JP2018005068A - Optical device, exposure device, and method for manufacturing article - Google Patents

Optical device, exposure device, and method for manufacturing article Download PDF

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JP2018005068A
JP2018005068A JP2016134000A JP2016134000A JP2018005068A JP 2018005068 A JP2018005068 A JP 2018005068A JP 2016134000 A JP2016134000 A JP 2016134000A JP 2016134000 A JP2016134000 A JP 2016134000A JP 2018005068 A JP2018005068 A JP 2018005068A
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mirror
permanent magnet
optical device
shape
optical
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JP6929024B2 (en
JP2018005068A5 (en
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柴田　雄吾
Yugo Shibata
雄吾 柴田
浩平 長野
Kohei Nagano
浩平 長野
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Canon Inc
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Canon Inc
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Priority to JP2016134000A priority Critical patent/JP6929024B2/en
Priority to CN201780040473.6A priority patent/CN109416457B/en
Priority to PCT/JP2017/022311 priority patent/WO2018008364A1/en
Priority to KR1020197002601A priority patent/KR102165797B1/en
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/10—Mirrors with curved faces
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/185—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors with means for adjusting the shape of the mirror surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide an optical device capable of preventing heat due to shape correction of an optical element from being generated and correcting the shape with high accuracy.SOLUTION: An optical device 10 for deforming a reflection surface 1a of a mirror 1, comprises: a base plate 5 placed spaced away from a rear surface 1b which is opposite to the reflection surface 1a; and a correction unit 2 including a mirror side magnet 3 attached on the surface opposite to the reflection surface 1a, and a base side magnet 4 placed at a position facing the mirror side magnet 3 of the base plate 5. The correction unit 2 corrects the shape of the reflection surface 1a by repulsive force or suction force generated by the mirror side magnet 3 and the base side magnet 4.SELECTED DRAWING: Figure 2

Description

本発明は、光学装置、露光装置及び物品の製造方法に関する。   The present invention relates to an optical apparatus, an exposure apparatus, and an article manufacturing method.

半導体デバイスなどの製造に用いられる露光装置の解像度を向上させるため、露光装置における投影光学系の光学収差、像倍率、像歪み、フォーカスなどの種々の光学特性を補正することが求められている。光学特性の補正は、投影光学系に含まれるミラーの形状を基準形状から変形させることで実現される。ここで、加工誤差等によりミラーの形状が基準形状からずれて形状誤差を有する場合、光学特性の補正のためには、形状誤差も考慮してミラーを変形させる必要がある。特許文献１は、ミラー取り付け時のねじ締結によって発生する理想形状（基準形状）からの形状誤差を、電磁石アクチュエータを駆動することで補正する技術を開示している。   In order to improve the resolution of an exposure apparatus used for manufacturing a semiconductor device or the like, it is required to correct various optical characteristics such as optical aberration, image magnification, image distortion, and focus of a projection optical system in the exposure apparatus. The correction of the optical characteristics is realized by changing the shape of the mirror included in the projection optical system from the reference shape. Here, when the mirror shape deviates from the reference shape due to a processing error or the like and has a shape error, it is necessary to deform the mirror in consideration of the shape error in order to correct the optical characteristics. Patent Document 1 discloses a technique for correcting a shape error from an ideal shape (reference shape) generated by screw fastening when a mirror is attached by driving an electromagnet actuator.

特開平２−１０１４０２号公報Japanese Patent Laid-Open No. 2-101402

しかしながら、上記文献の技術を用いて、電磁石アクチュエータにより形状誤差を補正しつつ、光学特性の補正のためにミラーを変形させる場合、電磁石アクチュエータからの発熱によりミラーに意図しない変形が起こり、新たな光学収差が生じうる。   However, when the mirror is deformed to correct the optical characteristics while correcting the shape error by the electromagnet actuator using the technique of the above document, unintentional deformation occurs in the mirror due to the heat generated from the electromagnet actuator, and a new optical Aberrations can occur.

本発明は、例えば、光学素子の形状補正に伴う発熱を抑制し、高精度に形状を補正することが可能な光学装置を提供することを目的とする。   For example, an object of the present invention is to provide an optical device capable of suppressing heat generation associated with shape correction of an optical element and correcting the shape with high accuracy.

