングから商標名3−4237ダイエレクトリックタフゲルで入手可能な2剤オルガノポリシロキサン調合物(粘度=290cp、硬化後のショアOO硬度=30)とを組み合わせて調合した。
上述したと同じに、以下の調合物の剥離強さを試験した。インチあたりポンド(ppi)で報告する。
2つの調合物の摩擦係数(CoF)を測定した。65wt%のGEシリコーンズLIM6040と35%のダウコーニングゲル3−4237とを用いて作られた調合物について、表Aおよび表Bのデータを測定した。65wt%のGEシリコーンズLIM6071と35%のダウコーニングゲル3−4237を用いて作られた調合物について、表C中のデータを測定した。硬化シリコーン層の外表面は、平坦かまたは表に示す凸のディンプルを備えていた。
Claims (48)
- ASTM D2240に準拠して測定された60以下のショアAデュロメーターを有し、外表面と、反対側にある内表面とを有する硬化シリコーン層と、
前記内表面上に配置され、前記内表面と接触する第1の接着剤層と、
を含むシリコーングリップであって、
前記シリコーン層は、
シリコーン組成物の硬化を促進する触媒と、分子あたり少なくとも2つのアルケニル基を有する高分子量オルガノポリシロキサンと分子あたり少なくとも2つのケイ素結合水素原子を有するオルガノポリシロキサンとを含む硬化性シリコーン組成物とを反応させ、ASTM D2240に準拠して測定された硬度が30から60のショアAデュロメーターを有する硬化シリコーンと、
シリコーン組成物の硬化を促進する触媒と、分子あたり少なくとも2つのアルケニル基を有する低分子量オルガノポリシロキサンと分子あたり少なくとも2つのケイ素結合水素原子を有するオルガノポリシロキサンとを含む硬化性シリコーン組成物とを反応させ、ASTM D2240に準拠して測定された硬度が20から60のショアOOデュロメーターを有する硬化シリコーンとからなる、グリップ。 - 分子あたり少なくとも2つのケイ素結合水素原子を有する前記オルガノポリシロキサンは、分子あたり少なくとも2つのケイ素結合水素原子を有する第1のオルガノポリシロキサンと、分子あたり少なくとも2つのケイ素結合水素原子を有する第2のオルガノポリシロキサンとを含み、さらに、分子あたり少なくとも2つのアルケニル基を有する前記高分子量オルガノポリシロキサンと、分子あたり少なくとも2つのケイ素結合水素原子を有する前記第1のオルガノポリシロキサンとの反応によって、30から60のショアAデュロメーターを有する硬化シリコーンが作り出され、分子あたり少なくとも2つのアルケニル基を有する前記低分子量オルガノポリシロキサンと、分子あたり少なくとも2つのケイ素結合水素原子を有する前記第2のオルガノポリシロキサンとの反応によって、20から60のショアOOデュロメーターを有する硬化シリコーンが作り出される、請求項1に記載のグリップ。
- 前記硬化性シリコーン組成物は、充填材をすべて除くと、約0.05から約50wt%の反応性オルガノシロキサンをさらに含む、請求項1に記載のグリップ。
- 反応性基は、エポキシ基である、請求項3に記載のグリップ。
- 反応性オルガノシランは、グリシドキシプロピルトリ(C1〜3アルコキシ)シラン、グリシドキシプロピルジ(C1〜3アルコキシ)(C1〜3アルキル)シラン、2,3−エポキシシクロヘキシル−4−エチルトリ(C1〜3アルコキシ)シラン、2,3−エポキシシクロヘキシル−4−エトキシエチルジ(C1〜3アルコキシ)(C1〜3アルキル)シラン、またはアルコキシシラン単量体の少なくとも1つを含む組み合わせである、請求項3に記載のグリップ。
- シリコーン流体をさらに含む、請求項1に記載のグリップ。
- 前記シリコーン流体は、硬化性シリコーン組成物と共硬化する、請求項6に記載のグリップ。
- 分子あたり少なくとも2つのアルケニル基を有する前記オルガノポリシロキサンは、式:
MaDbTcQd
を有し、
前記下添字a、b、cおよびdは、ゼロまたは正の整数であって、下添字aとbとがともにゼロに等しければ下添字cは2以上であるという限定を有し、
Mは、式R3SiO1/2を有し、
Dは、式R2SiO2/2を有し、
Tは、式RSiO3/2を有し、
Qは、式SiO4/2を有し、各R基は、独立に、水素、アルケニル基、1から40の炭素原子をそれぞれ有する置換および非置換一価炭化水素基を表し、前記R基の少なくとも2つはアルケニル基であるという限定を有し、
分子あたり少なくとも2つのケイ素結合水素原子を有する前記オルガノポリシロキサンは、一般に、式:
M′aD′bT′cQ′d
によって表され、
前記下添字a、b、cおよびdは、ゼロまたは正の整数であって、下添字aとbとがともにゼロに等しければ下添字cは2以上であるという前記限定を有し、
M′は、式R3SiO1/2を有し、
D′は、式R2SiO2/2を有し、
T′は、式RSiO3/2を有し、
