TW202036073A - Optical device, exposure device, and article manufacturing method wherein the optical device includes an optical component, a supporting mechanism, and an operating mechanism - Google Patents

Abstract

The present disclosure relates to an optical device, an exposure device, and an article manufacturing method. The optical device includes an optical component; a supporting mechanism having a supporting portion for supporting the optical component and a position restricting portion for restricting the position of the optical component in a first direction; and an operating mechanism for applying a force on the optical component in a second direction that is different from the first direction to operate the optical component. The operating mechanism includes a contact portion that contacts the optical component; an operation portion that moves the contact portion in the second direction; and a connection portion that connects the contact portion and the operation portion. The connection portion is configured to move the operation portion with respect to the contact portion in the first direction.

Description

光學裝置、曝光裝置以及物品製造方法Optical device, exposure device, and article manufacturing method

本發明關於光學裝置、曝光裝置以及物品製造方法。The present invention relates to an optical device, an exposure device, and an article manufacturing method.

在藉由支撐機構支撐如透鏡或者反射鏡的光學零件的光學裝置中，光學零件可能由於由其自重等發生的應力而變形。例如，在專利文獻1中，記載了在透鏡和透鏡設置部在多個點接觸的結構中，透鏡變形而光學特性可能惡化。 現有技術文獻 專利文獻 專利文獻1：日本特開2001-242364號公報In an optical device in which an optical component such as a lens or a mirror is supported by a supporting mechanism, the optical component may be deformed due to stress caused by its own weight or the like. For example, in Patent Document 1, it is described that in a configuration in which the lens and the lens installation portion are in contact at multiple points, the lens is deformed and the optical characteristics may deteriorate. Prior art literature Patent literature Patent Document 1: Japanese Patent Application Publication No. 2001-242364

[發明所欲解決的課題] 由於應力引起的光學零件的變形特別在如曝光裝置、大型望遠鏡那樣具有大型的光學零件的光學裝置中，可能對成像性能造成大的影響。另外，即使在具有小型的光學零件的光學裝置中，如果要求的成像性能高，則可能無法忽略由於應力引起的光學零件的變形。 本發明的目的在於提供一種對降低由於對光學零件作用的應力引起的影響有利的技術。 [解決課題的手段] 本發明的1個側面關於光學裝置，前述光學裝置具備：光學零件；支撐機構，具有支撐前述光學零件的支撐部及限制前述光學零件在第1方向上的位置的位置限制部；以及操作機構，用於在與前述第1方向不同的第2方向上對前述光學零件施加力，操作前述光學零件，前述操作機構包括：接觸部，與前述光學零件接觸；操作部，使前述接觸部在前述第2方向上移動；以及連結部，連結前述接觸部和前述操作部，前述連結部構成為能夠在前述第1方向上使前述操作部和前述接觸部相對地移動。 根據本發明，提供對降低由於對光學零件作用的應力引起的影響有利的技術。[The problem to be solved by the invention] Deformation of optical components due to stress may have a large impact on imaging performance, especially in optical devices having large optical components such as exposure devices and large telescopes. In addition, even in an optical device with small optical parts, if the required imaging performance is high, the deformation of the optical parts due to stress may not be ignored. The object of the present invention is to provide a technique that is advantageous in reducing the influence caused by the stress acting on the optical component. [Means to solve the problem] One aspect of the present invention relates to an optical device. The optical device includes: an optical component; a supporting mechanism having a supporting portion for supporting the optical component and a position restricting portion for restricting the position of the optical component in the first direction; and an operating mechanism, For applying force to the optical component in a second direction different from the first direction to operate the optical component, the operating mechanism includes: a contact portion to contact the optical component; an operating portion to make the contact portion in the first Moving in two directions; and a connecting portion connecting the contact portion and the operating portion, and the connecting portion is configured to be able to relatively move the operating portion and the contact portion in the first direction. According to the present invention, there is provided a technique advantageous for reducing the influence caused by the stress acting on the optical component.