上記課題を解決するために、本発明の一側面である光学装置は、光学素子の反射面を変形させる光学装置であって、前記反射面の反対側の面に離間して配置されるベースプレートと、前記反射面の反対側の面に取り付けられる第１の永久磁石と、前記ベースプレートの前記第１の永久磁石に対向する位置に配置される第２の永久磁石とを含む補正ユニットと、を有し、前記補正ユニットは、前記第１の永久磁石と前記第２の永久磁石により発生する反発力または吸引力により、前記反射面の形状を補正する。   In order to solve the above problems, an optical device according to one aspect of the present invention is an optical device that deforms a reflective surface of an optical element, and includes a base plate that is disposed apart from a surface opposite to the reflective surface. A correction unit including a first permanent magnet attached to a surface opposite to the reflecting surface and a second permanent magnet disposed at a position of the base plate facing the first permanent magnet. The correction unit corrects the shape of the reflecting surface by a repulsive force or an attractive force generated by the first permanent magnet and the second permanent magnet.

本発明によれば、例えば、光学素子の形状補正に伴う発熱を抑制し、高精度に形状を補正することが可能な光学装置を提供することができる。   ADVANTAGE OF THE INVENTION According to this invention, the optical apparatus which can suppress the heat_generation | fever accompanying shape correction of an optical element, for example, and can correct | amend a shape with high precision can be provided.

第１実施形態に係る露光装置の概略構成を示す図である。It is a figure which shows schematic structure of the exposure apparatus which concerns on 1st Embodiment. 第１実施形態に係る光学装置の概略構成を示す断面図である。It is sectional drawing which shows schematic structure of the optical apparatus which concerns on 1st Embodiment. 第１実施形態に係る光学装置の概略構成を示す正面図である。It is a front view which shows schematic structure of the optical apparatus which concerns on 1st Embodiment. 第２実施形態に係る光学装置の概略構成を示す断面図である。It is sectional drawing which shows schematic structure of the optical apparatus which concerns on 2nd Embodiment. 第２実施形態に係る光学装置の概略構成を示す正面図である。It is a front view which shows schematic structure of the optical apparatus which concerns on 2nd Embodiment.

図１は、露光装置の概略構成を示す図である。露光装置５０は、照明光学系ＩＬと、投影光学系ＵＭと、マスク５５を保持して移動可能なマスクステージＭＳと、基板５６を保持して移動可能な基板ステージＰＳとを含みうる。また、露光装置５０は、基板５６を露光する処理を制御する制御部５１を含む。   FIG. 1 is a view showing a schematic configuration of an exposure apparatus. The exposure apparatus 50 may include an illumination optical system IL, a projection optical system UM, a mask stage MS that can move while holding the mask 55, and a substrate stage PS that can move while holding the substrate 56. The exposure apparatus 50 includes a control unit 51 that controls processing for exposing the substrate 56.

照明光学系ＩＬに含まれる光源（不図示）から射出された光は、照明光学系ＩＬに含まれるスリット（不図示）によって、例えば、Ｙ方向に長い円弧状の照明領域をマスク５５上に形成することができる。マスク５５および基板５６は、マスクステージＭＳおよび基板ステージＰＳによってそれぞれ保持されており、投影光学系ＵＭを介して光学的にほぼ共役な位置（投影光学系ＵＭの物体面および像面の位置）に配置される。投影光学系ＵＭは、所定の投影倍率（例えば１／２倍）を有し、マスク５５に形成されたパターンを基板５６に投影する。そして、マスクステージＭＳおよび基板ステージＰＳを、投影光学系ＵＭの物体面と平行な方向（例えば図１のＸ方向）に、投影光学系ＵＭの投影倍率に応じた速度比で走査させる。これにより、マスク５５に形成されたパターンを基板５６に転写することができる。   Light emitted from a light source (not shown) included in the illumination optical system IL forms, for example, an arc-shaped illumination region that is long in the Y direction on the mask 55 by a slit (not shown) included in the illumination optical system IL. can do. The mask 55 and the substrate 56 are respectively held by the mask stage MS and the substrate stage PS, and are optically conjugate positions (positions of the object plane and the image plane of the projection optical system UM) via the projection optical system UM. Be placed. The projection optical system UM has a predetermined projection magnification (for example, ½ times), and projects the pattern formed on the mask 55 onto the substrate 56. Then, the mask stage MS and the substrate stage PS are scanned in a direction parallel to the object plane of the projection optical system UM (for example, the X direction in FIG. 1) at a speed ratio corresponding to the projection magnification of the projection optical system UM. Thereby, the pattern formed on the mask 55 can be transferred to the substrate 56.