Q′は、式SiO4/2を有し、各R基は、独立に、水素、1から40の炭素原子をそれぞれ有する置換および非置換一価炭化水素基を表し、前記R基の少なくとも2つは水素であるという限定を有し、前記反応性オルガノシロキサンは、式:
M″aD″bT″cQ″d
によって表され、
前記下添字a、b、cおよびdは、ゼロまたは正の整数であって、下添字aとbとがともにゼロに等しければ下添字cは2以上であるという限定を有し、
M″は、式R3SiO1/2を有し、
D″は、式R2SiO2/2を有し
T″は、式RSiO3/2を有し、
Q″は、式SiO4/2を有し、
各R基は、独立に、水素、アルケニル基、1から40の炭素原子をそれぞれ有する置換および非置換一価炭化水素基を表し、前記シリコーン中に存在する任意のアルケニル基および/または反応性水素化物基に加えて、前記R基の1つ以上は反応性有機基であるという限定を有し、前記反応性有機基は、エポキシ基、アクリラート基、メタクリラート基または前記基の少なくとも一つを含む組み合わせを含む、請求項1に記載のグリップ。 - 前記硬化シリコーン層の前記外表面は、平坦である、請求項1に記載のグリップ。
- 前記硬化シリコーン層の前記外表面は、ISO−1302−2002によって測定したとき、約1.22マイクロメートル以下の平均粗さ値を有する、請求項1に記載のグリップ。
- 前記硬化シリコーン層の前記外表面は、凹凸を有する、請求項1に記載のグリップ。
- 前記凹凸を有する外表面は、***物、窪み、条痕、斜行平行線、波線、ランダム構造体、平行構造体、モザイク、整列または非整列パターンの魚鱗模様、石積み模様、または前記凹凸体の少なくとも1つを含む組み合わせを含む、請求項11に記載のグリップ。
- 前記硬化シリコーン層および/または前記第1の接着剤層は、抗菌および/または抗ウイルス添加剤を含む、請求項1に記載のグリップ。
- 前記グリップは、実質的に透明である、請求項1に記載のグリップ。
- 前記グリップは、不規則な表面に形を合せることができる、請求項1に記載のグリップ。
- 前記硬化シリコーン層の前記外表面は平坦であり、約100グラムのスレッド重量を用いてASTM D1894−01に従ってそれぞれ測定したとき、約5以上の乾いたガラス上の静摩擦係数および/または約3.5以上の乾いたガラス上の動摩擦係数を有する、請求項1に記載のグリップ。
- 前記硬化シリコーン層の前記外表面は、約100グラムのスレッド重量を用いてASTM D1894−01に従って測定したとき、約11以上の乾いたガラス上の静摩擦係数および/または約7.5以上の乾いたガラス上の動摩擦係数を有する凸のディンプルを有する凸の表面である、請求項1に記載のグリップ。
- H−18ホイール、500グラム負荷および500サイクルを用いてASTM D4060−01に従って測定したとき、約15のショアAデュロメーターを有するシリコーン層の重量減少は、約20gより少ない、請求項1に記載のグリップ。
- H−18ホイール、500グラム負荷および500サイクルを用いてASTM D4060−01に従って測定したとき、約30のショアAデュロメーターを有するシリコーン層の重量減少は、約20gより少ない、請求項1に記載のグリップ。
- 物品であって、請求項1に記載の前記シリコーングリップを、前記第1の接着剤層を介して前記物品の表面に接着した物品。
- 硬化シリコーンフィルム層を前記接着剤層と接触させることを含む、請求項1に記載のシリコーングリップの製造方法。
- 前記硬化性シリコーン組成物の表面を、硬化させる前に、硬化させる間に、または部分的に硬化させた後に、凹凸を有する表面と接触させ、前記硬化シリコーン層の前記外表面に凹凸を設けることをさらに含む、請求項11に記載の方法。
- 第1の側および第2の側を有する補助層と、第2の接着剤層とを含み、前記補助層の前記第1の側は前記硬化シリコーン層と反対側の前記第1の接着剤層の側にあり、前記第1の接着剤層と接触して配置され、前記第2の接着剤層は、前記補助層の前記第2の側にあって前記補助層の前記第2の側と接触して配置されている、請求項1に記載のグリップ。
- 物品であって、請求項23に記載の前記シリコーングリップを、前記第2の接着剤層を介して前記物品の表面に接着した物品。
- ASTM D2240に準拠して測定された60以下のショアAデュロメーターを有し、外表面と、反対側にある内表面とを有する硬化シリコーン層と、
前記内表面の上に配置され、前記内表面と接触する補助層と、
を含むシリコーングリップであって、
前記シリコーン層は、
シリコーン組成物の硬化を促進する触媒と、分子あたり少なくとも2つのアルケニル基を有する高分子量オルガノポリシロキサンと分子あたり少なくとも2つのケイ素結合水素原子を有するオルガノポリシロキサンとを含む硬化性シリコーン組成物とを反応させ、ASTM D2240に準拠して測定された硬度が30から60のショアAデュロメーターを有する硬化シリコーンと、
