JP2020016708A - Optical device, projection optical system, exposure apparatus, and method of manufacturing article - Google Patents

Optical device, projection optical system, exposure apparatus, and method of manufacturing article Download PDF

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JP2020016708A
JP2020016708A JP2018138013A JP2018138013A JP2020016708A JP 2020016708 A JP2020016708 A JP 2020016708A JP 2018138013 A JP2018138013 A JP 2018138013A JP 2018138013 A JP2018138013 A JP 2018138013A JP 2020016708 A JP2020016708 A JP 2020016708A
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optical element
optical
guide
convex mirror
unit
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JP7075302B2 (en
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柴田　雄吾
Yugo Shibata
雄吾 柴田
淳生 遠藤
Atsuo Endo
淳生 遠藤
直人 布施
Naoto Fuse
直人 布施
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Canon Inc
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Canon Inc
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0605—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors
    • G02B17/0615—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors off-axis or unobscured systems in wich all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)

Abstract

To provide a technique advantageous in terms of vibration of an optical element when an adjustment mechanism for adjusting the position of the optical element is provided.SOLUTION: An optical device is provided with an adjustment mechanism for adjusting the position of an optical element. The adjustment mechanism includes a first guide part for guiding movement of the optical element in a first direction in a plane perpendicular to an optical axis of the optical element, a second guide part for guiding movement of the optical element in a second direction different from the first direction in the plane, and a third guide part for guiding movement of the optical element in a third direction intersecting the plane and the optical axis.SELECTED DRAWING: Figure 2

Description

本発明は、光学素子の位置を調整する調整機構を備えた光学装置、投影光学系、露光装置、および物品の製造方法に関する。   The present invention relates to an optical device having an adjustment mechanism for adjusting the position of an optical element, a projection optical system, an exposure device, and a method of manufacturing an article.

液晶パネル等の表示素子や半導体デバイスなどの製造工程（リソグラフィ工程）で用いられる装置の１つとして、マスクのパターンを基板上に投影して該基板を露光する露光装置がある。特許文献１には、凸面鏡や凹面鏡などの複数の光学素子を用いてマスクのパターン像を基板上に投影する投影光学系を有する、いわゆる反射ミラー型（ミラープロジェクション型）の露光装置が開示されている。   As one of apparatuses used in a manufacturing process (lithography process) of a display element such as a liquid crystal panel or a semiconductor device, there is an exposure apparatus that exposes the substrate by projecting a mask pattern onto the substrate. Patent Document 1 discloses a so-called reflection mirror type (mirror projection type) exposure apparatus having a projection optical system for projecting a mask pattern image onto a substrate using a plurality of optical elements such as a convex mirror and a concave mirror. I have.

特開２０１６−１０９７４１号公報JP-A-2006-109741

投影光学系では、非点収差等の結像性能を調整するため、光学素子（例えば凸面鏡）の位置を調整する調整機構が設けられることが好ましい。しかしながら、調整機構を設けたことにより、外乱の影響を受けたときの光学素子の振動が大きくなってしまうと、マスクのパターン像を基板上に精度よく投影することが困難になりうる。   In the projection optical system, it is preferable to provide an adjustment mechanism for adjusting the position of an optical element (for example, a convex mirror) in order to adjust the imaging performance such as astigmatism. However, when the adjustment mechanism is provided, if the vibration of the optical element under the influence of disturbance increases, it may be difficult to accurately project the pattern image of the mask onto the substrate.

そこで、本発明は、光学素子の位置を調整する調整機構を設けたときの該光学素子の振動の点で有利な技術を提供することを目的とする。   Therefore, an object of the present invention is to provide a technique advantageous in terms of vibration of the optical element when an adjustment mechanism for adjusting the position of the optical element is provided.

上記目的を達成するために、本発明の一側面としての光学装置は、光学素子の位置を調整する調整機構を備えた光学装置であって、前記調整機構は、前記光学素子の光軸に垂直な面内における第１方向に、前記光学素子の移動を案内する第１案内部と、前記面内において前記第１方向と異なる第２方向に、前記光学素子の移動を案内する第２案内部と、前記面および前記光軸と交差する第３方向に、前記光学素子の移動を案内する第３案内部と、を含むことを特徴とする。   In order to achieve the above object, an optical device according to one aspect of the present invention is an optical device including an adjustment mechanism for adjusting a position of an optical element, wherein the adjustment mechanism is perpendicular to an optical axis of the optical element. A first guide for guiding the movement of the optical element in a first direction in a plane, and a second guide for guiding the movement of the optical element in a second direction different from the first direction in the plane. And a third guide portion for guiding the movement of the optical element in a third direction intersecting the surface and the optical axis.

本発明の更なる目的又はその他の側面は、以下、添付図面を参照して説明される好ましい実施形態によって明らかにされるであろう。   Further objects and other aspects of the present invention will become apparent from the preferred embodiments described below with reference to the accompanying drawings.

本発明によれば、例えば、光学素子の位置を調整する調整機構を設けたときの該光学素子の振動の点で有利な技術を提供することができる。   According to the present invention, for example, an advantageous technique can be provided in terms of vibration of the optical element when an adjustment mechanism for adjusting the position of the optical element is provided.

露光装置の概略図である。It is a schematic diagram of an exposure apparatus. 調整機構の構成例を示す図である。It is a figure showing the example of composition of an adjustment mechanism. 調整機構の構成例を示す図である。It is a figure showing the example of composition of an adjustment mechanism. 第３調整部（第３案内部）を示す図である。It is a figure showing a 3rd adjustment part (third guide part). 凸面鏡の位置を調整する方法を説明するための図である。It is a figure for explaining a method of adjusting a position of a convex mirror. 従来の調整機構と本実施形態の調整機構との比較を示す図である。FIG. 9 is a diagram showing a comparison between a conventional adjustment mechanism and the adjustment mechanism of the present embodiment.

以下、添付図面を参照して、本発明の好適な実施の形態について説明する。なお、各図において、同一の部材ないし要素については同一の参照番号を付し、重複する説明は省略する。   Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings. In the drawings, the same members or elements are denoted by the same reference numerals, and redundant description will be omitted.

＜第１実施形態＞
本発明に係る第１実施形態について説明する。図１は、本実施形態における、投影光学系ＰＬを含む露光装置１０の概略図である。本実施形態の露光装置１０は、マスクＭと基板Ｓ（例えばガラス基板）とをＹ方向に相対的に移動させながら、マスクＭに形成されたパターンの像を、フォトレジストが塗布された基板Ｓに投影して、基板Ｓを露光する。露光装置１０は、マスクＭを照明する照明光学系ＩＬと、マスクＭのパターンを基板上に投影する投影光学系ＰＬと、制御部ＣＮＴとを有する。制御部ＣＮＴは、例えばＣＰＵやメモリなどを含むコンピュータによって構成され、露光装置１０の各部を制御する。 <First embodiment>
A first embodiment according to the present invention will be described. FIG. 1 is a schematic view of an exposure apparatus 10 including a projection optical system PL according to the present embodiment. The exposure apparatus 10 of the present embodiment transfers an image of a pattern formed on the mask M to a substrate S coated with a photoresist while relatively moving the mask M and the substrate S (for example, a glass substrate) in the Y direction. To expose the substrate S. The exposure apparatus 10 has an illumination optical system IL that illuminates the mask M, a projection optical system PL that projects the pattern of the mask M onto a substrate, and a control unit CNT. The control unit CNT is configured by a computer including a CPU and a memory, for example, and controls each unit of the exposure apparatus 10.