投影光学系ＵＭは、例えば、図１に示すように、平面鏡５２と、凹面鏡であるミラー１と、凸面鏡５４とを含むように構成される。照明光学系ＩＬから出射し、マスク５５を透過した露光光は、平面鏡５２の第１面５２ａにより光路を折り曲げられ、ミラー１の第１面１ａ１に入射する。ミラー１の第１面１ａ１において反射した露光光は、凸面鏡５４において反射し、ミラー１の第２面１ａ２に入射する。ミラー１の第２面１ａ２において反射した露光光は、平面鏡５２の第２面５２ｂにより光路を折り曲げられ、基板５６上に結像する。   For example, as shown in FIG. 1, the projection optical system UM is configured to include a plane mirror 52, a mirror 1 that is a concave mirror, and a convex mirror 54. The exposure light emitted from the illumination optical system IL and transmitted through the mask 55 has its optical path bent by the first surface 52 a of the plane mirror 52 and is incident on the first surface 1 a 1 of the mirror 1. The exposure light reflected by the first surface 1a1 of the mirror 1 is reflected by the convex mirror 54 and enters the second surface 1a2 of the mirror 1. The exposure light reflected by the second surface 1 a 2 of the mirror 1 is bent on the optical path by the second surface 52 b of the plane mirror 52 and forms an image on the substrate 56.

（第１実施形態）
次に、図２及び図３を参照して第１実施形態の光学装置１０及び形状誤差の補正方法について説明する。光学装置１０は、例えば、反射ミラー型の露光装置に用いられる大口径凹面ミラー装置である。図２は、光学装置の断面図である。光学装置１０は、ミラー１とベースプレート５と複数の形状誤差補正ユニット（補正ユニット）２とを備える。ミラー１は、光を反射する反射面１ａと、反射面の反対側の面である裏面１ｂとを有する光学素子である。ミラー１は、固定部材６を介して、ベースプレート５に固定されている。ベースプレート５は、裏面１ｂに離間して配置されている。 (First embodiment)
Next, the optical device 10 and the shape error correction method according to the first embodiment will be described with reference to FIGS. The optical device 10 is, for example, a large-diameter concave mirror device used in a reflection mirror type exposure apparatus. FIG. 2 is a cross-sectional view of the optical device. The optical device 10 includes a mirror 1, a base plate 5, and a plurality of shape error correction units (correction units) 2. The mirror 1 is an optical element having a reflective surface 1a that reflects light and a back surface 1b that is a surface opposite to the reflective surface. The mirror 1 is fixed to the base plate 5 via a fixing member 6. The base plate 5 is spaced apart from the back surface 1b.