シリコーン組成物の硬化を促進する触媒と、分子あたり少なくとも2つのアルケニル基を有する低分子量オルガノポリシロキサンと分子あたり少なくとも2つのケイ素結合水素原子を有するオルガノポリシロキサンとを含む硬化性シリコーン組成物とを反応させ、ASTM D2240に準拠して測定された硬度が20から60のショアOOデュロメーターを有する硬化シリコーンとからなり、
さらに、前記補助層と前記硬化シリコーン層との間の前記剥離強さは、ASTM D903−98に従って測定したとき、25ミリメートルあたり約1,000グラム以上の力である、グリップ。 - 分子あたり少なくとも2つのケイ素結合水素原子を有する前記オルガノポリシロキサンは、分子あたり少なくとも2つのケイ素結合水素原子を有する第1のオルガノポリシロキサンと、分子あたり少なくとも2つのケイ素結合水素原子を有する第2のオルガノポリシロキサンとを含み、さらに、分子あたり少なくとも2つのアルケニル基を有する前記高分子量オルガノポリシロキサンと、分子あたり少なくとも2つのケイ素結合水素原子を有する前記第1のオルガノポリシロキサンとの反応によって、30から60のショアAデュロメーターを有する硬化シリコーンが作り出され、分子あたり少なくとも2つのアルケニル基を有する前記低分子量オルガノポリシロキサンと、分子あたり少なくとも2つのケイ素結合水素原子を有する前記第2のオルガノポリシロキサンとの反応によって、20から60のショアOOデュロメーターを有する硬化シリコーンが作り出される、請求項25に記載のグリップ。
- 前記補助層は、ポリエステル、ポリウレタン、ポリカーボネート、ポリアミド、ポリオレフィン、ポリスチレン、ポリ(フェニレンオキシド)、ナイロン、ポリ塩化ビニル、ポリイミド、ポリエーテルイミド、ポリアセタール、または重合体の少なくとも1つを含む組み合わせを含む、請求項25に記載のグリップ。
- 前記補助層は、立方フィートあたり約65ポンドより小さな密度を有する発泡体を含む、請求項25に記載のグリップ。
- 前記補助層は、立方フィートあたり約50ポンドより小さな密度を有する発泡体を含む、請求項25に記載のグリップ。
- 前記グリップは、透明である、請求項25に記載のグリップ。
- 前記補助層は画像証印を含み、前記シリコーン層は透明である、請求項25に記載のグリップ。
- 前記硬化シリコーン層の前記外表面は平坦であり、約100グラムのスレッド重量を用いてASTM D1894−01に従ってそれぞれ測定したとき、約5以上の乾いたガラス上の静摩擦係数および/または約3.5以上の乾いたガラス上の動摩擦係数を有する、請求項25に記載のグリップ。
- H−18ホイール、500グラム負荷および500サイクルを用いてASTM D4060−01に従って測定したとき、約15のショアAデュロメーターを有するシリコーン層の重量低下は、約20gより少ない、請求項25に記載のグリップ。
- H−18ホイール、500グラム負荷および500サイクルを用いてASTM D4060−01に従って測定したとき、約30のショアAデュロメーターを有するシリコーン層の重量低下は、約20gより少ない、請求項25に記載のグリップ。
- 前記硬化シリコーン層の前記外表面は、約100グラムのスレッド重量を用いてASTM D1894−01に従ってそれぞれ測定したとき、約11以上の乾いたガラス上の静摩擦係数および/または約7.5以上の乾いたガラス上の動摩擦係数を有する凸のディンプルを有する凸の表面である、請求項25に記載のグリップ。
- 前記補助層を、前記硬化性シリコーン組成物と接触させること、および前記硬化性シリコーン組成物を硬化させることを含む、請求項25に記載のグリップの製造方法。
- 硬化させる前、硬化させる間、または部分的に硬化させた後に、前記硬化性シリコーン組成物の表面を凹凸成形用表面と接触させ、前記硬化シリコーン層の前記外表面に凹凸を設けることをさらに含む、請求項36に記載の方法。
- 前記硬化性シリコーン組成物を剥離層上にキャストした後、前記補助層と接触させる、請求項36に記載の方法。
- 前記硬化性シリコーン組成物の前記層は、キャストした後、前記補助層と接触させる前には未硬化であるかまたは部分硬化されている、請求項38に記載の方法。
- 前記剥離層は、凹凸を有する、請求項38に記載の方法。
- 物品であって、請求項25に記載の前記グリップを接着剤層を介して前記物品の表面に接着した物品。
- 前記補助層は、立方フィートあたり約65ポンドより小さな密度を有する発泡体である、請求項41に記載の物品。
- 前記補助層の上の前記シリコーン層と反対の側に配置され、前記補助層と接触する接着剤層をさらに含む、請求項25に記載のグリップ。
- 前記補助層は、立方フィートあたり約65ポンドより小さな密度を有する発泡体である、請求項43に記載のグリップ。