投影光学系ＰＬは、マスクＭからの光を反射する複数の光学素子によって構成されうる。具体的には、投影光学系ＰＬは、第１反射面１１ａおよび第２反射面１１ｂを有する多面光学部材１１と、第１凹反射面１２ａおよび第２凹反射面１２ｂを有する凹面鏡１２と、反射面１３ａを有する凸面鏡１３とを含みうる。多面光学部材１１、凹面鏡１２、および凸面鏡１３は、マスクＭ（物体面）のパターンを基板Ｓ（像面）状に結像する結像光学系を構成する。凹面鏡１２および凸面鏡１３の光軸１４は共通であり、図１では一点鎖線によって示されている。また、投影光学系ＰＬは、これらの光学素子を収納する鏡筒１５を有する。   The projection optical system PL can be configured by a plurality of optical elements that reflect light from the mask M. Specifically, the projection optical system PL includes a polyhedral optical member 11 having a first reflecting surface 11a and a second reflecting surface 11b, a concave mirror 12 having a first concave reflecting surface 12a and a second concave reflecting surface 12b, And a convex mirror 13 having a surface 13a. The polygonal optical member 11, the concave mirror 12, and the convex mirror 13 constitute an imaging optical system that images the pattern of the mask M (object plane) on the substrate S (image plane). The optical axis 14 of the concave mirror 12 and the convex mirror 13 is common, and is shown by a dashed line in FIG. In addition, the projection optical system PL has a lens barrel 15 that houses these optical elements.

ここで、本実施形態では、鉛直方向（例えば基板Ｓの面と垂直な方向）をＺ方向とし、水平面内（例えば基板Ｓの面と平行な面内）において互いに直行する２つの方向をＸ方向、Ｙ方向とする。また、本実施形態のＹ方向は、凸面鏡１３（凹面鏡１２）の光軸１４と平行な方向（光軸方向）であるものとして定義される。   Here, in the present embodiment, a vertical direction (for example, a direction perpendicular to the surface of the substrate S) is defined as a Z direction, and two directions orthogonal to each other in a horizontal plane (for example, a surface parallel to the surface of the substrate S) are defined as X directions. , Y direction. The Y direction in the present embodiment is defined as a direction (optical axis direction) parallel to the optical axis 14 of the convex mirror 13 (concave mirror 12).

多面光学部材１１は、例えば、ＹＺ断面が三角形状または台形状の部材であり、第１反射面１１ａ、第２反射面１１ｂ、および面１１ｃを含む複数の平面で構成される。多面光学部材１１の第１反射面１１ａ、第２反射面１１ｂには反射膜が形成され、入射光を反射させて、光路を折り曲げる機能を有する。また、本実施形態の多面光学部材１１には、凸面鏡１３を支持する支持部材１６が貫通する貫通穴１１ｄが設けられている。   The polyhedral optical member 11 is, for example, a member having a triangular or trapezoidal YZ section, and includes a plurality of planes including a first reflecting surface 11a, a second reflecting surface 11b, and a surface 11c. A reflection film is formed on the first reflection surface 11a and the second reflection surface 11b of the multi-surface optical member 11, and has a function of reflecting incident light and bending an optical path. Further, the polygonal optical member 11 of the present embodiment is provided with a through hole 11d through which a support member 16 that supports the convex mirror 13 penetrates.

照明光学系ＩＬから−Ｚ方向に射出された光は、マスクＭを透過し、マスクＭの下方に配置された多面光学部材１１の第１反射面１１ａで＋Ｙ方向に折り曲げられる。多面光学部材１１の第１反射面１１ａで折り曲げられた光は、第１凹反射面１２ａ、凸面鏡１３の反射面１３ａ、第２凹反射面１２ｂ、第２反射面１１ｂの順に反射され、基板Ｓに入射する。つまり、投影光学系ＰＬでは、物体面からの光が、第１反射面１１ａ、第１凹反射面１２ａ、反射面１３ａ、第２凹反射面１２ｂ、第２反射面１１ａの順で反射されるように、多面光学部材１１、凹面鏡１２および凸面鏡１３が構成されうる。   The light emitted from the illumination optical system IL in the −Z direction passes through the mask M and is bent in the + Y direction on the first reflection surface 11a of the polyhedral optical member 11 disposed below the mask M. The light bent by the first reflecting surface 11a of the multi-surface optical member 11 is reflected in the order of the first concave reflecting surface 12a, the reflecting surface 13a of the convex mirror 13, the second concave reflecting surface 12b, and the second reflecting surface 11b. Incident on. That is, in the projection optical system PL, light from the object surface is reflected in the order of the first reflecting surface 11a, the first concave reflecting surface 12a, the reflecting surface 13a, the second concave reflecting surface 12b, and the second reflecting surface 11a. Thus, the polygonal optical member 11, the concave mirror 12, and the convex mirror 13 can be configured.

凸面鏡１３は、支持部材１６によって支持されうる。支持部材１６は、凸面鏡１３の光軸１４の方向（Ｙ方向）に沿って延伸した部材であり、一方の端部は、投影光学系ＰＬの鏡筒１５に接続され、他方の端部は、凸面鏡１３の反射面１３ａの反対側の面に調整機構２０を介して接続される。つまり、支持部材１６は、一方の端部が鏡筒１５に支持され、他方の端部で凸面鏡１３を支持する片持ち梁の構造となっている。   The convex mirror 13 can be supported by a support member 16. The support member 16 is a member extending along the direction of the optical axis 14 of the convex mirror 13 (Y direction), one end of which is connected to the lens barrel 15 of the projection optical system PL, and the other end of which is The convex mirror 13 is connected to a surface on the opposite side of the reflection surface 13 a via an adjustment mechanism 20. That is, the support member 16 has a cantilever structure in which one end is supported by the lens barrel 15 and the other end supports the convex mirror 13.

［調整機構の構成］
投影光学系ＰＬでは、非点収差等の結像性能（光学性能）を調整する光学装置において、光学素子（例えば凸面鏡１３）の位置を３軸方向（Ｘ方向、Ｙ方向、Ｚ方向）に調整するための機構が設けられることが好ましい。本実施形態では、凸面鏡１３の位置を調整するための調整機構２０が、凸面鏡１３と支持部材１６との間に設けられうる。しかしながら、調整機構２０を設けたことによって凸面鏡１３の支持剛性が低下し、外乱の影響を受けたときの凸面鏡１３の振動が大きくなってしまうと、マスクＭのパターン像を基板上に精度よく投影することが困難になりうる。そこで、本実施形態の調整機構２０は、凸面鏡１３の支持剛性の低下を抑えることができるように構成されている。 [Configuration of adjustment mechanism]
In the projection optical system PL, in an optical device that adjusts imaging performance (optical performance) such as astigmatism, the position of an optical element (for example, the convex mirror 13) is adjusted in three axial directions (X, Y, and Z directions). It is preferable to provide a mechanism for performing the operation. In the present embodiment, an adjustment mechanism 20 for adjusting the position of the convex mirror 13 can be provided between the convex mirror 13 and the support member 16. However, when the adjustment mechanism 20 is provided, the support rigidity of the convex mirror 13 is reduced, and when the vibration of the convex mirror 13 is affected by disturbance, the pattern image of the mask M is accurately projected on the substrate. Can be difficult to do. Therefore, the adjusting mechanism 20 of the present embodiment is configured to be able to suppress a decrease in the support rigidity of the convex mirror 13.