補正ユニット２はミラー１とベースプレート５の間に配置され、ミラー１の裏面１ｂに設置されたミラー側の第１の永久磁石（ミラー側磁石）３と、対向するベースプレート５に配置されたベース側の第２の永久磁石（ベース側磁石）４とで構成されている。補正ユニット２は、ミラー側磁石３に対向するベース側磁石４の極性を反転させて設置することで、吸引力または反発力を発生することができる。また、ミラー側磁石３と対向するベース側磁石４との磁石間距離を、調整機構１３を用いて調整することで、発生する力の量を調整することができる。具体的には、調整機構１３によりベース側磁石４の配置する位置を調整することで、磁石間距離を調整する。なお、本実施形態においてはベース側磁石４の極性を変える場合を説明したが、これに限られるものではなく、ミラー側磁石３の極性を変えることで吸引力と反発力を切り替えてもよい。   The correction unit 2 is arranged between the mirror 1 and the base plate 5, and the first permanent magnet (mirror side magnet) 3 on the mirror side installed on the back surface 1 b of the mirror 1 and the base side arranged on the opposing base plate 5. And the second permanent magnet (base side magnet) 4. The correction unit 2 can generate an attractive force or a repulsive force by reversing the polarity of the base-side magnet 4 facing the mirror-side magnet 3. Further, the amount of force generated can be adjusted by adjusting the distance between the magnets of the base side magnet 4 facing the mirror side magnet 3 using the adjusting mechanism 13. Specifically, the distance between the magnets is adjusted by adjusting the position where the base side magnet 4 is arranged by the adjusting mechanism 13. In the present embodiment, the case where the polarity of the base-side magnet 4 is changed has been described. However, the present invention is not limited to this, and the attractive force and the repulsive force may be switched by changing the polarity of the mirror-side magnet 3.

次に、補正ユニット２を用いたミラー１の形状誤差補正方法について説明する。計測部１２を用いてミラー１の反射面１ａの形状を測定し、形状の誤差を補正するために必要な力の方向及び量（形状誤差）を算出する。計測部１２は、レーザ干渉計やシャック・ハルトマンセンサなど、ミラー１の反射面１ａの形状を計測する計測器で構成される。   Next, a method for correcting the shape error of the mirror 1 using the correction unit 2 will be described. The shape of the reflecting surface 1a of the mirror 1 is measured using the measuring unit 12, and the direction and amount of force (shape error) necessary to correct the shape error are calculated. The measuring unit 12 includes a measuring instrument that measures the shape of the reflecting surface 1a of the mirror 1, such as a laser interferometer or a Shack-Hartmann sensor.

形状の誤差を補正するために必要な力の方向及び量を示す形状誤差の正負（凹凸）に応じて、各補正ユニット２のベース側磁石４の極性を選択し、吸引力または反発力のいずれかを発生させる。形状誤差の大きさに応じて、各補正ユニット２のミラー側磁石３とベース側磁石４の磁石間距離を調整機構１３により調節して、発生力を調整する。複数の補正ユニット２によって、ミラー１に部分的に引張応力或いは圧縮応力が生じる。そのため、ミラー面１ａが引張応力あるいは圧縮応力に応じて部分的に弾性変形し、ミラー面１ａの形状誤差が補正される。本実施形態の光学装置１０は、永久磁石で構成される補正ユニット２により形状補正機構が発熱することなくミラー１の形状誤差を補正することができる。   The polarity of the base side magnet 4 of each correction unit 2 is selected according to the sign of the shape error indicating the direction and amount of force required to correct the shape error, and either the attractive force or the repulsive force is selected. To generate. According to the magnitude of the shape error, the distance between the mirror side magnet 3 and the base side magnet 4 of each correction unit 2 is adjusted by the adjusting mechanism 13 to adjust the generated force. Tensile stress or compressive stress is partially generated in the mirror 1 by the plurality of correction units 2. Therefore, the mirror surface 1a is partially elastically deformed according to tensile stress or compressive stress, and the shape error of the mirror surface 1a is corrected. The optical device 10 of the present embodiment can correct the shape error of the mirror 1 without the shape correction mechanism generating heat by the correction unit 2 formed of a permanent magnet.

次に、図３を参照して補正ユニット２の配置について説明する。図３は、図２の矢印Ａの方向で光学装置１０を見た正面図である。補正ユニット２は、同一円周上に９０°間隔で４箇所に配置し、それとは別のさらに外側の円周上に４５°間隔でさらに８箇所に配置する。しかしながら、補正ユニット２の配置はこれに限られるものではなく、補正したい光学収差によって個数および配置を変えてもよい。   Next, the arrangement of the correction unit 2 will be described with reference to FIG. 3 is a front view of the optical device 10 as viewed in the direction of arrow A in FIG. The correction units 2 are arranged at four positions at intervals of 90 ° on the same circumference, and are further arranged at eight places at intervals of 45 ° on a further outer circumference. However, the arrangement of the correction units 2 is not limited to this, and the number and arrangement may be changed depending on the optical aberration to be corrected.