以下，參照附圖，詳細說明實施方式。此外，以下的實施方式不限定權利要求書所關於的發明。在實施方式中記載了多個特徵，但這些多個特徵未必在發明中全部必需，另外，多個特徵也可以任意地組合。進而，在附圖中，對同一或者同樣的結構附加同一參照編號，省略重複的說明。 在圖1~圖6中，示意地示出本發明的第1實施方式的光學裝置100的結構。圖1是本發明的第1實施方式的光學裝置100的正面圖，圖2是圖1的A-A剖面圖，圖3是圖1的B-B剖面圖。光學裝置100可以具備1個光學零件111、支撐光學零件111的1個或者多個支撐機構130、以及用於操作光學零件111的1個或者多個操作機構140。在一個例子中，光學裝置100可以具備1個光學零件111、2個支撐機構130、以及2個操作機構140。在此，在將2個支撐機構130相互區分而說明的情況下，記載為支撐機構130a、130b，在不不相互區分它們的情況下，記載為支撐機構130。在簡單地說明為支撐機構130的情況下，支撐機構130的個數可以是1個或者多個。同樣地，在將2個操作機構140相互區分的情況下，記載為操作機構140a、140b，在不相互區分它們的情況下，記載為操作機構140。在簡單地說明為操作機構140的情況下，操作機構140的個數可以是1個或者多個。 支撐機構130可以具有支撐光學零件111的支撐部120、和限制光學零件111在第1方向202上的位置的位置限制部131、132。在此，還將支撐機構130a的支撐部120記載為支撐部120a，將支撐機構130b的支撐部120記載為支撐部120b。2個支撐機構130可以具有關於對稱軸110相互對稱的構造。藉由2個支撐機構130，光學零件111在第2方向203以及第3方向201上的位置可以被限制。第3方向可以是與第1方向202以及第2方向203這雙方不同的方向。在一個例子中，第1方向202、第2方向203以及第3方向201可以是相互成90度的角度。在其他觀點中，第1方向202、第2方向203以及第3方向201可以與XYZ正交坐標系中的X軸方向、Z軸方向、Y軸方向分別對應。 操作機構140可以為了對光學零件111在與第1方向202不同的第2方向203上施加力來操作光學零件111而設置。操作機構140例如可以是對光學零件111在第2方向203上施加力來驅動光學零件111的驅動機構。2個操作機構140可以具有關於對稱軸110相互對稱的構造。對稱軸110可以配置成通過光學零件111的中心。這樣的驅動機構可以藉由未圖示的控制部控制為執行後述應力降低動作。 操作機構140可以包括與光學零件111接觸的接觸部141、使接觸部141在第2方向203上移動的操作部142、以及連結接觸部141和操作部142的連結部145。藉由操作部142在第2方向203上移動，連結部145以及接觸部141也在第2方向203上移動，對光學零件111施加第2方向203的力。由此，光學零件111可以在第2方向203上被驅動。連結部145可以包括固定到操作部142的第1部分146、和固定到接觸部141的第2部分147。連結部145可以構成為能夠在第1方向使操作部142和接觸部141相對地移動。 操作機構140可以用於降低由對光學零件111作用的應力引起的影響(例如光學零件111的變形、或者由此引起的光學零件111的光學性能的變化)。光學零件111可以在使用狀態下藉由2個支撐機構130a、130b支撐。在藉由支撐機構130a、130b支撐光學零件111時，既可能有光學零件111最初接觸到支撐機構130a的支撐部120，接著接觸到支撐機構130b的支撐部120的情況，也可能有與此相反的情況。或者，在藉由支撐機構130的支撐部120支撐光學零件111時，既可能有光學零件111以光學零件111和支撐部120的接觸部位為中心而旋轉的情況，也可能有不旋轉的情況。這樣，利用支撐機構130的支撐部120的光學零件111的支撐的開始狀態各種各樣，不是一定的。因此，最終地對由支撐機構130支撐的光學零件111作用的應力、以及由於該應力引起的影響也各種各樣。因此，操作機構140可以用於降低由對光學零件111作用的應力引起的影響(例如光學零件111的變形、或者由此引起的光學零件111的光學性能的變化)。 在圖4的(a)~圖4的(e)中，例示了用於降低由對光學零件111作用的應力引起的影響的操作(以下還稱為應力降低操作)。操作機構140a、140b構成為能夠變更光學零件111的狀態，該狀態如以下詳述，可以包括由支撐機構130支撐光學零件111的第1狀態、和由操作機構140支撐光學零件111的第2狀態。在光學零件111的設置時，藉由以從第1狀態經由第2狀態轉移到第1狀態的方式決定設置規則，能夠使對光學零件111作用的應力成為恒定。例如，在出廠前的調整時依照設置規則設置光學零件111之後調整光學零件111，之後，在出廠後的調整時也依照設置規則設置光學零件111之後調整光學零件111是有用的。根據這樣的方法，能夠使在出廠前的調整時對光學零件111作用的應力和在出廠後的調整時對光學零件111作用的應力相等，所以能夠使出廠後的調整作業容易化。 以下，參照圖4的(a)~圖4的(e)，說明利用操作機構140的操作例。在圖4的(a)~圖4的(e)中，僅示出支撐機構130的構成要素中的支撐部120(120a、120b)。在圖4的(a)中，示出初始狀態。初始狀態與第1狀態相當。在初始狀態下，依賴於利用支撐機構130a、130b的光學零件111的支撐開始時的狀態的應力在光學零件111中可能存在。或者，在初始狀態下，在由支撐機構130a、130b支撐光學零件111的狀態下施加到光學裝置100的衝擊、振動(例如搬運時的衝擊、振動)所引起的應力在光學零件111中可能存在。 首先，如圖4的(b)所示，可以以使光學零件111離開支撐機構130a的支撐部120a的方式，操作操作機構140a。在該狀態下，藉由支撐機構130b的支撐部120b以及操作機構140a支撐光學零件111。 接下來，如圖4的(c)所示，可以藉由操作機構140b，以使光學零件111離開支撐機構130b的支撐部120b的方式，操作操作機構140a。由此，成為藉由操作機構140a、140b支撐光學零件111的第2狀態。 接下來，如圖4的(d)所示，可以以使支撐機構130a的支撐部120a和光學零件111接觸的方式，操作操作機構140a。在該狀態下，藉由支撐機構130b的支撐部120b以及操作機構140b支撐光學零件111。接下來，如圖4的(e)所示，可以以使支撐機構130b的支撐部120b和光學零件111接觸的方式，操作操作機構140b。由此，成為藉由支撐機構130a、130b的支撐部120a、120b支撐光學零件111的第1狀態。即，在圖4的(a)~圖4的(e)的例子中，光學零件111的狀態從第1狀態經由第2狀態成為第1狀態。 圖5是圖4的(b)的C-C剖面圖。操作機構140優選僅在第2方向203上移動，但現實中，可能由於操作機構140的加工誤差、裝配誤差、調整殘差等，如圖5例示，在第2方向203上的操作時在第1方向202上也移動。在操作部142在第1方向202上移動時，針對與操作部142連結的連結部145、與連結部145連結的接觸部141、以及光學零件111作用第1方向202上的操作力151、161、171。圖6是圖4的(b)的D-D剖面圖。光學零件111由於被支撐機構130限制第1方向202的位置，所以對光學零件111作用抵抗操作力171的反力172而光學零件111不移動。另外，接觸部141由於從光學零件111接受抵抗操作力161的反力而不移動。 連結部145可以包括第1部分146和第2部分147。第1部分146和第2部分147能夠在第1方向202的方向上相對地移動。在第1方向上使第1部分146相對於第2部分147相對地移動而所需的力(將其還稱為可動阻力)，係小於在光學零件111與接觸部141之間作用的靜止摩擦阻力。可動阻力是在第1方向上使操作部142相對於接觸部141相對地移動而所需的力。換言之，可動阻力是在第1方向上使操作部142和接觸部141相對地移動而所需的力。 第1部分146從操作部142接受操作力151，相對於第2部分147在第1方向202上相對地移動。第2部分147伴隨第1部146移動，藉由上述可動阻力的反作用，在第1方向202上接受操作力152，但由於從接觸部141接受抵抗操作力152的反力而不移動。 如以上前述，伴隨操作部142在第1方向202上移動，第1部分146在第1方向202上移動。關於第2部分147、接觸部141以及光學零件111，由於可動阻力的反作用引起的力、和來自支撐機構130的反力所引起的力在內部平衡，不移動而留在原來的位置。此時，對光學零件111作用的操作力171以及反力172的大小等於可動阻力的大小。 在由於對光學零件111作用的操作力171以及反力172而對光學零件111作用應力時，存在在光學零件111中發生歪斜，光學零件111的光學性能降低的可能性。因此，優選將操作力171以及反力172抑制得較小。操作機構140包括連結部145，藉由其減小可動阻力，從而能夠將操作力171以及反力172抑制得較小。作為結果，對光學零件111作用的應力被抑制得較小，在光學零件111中發生的歪斜減少，光學零件111的光學性能降低被抑制。 在圖7中，示出連結部145的第1結構例。連結部145可以包括固定到操作部142的第1部分246、和固定到接觸部141的第2部分247。第1部分246能夠相對於第2部分247相對地移動。連結部145可以包括能夠在第1方向202使操作部142和接觸部141相對地移動的彈性部。在一個例子中，第1部分246可以由這樣的彈性部構成。在另一例子中，第2部分247可以由這樣的彈性部構成。在又一例子中，第1部分246以及第2部分247可以由這樣的彈性部構成。 在圖7中，示出第1部分246由彈性部構成的例子。第1部分246變形時的阻力(將其還稱為變形阻力)的大小可以成為第1部分246從操作部142接受的操作力251的大小以下。第1部分246從操作部142接受操作力251，在第1方向202變形。第2部分247伴隨第1部分246變形，由於變形阻力的反作用，在第1方向202上接受操作力252，但由於從接觸部141接受抵抗操作力252的反力而不移動。關於接觸部141以及光學零件111，由於變形阻力的反作用引起的力、和來自支撐機構130的反力所引起的力在內部平衡，不移動而留在原來的位置。 此時，對光學零件111作用的操作力271的大小、和來自支撐機構130的反力的大小等於變形阻力的大小。因此，藉由減小變形阻力，能夠將操作力271以及來自支撐機構130的反力抑制得較小。作為結果，對光學零件111作用的應力被抑制得較小，在光學零件111中發生的歪斜減少，光學零件111的光學性能降低被抑制。 在圖8的(a)~圖8的(c)中，示出支撐機構130的其他結構例以及動作例。支撐機構130可以具有支撐光學零件111的支撐部120、限制光學零件111在第1方向202上的位置的位置限制部131、132、以及使位置限制部131、132的位置分別變更的變更機構133、135。在圖8的(a)~圖8的(c)中，示出使在光學零件111中的與位置限制部131、132抵接的區域中作用的應力成為預定的應力狀態，按壓光學零件111而在第1方向202定位的工序。 圖8的(a)是圖4的(c)的E-E剖面圖。在圖8的(b)中，示出從圖8的(a)的狀態，藉由變更機構133、135將位置限制部131、132的位置變更為離開光學零件111的位置的狀態。藉由將位置限制部131、132的位置變更為離開光學零件111的位置，由於位置限制部131、132和光學零件111的接觸對光學零件111作用的應力被去除。此時，光學零件111有時由於去除該應力之前的應力狀態而在第1方向202上移動。在圖8的(b)中，例示光學零件111移動到位置限制部132側的狀態。 在圖8的(c)中，示出從圖8的(b)的狀態，藉由變更機構133、135將位置限制部131、132的位置變更為位置限制部131、132與光學零件111抵接的位置，光學零件111被配置到預定位置的狀態。在該例子中，變更位置限制部132的位置，以使在位置限制部132與光學零件111抵接之後，從虛線所示的位置(圖8的(b)的位置)至實線所示的預定位置為止在按壓光學零件111的同時使光學零件111移動。 在藉由變更機構133、135變更位置限制部131、132的位置後，與光學零件111接觸的接觸部141、以及與接觸部141連結的第2部分147與光學零件111一起移動。另一方面，第1部146和操作部142的摩擦阻力對第1部分146作用，所以第1部分146不移動。藉由位置限制部132按壓光學零件111的按壓力181等於第2部分147相對於第1部分146相對地移動時的阻力(將其還稱為按壓阻力)的大小。 在由於對光學零件111作用的按壓力181而對光學零件111作用應力時，存在在光學零件111中發生歪斜，光學零件111的光學性能降低的可能性，所以優選將按壓力181抑制得較小。操作機構140包括能夠使操作部142和接觸部141相對地移動的連結部145，由此能夠減小按壓阻力，能夠將按壓力181抑制得較小。作為結果，對光學零件111作用的應力被抑制得較小，在光學零件111中發生的歪斜減少，光學零件111的光學性能降低被抑制。 在圖9中，示出作為第1實施方式的第1實施例的光學裝置300的正面圖。光學裝置300可以具備作為光學零件的反射鏡311、支撐反射鏡311的支撐機構330a、330b、以及操作反射鏡311的操作機構340a、340b。光學裝置300進而可以具備固定有支撐機構330a、330b以及操作機構340a、340b的鏡筒301。 圖10是圖9的F-F剖面圖。支撐機構330a可以包括：金屬體331、332，具有用於在與反射鏡311的光軸平行的第1方向402限制反射鏡311的位置的突起；以及帶彈性體的金屬體320，在表面具有用於支撐反射鏡311的重量的彈性片材。支撐機構330b具有與支撐機構330a相同的結構。支撐機構330a、330b可以相對光學裝置300的對稱軸310對稱地配置。對稱軸310可以配置成藉由反射鏡311的中心(光軸)。 圖11是圖9的G-G剖面圖。操作機構340可以包括與反射鏡311接觸的帶彈性體的金屬體341、能夠在與重力方向平行的第2方向203上移動的螺栓(操作部)342、以及連結帶彈性體的金屬體341和螺栓342的連結部345。螺栓342在與鏡筒301螺絲卡合而使螺栓342旋轉時，能夠使連結部345在第203方向上移動。在連結部345在第2方向203上移動時，與連結部345連結的帶彈性體的金屬體341也在第2方向203上移動。 連結部345可以是具有在第1方向202具有自由度的線性滑軌的構造體。連結部345例如可以包括由金屬板348和滑軌343的結合體構成的滑軌部346、以及由滑架344和金屬板349的結合體構成的滑架部347。在一個例子中，該線性滑軌的動摩擦係數在荷重比例為0.1時是0.003，在反射鏡311、帶彈性體的金屬體341的重量作用的狀態下是0.02。在光學裝置300中，藉由經由圖4的(a)至圖4的(e)的一連串的工序，對反射鏡311作用的應力也可以成為基於該工序的預定的應力狀態。 圖12是實施圖4的(b)的工序的曝光裝置300的D-D剖面圖。在此，螺栓342、連結部345以及帶彈性體的金屬體341除了在第2方向203上移動以外，由於加工誤差、裝配誤差、調整誤差等在第1方向202上也可能稍微移動。因此，在圖12中，為便於說明，示出螺栓342在第2方向203上移動的同時在第1方向202上也移動的狀態。 在螺栓342在第1方向202上移動時，針對滑軌部346、滑架部347、帶彈性體的金屬體341以及反射鏡311，在第1方向202作用操作力351、352、361、371。反射鏡311由於被支撐機構320、330限制第1方向202上的位置，所以對反射鏡311作用抵抗操作力371的反力而反射鏡311不移動。帶彈性體的金屬體341由於從反射鏡311接受抵抗操作力361的反力而不移動。滑軌部346從螺栓342接受操作力351，相對於滑架部347，在第1方向202相對地移動。滑架部347伴隨滑軌部346移動，由於前述線性滑軌的阻力的反作用而在第1方向202上接受操作力352，但由於從帶彈性體的金屬體341接受抵抗操作力352的反力而不移動。 如以上前述，伴隨螺栓342在第1方向202上移動，滑軌部346在第1方向202上移動。關於滑架部347、帶彈性體的金屬體341以及反射鏡311，由於前述線性滑軌的阻力的反作用引起的力、和來自支撐機構320、330的反力所引起的力在內部平衡，不移動而留在原來的位置。此時，對反射鏡311作用的操作力371、以及來自支撐機構320、330的反力的大小等於前述線性滑軌的阻力的大小。 在一個例子中，前述線性滑軌的阻力在將藉由反射鏡311和帶彈性體的金屬體341對前述線性滑軌作用的重量之和設為Mg時成為0.02Mg。其是不具有連結部345的結構、即螺栓342和帶彈性體的金屬體341直接結合的結構的10分之1的大小(螺栓342和帶彈性體的金屬體341的動摩擦係數為0.2的情況)。 在由於對反射鏡311作用的操作力371以及來自支撐機構320、330的反力而對反射鏡311作用應力時，存在在反射鏡311中發生歪斜，反射鏡311的光學性能降低的可能性。因此，優選將操作力371以及來自支撐機構320、330的反力抑制得較小。操作機構340包括能夠使操作部342和接觸部341相對地移動的連結部345，由此能夠減小前述線性滑軌的動摩擦係數，能夠將操作力371以及來自支撐機構330的反力372抑制得較小。作為結果，對反射鏡311作用的應力被抑制得較小，在反射鏡311中發生的歪斜減少，反射鏡311的光學性能降低被抑制。 在圖13中，示出作為第1實施方式的第2實施例的光學裝置500的正面圖。光學裝置500可以具備作為光學零件的反射鏡511、支撐反射鏡511的支撐機構530a、530b、以及操作反射鏡511的操作機構540a、540b。光學裝置500進而可以具備固定有支撐機構530a、530b以及操作機構540a、540b的鏡筒501。支撐機構530a、530b的結構可以與光學裝置300的支撐機構330a、330b相同。 圖14是操作機構540的立體圖。圖15是圖13的H-H剖面圖。操作機構540可以包括：帶彈性體的金屬體(接觸部)541，在表面具有用於支撐反射鏡511的重量的彈性片材；以及線性致動器542，具有在與重力方向平行的第2方向上驅動可動部的步進馬達。金屬體(接觸部)541和線性致動器542藉由具有板簧543以及金屬體546、547、548的連結部相互連結。線性致動器542被固定到鏡筒501。在驅動線性致動器542時，能夠使連結部545在第2方向203上移動。伴隨連結部545的移動，帶彈性體的金屬體541也在第2方向603上移動。在光學裝置500中，藉由經由圖4的(a)至圖4的(e)的一連串的工序，對反射鏡511作用的應力也成為基於該工序的預定的應力狀態。 圖16是實施圖4的(b)的工序的第2實施例的光學裝置500的D-D剖面圖。在此，線性致動器542的可動部、連結部545、帶彈性體的金屬體541除了在第2方向203上移動以外，由於加工誤差、裝配誤差、調整誤差等在第1方向202上也可能移動。因此，在圖16中，為便於說明，示出線性致動器542除了在驅動其可動部的第2方向203以外，在第1方向202上也具有驅動分量的狀態。 在線性致動器542在第2方向202上驅動其可動部時，針對板簧543、金屬體547、帶彈性體的金屬體541、反射鏡511作用第2方向202的操作力551、552、561、571。反射鏡511由於被支撐機構520、530限制第1方向202上的位置，所以對反射鏡511作用抵抗操作力571的反力而反射鏡511不移動。帶彈性體的金屬體541由於從反射鏡511接受抵抗操作力561的反力而不移動。板簧543從線性致動器542接受操作力551，在第1方向202變形。金屬體547伴隨板簧543變形，藉由板簧543的彈性力在第2方向202上接受操作力552，但由於從帶彈性體的金屬體541接受抵抗操作力552的反力而不移動。 如以上所述，伴隨線性致動器542使其可動部在第1方向202上移動，板簧543在第1方向202變形。關於金屬體547、帶彈性體的金屬體541、反射鏡511，因為板簧543的彈性力、和來自支撐機構520、530的反力所引起的力在內部平衡，不移動而留在原來的位置。 此時，對反射鏡511作用的操作力571、反力的大小等於板簧543的彈性力的大小。 在一個例子中，能夠使板簧543的與第1方向202有關的最大變形量成為0.10mm，使板簧543的變形部的尺寸成為80mm×67mm，使厚度成為1.6mm，使材質成為比重為7.9、楊氏模量為186GPa的彈簧用不銹鋼SUS304。在該情況下，板簧543的彈性力是約10N。 在不具有連結部545的結構、即線性致動器542和帶彈性體的金屬體541直接結合的結構中，對反射鏡511作用的操作力571在以下敘述的條件下是1000N。 ＜條件＞反射鏡511和帶彈性體的金屬體541對線性致動器542作用的重量之和是500kgf，線性致動器542和帶彈性體的金屬體541的動摩擦係數是0.2。 在由於對反射鏡511作用的操作力571、來自支撐機構520、530的反力而對反射鏡511作用應力時，存在在反射鏡511中發生歪斜，反射鏡511的光學性能降低的可能性。因此，優選將操作力571以及反力572抑制得較小。操作機構540包括能夠使線性致動器542和金屬體541相對地移動的連結部545，由此能夠將操作力571、來自支撐機構520、530的反力抑制得較小。作為結果，對反射鏡511作用的應力被抑制得較小，在反射鏡511中發生的歪斜減少，反射鏡511的光學性能降低被抑制。 在圖17中，示出作為第1實施方式的第3實施例的光學裝置700的正面圖。光學裝置700可以具備作為光學零件的反射鏡711、支撐反射鏡711的支撐機構730a、730b、以及操作反射鏡711的操作機構740a、740b。光學裝置700進而可以具備固定有支撐機構730a、730b以及操作機構740a、740b的鏡筒701。 圖18是圖17的I-I剖面圖。支撐機構730a可以包括作為在與反射鏡711的光軸平行的第1方向202上驅動位置限制部731、732的變更機構的氣缸734、736。支撐機構730a進而可以包括用於將氣缸734、736固定到鏡筒701的金屬制的外殼733、735。支撐機構730b可以具有與支撐機構730a同樣的結構。支撐機構730a、730b可以相對光學裝置700的對稱軸710對稱地配置。對稱軸710可以配置成通過反射鏡711的中心(光軸)。操作機構740a、740b可以具有與第2實施例的操作機構540a、540b同樣的結構。在光學裝置700中，藉由經由圖4的(a)至圖4的(e)的一連串的工序，對反射鏡711作用的應力也成為基於該工序的預定的應力狀態。 在圖19的(a)~圖19的(c)中，示出使對反射鏡711中的與位置限制部731、732抵接的區域作用的應力成為預定的應力狀態，按壓反射鏡711而在第1方向202定位的工序。圖19的(a)是光學裝置700的圖4的(c)的工序的E-E剖面圖。圖19的(b)示出從圖19的(a)的狀態，藉由氣缸734、736將位置限制部731、732的位置變更為離開反射鏡711的位置的狀態。藉由將位置限制部131、132的位置變更為離開反射鏡711的位置，由於位置限制部131、132和反射鏡711的接觸對反射鏡711作用的應力被去除。 在圖19的(c)中，示出從圖19的(b)的狀態，藉由氣缸734、736將位置限制部131、132的位置變更為位置限制部131、132與反射鏡711抵接的位置，將反射鏡711配置到預定的位置的狀態。在藉由氣缸734、736驅動位置限制部131、132並按壓反射鏡711時，支撐反射鏡711的帶彈性體的金屬體541、與帶彈性體的金屬體541連結的金屬體547與反射鏡711一起移動。另一方面，板簧543伴隨金屬體547的移動而變形。氣缸734、736按壓反射鏡711的按壓力781等於板簧543的彈性力。 在一個例子中，板簧543的彈性力在使用在第2實施例中說明的尺寸、材質、最大變形量的板簧543時為約10N。在不具有連結部545的結構、即線性致動器542和帶彈性體的金屬體541直接結合的結構中，為了按壓並驅動反射鏡711而所需的按壓力781在以下敘述的條件下是1000N。 ＜條件＞反射鏡711和帶彈性體的金屬體541對線性致動器542作用的重量之和是500kgf，線性致動器542和帶彈性體的金屬體541的動摩擦係數是0.2。 在由於對反射鏡711作用的按壓力781而對反射鏡711作用應力時，存在在反射鏡711中發生歪斜，反射鏡711的光學性能降低的可能性。因此，優選將按壓力781抑制得較小。操作機構740包括能夠使線性致動器542和金屬體541相對地移動的連結部545，由此能夠將按壓力781抑制得較小。作為結果，對反射鏡711作用的應力被抑制得較小，在反射鏡711中發生的歪斜減少，反射鏡711的光學性能劣化被抑制。 圖20是本發明的第2實施方式的曝光裝置1000的側面圖。曝光裝置1000可以具備照明裝置1100、曝光圖案形成裝置1200、投影光學裝置(投影光學系統)1300、載置台裝置1400、以及電氣控制裝置1500。照明裝置1100、曝光圖案形成裝置1200、投影光學裝置1300、載置台裝置1400以及電氣控制裝置1500可以收容於腔1600。以第1實施方式的光學裝置100等為代表的光學裝置例如可以構成投影光學裝置1300的一部分。 電氣控制裝置1500進行用於將照明裝置1100、曝光圖案形成裝置1200、投影光學裝置1300、載置台裝置1400、腔1600的內部空間的溫度保持為預定的溫度範圍的電氣控制。另外，在曝光時，進行用於使照明裝置1100、曝光圖案形成裝置1200、投影光學裝置1300、載置台裝置1400的操作部連動的電氣控制。 由照明裝置1100生成的曝光光被照射到曝光圖案形成裝置1200，形成曝光圖案。曝光圖案藉由投影光學裝置1300被投影到在載置台裝置1400的載置台上搭載的基板(晶圓或者玻璃板)。 構成光學裝置100的光學零件111，係作為構成投影光學裝置1300的光學系統的一部分，大幅影響使由曝光圖案形成裝置形成的曝光圖案在晶圓、玻璃板上成像時的成像性能。因此，在應力對光學零件111作用時，存在在光學零件111中發生歪斜，前述成像性能降低的可能性。