図２および図３は、本実施形態の調整機構２０の構成例を示す図である。図２は、調整機構２０をＸ方向から見た図であり、図３は、調整機構２０をＺ方向から見た図である。本実施形態の調整機構２０は、例えば、凸面鏡１３の光軸方向（Ｙ方向）に沿って直列に配置された第１調整部２０ａ、第２調整部２０ｂ、および第３調整部２０ｃを含みうる。図２および図３に示す調整機構２０の構成例では、凸面鏡１３側から第１調整部２０ａ、第２調整部２０ｂ、第２調整部２０ｃの順で配列しているが、各調整部２０ａ〜２０ｃの配列順は任意でありうる。   2 and 3 are diagrams illustrating a configuration example of the adjustment mechanism 20 of the present embodiment. FIG. 2 is a view of the adjusting mechanism 20 as viewed from the X direction, and FIG. 3 is a view of the adjusting mechanism 20 as viewed from the Z direction. The adjustment mechanism 20 of the present embodiment may include, for example, a first adjustment unit 20a, a second adjustment unit 20b, and a third adjustment unit 20c arranged in series along the optical axis direction (Y direction) of the convex mirror 13. . In the configuration example of the adjustment mechanism 20 illustrated in FIGS. 2 and 3, the first adjustment unit 20a, the second adjustment unit 20b, and the second adjustment unit 20c are arranged in this order from the convex mirror 13 side. The sequence of 20c can be arbitrary.

第１調整部２０ａは、凸面鏡１３の光軸１４に垂直な面内（本実施形態ではＸＺ面内）における第１方向（本実施形態ではＺ方向）に、凸面鏡１３の位置を調整するための機構である。第１調整部２０ａは、凸面鏡１３の姿勢を維持しながら、第１方向（Ｚ方向）に沿った凸面鏡１３の並進移動を案内する第１案内部２１を含む。第１案内部２１は、例えば、Ｚ方向に延伸したガイドレール２１ａ（固定部材）と、ガイドレール２１ａに沿って移動可能な移動体２１ｂ（可動部材）とを含むリニアガイドによって構成されうる。ガイドレール２１ａは、凸面鏡１３に取り付けられたベース板２４に固定され、移動体２１ｂは、ベース板２５に固定されうる。ここで、第１案内部２１では、凸面鏡１３の姿勢変動を低減するため、図３に示すように、Ｘ方向に離間した複数（本実施形態では２つ）のリニアガイドが設けられるとよい。第１案内部２１は、リニアガイドを用いる構成以外にも、クロスローラガイドを用いる構成や、Ｖ字型溝にボールを配置する構成、アリ溝ガイドを用いる構成、無給油ガイドを用いる構成などを適用することができる。   The first adjusting unit 20a adjusts the position of the convex mirror 13 in a first direction (Z direction in the present embodiment) in a plane perpendicular to the optical axis 14 of the convex mirror 13 (in the XZ plane in the present embodiment). Mechanism. The first adjustment unit 20a includes a first guide unit 21 that guides the translation of the convex mirror 13 along the first direction (Z direction) while maintaining the attitude of the convex mirror 13. The first guide portion 21 may be configured by, for example, a linear guide including a guide rail 21a (fixed member) extending in the Z direction and a movable body 21b (movable member) movable along the guide rail 21a. The guide rail 21a can be fixed to a base plate 24 attached to the convex mirror 13, and the moving body 21b can be fixed to the base plate 25. Here, in the first guide portion 21, in order to reduce the variation in the attitude of the convex mirror 13, a plurality of (two in the present embodiment) linear guides separated in the X direction may be provided as shown in FIG. The first guide portion 21 may include a configuration using a cross roller guide, a configuration using a ball in a V-shaped groove, a configuration using a dovetail groove guide, a configuration using an oilless guide, and the like, in addition to the configuration using a linear guide. Can be applied.

また、第１調整部２０ａは、第１案内部２１に沿って凸面鏡１３を第１方向（Ｚ方向）に駆動する第１駆動部を含みうる。第１駆動部は、例えばステッピングモータやリニアモータなどのアクチュエータを含み、第１案内部２１のガイドレール２１ａと移動体２１ｂとをＺ方向に相対的に駆動することで、凸面鏡１３をＺ方向に駆動することができる。ステッピングモータは、汎用アクチュエータであるため比較的安価であり、また、駆動パルス数で位置を制御できるため、位置調整制御が容易である点で優れている。リニアモータは、直線駆動アクチュエータであるため、ステッピングモータのような回転駆動アクチュエータを用いる場合に必要となる回転運動を直線運動に変換する機構が不要であり、第１駆動部の構成を簡素化できるという点で優れている。本実施形態の第１駆動部は、例えば、第１案内部２１のガイドレール２１ａを固定子とし、移動体２１ｂを可動子とするリニアモータによって構成されうる。   In addition, the first adjustment unit 20a may include a first driving unit that drives the convex mirror 13 along the first guide unit 21 in the first direction (Z direction). The first drive unit includes, for example, an actuator such as a stepping motor or a linear motor, and drives the guide rail 21a of the first guide unit 21 and the moving body 21b relatively in the Z direction to move the convex mirror 13 in the Z direction. Can be driven. Since the stepping motor is a general-purpose actuator, it is relatively inexpensive, and its position can be controlled by the number of drive pulses, so that it is excellent in that the position adjustment control is easy. Since the linear motor is a linear drive actuator, there is no need to provide a mechanism for converting a rotary motion necessary for using a rotary drive actuator such as a stepping motor into a linear motion, and the configuration of the first drive unit can be simplified. It is excellent in that. The first drive unit of the present embodiment can be configured by, for example, a linear motor in which the guide rail 21a of the first guide unit 21 is a stator and the moving body 21b is a mover.

ここで、第１駆動部は、組み立て時やメンテナンス時において凸面鏡１３の位置を調整する場合には、アクチュエータ以外にも、押し引きネジや、押しネジと引張りバネとで与圧を変更する機構など、手動で凸面鏡１３を駆動する構成であってもよい。第１駆動部を上記の手動機構で構成した場合、第１駆動部の構成を簡素化できるとともに、安価に作製することができる。また、アクチュエータ等の発熱源がないため、発熱による投影光学系ＰＬの結像性能の劣化を低減することもできる。   Here, when the position of the convex mirror 13 is adjusted at the time of assembly or maintenance, the first drive unit may use a push / pull screw or a mechanism that changes the pressurization with a push screw and a tension spring, in addition to the actuator. Alternatively, the configuration may be such that the convex mirror 13 is manually driven. When the first drive unit is configured by the above-described manual mechanism, the configuration of the first drive unit can be simplified and can be manufactured at low cost. In addition, since there is no heat source such as an actuator, it is also possible to reduce deterioration of the imaging performance of the projection optical system PL due to heat generation.

さらに、第１調整部２０ａは、調整後の凸面鏡１３の位置を保持（維持）するための保持部を含んでもよい。該保持部は、例えば、第１案内部２１のガイドレール２１ａと移動体２１ｂとの相対位置をロック（固定）するロック機構（固定機構）を含みうる。ロック機構としては、例えばエアクランパなどが用いられ、この場合、ガイドレール２１ａと移動体２１ｂとの相対位置を遠隔でロックすることができる。また、ロック機構は、ネジ締結によってガイドレール２１ａと移動体２１ｂとの相対位置をロックする機構であってもよい。この場合、第１調整部２０ａによる凸面鏡１３の支持剛性を向上させることができる。   Further, the first adjusting unit 20a may include a holding unit for holding (maintaining) the position of the convex mirror 13 after the adjustment. The holding unit may include, for example, a lock mechanism (fixing mechanism) that locks (fixes) the relative position between the guide rail 21a of the first guide unit 21 and the moving body 21b. As the lock mechanism, for example, an air clamper is used, and in this case, the relative position between the guide rail 21a and the moving body 21b can be remotely locked. The locking mechanism may be a mechanism that locks the relative position between the guide rail 21a and the moving body 21b by screwing. In this case, the support rigidity of the convex mirror 13 by the first adjustment unit 20a can be improved.