なお、本実施形態の光学装置は要旨を逸脱しない範囲で種々に変形することが可能である。例えば、補正ユニット２の数や配置等を任意に設定することが可能である。また、ミラー１の外周部を固定部材６によってベースプレート５に固定しているが、ミラー１の任意の箇所を固定部材６によってベースプレート５に固定してもよい。また、ミラー１とベースプレート５の連結に、ねじや接着等の手段を採用してもよい。第１実施形態では、円形の凹面を有する球面ミラーをミラー１として用いる例について説明したが、それに限られるものではなく、例えば、平面ミラーや凸面を有する球面ミラーをミラー１として用いてもよい。計測部１２は、面形状を計測するセンサを例に説明したが、ミラー１の複数の位置を計測する複数の変位センサで構成されたセンサアレイを用いてもよい。   Note that the optical device according to the present embodiment can be variously modified without departing from the scope of the invention. For example, the number and arrangement of the correction units 2 can be arbitrarily set. Further, although the outer peripheral portion of the mirror 1 is fixed to the base plate 5 by the fixing member 6, any part of the mirror 1 may be fixed to the base plate 5 by the fixing member 6. Further, a means such as a screw or adhesion may be employed for connecting the mirror 1 and the base plate 5. In the first embodiment, an example in which a spherical mirror having a circular concave surface is used as the mirror 1 has been described. However, the present invention is not limited to this. For example, a flat mirror or a spherical mirror having a convex surface may be used as the mirror 1. Although the measuring unit 12 has been described by taking the sensor for measuring the surface shape as an example, a sensor array including a plurality of displacement sensors for measuring a plurality of positions of the mirror 1 may be used.

（第２実施形態）
次に、図４及び図５を参照して第２実施形態の光学装置２０及び形状誤差の補正方法について説明する。なお、図４及び図５において、第１実施形態と共通する部材には同じ符号を付し、その説明を省略する。図４は、第２実施形態に係る光学装置の断面図である。光学装置２０は、例えば、反射ミラー型の露光装置に用いられる大口径凹面ミラー装置であり、図１の露光装置ではミラー１に適用されうる。第２実施形態の光学装置２０は、例えば、露光装置の投影光学系に含まれるミラー１の反射面１ａを変形させることによって投影光学系の光学収差や、投影像の倍率や歪みやフォーカスを補正する。光学装置２０は、ミラー１と、ベースプレート５と、複数のアクチュエータ７と、複数の変位センサ１４と、制御部１１とを含む。 (Second Embodiment)
Next, the optical device 20 and the shape error correction method according to the second embodiment will be described with reference to FIGS. 4 and 5, members that are the same as those in the first embodiment are given the same reference numerals, and descriptions thereof are omitted. FIG. 4 is a cross-sectional view of the optical device according to the second embodiment. The optical device 20 is, for example, a large-diameter concave mirror device used in a reflection mirror type exposure apparatus, and can be applied to the mirror 1 in the exposure apparatus of FIG. The optical device 20 according to the second embodiment corrects optical aberration of the projection optical system, magnification, distortion, and focus of the projection image by deforming the reflecting surface 1a of the mirror 1 included in the projection optical system of the exposure apparatus, for example. To do. The optical device 20 includes a mirror 1, a base plate 5, a plurality of actuators 7, a plurality of displacement sensors 14, and a control unit 11.