在光學裝置100中，對光學零件111作用的應力被抑制得較小，所以在光學零件111中發生的歪斜降低。作為結果，能夠將光學零件111的成像性能的劣化抑制得較小，能夠提供具有良好的成像性能的曝光裝置1000。 圖21是本發明的第3實施方式的曝光裝置2000的側面圖。曝光裝置2000可以具備照明單元2100、曝光光罩單元2200、投影單元(投影光學系統)2300、載置台單元2400以及電氣控制單元2500。照明單元2100、曝光光罩單元2200、投影單元2300、載置台單元2400以及電氣控制單元2500可以收容於腔2600。以第1實施方式的光學裝置300等為代表的光學裝置可以構成投影單元2300的一部分。 電氣控制單元2500進行用於將照明單元2100、曝光光罩單元2200、投影單元2300、載置台單元2400、腔2600的內部空間的溫度保持為預定的溫度範圍的電氣控制。具體而言，電氣控制單元2500可以根據配置於各部件的內部空間的溫度感測器的值，對向各部件送氣的清潔的乾燥空氣的溫度進行回饋控制。 在進行曝光時，需要使以下敘述的各單元的動作同步。照明單元的動作是照射照明光的時序和照射時間。曝光光罩單元2200的動作是對構成曝光光罩單元2200的曝光光罩進行掃描的時序和掃描的速度。投影單元2300的動作是在構成投影單元2300的投影光學系統中，伴隨驅動的驅動光學系統的時序和驅動的速度。載置台單元2400的動作是對構成載置台單元2400的載置台進行驅動的時序和驅動的速度。電氣控制單元2500進行用於使上述各單元的動作同步的電氣控制。 由照明單元2100生成的曝光光被照射到構成光罩曝光光罩單元2200的曝光光罩2201，透射前述曝光光罩，從而形成以曝光光罩為物面的曝光圖案。曝光圖案藉由投影單元2300被投影到在載置台單元2400的載置台上搭載的玻璃板2401。 構成光學裝置300的反射鏡311，係作為構成投影單元2300的投影光學系統2301的一部分，大幅影響使透射曝光光罩2201的曝光光在塗敷到玻璃板2401的抗蝕劑上成像時的成像性能。因此，在應力對反射鏡311作用時，存在在反射鏡311中發生歪斜，前述成像性能劣化的可能性。在光學裝置300中，對反射鏡311作用的應力被抑制得較小，所以在反射鏡311中發生的歪斜降低。作為結果，能夠將反射鏡311的成像性能的劣化抑制得較小，能夠提供具有良好的成像性能的曝光裝置2000。 以下，說明使用上述曝光裝置製造物品(半導體IC元件、液晶顯示元件、MEMS等)的物品製造方法。可以經由使用上述曝光裝置對塗敷有感光劑的基板(晶圓、玻璃基板等)進行曝光的工序、使該基板的感光劑顯影而形成圖案的工序、以及使用該圖案來處理基板的工序，根據該處理後的基板製造物品。其他公知的工序包括蝕刻、抗蝕劑剝離、切割、接合、封裝等。根據本物品製造方法，能夠製造品質比以往高的物品。 發明不限制於上述實施方式，能夠不脫離發明的精神以及範圍而進行各種變更以及變形。因此，為了公開發明的範圍而添附申請專利範圍。Hereinafter, embodiments will be described in detail with reference to the drawings. In addition, the following embodiment does not limit the invention concerning a claim. Although a plurality of features are described in the embodiment, all of these features are not necessarily required in the invention, and a plurality of features may be combined arbitrarily. Furthermore, in the drawings, the same reference numerals are attached to the same or similar structures, and repeated descriptions are omitted. 1 to 6 schematically show the structure of the optical device 100 according to the first embodiment of the present invention. Fig. 1 is a front view of an optical device 100 according to a first embodiment of the present invention, Fig. 2 is a cross-sectional view of A-A in Fig. 1, and Fig. 3 is a cross-sectional view of B-B of Fig. 1. The optical device 100 may include one optical component 111, one or more supporting mechanisms 130 for supporting the optical component 111, and one or more operating mechanisms 140 for operating the optical component 111. In one example, the optical device 100 may include one optical component 111, two supporting mechanisms 130, and two operating mechanisms 140. Here, when two supporting mechanisms 130 are distinguished and described from each other, they are described as supporting mechanisms 130a and 130b, and unless they are distinguished from each other, they are described as supporting mechanism 130. In the case of simply describing the support mechanism 130, the number of the support mechanism 130 may be one or more. Similarly, when two operating mechanisms 140 are distinguished from each other, they are described as operating mechanisms 140a and 140b, and when they are not distinguished from each other, they are described as operating mechanism 140. In the case of simply describing the operating mechanism 140, the number of operating mechanisms 140 may be one or more. The supporting mechanism 130 may have a supporting portion 120 that supports the optical component 111 and position restricting portions 131 and 132 that restrict the position of the optical component 111 in the first direction 202. Here, the supporting portion 120 of the supporting mechanism 130a is also referred to as the supporting portion 120a, and the supporting portion 120 of the supporting mechanism 130b is referred to as the supporting portion 120b. The two supporting mechanisms 130 may have a mutually symmetrical structure about the symmetry axis 110. With the two supporting mechanisms 130, the position of the optical component 111 in the second direction 203 and the third direction 201 can be restricted. The third direction may be a direction different from both the first direction 202 and the second direction 203. In an example, the first direction 202, the second direction 203, and the third direction 201 may be at an angle of 90 degrees to each other. In another viewpoint, the first direction 202, the second direction 203, and the third direction 201 may respectively correspond to the X-axis direction, the Z-axis direction, and the Y-axis direction in the XYZ orthogonal coordinate system. The operating mechanism 140 may be provided to apply a force to the optical component 111 in a second direction 203 different from the first direction 202 to operate the optical component 111. The operating mechanism 140 may be, for example, a driving mechanism that applies a force to the optical component 111 in the second direction 203 to drive the optical component 111. The two operating mechanisms 140 may have a mutually symmetrical structure about the symmetry axis 110. The symmetry axis 110 may be configured to pass through the center of the optical part 111. Such a driving mechanism can be controlled by a control unit (not shown) to perform a stress reduction operation described later. The operating mechanism 140 may include a contact portion 141 that contacts the optical component 111, an operation portion 142 that moves the contact portion 141 in the second direction 203, and a connection portion 145 that connects the contact portion 141 and the operation portion 142. As the operation portion 142 moves in the second direction 203, the connecting portion 145 and the contact portion 141 also move in the second direction 203, and a force in the second direction 203 is applied to the optical component 111. Thereby, the optical component 111 can be driven in the second direction 203. The coupling part 145 may include a first part 146 fixed to the operation part 142 and a second part 147 fixed to the contact part 141. The connecting portion 145 may be configured to be able to relatively move the operation portion 142 and the contact portion 141 in the first direction. The operating mechanism 140 can be used to reduce the influence caused by the stress acting on the optical component 111 (for example, the deformation of the optical component 111 or the change in the optical performance of the optical component 111 caused thereby). The optical component 111 can be supported by two supporting mechanisms 130a and 130b in the use state. When the optical component 111 is supported by the supporting mechanisms 130a and 130b, it is possible that the optical component 111 first touches the supporting portion 120 of the supporting mechanism 130a and then touches the supporting portion 120 of the supporting mechanism 130b, or vice versa. Case. Alternatively, when the optical component 111 is supported by the supporting portion 120 of the supporting mechanism 130, the optical component 111 may rotate around the contact portion of the optical component 111 and the supporting portion 120, or may not rotate. In this way, the starting state of the support of the optical component 111 by the support portion 120 of the support mechanism 130 is various and not always constant. Therefore, the stress that ultimately acts on the optical component 111 supported by the support mechanism 130 and the influence caused by the stress are also various. Therefore, the operating mechanism 140 can be used to reduce the influence caused by the stress acting on the optical component 111 (for example, the deformation of the optical component 111 or the change in the optical performance of the optical component 111 caused thereby). In FIGS. 4(a) to 4(e), an operation for reducing the influence caused by the stress acting on the optical component 111 (hereinafter also referred to as a stress reducing operation) is illustrated. The operating mechanisms 140a and 140b are configured to be able to change the state of the optical component 111. As described in detail below, the state may include a first state where the optical component 111 is supported by the support mechanism 130 and a second state where the optical component 111 is supported by the operating mechanism 140 . When the optical component 111 is installed, by determining the installation rule so as to transition from the first state to the first state through the second state, the stress acting on the optical component 111 can be made constant. For example, it is useful to adjust the optical component 111 after setting the optical component 111 according to the setting rule during the adjustment before the factory, and then adjust the optical component 111 after setting the optical component 111 according to the setting rule during the post-factory adjustment. According to such a method, the stress applied to the optical component 111 during the adjustment before shipment can be equal to the stress applied to the optical component 111 during the adjustment after shipment, so the adjustment work after shipment can be simplified. Hereinafter, with reference to FIG. 4(a) to FIG. 4(e), an operation example using the operating mechanism 140 will be described. In FIGS. 4(a) to 4(e), only the support portion 120 (120a, 120b) among the constituent elements of the support mechanism 130 is shown. In (a) of FIG. 4, the initial state is shown. The initial state is equivalent to the first state. In the initial state, a stress depending on the state when the support of the optical component 111 using the supporting mechanisms 130a and 130b is started may exist in the optical component 111. Or, in the initial state, stress caused by shock and vibration (for example, shock and vibration during transportation) applied to the optical device 100 while supporting the optical component 111 by the supporting mechanisms 130a and 130b may exist in the optical component 111 . First, as shown in FIG. 4(b), the operating mechanism 140a may be operated in such a manner that the optical component 111 is separated from the supporting portion 120a of the supporting mechanism 130a. In this state, the optical component 111 is supported by the supporting portion 120b of the supporting mechanism 130b and the operating mechanism 140a. Next, as shown in FIG. 4(c), the operating mechanism 140a can be operated by the operating mechanism 140b in such a manner that the optical component 111 is separated from the supporting portion 120b of the supporting mechanism 130b. As a result, it becomes a second state in which the optical component 111 is supported by the operating mechanisms 140a and 140b. Next, as shown in FIG. 4(d), the operating mechanism 140a may be operated in such a manner that the supporting portion 120a of the supporting mechanism 130a and the optical component 111 are brought into contact. In this state, the optical component 111 is supported by the supporting portion 120b of the supporting mechanism 130b and the operating mechanism 140b. Next, as shown in FIG. 4(e), the operating mechanism 140b may be operated in such a manner that the supporting portion 120b of the supporting mechanism 130b and the optical component 111 are brought into contact. Thereby, it becomes a 1st state which supports the optical component 111 by the support part 120a, 120b of the support mechanism 130a, 130b. That is, in the example of FIG. 4(a)-FIG. 4(e), the