第２調整部２０ｂは、凸面鏡１３の光軸１４に垂直な面内（ＸＺ面内）において第１方向と異なる第２方向（本実施形態では、第１方向（Ｚ方向）に垂直なＸ方向）に、凸面鏡１３の位置を調整するための機構である。第２調整部２０ｂは、凸面鏡１３の姿勢を維持しながら、第２方向（Ｘ方向）に沿って凸面鏡１３の並進移動を案内する第２案内部２２を含む。第２案内部２２は、例えば、Ｘ方向に延伸したガイドレール２２ａ（固定部材）と、ガイドレール２２ａに沿って移動可能な移動体２２ｂ（可動部材）とを含むリニアガイドによって構成される。ガイドレール２２ａは、第１案内部２１の移動体２１ｂが固定されたベース板２５に固定され、移動体２２ｂは、ベース板２６に固定されうる。ここで、第２案内部２２では、凸面鏡１３の姿勢変動を低減するため、図２に示すように、Ｚ方向に離間した複数（本実施形態では２つ）のリニアガイドが設けられるとよい。第２案内部２２は、第１案内部２１と同様に、リニアガイドを用いる構成以外の構成を適用することができる。   The second adjusting unit 20b is arranged in a direction perpendicular to the optical axis 14 of the convex mirror 13 (in an XZ plane) in a second direction different from the first direction (in the present embodiment, an X direction perpendicular to the first direction (Z direction)). ) Is a mechanism for adjusting the position of the convex mirror 13. The second adjustment unit 20b includes a second guide unit 22 that guides the translation of the convex mirror 13 along the second direction (X direction) while maintaining the attitude of the convex mirror 13. The second guide portion 22 is configured by, for example, a linear guide including a guide rail 22a (fixed member) extending in the X direction and a movable body 22b (movable member) movable along the guide rail 22a. The guide rail 22a can be fixed to a base plate 25 to which the moving body 21b of the first guide portion 21 is fixed, and the moving body 22b can be fixed to the base plate 26. Here, in the second guide portion 22, a plurality (two in the present embodiment) of linear guides spaced in the Z direction may be provided as shown in FIG. Similar to the first guide portion 21, the second guide portion 22 can adopt a configuration other than the configuration using the linear guide.

また、第２調整部２０ｂは、第２案内部２２に沿って凸面鏡１３を第２方向（Ｘ方向）に駆動する第２駆動部を含みうる。第２駆動部は、例えばステッピングモータやリニアモータなどのアクチュエータを含み、第２案内部２２のガイドレール２２ａと移動体２２ｂとをＸ方向に相対的に駆動することで、凸面鏡１３をＸ方向に駆動することができる。本実施形態の第２駆動部は、第１駆動部と同様に、例えば、第２案内部２２のガイドレール２２ａを固定子とし、移動体２２ｂを可動子とするリニアモータによって構成されうるが、リニアモータ以外のアクチュエータや上記の手動機構などで構成されてもよい。さらに、第２調整部２０ｂは、調整後の凸面鏡１３の位置を保持（維持）するための保持部を含んでもよい。該保持部は、第１調整部２０ａと同様に、第２案内部２２のガイドレール２２ａと移動体２２ｂとの相対位置をロックするロック機構を含みうる。   Further, the second adjusting unit 20b may include a second driving unit that drives the convex mirror 13 in the second direction (X direction) along the second guide unit 22. The second drive unit includes, for example, an actuator such as a stepping motor or a linear motor, and drives the guide rail 22a of the second guide unit 22 and the moving body 22b relatively in the X direction to move the convex mirror 13 in the X direction. Can be driven. Like the first drive unit, the second drive unit of the present embodiment can be configured by, for example, a linear motor in which the guide rail 22a of the second guide unit 22 is a stator and the moving body 22b is a mover. It may be constituted by an actuator other than the linear motor or the above-mentioned manual mechanism. Further, the second adjustment unit 20b may include a holding unit for holding (maintaining) the position of the convex mirror 13 after the adjustment. The holding unit may include a lock mechanism that locks the relative position between the guide rail 22a of the second guide unit 22 and the moving body 22b, similarly to the first adjustment unit 20a.

第３調整部２０ｃは、凸面鏡１３の光軸方向（本実施形態ではＹ方向）に凸面鏡１３の位置を調整するための機構である。第３調整部２０ｃは、凸面鏡１３の姿勢を維持しながら、凸面鏡１３の光軸１４に垂直な面（ＸＺ面）および凸面鏡１３の光軸１４に交差する第３方向（本実施形態ではＹ’方向）に沿った凸面鏡の並進移動を案内する第３案内部２３を含む。なお、以下では、凸面鏡１３の光軸１４に垂直な面を「垂直面」と呼ぶことがある
ここで、第３方向は、垂直面（ＸＺ面）に対して傾けられた方向であり、本実施形態では、第１方向（Ｚ方向）と凸面鏡１３の光軸方向（Ｙ方向）とを含む面内（ＹＺ面内）における一方向（Ｙ’方向）として定義されうる。しかしながら、第３方向は、ＹＺ面内の一方向に限られるものではなく、例えば、第２方向（Ｘ方向）と凸面鏡１３の光軸方向（Ｙ方向）とを含む面内（ＸＹ面内）における一方向など、垂直面（ＸＺ面）に交差する方向であればよい。また、垂直面（ＸＺ面）と第３方向（Ｙ’方向）との間の角度θは、実験やシミュレーションにより得られた凸面鏡１３の支持剛性（対振動性能）と凸面鏡１３の光軸方向への移動ストロークとの関係から、０．６度以上かつ３０度以下の範囲内であるとよい。より好ましくは、２．５度以上かつ３．５度以下の範囲内であるとよい。 The third adjusting unit 20c is a mechanism for adjusting the position of the convex mirror 13 in the optical axis direction of the convex mirror 13 (Y direction in the present embodiment). The third adjustment unit 20c keeps the posture of the convex mirror 13 while maintaining a posture (XZ plane) perpendicular to the optical axis 14 of the convex mirror 13 and a third direction (Y ′ in the present embodiment) intersecting the optical axis 14 of the convex mirror 13. And a third guide portion 23 for guiding the translation of the convex mirror along the first direction. In the following, a plane perpendicular to the optical axis 14 of the convex mirror 13 may be referred to as a “vertical plane”. Here, the third direction is a direction inclined with respect to the vertical plane (XZ plane). In the embodiment, it can be defined as one direction (Y 'direction) in a plane (YZ plane) including the first direction (Z direction) and the optical axis direction (Y direction) of the convex mirror 13. However, the third direction is not limited to one direction in the YZ plane, but is, for example, in a plane including the second direction (X direction) and the optical axis direction (Y direction) of the convex mirror 13 (XY plane). Any direction may be used as long as the direction intersects the vertical plane (XZ plane), such as one direction in. Further, the angle θ between the vertical plane (XZ plane) and the third direction (Y ′ direction) is determined by the support rigidity (anti-vibration performance) of the convex mirror 13 and the optical axis direction of the convex mirror 13 obtained by experiments and simulations. From the relationship with the moving stroke, the angle is preferably in the range of 0.6 degrees or more and 30 degrees or less. More preferably, it is good to be in the range of 2.5 degrees or more and 3.5 degrees or less.