制御部１１は、ＣＰＵやメモリなどを有し、変位センサ１４と複数のアクチュエータ７を制御する。アクチュエータ７は、ミラー１とベースプレート５との間に配置され、ミラー１の裏面１ｂに力を加える。アクチュエータ７は、裏面１ｂに固定された可動子磁石８とベースプレート５に固定されている固定子コイル９を有する。変位センサ１４は、ミラー１の裏面１ｂまでの距離を計測する。変位センサ１４の計測値をもとに制御部１１でアクチュエータ７の駆動指令値が算出され、所望の力が発生される。これにより、ミラー１の反射面１ａを高速かつ高精度に変形させることができ、投影光学系ＵＭにおける光学収差をリアルタイムかつ高精度に補正することができる。   The control unit 11 includes a CPU, a memory, and the like, and controls the displacement sensor 14 and the plurality of actuators 7. The actuator 7 is disposed between the mirror 1 and the base plate 5, and applies a force to the back surface 1 b of the mirror 1. The actuator 7 has a mover magnet 8 fixed to the back surface 1 b and a stator coil 9 fixed to the base plate 5. The displacement sensor 14 measures the distance to the back surface 1 b of the mirror 1. Based on the measured value of the displacement sensor 14, the controller 11 calculates a drive command value for the actuator 7, and a desired force is generated. Thereby, the reflecting surface 1a of the mirror 1 can be deformed at high speed and with high accuracy, and the optical aberration in the projection optical system UM can be corrected in real time with high accuracy.

また、光学装置２０は、補正ユニット２を有している。補正ユニット２は、ミラー１とベースプレート５の間に配置され、ミラー１の裏面１ｂに設置されたミラー側磁石３と対向するベースプレート５に配置されたベース側磁石４とで構成されている。補正ユニット２による形状補正方法は、第１実施形態と同様である。形状誤差の測定には、第１実施形態と同様に計測部１２を用いてもよいし、変位センサ１４を用いてもよい。   The optical device 20 has a correction unit 2. The correction unit 2 is arranged between the mirror 1 and the base plate 5, and includes a base side magnet 4 arranged on the base plate 5 facing the mirror side magnet 3 installed on the back surface 1 b of the mirror 1. The shape correction method by the correction unit 2 is the same as in the first embodiment. For measurement of the shape error, the measurement unit 12 may be used as in the first embodiment, or the displacement sensor 14 may be used.

ミラー１の組立誤差や加工誤差に起因する形状誤差を、この各アクチュエータ７で補正を行うと、形状誤差に応じて必要な力を常時出し続けなければならないので発熱が大きくなってしまい、ミラー１に意図しない変形をもたらしてしまう。しかし、補正ユニット２を用いて組立誤差や加工誤差に起因する形状誤差を補正することで、発熱することなく組立誤差や加工誤差に起因する形状誤差を補正することができる。これにより各アクチュエータは、投影光学系ＵＭにおける光学収差の補正に必要な変形駆動量に対して必要な力のみを発生すればよくなるので、相対的に発熱を抑えることができる。さらに、一般的に第２実施形態のように複数のアクチュエータで変形駆動を行う光学装置２０においてはミラー１に要求される加工精度は高くなるが、加工誤差を補正ユニット２で補正することができるので、ミラー１の加工時間及び加工コストを抑制できる。   If the actuator 7 corrects the shape error caused by the assembly error or processing error of the mirror 1, the necessary force must be continuously generated according to the shape error, so that the heat generation becomes large. Cause unintended deformation. However, by correcting the shape error caused by the assembly error or the machining error using the correction unit 2, the shape error caused by the assembly error or the machining error can be corrected without generating heat. As a result, each actuator only needs to generate a force necessary for the deformation driving amount necessary for correcting the optical aberration in the projection optical system UM, so that heat generation can be relatively suppressed. Further, in the optical device 20 that generally performs deformation driving with a plurality of actuators as in the second embodiment, the processing accuracy required for the mirror 1 is high, but the processing error can be corrected by the correction unit 2. Therefore, the processing time and processing cost of the mirror 1 can be suppressed.

次に、図５を用いて補正ユニット２及びアクチュエータ７の配置について説明する。図５は、図４の矢印Ｂの方向で光学装置２０を見た正面図である。第２実施形態では、補正ユニット２及びアクチュエータ７をそれぞれ同一円周上に９０°間隔で４箇所ずつ配置し、それとは別のさらに外側の円周上に４５°間隔でさらに８箇所ずつ配置している。しかしながら、補正ユニット２及びアクチュエータ７の配置の配置はこれに限られるものではなく、補正したい光学収差によって個数および配置を変えてもよい。   Next, the arrangement of the correction unit 2 and the actuator 7 will be described with reference to FIG. FIG. 5 is a front view of the optical device 20 as viewed in the direction of arrow B in FIG. In the second embodiment, the correction unit 2 and the actuator 7 are arranged at four positions at intervals of 90 ° on the same circumference, respectively, and at eight places at intervals of 45 ° on a further outer circumference. ing. However, the arrangement of the correction unit 2 and the actuator 7 is not limited to this, and the number and arrangement may be changed depending on the optical aberration to be corrected.