state of the optical component 111 becomes a 1st state from a 1st state via a 2nd state. Fig. 5 is a cross-sectional view taken along line C-C of Fig. 4(b). The operating mechanism 140 preferably only moves in the second direction 203, but in reality, it may be due to processing errors, assembly errors, adjustment residuals, etc., of the operating mechanism 140. As shown in FIG. 5, the operation in the second direction 203 is in the second direction. It also moves in the direction 202. When the operating portion 142 moves in the first direction 202, the operating forces 151 and 161 in the first direction 202 are applied to the connecting portion 145 connected to the operating portion 142, the contact portion 141 connected to the connecting portion 145, and the optical component 111. , 171. Fig. 6 is a cross-sectional view taken along the line D-D of Fig. 4(b). Since the position of the optical component 111 in the first direction 202 is restricted by the support mechanism 130, a reaction force 172 against the operating force 171 acts on the optical component 111, and the optical component 111 does not move. In addition, the contact portion 141 does not move because it receives a reaction force against the operating force 161 from the optical component 111. The connecting part 145 may include a first part 146 and a second part 147. The first part 146 and the second part 147 can move relatively in the direction of the first direction 202. The force required to move the first portion 146 relative to the second portion 147 in the first direction (also referred to as movable resistance) is smaller than the static friction acting between the optical component 111 and the contact portion 141 resistance. The movable resistance is the force required to relatively move the operation portion 142 with respect to the contact portion 141 in the first direction. In other words, the movable resistance is the force required to move the operation portion 142 and the contact portion 141 relatively in the first direction. The first portion 146 receives the operating force 151 from the operating portion 142 and moves relative to the second portion 147 in the first direction 202. With the movement of the first portion 146, the second portion 147 receives the operating force 152 in the first direction 202 due to the reaction of the movable resistance described above, but does not move because it receives the reaction force against the operating force 152 from the contact portion 141. As described above, as the operation portion 142 moves in the first direction 202, the first portion 146 moves in the first direction 202. Regarding the second portion 147, the contact portion 141, and the optical component 111, the force due to the reaction of the movable resistance and the force due to the reaction from the support mechanism 130 are internally balanced, and remain in their original positions without moving. At this time, the magnitude of the operating force 171 and the reaction force 172 acting on the optical component 111 are equal to the magnitude of the movable resistance. When a stress is applied to the optical component 111 due to the operating force 171 and the reaction force 172 acting on the optical component 111, skew may occur in the optical component 111 and the optical performance of the optical component 111 may be reduced. Therefore, it is preferable to suppress the operating force 171 and the reaction force 172 to be small. The operating mechanism 140 includes the connecting portion 145, and by reducing the movable resistance, the operating force 171 and the reaction force 172 can be suppressed to be small. As a result, the stress acting on the optical component 111 is suppressed to be small, the skew occurring in the optical component 111 is reduced, and the reduction in the optical performance of the optical component 111 is suppressed. In FIG. 7, a first configuration example of the connecting portion 145 is shown. The coupling part 145 may include a first part 246 fixed to the operation part 142 and a second part 247 fixed to the contact part 141. The first part 246 can move relatively with respect to the second part 247. The connecting portion 145 may include an elastic portion capable of relatively moving the operation portion 142 and the contact portion 141 in the first direction 202. In an example, the first portion 246 may be composed of such an elastic part. In another example, the second portion 247 may be composed of such an elastic part. In another example, the first part 246 and the second part 247 may be composed of such elastic parts. FIG. 7 shows an example in which the first portion 246 is composed of an elastic portion. The magnitude of the resistance when the first portion 246 is deformed (this is also referred to as deformation resistance) may be equal to or less than the magnitude of the operating force 251 that the first portion 246 receives from the operating portion 142. The first portion 246 receives the operating force 251 from the operating portion 142 and deforms in the first direction 202. As the first portion 246 deforms, the second portion 247 receives the operating force 252 in the first direction 202 due to the reaction of the deformation resistance, but does not move because it receives the reaction force against the operating force 252 from the contact portion 141. Regarding the contact portion 141 and the optical component 111, the force due to the reaction of the deformation resistance and the force due to the reaction from the support mechanism 130 are internally balanced, and remain in their original positions without moving. At this time, the magnitude of the operating force 271 acting on the optical component 111 and the magnitude of the reaction force from the support mechanism 130 are equal to the magnitude of the deformation resistance. Therefore, by reducing the deformation resistance, the operating force 271 and the reaction force from the support mechanism 130 can be suppressed to be small. As a result, the stress acting on the optical component 111 is suppressed to be small, the skew occurring in the optical component 111 is reduced, and the reduction in the optical performance of the optical component 111 is suppressed. In FIGS. 8( a) to 8 (c ), other configuration examples and operation examples of the support mechanism 130 are shown. The supporting mechanism 130 may include a supporting portion 120 that supports the optical component 111, position restricting portions 131 and 132 that restrict the position of the optical component 111 in the first direction 202, and a changing mechanism 133 that changes the positions of the position restricting portions 131 and 132. , 135. In FIGS. 8(a) to 8(c), it is shown that the stress acting in the region of the optical component 111 contacting the position restricting portions 131 and 132 becomes a predetermined stress state, and the optical component 111 is pressed And the process of positioning in the first direction 202. Fig. 8(a) is an E-E cross-sectional view of Fig. 4(c). In (b) of FIG. 8, the state in which the position of the position restricting parts 131 and 132 is changed to the position away from the optical component 111 by the changing mechanisms 133 and 135 from the state of (a) in FIG. 8 is shown. By changing the position of the position restricting parts 131 and 132 to a position away from the optical part 111, the stress applied to the optical part 111 due to the contact between the position restricting parts 131 and 132 and the optical part 111 is removed. At this time, the optical component 111 may move in the first direction 202 due to the stress state before the stress is removed. In (b) of FIG. 8, a state in which the optical component 111 is moved to the position control portion 132 side is illustrated. In FIG. 8(c), it is shown from the state of FIG. 8(b) that the position of the position restricting portions 131, 132 is changed to the position restricting portions 131, 132 and the optical component 111 by the changing mechanisms 133, 135. In the connected position, the optical component 111 is arranged in a predetermined position. In this example, the position of the position restricting portion 132 is changed so that after the position restricting portion 132 abuts on the optical component 111, the position shown by the dotted line (the position of FIG. 8(b)) is changed to that shown by the solid line. The optical component 111 is moved while pressing the optical component 111 up to a predetermined position. After the positions of the position restricting parts 131 and 132 are changed by the changing mechanisms 133 and 135, the contact part 141 contacting the optical component 111 and the second portion 147 connected to the contact part 141 move together with the optical component 111. On the other hand, since the frictional resistance of the first part 146 and the operation part 142 acts on the first part 146, the first part 146 does not move. The pressing force 181 for pressing the optical component 111 by the position restricting portion 132 is equal to the magnitude of the resistance when the second part 147 moves relative to the first part 146 (this is also referred to as pressing resistance). When stress is applied to the optical component 111 due to the pressing force 181 acting on the optical component 111, there is a possibility that skew occurs in the optical component 111 and the optical performance of the optical component 111 is reduced. Therefore, it is preferable to suppress the pressing force 181 to a small value. . The operating mechanism 140 includes the connecting portion 145 capable of relatively moving the operating portion 142 and the contact portion 141, thereby reducing the pressing resistance and suppressing the pressing force 181 to a low level. As a result, the stress acting on the optical component 111 is suppressed to be small, the skew occurring in the optical component 111 is reduced, and the reduction in the optical performance of the optical component 111 is suppressed. FIG. 9 shows a front view of an optical device 300 as a first example of the first embodiment. The optical device 300 may include a mirror 311 as an optical component, support mechanisms 330a and 330b that support the mirror 311, and operation mechanisms 340a and 340b that operate the mirror 311. The optical device 300 may further include a lens barrel 301 to which support mechanisms 330a and 330b and operating mechanisms 340a and 340b are fixed. Fig. 10 is a cross-sectional view taken along the line F-F in Fig. 9. The support mechanism 330a may include: metal bodies 331, 332 with protrusions for restricting the position of the mirror 311 in the first direction 402 parallel to the optical axis of the mirror 311; and a metal body 320 with an elastic body on the surface An elastic sheet for supporting the weight of the mirror 311. The support mechanism 330b has the same structure as the support mechanism 330a. The supporting mechanisms 330 a and 330 b may be symmetrically arranged with respect to the symmetry axis 310 of the optical device 300. The symmetry axis 310 may be configured to pass through the center (optical axis) of the mirror 311. Fig. 11 is a G-G