第３案内部２３は、例えば、Ｙ’方向に延伸したガイドレール２３ａ（固定部材）と、ガイドレール２３ａに沿って移動可能な移動体２３ｂ（可動部材）とを含むリニアガイドによって構成されうる。ガイドレール２３ａは、第２案内部２２の移動体２２ｂが固定されたベース板２６に固定部材２８を介して固定され、移動体２３ｂは、支持部材１６に取り付けられたベース板２７に固定部材２９を介して固定されうる。固定部材２８は、ベース板２６への接触面とガイドレール２３ａへの接触面とが角度θを成すように構成され、固定部材２９も同様に、ベース板２７への接触面と移動体２３ｂへの接触面とが角度θを成すように構成される。これにより、ガイドレール２３ａと移動体２３ｂとをＹ’方向に相対的に移動させ、Ｙ’方向への凸面鏡１３の並進移動を案内することができる。ここで、第３案内部２３では、凸面鏡１３の姿勢変動を低減するため、図３に示すように、Ｘ方向に離間した複数（本実施形態では２つ）のリニアガイドが設けられるとよい。第２案内部２２は、第１案内部２１と同様に、リニアガイドを用いる構成以外の構成を適用することができる。   The third guide portion 23 can be configured by, for example, a linear guide including a guide rail 23a (fixed member) extending in the Y 'direction and a movable body 23b (movable member) movable along the guide rail 23a. The guide rail 23 a is fixed via a fixing member 28 to a base plate 26 to which the moving body 22 b of the second guide portion 22 is fixed, and the moving body 23 b is fixed to a base plate 27 attached to the support member 16. Can be fixed. The fixing member 28 is configured such that the contact surface with the base plate 26 and the contact surface with the guide rail 23a form an angle θ, and the fixing member 29 similarly has a contact surface with the base plate 27 and the moving body 23b. Is configured to form an angle θ. Thus, the guide rail 23a and the moving body 23b can be relatively moved in the Y 'direction, and can guide the translation of the convex mirror 13 in the Y' direction. Here, in the third guide portion 23, as shown in FIG. 3, a plurality of (two in the present embodiment) linear guides spaced in the X direction may be provided in order to reduce the variation in the attitude of the convex mirror 13. Similar to the first guide portion 21, the second guide portion 22 can adopt a configuration other than the configuration using the linear guide.

また、第３調整部２０ｃは、第３案内部２３に沿って凸面鏡１３を第３方向（Ｙ’方向）に駆動する第３駆動部を含みうる。第３駆動部は、例えばステッピングモータやリニアモータなどのアクチュエータを含み、第３案内部２３のガイドレール２３ａと移動体２３ｂとをＹ’方向に相対的に駆動することができる。本実施形態の第３駆動部は、第１駆動部と同様に、例えば、第３案内部２３のガイドレール２３ａを固定子とし、移動体２３ｂを可動子とするリニアモータによって構成されうるが、リニアモータ以外のアクチュエータや上記の手動機構などで構成されてもよい。さらに、第３調整部２０ｃは、調整後の凸面鏡１３の位置を保持（維持）するための保持部を含んでもよい。該保持部は、第１調整部２０ａと同様に、第３案内部２３のガイドレール２３ａと移動体２３ｂとの相対位置をロックするロック機構を含みうる。   Further, the third adjusting unit 20c may include a third driving unit that drives the convex mirror 13 in the third direction (Y ′ direction) along the third guide unit 23. The third drive unit includes, for example, an actuator such as a stepping motor or a linear motor, and can relatively drive the guide rail 23a of the third guide unit 23 and the moving body 23b in the Y 'direction. Like the first drive unit, the third drive unit of the present embodiment can be configured by, for example, a linear motor in which the guide rail 23a of the third guide unit 23 is a stator and the moving body 23b is a mover. It may be constituted by an actuator other than the linear motor or the above-mentioned manual mechanism. Further, the third adjusting unit 20c may include a holding unit for holding (maintaining) the position of the convex mirror 13 after the adjustment. The holding unit may include a lock mechanism that locks the relative position between the guide rail 23a of the third guide unit 23 and the moving body 23b, similarly to the first adjustment unit 20a.

［凸面鏡の移動成分］
このように構成された調整機構２０では、第３案内部２３により凸面鏡１３の移動が第３方向（Ｙ’方向）に案内されると、凸面鏡１３には、光軸方向（Ｙ方向）への移動成分に加えて、第１方向（Ｚ方向）への移動成分が生じうる。そのため、３軸方向（Ｘ方向、Ｙ方向、Ｚ方向）における凸面鏡１３の位置の目標調整量を、各調整部２０ａ〜２０ｃでの調整量（即ち、ガイドレールと移動体との相対移動量）としてそのまま用いることができない。つまり、本実施形態の調整機構２０を用いる場合、凸面鏡１３の位置の目標調整量に基づいて、各調整部２０ａ〜２０ｃでの調整量を決定する必要である。以下に、各調整部２０ａ〜２０ｃでの調整量の決定処理について、図４を参照しながら説明する。ここで、各調整部２０ａ〜２０ｃの調整量は、制御部ＣＮＴによって決定されてもよい。この場合、制御部ＣＮＴは、決定した調整量に基づいて、各調整部２０ａ〜２０ｃの駆動部を制御することができる。 [Moving component of convex mirror]
In the adjusting mechanism 20 configured as described above, when the movement of the convex mirror 13 is guided in the third direction (Y ′ direction) by the third guide portion 23, the convex mirror 13 is moved in the optical axis direction (Y direction). In addition to the moving component, a moving component in the first direction (Z direction) may occur. Therefore, the target adjustment amount of the position of the convex mirror 13 in the three axis directions (X direction, Y direction, and Z direction) is adjusted by the adjustment amounts of the respective adjustment units 20a to 20c (that is, the relative movement amount between the guide rail and the moving body) Cannot be used as it is. That is, when using the adjustment mechanism 20 of the present embodiment, it is necessary to determine the adjustment amounts of the respective adjustment units 20a to 20c based on the target adjustment amounts of the position of the convex mirror 13. Hereinafter, the adjustment amount determination processing in each of the adjustment units 20a to 20c will be described with reference to FIG. Here, the adjustment amount of each of the adjustment units 20a to 20c may be determined by the control unit CNT. In this case, the control unit CNT can control the drive units of the adjustment units 20a to 20c based on the determined adjustment amount.