第２実施形態では、ミラー１の中心部を固定部材６によってベースプレート５に固定しているが、ミラー１の任意の箇所を固定部材６によってベースプレート５に固定してもよい。各アクチュエータ７としては、例えば、ボイスコイルモータ（ＶＣＭ）など、互いに接触しない可動子磁石８と固定子コイル９とを含む非接触型のアクチュエータや、圧電素子などの変位アクチュエータが用いられてもよい。   In the second embodiment, the central portion of the mirror 1 is fixed to the base plate 5 by the fixing member 6, but any part of the mirror 1 may be fixed to the base plate 5 by the fixing member 6. As each actuator 7, for example, a non-contact type actuator including a mover magnet 8 and a stator coil 9 that are not in contact with each other, such as a voice coil motor (VCM), or a displacement actuator such as a piezoelectric element may be used. .

以上説明したように、永久磁石で構成された補正ユニットで光学装置の形状補正を行うことで、第１実施形態に示したように形状補正に伴う発熱をすることなく、または、第２実施形態に示したように発熱を抑制して、高精度な形状補正を行うことができる。なお、上記実施形態では、露光装置に適用する例を説明したが、上記実施形態に係る光学装置を適用可能な装置は、例えば、ＥＵＶ光の照射により基板上にレジストの潜像パターンを形成するリソグラフィ装置がある。その他、レーザ加工装置、眼底撮影装置、望遠鏡等にも適用可能である。   As described above, the shape correction of the optical device is performed by the correction unit composed of the permanent magnet, so that the heat generation due to the shape correction as shown in the first embodiment or the second embodiment is performed. As shown in FIG. 5, heat generation can be suppressed and highly accurate shape correction can be performed. In the above embodiment, an example of application to an exposure apparatus has been described. However, an apparatus to which the optical apparatus according to the above embodiment can be applied forms, for example, a latent image pattern of a resist on a substrate by irradiation with EUV light. There is a lithographic apparatus. In addition, the present invention can be applied to a laser processing apparatus, a fundus photographing apparatus, a telescope, and the like.

（物品の製造方法に係る実施形態）
本実施形態にかかる物品の製造方法は、例えば、半導体デバイス等のマイクロデバイスや微細構造を有する素子等の物品を製造するのに好適である。本実施形態の物品の製造方法は、基板に塗布された感光剤に上記の露光装置を用いて潜像パターンを形成する工程（基板を露光する工程）と、かかる工程で潜像パターンが形成された基板を現像する工程とを含む。さらに、かかる製造方法は、他の周知の工程（酸化、成膜、蒸着、ドーピング、平坦化、エッチング、レジスト剥離、ダイシング、ボンディング、パッケージング等）を含む。本実施形態の物品の製造方法は、従来の方法に比べて、物品の性能・品質・生産性・生産コストの少なくとも１つにおいて有利である。 (Embodiment related to article manufacturing method)
The method for manufacturing an article according to the present embodiment is suitable for manufacturing an article such as a microdevice such as a semiconductor device or an element having a fine structure, for example. In the method for manufacturing an article according to the present embodiment, a latent image pattern is formed on the photosensitive agent applied to the substrate using the above-described exposure apparatus (a step of exposing the substrate), and the latent image pattern is formed in this step. Developing the substrate. Further, the manufacturing method includes other well-known steps (oxidation, film formation, vapor deposition, doping, planarization, etching, resist stripping, dicing, bonding, packaging, and the like). The method for manufacturing an article according to the present embodiment is advantageous in at least one of the performance, quality, productivity, and production cost of the article as compared with the conventional method.

以上、本発明の好ましい実施形態について説明したが、本発明は、これらの実施形態に限定されず、その要旨の範囲内で種々の変形および変更が可能である。   As mentioned above, although preferable embodiment of this invention was described, this invention is not limited to these embodiment, A various deformation | transformation and change are possible within the range of the summary.