sectional view of Fig. 9. The operating mechanism 340 may include a metal body 341 with an elastic body that is in contact with the mirror 311, a bolt (operating portion) 342 that can move in the second direction 203 parallel to the direction of gravity, and a metal body 341 that connects the elastic body with The connecting portion 345 of the bolt 342. When the bolt 342 is engaged with the lens barrel 301 screw to rotate the bolt 342, the connecting portion 345 can be moved in the 203rd direction. When the connecting portion 345 moves in the second direction 203, the elastic metal body 341 connected to the connecting portion 345 also moves in the second direction 203. The connecting portion 345 may be a structure having a linear slide rail having a degree of freedom in the first direction 202. The connecting portion 345 may include, for example, a slide rail portion 346 composed of a combination of a metal plate 348 and a slide rail 343 and a carriage portion 347 composed of a combination of the slide frame 344 and the metal plate 349. In one example, the coefficient of dynamic friction of the linear slide rail is 0.003 when the load ratio is 0.1, and is 0.02 when the weight of the reflector 311 and the metal body 341 with elastic body acts. In the optical device 300, by going through a series of steps from FIGS. 4(a) to 4(e), the stress acting on the mirror 311 can also become a predetermined stress state based on the steps. Fig. 12 is a D-D cross-sectional view of the exposure apparatus 300 that implements the step of Fig. 4(b). Here, the bolt 342, the connecting portion 345, and the metal body 341 with an elastic body move in the second direction 203, but may also move slightly in the first direction 202 due to processing errors, assembly errors, adjustment errors, and the like. Therefore, in FIG. 12, for convenience of explanation, a state where the bolt 342 moves in the second direction 203 and also moves in the first direction 202 is shown. When the bolt 342 moves in the first direction 202, operating forces 351, 352, 361, 371 are applied in the first direction 202 to the slide rail portion 346, the carriage portion 347, the elastic metal body 341, and the mirror 311 . Since the position of the mirror 311 in the first direction 202 is restricted by the support mechanisms 320 and 330, a reaction force against the operating force 371 acts on the mirror 311, and the mirror 311 does not move. The metal body 341 with an elastic body does not move because it receives a reaction force against the operating force 361 from the mirror 311. The slide rail portion 346 receives the operating force 351 from the bolt 342 and moves relative to the carriage portion 347 in the first direction 202. The carriage portion 347 moves with the slide rail portion 346, and receives the operating force 352 in the first direction 202 due to the reaction of the resistance of the aforementioned linear slide rail, but receives the reaction force against the operating force 352 from the metal body 341 with elastic body. Without moving. As described above, as the bolt 342 moves in the first direction 202, the slide rail portion 346 moves in the first direction 202. With regard to the carriage portion 347, the metal body 341 with an elastic body, and the mirror 311, the force caused by the reaction of the resistance of the linear slide rail and the force caused by the reaction force from the support mechanisms 320 and 330 are internally balanced, and they are not Move and stay in the original position. At this time, the magnitude of the operating force 371 acting on the mirror 311 and the reaction force from the supporting mechanisms 320 and 330 are equal to the magnitude of the resistance of the aforementioned linear slide. In one example, the resistance of the linear slide rail becomes 0.02 Mg when the sum of the weights acting on the linear slide rail by the reflecting mirror 311 and the metal body 341 with elastic body is Mg. It is a structure that does not have a connecting portion 345, that is, a structure in which the bolt 342 and the metal body 341 with an elastic body are directly connected to one-tenth of the size (when the dynamic friction coefficient of the bolt 342 and the metal body 341 with an elastic body is 0.2 ). When stress is applied to the reflecting mirror 311 due to the operating force 371 acting on the reflecting mirror 311 and the reaction force from the supporting mechanisms 320 and 330, there is a possibility that the reflecting mirror 311 will be skewed and the optical performance of the reflecting mirror 311 may be reduced. Therefore, it is preferable to suppress the operating force 371 and the reaction force from the support mechanisms 320 and 330 to be small. The operating mechanism 340 includes a connecting portion 345 capable of relatively moving the operating portion 342 and the contact portion 341, thereby reducing the coefficient of dynamic friction of the linear slide rail, and suppressing the operating force 371 and the reaction force 372 from the support mechanism 330 Smaller. As a result, the stress acting on the mirror 311 is suppressed to be small, the skew occurring in the mirror 311 is reduced, and the reduction in the optical performance of the mirror 311 is suppressed. FIG. 13 shows a front view of an optical device 500 as a second example of the first embodiment. The optical device 500 may include a mirror 511 as an optical component, support mechanisms 530a and 530b for supporting the mirror 511, and operation mechanisms 540a and 540b for operating the mirror 511. The optical device 500 may further include a lens barrel 501 to which support mechanisms 530a and 530b and operating mechanisms 540a and 540b are fixed. The structure of the supporting mechanisms 530a and 530b may be the same as the supporting mechanisms 330a and 330b of the optical device 300. FIG. 14 is a perspective view of the operating mechanism 540. Fig. 15 is a cross-sectional view taken along the line H-H in Fig. 13. The operating mechanism 540 may include: a metal body (contact portion) 541 with an elastic body having an elastic sheet on the surface for supporting the weight of the mirror 511; and a linear actuator 542 having a second body parallel to the direction of gravity. A stepping motor that drives the movable part in the direction. The metal body (contact portion) 541 and the linear actuator 542 are connected to each other by a connecting portion having a plate spring 543 and metal bodies 546, 547, and 548. The linear actuator 542 is fixed to the lens barrel 501. When the linear actuator 542 is driven, the connecting portion 545 can be moved in the second direction 203. Along with the movement of the connecting portion 545, the metal body 541 with an elastic body also moves in the second direction 603. In the optical device 500, by going through a series of steps from FIGS. 4(a) to 4(e), the stress acting on the mirror 511 also becomes a predetermined stress state based on the steps. Fig. 16 is a D-D cross-sectional view of the optical device 500 of the second embodiment in which the process of Fig. 4(b) is performed. Here, the movable part of the linear actuator 542, the connecting part 545, and the metal body 541 with an elastic body move in the second direction 203, but also in the first direction 202 due to machining errors, assembly errors, adjustment errors, etc. May move. Therefore, in FIG. 16, for convenience of explanation, the linear actuator 542 has a driving component in the first direction 202 in addition to the second direction 203 in which the movable part is driven. When the linear actuator 542 drives its movable part in the second direction 202, the operating forces 551, 552, and 552 in the second direction 202 are applied to the leaf spring 543, the metal body 547, the metal body 541 with an elastic body, and the mirror 511. 561, 571. Since the position of the mirror 511 in the first direction 202 is restricted by the support mechanisms 520 and 530, a reaction force against the operating force 571 acts on the mirror 511, and the mirror 511 does not move. The metal body 541 with an elastic body does not move because it receives a reaction force against the operating force 561 from the mirror 511. The plate spring 543 receives the operating force 551 from the linear actuator 542 and deforms in the first direction 202. The metal body 547 receives the operating force 552 in the second direction 202 by the elastic force of the leaf spring 543 in accordance with the deformation of the leaf spring 543, but does not move because it receives a reaction force against the operating force 552 from the metal body 541 with elastic body. As described above, as the linear actuator 542 moves its movable portion in the first direction 202, the plate spring 543 is deformed in the first direction 202. Regarding the metal body 547, the metal body 541 with an elastic body, and the reflecting mirror 511, the force caused by the elastic force of the leaf spring 543 and the reaction force from the supporting mechanisms 520 and 530 is internally balanced, and stays in the original position without moving. position. At this time, the magnitude of the operating force 571 and the reaction force acting on the mirror 511 are equal to the magnitude of the elastic force of the leaf spring 543. In one example, the maximum deformation amount of the leaf spring 543 related to the first direction 202 can be 0.10 mm, the size of the deformation portion of the leaf spring 543 can be 80 mm × 67 mm, the thickness can be 1.6 mm, and the material can be made to have a specific gravity of 7.9. Stainless steel SUS304 for springs with Young's modulus of 186GPa. In this case, the elastic force of the leaf spring 543 is about 10N. In the structure without the connecting portion 545, that is, the structure in which the linear actuator 542 and the metal body 541 with an elastic body are directly coupled, the operating force 571 acting on the mirror 511 is 1000 N under the conditions described below. <Conditions> The sum of the weight acting on the linear actuator 542 by the reflecting mirror 511 and the metal body 541 with elastic body is 500 kgf, and the dynamic friction coefficient of the linear actuator 542 and the metal body 541 with elastic body is 0.2. When stress is applied to the mirror 511 due to the operating force 571 acting on the mirror 511 and the reaction forces from the support mechanisms 520 and 530, the mirror 511 may be skewed and the optical performance of the mirror 511 may decrease. Therefore, it is preferable to suppress the operating force 571 and the reaction force 572 to be small. The operating mechanism 540 includes the connecting portion 545 capable of relatively moving the linear actuator 542 and the metal body 541, so that the operating force 571 and the reaction force from the support mechanisms 520 and 530 can be suppressed to be small. As a result, the stress acting on the mirror 511 is suppressed to be small, the skew occurring in the mirror 511 is reduced, and the decrease in the optical performance of the mirror 511 is suppressed. FIG. 17 shows a front view of an optical device 700 as a third example of the first embodiment. The optical device 700 may include a mirror 