図４は、第３調整部２０ｃ（第３案内部２３）を示す図である。また、各方向における凸面鏡１３の目標調整量、各調整部２０ａ〜２０ｃでの調整量、第３調整部２０ｃによる位置調整で生じた凸面鏡１３の移動成分を以下のように定義する。
Ｓｚ：Ｚ方向における凸面鏡の目標調整量
Ｓｘ：Ｘ方向における凸面鏡の目標調整量
Ｓｙ：Ｙ方向における凸面鏡の目標調整量
Ｔｚ：第１調整部での調整量
Ｔｘ：第２調整部での調整量
Ｔｙ’：第３調整部での調整量
Ｙ’ｚ：第３調整部による位置調整で生じたＺ方向への凸面鏡の移動成分
Ｙ’ｙ：第３調整部による位置調整で生じたＹ方向への凸面鏡の移動成分
θ：ＸＺ面とＹ’方向との間の角度 FIG. 4 is a diagram illustrating the third adjustment unit 20c (the third guide unit 23). The target adjustment amount of the convex mirror 13 in each direction, the adjustment amount of each of the adjustment units 20a to 20c, and the moving component of the convex mirror 13 generated by the position adjustment by the third adjustment unit 20c are defined as follows.
Sz: target adjustment amount of the convex mirror in the Z direction Sx: target adjustment amount of the convex mirror in the X direction Sy: target adjustment amount of the convex mirror in the Y direction Tz: adjustment amount in the first adjustment unit Tx: adjustment amount in the second adjustment unit Ty ': Adjustment amount in the third adjustment unit Y'z: Movement component of the convex mirror in the Z direction caused by position adjustment by the third adjustment unit Y'y: In Y direction caused by position adjustment by the third adjustment unit Θ: the angle between the XZ plane and the Y ′ direction

この場合、第３調整部２０ｃによる位置調整で生じたＺ方向への凸面鏡１３の移動成分Ｙ’ｚ、およびＹ方向への凸面鏡１３の移動成分Ｙ’ｙは、以下の式（１）によって表すことができる。
Ｙ’ｚ＝−Ｔｙ’×ｃｏｓθ
Ｙ’ｙ＝Ｔｙ’×ｓｉｎθ
ｔａｎθ＝Ｙ’ｙ／Ｙ’ｚ ・・・（１） In this case, the movement component Y'z of the convex mirror 13 in the Z direction and the movement component Y'y of the convex mirror 13 in the Y direction caused by the position adjustment by the third adjustment unit 20c are expressed by the following equation (1). be able to.
Y′z = −Ty ′ × cos θ
Y'y = Ty '× sin θ
tan θ = Y′y / Y′z (1)

また、各方向における凸面鏡１３の目標調整量と、各調整部２０ａ〜２０ｃでの調整量との関係は、以下の式（２）によって表すことができる。
Ｓｚ＝Ｔｚ＋Ｙ’ｚ
Ｓｘ＝Ｔｘ
Ｓｙ＝Ｙ’ｙ ・・・（２） Further, the relationship between the target adjustment amount of the convex mirror 13 in each direction and the adjustment amount of each of the adjustment units 20a to 20c can be expressed by the following equation (2).
Sz = Tz + Y'z
Sx = Tx
Sy = Y'y (2)

したがって、上記の式（１）および式（２）より、各調整部２０ａ〜２０ｃでの調整量を、以下の式（３）に基づいて決定することができる。
Ｓｚ＝Ｔｚ−Ｔｙ’×ｃｏｓθ
Ｓｘ＝Ｔｘ
Ｓｙ＝Ｔｙ’×ｓｉｎθ ・・・（３） Therefore, from the above equations (1) and (2), the adjustment amounts in the respective adjustment units 20a to 20c can be determined based on the following equation (3).
Sz = Tz−Ty ′ × cos θ
Sx = Tx
Sy = Ty ′ × sin θ (3)

［凸面鏡の位置補正］
上述したように、第３案内部２３により凸面鏡１３の移動が第３方向（Ｙ’方向）に案内されると、凸面鏡１３には、光軸方向（Ｙ方向）への移動成分に加えて、第１方向（Ｚ方向）への移動成分が生じうる。このように第３案内部２３により凸面鏡１３の移動が案内されたときの第１方向（Ｚ方向）への移動成分は、第１案内部２１で案内される凸面鏡１３の移動によって補正することができる。即ち、第３調整部２０ｃによる調整で生じたＺ方向への移動成分を、第１調整部２０ａによる調整で補正可能である。以下に、その補正方法について、図５を参照しながら説明する。ここで、以下に示す補正方法は、制御部ＣＮＴにより各調整部２０ａ〜２０ｃの駆動部を制御することで行われてもよい。 [Position correction of convex mirror]
As described above, when the movement of the convex mirror 13 is guided by the third guide portion 23 in the third direction (Y ′ direction), the convex mirror 13 has a component in addition to the moving component in the optical axis direction (Y direction). A moving component in the first direction (Z direction) may occur. Thus, the movement component in the first direction (Z direction) when the movement of the convex mirror 13 is guided by the third guide portion 23 can be corrected by the movement of the convex mirror 13 guided by the first guide portion 21. it can. That is, the movement component in the Z direction caused by the adjustment by the third adjustment unit 20c can be corrected by the adjustment by the first adjustment unit 20a. Hereinafter, the correction method will be described with reference to FIG. Here, the correction method described below may be performed by controlling the drive units of the adjustment units 20a to 20c by the control unit CNT.

図５は、凸面鏡１３の位置を調整する方法を説明するための図であり、凸面鏡１３の位置を＋Ｙ方向に目標調整量Ｙａだけ調整する例を示している。図５（ａ）は、凸面鏡１３の座標が（Ｘ，Ｙ，Ｚ）＝（０，０，０）である調整前の状態を示している。また、図５（ｂ）は、第３調整部２０ｃによる調整を行った後の状態を示しており、図５（ｃ）は、第１調整部２０ａによる補正を行った後の状態を示している。   FIG. 5 is a diagram for explaining a method of adjusting the position of the convex mirror 13 and shows an example in which the position of the convex mirror 13 is adjusted by the target adjustment amount Ya in the + Y direction. FIG. 5A shows a state before adjustment in which the coordinates of the convex mirror 13 are (X, Y, Z) = (0, 0, 0). FIG. 5B shows a state after the adjustment by the third adjustment unit 20c, and FIG. 5C shows a state after the correction by the first adjustment unit 20a. I have.

凸面鏡１３の位置を＋Ｙ方向に目標調整量Ｙａだけ調整する場合、第３調整部２０ｃの調整量Ｔｙ’ａ（即ち、Ｙ’方向におけるガイドレール２３ａと移動体２３ｂとの相対移動量）を、以下の式（４）によって求めることができる。また、第３調整部２０ｃにより調整を行ったときに生じるＺ方向への凸面鏡１３の移動成分Ｔｚａは、以下の式（５）によって求められる。したがって、求めた調整量Ｔｙ’ａだけ、第３調整部により凸面鏡１３をＹ’方向に移動させると、図５（ｂ）に示すように、凸面鏡１３の座標が（Ｘ，Ｙ，Ｚ）＝（０，Ｙａ，−Ｔｚａ）となる。
Ｔｙ’ａ＝Ｙａ／ｓｉｎθ ・・・（４）
Ｔｚａ＝Ｔｙ’ａ×ｃｏｓθ
＝Ｙａ／ｓｉｎθ×ｃｏｓθ ・・・（５） When the position of the convex mirror 13 is adjusted by the target adjustment amount Ya in the + Y direction, the adjustment amount Ty′a of the third adjustment unit 20c (that is, the relative movement amount between the guide rail 23a and the moving body 23b in the Y ′ direction) is It can be obtained by the following equation (4). Further, a movement component Tza of the convex mirror 13 in the Z direction generated when the adjustment is performed by the third adjustment unit 20c is obtained by the following equation (5). Therefore, when the convex mirror 13 is moved in the Y ′ direction by the third adjustment unit by the obtained adjustment amount Ty′a, the coordinates of the convex mirror 13 become (X, Y, Z) = as shown in FIG. 5B. (0, Ya, -Tza).
Ty'a = Ya / sin θ (4)
Tza = Ty'a × cos θ
= Ya / sin θ × cos θ (5)

このように第３調整部２０ｃにより凸面鏡１３を＋Ｙ方向に目標調整量Ｙａだけ調整すると、Ｚ方向への凸面鏡１３の移動成分Ｔｚａが生じる。そのため、当該移動成分Ｔｚａが補正されるように、第１調整部２０ａにより凸面鏡１３をＺ方向に移動させる。これにより、図５（ｃ）に示すように、凸面鏡１３の座標を（Ｘ，Ｙ，Ｚ）＝（０，Ｙａ，０）とすることができる。   As described above, when the convex mirror 13 is adjusted in the + Y direction by the target adjustment amount Ya by the third adjusting unit 20c, a movement component Tza of the convex mirror 13 in the Z direction is generated. Therefore, the first adjusting unit 20a moves the convex mirror 13 in the Z direction so that the moving component Tza is corrected. Thereby, as shown in FIG. 5C, the coordinates of the convex mirror 13 can be set to (X, Y, Z) = (0, Ya, 0).