１ ミラー
２ 補正ユニット
３ ミラー側磁石
４ ベース側磁石
５ ベース


1 Mirror 2 Correction Unit 3 Mirror Side Magnet 4 Base Side Magnet 5 Base


Claims (10)

光学素子の反射面を変形させる光学装置であって、
前記反射面の反対側の面に離間して配置されるベースプレートと、
前記反射面の反対側の面に取り付けられる第１の永久磁石と、前記ベースプレートの前記第１の永久磁石に対向する位置に配置される第２の永久磁石とを含む補正ユニットと、を有し、
前記補正ユニットは、前記第１の永久磁石と前記第２の永久磁石により発生する反発力または吸引力により、前記反射面の形状を補正することを特徴とする光学装置。 An optical device for deforming a reflective surface of an optical element,
A base plate that is spaced apart from the opposite surface of the reflecting surface;
A correction unit including a first permanent magnet attached to a surface opposite to the reflecting surface, and a second permanent magnet disposed at a position opposite to the first permanent magnet of the base plate. ,
The optical device is characterized in that the correction unit corrects the shape of the reflecting surface by a repulsive force or an attractive force generated by the first permanent magnet and the second permanent magnet. 前記第２の永久磁石の極性を変えることで、前記反発力と前記吸引力を切り替えることを特徴とする請求項１に記載の光学装置。   The optical apparatus according to claim 1, wherein the repulsive force and the attractive force are switched by changing a polarity of the second permanent magnet. 前記第２の永久磁石の極性は、前記反射面の形状を測定する計測部により計測された形状誤差に基づいて変えることを特徴とする請求項２に記載の光学装置。   The optical apparatus according to claim 2, wherein the polarity of the second permanent magnet is changed based on a shape error measured by a measuring unit that measures the shape of the reflecting surface. 前記第２の永久磁石の位置を調整することで、前記第１の永久磁石と前記第２の永久磁石との距離を調整する調整機構をさらに有することを特徴とする請求項１乃至３のうちいずれか１項に記載の光学装置。   The adjustment mechanism for adjusting the distance between the first permanent magnet and the second permanent magnet by adjusting the position of the second permanent magnet is further provided. The optical device according to any one of the above. 前記調整機構は、前記反射面の形状を測定する計測部により計測された形状誤差に基づいて前記第２の永久磁石の位置を調整することを特徴とする請求項４に記載の光学装置。   The optical device according to claim 4, wherein the adjustment mechanism adjusts a position of the second permanent magnet based on a shape error measured by a measurement unit that measures the shape of the reflecting surface. 前記反射面の反対側の面に取り付けられた磁石と、前記ベースプレートの前記磁石に対向する位置に配置されるコイルとを含むアクチュエータをさらに有することを特徴とする請求項１乃至５のうちいずれか１項に記載の光学装置。   The actuator according to any one of claims 1 to 5, further comprising an actuator including a magnet attached to a surface opposite to the reflecting surface and a coil disposed at a position facing the magnet of the base plate. The optical device according to item 1. 前記ベースプレートに配置された、前記ベースプレートと前記反射面の反対側の面との距離を計測する変位センサをさらに有することを特徴とする請求項６に記載の光学装置。   The optical apparatus according to claim 6, further comprising a displacement sensor that is disposed on the base plate and measures a distance between the base plate and a surface opposite to the reflecting surface. 前記アクチュエータは、前記変位センサが計測した前記距離に基づいて駆動することを特徴とする請求項７に記載の光学装置。   The optical device according to claim 7, wherein the actuator is driven based on the distance measured by the displacement sensor. 請求項１ないし８のいずれか１項に記載の光学装置を有することを特徴とする露光装置。   An exposure apparatus comprising the optical apparatus according to claim 1. 請求項９に記載の露光装置を用いて基板を露光する工程と、
前記露光された前記基板を現像する工程と、を含む
ことを特徴とする物品の製造方法。
Exposing the substrate using the exposure apparatus according to claim 9;
Developing the exposed substrate. A method for manufacturing an article.
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