711 as an optical component, support mechanisms 730a and 730b that support the mirror 711, and operation mechanisms 740a and 740b that operate the mirror 711. The optical device 700 may further include a lens barrel 701 to which support mechanisms 730a and 730b and operating mechanisms 740a and 740b are fixed. Fig. 18 is a cross-sectional view taken along the line I-I in Fig. 17. The support mechanism 730a may include air cylinders 734 and 736 as changing mechanisms for driving the position restricting portions 731 and 732 in the first direction 202 parallel to the optical axis of the mirror 711. The support mechanism 730a may further include metal housings 733, 735 for fixing the cylinders 734, 736 to the lens barrel 701. The support mechanism 730b may have the same structure as the support mechanism 730a. The supporting mechanisms 730 a and 730 b may be symmetrically configured with respect to the symmetry axis 710 of the optical device 700. The symmetry axis 710 may be configured to pass through the center (optical axis) of the mirror 711. The operating mechanisms 740a and 740b may have the same structure as the operating mechanisms 540a and 540b of the second embodiment. In the optical device 700, by going through a series of steps from FIGS. 4(a) to 4(e), the stress acting on the mirror 711 also becomes a predetermined stress state based on the steps. In FIGS. 19(a) to 19(c), it is shown that the stress acting on the region of the mirror 711 that is in contact with the position restricting portions 731 and 732 becomes a predetermined stress state, and the mirror 711 is pressed and The process of positioning in the first direction 202. FIG. 19(a) is an E-E cross-sectional view of the process of FIG. 4(c) of the optical device 700. FIG. FIG. 19(b) shows a state in which the positions of the position restricting parts 731 and 732 are changed to positions separated from the mirror 711 by the air cylinders 734 and 736 from the state of FIG. 19(a). By changing the position of the position restricting parts 131 and 132 to a position away from the reflecting mirror 711, the stress applied to the reflecting mirror 711 due to the contact between the position restricting parts 131 and 132 and the reflecting mirror 711 is removed. In FIG. 19(c), it is shown from the state of FIG. 19(b) that the positions of the position restricting parts 131, 132 are changed by the air cylinders 734 and 736 so that the position restricting parts 131 and 132 are in contact with the mirror 711 The mirror 711 is arranged at a predetermined position. When the position regulating parts 131 and 132 are driven by the air cylinders 734 and 736 and the mirror 711 is pressed, the metal body 541 with an elastic body supporting the mirror 711, the metal body 547 connected with the metal body 541 with the elastic body, and the mirror 711 moves together. On the other hand, the leaf spring 543 deforms as the metal body 547 moves. The pressing force 781 of the air cylinders 734 and 736 pressing the mirror 711 is equal to the elastic force of the plate spring 543. In one example, the elastic force of the leaf spring 543 is approximately 10 N when the leaf spring 543 of the size, material, and maximum deformation amount described in the second embodiment is used. In the structure without the connecting portion 545, that is, in the structure in which the linear actuator 542 and the metal body 541 with an elastic body are directly coupled, the pressing force 781 required to press and drive the mirror 711 is under the conditions described below. 1000N. <Conditions> The sum of the weights acting on the linear actuator 542 by the mirror 711 and the metal body 541 with elastic body is 500 kgf, and the coefficient of dynamic friction of the linear actuator 542 and the metal body 541 with the elastic body is 0.2. When a stress is applied to the reflection mirror 711 due to the pressing force 781 applied to the reflection mirror 711, there is a possibility that a skew occurs in the reflection mirror 711, and the optical performance of the reflection mirror 711 may decrease. Therefore, it is preferable to suppress the pressing force 781 to be small. The operating mechanism 740 includes the connecting portion 545 that can relatively move the linear actuator 542 and the metal body 541, and thereby the pressing force 781 can be suppressed to be small. As a result, the stress acting on the mirror 711 is suppressed to be small, the skew occurring in the mirror 711 is reduced, and the deterioration of the optical performance of the mirror 711 is suppressed. FIG. 20 is a side view of the exposure apparatus 1000 according to the second embodiment of the present invention. The exposure device 1000 may include an illumination device 1100, an exposure pattern forming device 1200, a projection optical device (projection optical system) 1300, a mounting table device 1400, and an electric control device 1500. The lighting device 1100, the exposure pattern forming device 1200, the projection optical device 1300, the mounting table device 1400, and the electrical control device 1500 may be housed in the cavity 1600. The optical device represented by the optical device 100 of the first embodiment and the like may constitute a part of the projection optical device 1300, for example. The electrical control device 1500 performs electrical control for maintaining the temperature of the internal space of the lighting device 1100, the exposure pattern forming device 1200, the projection optical device 1300, the stage device 1400, and the cavity 1600 within a predetermined temperature range. In addition, at the time of exposure, electrical control for interlocking the operating parts of the illumination device 1100, the exposure pattern forming device 1200, the projection optical device 1300, and the stage device 1400 is performed. The exposure light generated by the lighting device 1100 is irradiated to the exposure pattern forming device 1200 to form an exposure pattern. The exposure pattern is projected by the projection optical device 1300 to the substrate (wafer or glass plate) mounted on the stage of the stage device 1400. The optical component 111 constituting the optical device 100 is a part of the optical system constituting the projection optical device 1300 and greatly affects the imaging performance of the exposure pattern formed by the exposure pattern forming device on the wafer or glass plate. Therefore, when stress acts on the optical component 111, there is a possibility that skew occurs in the optical component 111, and the aforementioned imaging performance may be reduced. In the optical device 100, the stress acting on the optical component 111 is suppressed to be small, so the skew that occurs in the optical component 111 is reduced. As a result, the deterioration of the imaging performance of the optical component 111 can be suppressed to be small, and the exposure apparatus 1000 having good imaging performance can be provided. Fig. 21 is a side view of an exposure apparatus 2000 according to a third embodiment of the present invention. The exposure apparatus 2000 may include an illumination unit 2100, an exposure mask unit 2200, a projection unit (projection optical system) 2300, a stage unit 2400, and an electrical control unit 2500. The lighting unit 2100, the exposure mask unit 2200, the projection unit 2300, the stage unit 2400, and the electrical control unit 2500 may be accommodated in the cavity 2600. The optical device represented by the optical device 300 of the first embodiment and the like may constitute a part of the projection unit 2300. The electrical control unit 2500 performs electrical control for maintaining the temperature of the internal space of the illumination unit 2100, the exposure mask unit 2200, the projection unit 2300, the stage unit 2400, and the cavity 2600 within a predetermined temperature range. Specifically, the electrical control unit 2500 can perform feedback control on the temperature of the clean dry air supplied to each component based on the value of the temperature sensor arranged in the internal space of each component. When performing exposure, it is necessary to synchronize the operations of each unit described below. The action of the lighting unit is the timing and the irradiation time of the illuminating light. The operation of the exposure mask unit 2200 is the timing and scanning speed of scanning the exposure mask constituting the exposure mask unit 2200. The operation of the projection unit 2300 is the timing and drive speed of the driving optical system accompanying the driving in the projection optical system constituting the projection unit 2300. The operation of the mounting table unit 2400 is the timing and speed of driving the mounting table constituting the mounting table unit 2400. The electric control unit 2500 performs electric control for synchronizing the operations of the aforementioned units. The exposure light generated by the illuminating unit 2100 is irradiated to the exposure mask 2201 constituting the mask exposure mask unit 2200, and transmits the aforementioned exposure mask, thereby forming an exposure pattern with the exposure mask as the object surface. The exposure pattern is projected by the projection unit 2300 onto the glass plate 2401 mounted on the stage of the stage unit 2400. The mirror 311 constituting the optical device 300 is a part of the projection optical system 2301 constituting the projection unit 2300, which greatly affects the image formation when the exposure light transmitted through the exposure mask 2201 is formed on the resist coated on the glass plate 2401 performance. Therefore, when stress acts on the mirror 311, there is a possibility that skew occurs in the mirror 311, and the aforementioned imaging performance may deteriorate. In the optical device 300, the stress acting on the mirror 311 is suppressed to be small, so the skew that occurs in the mirror 311 is reduced. As a result, the deterioration of the imaging performance of the mirror 311 can be suppressed to be small, and the exposure apparatus 2000 with good imaging performance can be provided. Hereinafter, an article manufacturing method for manufacturing articles (semiconductor IC elements, liquid crystal display elements, MEMS, etc.) using the exposure apparatus described above will be described. The process of exposing a substrate (wafer, glass substrate, etc.) coated with a photosensitive agent using the above-mentioned exposure device, a process of developing the photosensitive agent of the substrate to form a pattern, and a process of processing the substrate using the pattern can be performed, An article is manufactured based on the processed substrate. Other well-known processes include etching, resist stripping, cutting, bonding, packaging, and the like. According to this article manufacturing method, it is possible to manufacture articles of higher quality than before. The invention is not limited to the above-described embodiment, and various changes and modifications can be made without departing from the spirit and scope of the invention. Therefore, in order to disclose the scope of the invention, the scope of patent application is attached.