ここで、第３方向が、ＹＺ面内にない場合には、第３案内部２３により凸面鏡１３の移動が案内されたときに、第２方向（Ｘ方向）への移動成分が生じることがある。この場合には、第２案内部２２で案内される凸面鏡１３の移動によって、第２方向への移動成分を補正することができる。つまり、第３調整部２０ｃによる調整で生じたＸＺ方向への移動成分を、第１調整部２０ａおよび第２調整部２０ｂを用いて補正することができる。   Here, when the third direction is not in the YZ plane, when the movement of the convex mirror 13 is guided by the third guide portion 23, a movement component in the second direction (X direction) may occur. . In this case, the movement component in the second direction can be corrected by the movement of the convex mirror 13 guided by the second guide portion 22. That is, the movement component in the XZ direction caused by the adjustment by the third adjustment unit 20c can be corrected by using the first adjustment unit 20a and the second adjustment unit 20b.

［効果］
次に、本実施形態の調整機構２０の構成における効果について説明する。図６は、従来の調整機構３０と本実施形態の調整機構２０との比較を示す図である。図６（ａ）は、従来の調整機構３０の構成を示す概略図であり、図６（ｂ）は、本実施形態の調整機構２０の構成を示す概略図である。また、図６（ｃ）は、従来の調整機構３０と本実施形態の調整機構２０とにおける固有振動数の比較を示す図である。 [effect]
Next, effects of the configuration of the adjustment mechanism 20 of the present embodiment will be described. FIG. 6 is a diagram showing a comparison between the conventional adjusting mechanism 30 and the adjusting mechanism 20 of the present embodiment. FIG. 6A is a schematic diagram illustrating a configuration of a conventional adjustment mechanism 30, and FIG. 6B is a schematic diagram illustrating a configuration of the adjustment mechanism 20 of the present embodiment. FIG. 6C is a diagram showing a comparison of natural frequencies between the conventional adjusting mechanism 30 and the adjusting mechanism 20 of the present embodiment.

従来の調整機構３０では、図６（ａ）に示すように、３軸方向の各々について案内部が設けられていた。具体的には、Ｚ方向への凸面鏡１３の移動を案内する案内部３１と、Ｘ方向への凸面鏡１３の移動を案内する案内部３２と、Ｙ方向への凸面鏡１３の移動を案内する案内部３３とが設けられていた。それに対し、本実施形態の調整機構２０では、図６（ｂ）に示すように、Ｙ方向への凸面鏡の移動を案内する案内部の代わりに、Ｙ’方向（第３方向）への凸面鏡１３の移動を案内する第３案内部２３が設けられる。これにより、図６（ｃ）に示すように、本実施形態の調整機構２０では、図６（ｃ）に示すように、従来の調整機構３０と比べて固有振動数を大きくし、凸面鏡１３の支持剛性（例えば、ωｘ方向、ωｚ方向）を高めることができる。   In the conventional adjusting mechanism 30, as shown in FIG. 6A, a guide portion is provided for each of the three axial directions. Specifically, a guide portion 31 for guiding the movement of the convex mirror 13 in the Z direction, a guide portion 32 for guiding the movement of the convex mirror 13 in the X direction, and a guide portion for guiding the movement of the convex mirror 13 in the Y direction. 33 were provided. On the other hand, in the adjusting mechanism 20 of the present embodiment, as shown in FIG. 6B, instead of the guide portion for guiding the movement of the convex mirror in the Y direction, the convex mirror 13 in the Y ′ direction (third direction) is used. A third guide portion 23 for guiding the movement of the vehicle is provided. Thereby, as shown in FIG. 6C, in the adjusting mechanism 20 of the present embodiment, as shown in FIG. 6C, the natural frequency is increased as compared with the conventional adjusting mechanism 30, and the adjusting of the convex mirror 13 is performed. The supporting rigidity (for example, the ωx direction and the ωz direction) can be increased.

＜物品の製造方法の実施形態＞
本発明の実施形態にかかる物品の製造方法は、例えば、半導体デバイス等のマイクロデバイスや微細構造を有する素子等の物品を製造するのに好適である。本実施形態の物品の製造方法は、基板に塗布された感光剤に上記の露光装置を用いて潜像パターンを形成する工程（基板を露光する工程）と、かかる工程で潜像パターンが形成された基板を現像（加工）する工程とを含む。更に、かかる製造方法は、他の周知の工程（酸化、成膜、蒸着、ドーピング、平坦化、エッチング、レジスト剥離、ダイシング、ボンディング、パッケージング等）を含む。本実施形態の物品の製造方法は、従来の方法に比べて、物品の性能・品質・生産性・生産コストの少なくとも１つにおいて有利である。 <Embodiment of Method for Manufacturing Article>
The method for manufacturing an article according to the embodiment of the present invention is suitable for manufacturing an article such as a microdevice such as a semiconductor device or an element having a fine structure. The method for manufacturing an article according to the present embodiment includes a step of forming a latent image pattern on a photosensitive agent applied to a substrate using the above-described exposure apparatus (a step of exposing the substrate), and a step of forming a latent image pattern in the step. Developing (working) the substrate. Further, such a manufacturing method includes other well-known steps (oxidation, film formation, vapor deposition, doping, planarization, etching, resist peeling, dicing, bonding, packaging, and the like). The method of manufacturing an article according to the present embodiment is advantageous in at least one of the performance, quality, productivity, and production cost of the article, as compared with the conventional method.

以上、本発明の好ましい実施形態について説明したが、本発明はこれらの実施形態に限定されないことはいうまでもなく、その要旨の範囲内で種々の変形および変更が可能である。   Although the preferred embodiments of the present invention have been described above, it goes without saying that the present invention is not limited to these embodiments, and various modifications and changes can be made within the scope of the gist.