- 前記グリップは、実質的に透明である、請求項43に記載のグリップ。
- 前記補助層は画像証印を含み、前記シリコーン層および接着剤層は実質的に透明である、請求項43に記載のグリップ。
- 物品であって、請求項43に記載の前記グリップを前記接着剤層を介して前記物品の表面に接着した物品。
- 前記補助層は、立方フィートあたり約65ポンドより小さな密度を有する発泡体である、請求項47に記載の物品。
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JP2003317419A (ja) | 2002-04-16 | 2003-11-07 | Inoac Corp | 回転ディスク固定用シートおよびその製造方法 |
US20030211900A1 (en) * | 2002-05-10 | 2003-11-13 | Performance Golf, Inc. | Golf club grip for retaining an insert |
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WO2004050343A1 (en) | 2002-12-03 | 2004-06-17 | Antonini Fred A | Adhesive backed skins and grips for handheld devices |
WO2005026434A1 (en) | 2003-09-04 | 2005-03-24 | Flexible Innovations Ltd | Silicone-elastomer film and method of manufacturing same |
JP2005099518A (ja) | 2003-09-25 | 2005-04-14 | Inoac Corp | 液晶パネル固定用シート |
JP4503271B2 (ja) * | 2003-11-28 | 2010-07-14 | 東レ・ダウコーニング株式会社 | シリコーン積層体の製造方法 |
JP4818597B2 (ja) * | 2004-09-10 | 2011-11-16 | 東レ・ダウコーニング株式会社 | シリコーンゴム成形体、その製造方法およびエアバッグ用シリコーンゴムコーティング布の製造方法 |
JP2006134446A (ja) | 2004-11-04 | 2006-05-25 | Inoac Corp | 固定用シート |
-
2006
- 2006-08-02 GB GB0802163A patent/GB2444189B/en not_active Expired - Fee Related
- 2006-08-02 WO PCT/US2006/030061 patent/WO2007016617A2/en active Application Filing
- 2006-08-02 CN CN200680036531XA patent/CN101278011B/zh not_active Expired - Fee Related
- 2006-08-02 US US11/497,809 patent/US7625625B2/en not_active Expired - Fee Related
- 2006-08-02 DE DE112006001955T patent/DE112006001955T5/de not_active Ceased
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2021153911A1 (ko) | 2020-01-29 | 2021-08-05 | (주)코리아테크 | 코 피팅 조절기 |
Also Published As
Publication number | Publication date |
---|---|
GB2444189A (en) | 2008-05-28 |
WO2007016617A2 (en) | 2007-02-08 |
US7625625B2 (en) | 2009-12-01 |
JP2009502591A (ja) | 2009-01-29 |
CN101278011B (zh) | 2012-10-24 |
GB0802163D0 (en) | 2008-03-12 |
DE112006001955T5 (de) | 2008-08-28 |
US20070148409A1 (en) | 2007-06-28 |
CN101278011A (zh) | 2008-10-01 |
WO2007016617A3 (en) | 2007-07-12 |
GB2444189B (en) | 2011-09-21 |
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