100:光學裝置 111:光學零件 131,132:位置限制部 140:操作機構 145:連結部100: Optical device 111: optical parts 131, 132: Position restriction section 140: operating mechanism 145: Connection

[圖1]是示意地示出第1實施方式的光學裝置的結構的正面圖。 [圖2]是圖1的A-A剖面圖。 [圖3]是圖1的B-B剖面圖。 [圖4]是例示用於降低由於對光學零件作用的應力引起的影響的操作的圖。 [圖5]是圖4的(b)的C-C剖面圖。 [圖6]是圖4的(b)的D-D剖面圖 [圖7]是示出連結部的第1結構例的圖。 [圖8]是示出支撐機構的其他結構例以及動作例的圖。 [圖9]是示意地示出第1實施方式的第1實施例的光學裝置的結構的正面圖。 [圖10]是圖9的F-F剖面圖。 [圖11]是圖9的G-G剖面圖。 [圖12]是實施圖4的(b)的工序的第1實施例的曝光裝置的D-D剖面圖。 [圖13]是示意地示出第1實施方式的第2實施例的光學裝置的結構的正面圖。 [圖14]是第2實施例的光學裝置的操作機構的立體圖。 [圖15]是圖13的H-H剖面圖。 [圖16]是實施圖4的(b)的工序的第2實施例的曝光裝置的D-D剖面圖。 [圖17]是示意地示出第1實施方式的第3實施例的光學裝置的結構的正面圖。 [圖18]是圖17的I-I剖面圖。 [圖19]是示出第3實施例的光學裝置的動作例的圖。 [圖20]是示出第2實施方式的曝光裝置的結構的圖。 [圖21]是示出第3實施方式的曝光裝置的結構的圖。Fig. 1 is a front view schematically showing the structure of the optical device of the first embodiment. [Fig. 2] is a cross-sectional view taken along the line A-A in Fig. 1. [Fig. [Fig. 3] is a B-B cross-sectional view of Fig. 1. [Fig. [Fig. 4] is a diagram illustrating an operation for reducing the influence due to the stress acting on the optical part. [Fig. 5] is a cross-sectional view taken along line C-C of Fig. 4(b). [Fig. 6] is a cross-sectional view taken along the line D-D of Fig. 4(b) [Fig. 7] is a diagram showing a first configuration example of the connecting portion. [Fig. 8] Fig. 8 is a diagram showing another configuration example and an operation example of the support mechanism. [Fig. 9] Fig. 9 is a front view schematically showing the configuration of the optical device of the first example of the first embodiment. [Fig. 10] is a cross-sectional view taken along the line F-F in Fig. 9. [Fig. 11] is a G-G cross-sectional view of Fig. 9. [Fig. 12] Fig. 12 is a D-D cross-sectional view of the exposure apparatus of the first embodiment that performs the step of Fig. 4(b). [Fig. 13] Fig. 13 is a front view schematically showing the configuration of an optical device according to a second example of the first embodiment. Fig. 14 is a perspective view of the operating mechanism of the optical device of the second embodiment. [Fig. 15] is a cross-sectional view taken along the line H-H in Fig. 13. [Fig. 16] is a D-D cross-sectional view of the exposure apparatus of the second embodiment that implements the step of Fig. 4(b). [Fig. 17] Fig. 17 is a front view schematically showing the configuration of the optical device of the third example of the first embodiment. [Fig. 18] is a cross-sectional view taken along the line I-I in Fig. 17. Fig. 19 is a diagram showing an operation example of the optical device of the third embodiment. [Fig. 20] is a diagram showing the structure of an exposure apparatus according to a second embodiment. [Fig. 21] is a diagram showing the structure of an exposure apparatus according to a third embodiment.