１１：多面光学部材、１２：凹面鏡、１３：凸面鏡、１４：光軸、１６：支持部材、２０：調整機構、２１：第１案内部、２２：第２案内部、２３：第３案内部、 11: polyhedral optical member, 12: concave mirror, 13: convex mirror, 14: optical axis, 16: support member, 20: adjusting mechanism, 21: first guide portion, 22: second guide portion, 23: third guide portion,

Claims (12)

光学素子の位置を調整する調整機構を備えた光学装置であって、
前記調整機構は、
前記光学素子の光軸に垂直な面内における第１方向に、前記光学素子の移動を案内する第１案内部と、
前記面内において前記第１方向と異なる第２方向に、前記光学素子の移動を案内する第２案内部と、
前記面および前記光軸と交差する第３方向に、前記光学素子の移動を案内する第３案内部と、
を含むことを特徴とする光学装置。 An optical device having an adjustment mechanism for adjusting the position of the optical element,
The adjustment mechanism includes:
A first guide unit that guides the movement of the optical element in a first direction in a plane perpendicular to the optical axis of the optical element;
A second guide unit for guiding the movement of the optical element in a second direction different from the first direction in the plane;
A third guide unit that guides the movement of the optical element in a third direction that intersects the surface and the optical axis;
An optical device, comprising: 前記光学素子を支持する支持部材を更に含み、
前記調整機構は、前記支持部材と前記光学素子との間に設けられている、ことを特徴とする請求項１に記載の光学装置。 Further comprising a support member for supporting the optical element,
The optical device according to claim 1, wherein the adjustment mechanism is provided between the support member and the optical element. 前記第１案内部、前記第２案内部、および前記第３案内部は、前記光学素子の光軸方向に沿って直列に配列されている、ことを特徴とする請求項１又は２に記載の光学装置。   The said 1st guide part, the said 2nd guide part, and the said 3rd guide part are serially arranged along the optical axis direction of the said optical element, The Claims 1 or 2 characterized by the above-mentioned. Optical device. 前記面と前記第３方向との間の角度は、０．６度以上かつ３０度以下の範囲内である、ことを特徴とする請求項１乃至３のいずれか１項に記載の光学装置。   4. The optical device according to claim 1, wherein an angle between the surface and the third direction is in a range from 0.6 degrees to 30 degrees. 5. 前記第１案内部、前記第２案内部、および前記第３案内部はそれぞれ、前記光学素子の姿勢を維持しながら、前記光学素子の並進移動を案内するように構成されている、ことを特徴とする請求項１乃至４のいずれか１項に記載の光学装置。   The first guide section, the second guide section, and the third guide section are each configured to guide the translation of the optical element while maintaining the attitude of the optical element. The optical device according to any one of claims 1 to 4, wherein 前記調整機構は、前記第３案内部で前記光学素子の移動を案内したときの前記第１方向の移動成分を、前記第１案内部で案内される前記光学素子の移動によって補正可能に構成されている、ことを特徴とする請求項１乃至５のいずれか１項に記載の光学装置。   The adjustment mechanism is configured to be able to correct a movement component in the first direction when the movement of the optical element is guided by the third guide section by the movement of the optical element guided by the first guide section. The optical device according to claim 1, wherein: 前記調整機構は、前記第３案内部で前記光学素子の移動を案内したときの前記第２方向の移動成分を、前記第２案内部で案内される前記光学素子の移動によって補正可能に構成されている、ことを特徴とする請求項１乃至６のいずれか１項に記載の光学装置。   The adjustment mechanism is configured to be capable of correcting a movement component in the second direction when the movement of the optical element is guided by the third guide section by movement of the optical element guided by the second guide section. The optical device according to claim 1, wherein: 前記調整機構は、前記第１案内部に沿って前記光学素子を駆動する第１駆動部と、前記第２案内部に沿って前記光学素子を駆動する第２駆動部と、前記第３案内部に沿って前記光学素子を駆動する第３駆動部とを含み、
前記光学装置は、前記光学装置の位置の目標調整量に基づいて、前記第１駆動部、前記第２駆動部、および前記第３駆動部を制御する制御部を更に含む、ことを特徴とする請求項１乃至７のいずれか１項に記載の光学装置。 The adjustment mechanism includes a first drive unit that drives the optical element along the first guide unit, a second drive unit that drives the optical element along the second guide unit, and the third guide unit. And a third drive unit that drives the optical element along
The optical device further includes a control unit that controls the first drive unit, the second drive unit, and the third drive unit based on a target adjustment amount of the position of the optical device. The optical device according to claim 1. マスクのパターン像を基板上に投影する投影光学系であって、
光の反射面を有する光学素子と、
前記光学素子の位置を調整する調整機構を備えた、請求項１乃至８のいずれか１項に記載の光学装置と、
を含むことを特徴とする投影光学系。 A projection optical system for projecting a mask pattern image onto a substrate,
An optical element having a light reflecting surface,
The optical device according to claim 1, further comprising: an adjustment mechanism configured to adjust a position of the optical element.
A projection optical system comprising: 前記投影光学系は、凹面鏡および凸面鏡を含み、
前記調整機構は、前記光学素子として前記凸面鏡の位置を調整する、ことを特徴とする請求項９に記載の投影光学系。 The projection optical system includes a concave mirror and a convex mirror,
The projection optical system according to claim 9, wherein the adjustment mechanism adjusts a position of the convex mirror as the optical element. 基板を露光する露光装置であって、
マスクを照明する照明光学系と、
前記マスクのパターン像を前記基板上に投影する、請求項９又は１０に記載の投影光学系と、
を含むことを特徴とする露光装置。 An exposure apparatus for exposing a substrate, comprising:
An illumination optical system for illuminating the mask,
The projection optical system according to claim 9 or 10, wherein the pattern image of the mask is projected onto the substrate.
An exposure apparatus comprising: 請求項１１に記載の露光装置を用いて基板を露光する工程と、
前記工程で露光を行われた前記基板を現像する工程と、を含み、
現像された前記基板から物品を製造することを特徴とする物品の製造方法。 Exposing a substrate using the exposure apparatus according to claim 11,
Developing the substrate that has been exposed in the step,
An article manufacturing method, comprising manufacturing an article from the developed substrate.
JP2018138013A 2018-07-23 2018-07-23 Manufacturing methods for optical equipment, projection optics, exposure equipment, and articles Active JP7075302B2 (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114527579A (en) * 2022-03-16 2022-05-24 苏州凌云光工业智能技术有限公司 Optical machine adjusting device

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06226570A (en) * 1993-02-02 1994-08-16 Canon Inc Parallel moving device and lens moving device of exposure device using the same
JPH0735963A (en) * 1993-07-21 1995-02-07 Nikon Corp Position adjusting device for optical device
JPH07307270A (en) * 1994-05-13 1995-11-21 Canon Inc Projection magnification adjusting device and projection exposure device
JP2016109741A (en) * 2014-12-02 2016-06-20 キヤノン株式会社 Projection optical system, exposure apparatus, and method for producing device

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007256703A (en) 2006-03-24 2007-10-04 Nikon Corp Adjustment method, lens barrel manufactured using the adjustment method, and camera having the lens barrel
JP2013219089A (en) 2012-04-04 2013-10-24 Canon Inc Optical system, exposure apparatus and device manufacturing method
JP6226570B2 (en) 2013-06-03 2017-11-08 三菱電機株式会社 Switchgear

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06226570A (en) * 1993-02-02 1994-08-16 Canon Inc Parallel moving device and lens moving device of exposure device using the same
JPH0735963A (en) * 1993-07-21 1995-02-07 Nikon Corp Position adjusting device for optical device
JPH07307270A (en) * 1994-05-13 1995-11-21 Canon Inc Projection magnification adjusting device and projection exposure device
JP2016109741A (en) * 2014-12-02 2016-06-20 キヤノン株式会社 Projection optical system, exposure apparatus, and method for producing device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114527579A (en) * 2022-03-16 2022-05-24 苏州凌云光工业智能技术有限公司 Optical machine adjusting device
CN114527579B (en) * 2022-03-16 2024-02-02 苏州凌云光工业智能技术有限公司 Light machine assembling and adjusting device

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