100:光學裝置 100: Optical device

110:對稱軸 110: axis of symmetry

111:光學零件 111: optical parts

120a,120b:支撐部 120a, 120b: support part

130a,130b:支撐機構 130a, 130b: support mechanism

140a,140b:操作機構 140a, 140b: operating mechanism

201:第3方向 201: 3rd direction

202:第1方向 202: 1st direction

203:第2方向 203: 2nd direction

Claims (11)

一種光學裝置，其特徵在於，具備： 光學零件； 支撐機構，具有支撐前述光學零件的支撐部及限制前述光學零件在第1方向上的位置的位置限制部；以及 操作機構，用於對前述光學零件在與前述第1方向不同的第2方向上施加力，操作前述光學零件， 前述操作機構包括：接觸部，與前述光學零件接觸；操作部，使前述接觸部在前述第2方向上移動；以及連結部，連結前述接觸部和前述操作部，前述連結部構成為能夠關於前述第1方向使前述操作部和前述接觸部相對地移動。An optical device, characterized in that: Optical parts The supporting mechanism has a supporting portion supporting the optical component and a position restricting portion restricting the position of the optical component in the first direction; and The operating mechanism is used to apply force to the optical component in a second direction different from the first direction to operate the optical component, The operating mechanism includes: a contact portion that is in contact with the optical component; an operating portion that moves the contact portion in the second direction; and a connecting portion that connects the contact portion and the operating portion, and the connecting portion is configured to be able to In the first direction, the operation portion and the contact portion are relatively moved. 根據請求項1所述的光學裝置，其中， 在前述第1方向上使前述操作部相對於前述接觸部相對地移動而所需的力，係小於在前述光學零件與前述接觸部之間作用的靜止摩擦阻力。The optical device according to claim 1, wherein: The force required to move the operating portion relative to the contact portion in the first direction is smaller than the static frictional resistance acting between the optical component and the contact portion. 根據請求項1所述的光學裝置，其中， 還具備變更機構，該變更機構變更前述位置限制部在前述第1方向上的位置。The optical device according to claim 1, wherein: It also includes a changing mechanism that changes the position of the position restricting portion in the first direction. 根據請求項1所述的光學裝置，其中， 前述連結部包括彈性部，該彈性部能夠在前述第1方向使前述操作部和前述接觸部相對地移動。The optical device according to claim 1, wherein: The connecting portion includes an elastic portion capable of relatively moving the operation portion and the contact portion in the first direction. 根據請求項1所述的光學裝置，其中， 前述連結部包括線性滑軌，該線性滑軌能夠在前述第1方向使前述操作部和前述接觸部相對地移動。The optical device according to claim 1, wherein: The connecting portion includes a linear slide rail capable of relatively moving the operation portion and the contact portion in the first direction. 根據請求項1所述的光學裝置，其中， 前述連結部包括板簧，該板簧能夠在前述第1方向使前述操作部和前述接觸部相對地移動。The optical device according to claim 1, wherein: The connecting portion includes a leaf spring capable of relatively moving the operation portion and the contact portion in the first direction. 根據請求項1所述的光學裝置，其中， 前述操作機構構成為能夠變更前述光學零件的狀態，前述狀態包括由前述支撐機構支撐前述光學零件的第1狀態以及由前述操作機構支撐前述光學零件的第2狀態。The optical device according to claim 1, wherein: The operating mechanism is configured to be able to change the state of the optical component, and the state includes a first state in which the optical component is supported by the supporting mechanism and a second state in which the optical component is supported by the operating mechanism. 根據請求項7所述的光學裝置，其中， 前述狀態從前述第1狀態經由前述第2狀態成為前述第1狀態。The optical device according to claim 7, wherein: The state changes from the first state to the first state via the second state. 根據請求項7所述的光學裝置，其中， 前述操作機構包括驅動機構，前述驅動機構以使前述狀態從前述第1狀態經由前述第2狀態成為前述第1狀態的方式動作。The optical device according to claim 7, wherein: The operating mechanism includes a drive mechanism, and the drive mechanism operates to change the state from the first state to the first state via the second state. 一種曝光裝置，具備將曝光圖案投影到基板的投影光學系統，其特徵在於， 前述投影光學系統包括請求項1至9中的任意一項所述的光學裝置。An exposure device is provided with a projection optical system for projecting an exposure pattern onto a substrate, and is characterized in that: The aforementioned projection optical system includes the optical device described in any one of claims 1 to 9. 一種物品製造方法，其特徵在於，包括： 使用請求項10所述的曝光裝置對塗敷有感光劑的基板進行曝光的工序； 使前述感光劑顯影而形成圖案的工序；以及 使用前述圖案處理前述基板的工序， 由前述基板製造物品。An article manufacturing method, characterized in that it comprises: A process of exposing a substrate coated with a photosensitive agent using the exposure device described in claim 10; The process of developing the aforementioned photosensitive agent to form a pattern; and The process of processing the aforementioned substrate using the aforementioned pattern, An article is manufactured from the aforementioned substrate.

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