JP2016172255A - カーボンファイバ成長用Fe微粒子形成方法 - Google Patents
カーボンファイバ成長用Fe微粒子形成方法 Download PDFInfo
- Publication number
- JP2016172255A JP2016172255A JP2016107353A JP2016107353A JP2016172255A JP 2016172255 A JP2016172255 A JP 2016172255A JP 2016107353 A JP2016107353 A JP 2016107353A JP 2016107353 A JP2016107353 A JP 2016107353A JP 2016172255 A JP2016172255 A JP 2016172255A
- Authority
- JP
- Japan
- Prior art keywords
- film
- metal
- substrate
- fine particles
- catalyst
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010419 fine particle Substances 0.000 title claims abstract description 65
- 238000000034 method Methods 0.000 title claims description 21
- 229920000049 Carbon (fiber) Polymers 0.000 title description 5
- 239000004917 carbon fiber Substances 0.000 title description 5
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 title description 4
- 229910052751 metal Inorganic materials 0.000 claims abstract description 107
- 239000002184 metal Substances 0.000 claims abstract description 100
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 49
- 239000003054 catalyst Substances 0.000 claims abstract description 46
- 238000000137 annealing Methods 0.000 claims abstract description 21
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 21
- 239000000758 substrate Substances 0.000 claims description 63
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 29
- 229910052760 oxygen Inorganic materials 0.000 claims description 29
- 239000001301 oxygen Substances 0.000 claims description 29
- 230000003197 catalytic effect Effects 0.000 claims description 24
- 239000007789 gas Substances 0.000 claims description 16
- 238000000151 deposition Methods 0.000 claims description 8
- 239000002245 particle Substances 0.000 abstract description 11
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 72
- 239000002041 carbon nanotube Substances 0.000 description 43
- 229910021393 carbon nanotube Inorganic materials 0.000 description 27
- 230000004888 barrier function Effects 0.000 description 16
- 238000010586 diagram Methods 0.000 description 13
- 229910000838 Al alloy Inorganic materials 0.000 description 12
- 229910000640 Fe alloy Inorganic materials 0.000 description 12
- 230000015572 biosynthetic process Effects 0.000 description 9
- 230000008021 deposition Effects 0.000 description 6
- 238000005328 electron beam physical vapour deposition Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000003426 co-catalyst Substances 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- MUBKMWFYVHYZAI-UHFFFAOYSA-N [Al].[Cu].[Zn] Chemical compound [Al].[Cu].[Zn] MUBKMWFYVHYZAI-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 238000000889 atomisation Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 229910001026 inconel Inorganic materials 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011859 microparticle Substances 0.000 description 1
- 239000002110 nanocone Substances 0.000 description 1
- 239000002121 nanofiber Substances 0.000 description 1
- 239000002116 nanohorn Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Abstract
【解決手段】真空チャンバ内に、炭素含有ガスに非反応の助触媒金属を導入すると共に、助触媒金属中に非金属元素を存在させ、次いで、炭素含有ガスに接触反応する触媒金属を導入し、次いで熱アニール処理を行うことで最表面に触媒金属微粒子を析出させる。
【選択図】図1
Description
4 バリア膜
6 Al膜
8 酸素
10 Al/Fe合金膜
12 Fe微粒子
14 CNT
Claims (4)
- 真空環境下の基板上に炭素含有ガスに非反応の助触媒金属を導入する第1工程と、
この第1工程後、上記助触媒金属中に非金属元素を存在させる第2工程と、
この第2工程後、上記助触媒金属中に上記非金属元素が存在した状態下で、上記基板上
に炭素含有ガスに接触反応する触媒金属を導入する第3工程と、
この第3工程後、上記基板に対して熱アニール処理を施すことで基板上最表面に触媒金
属微粒子を析出させる第4工程と、
を含むことを特徴とする触媒金属微粒子形成方法。 - 上記非金属元素が酸素である、請求項1に記載の方法。
- 上記助触媒金属が非磁性金属を主構成とし、上記触媒金属が磁性金属を主構成とする、
請求項1または2に記載の方法。 - 請求項1ないし3のいずれかに記載の方法により製造されたものであり、最表面に複数
の触媒金属微粒子を含む、ことを特徴とする触媒金属微粒子形成基板。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016107353A JP6212598B2 (ja) | 2016-05-30 | 2016-05-30 | カーボンファイバ成長用Fe微粒子形成方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016107353A JP6212598B2 (ja) | 2016-05-30 | 2016-05-30 | カーボンファイバ成長用Fe微粒子形成方法 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015112899A Division JP5989858B2 (ja) | 2015-06-03 | 2015-06-03 | 触媒金属微粒子形成基板 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2016172255A true JP2016172255A (ja) | 2016-09-29 |
JP6212598B2 JP6212598B2 (ja) | 2017-10-11 |
Family
ID=57007894
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016107353A Active JP6212598B2 (ja) | 2016-05-30 | 2016-05-30 | カーボンファイバ成長用Fe微粒子形成方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP6212598B2 (ja) |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005279624A (ja) * | 2004-03-27 | 2005-10-13 | Osaka Prefecture | カーボンナノチューブの製造用触媒、製造方法及び製造装置 |
JP2007091480A (ja) * | 2005-09-26 | 2007-04-12 | Sonac Kk | 触媒配置構造 |
JP2007091479A (ja) * | 2005-09-26 | 2007-04-12 | Sonac Kk | カーボンファイバの製造方法 |
JP2007302524A (ja) * | 2006-05-12 | 2007-11-22 | Ulvac Japan Ltd | カーボンナノコイルの成長方法 |
WO2008105936A2 (en) * | 2006-10-19 | 2008-09-04 | University Of Cincinnati | Composite catalyst and method for manufacturing carbon nanostructured materials |
JP2009078956A (ja) * | 2007-09-27 | 2009-04-16 | Panasonic Corp | カーボンナノチューブ複合体、これを用いたエネルギーデバイス及びカーボンナノチューブ複合体の製造方法 |
-
2016
- 2016-05-30 JP JP2016107353A patent/JP6212598B2/ja active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005279624A (ja) * | 2004-03-27 | 2005-10-13 | Osaka Prefecture | カーボンナノチューブの製造用触媒、製造方法及び製造装置 |
JP2007091480A (ja) * | 2005-09-26 | 2007-04-12 | Sonac Kk | 触媒配置構造 |
JP2007091479A (ja) * | 2005-09-26 | 2007-04-12 | Sonac Kk | カーボンファイバの製造方法 |
JP2007302524A (ja) * | 2006-05-12 | 2007-11-22 | Ulvac Japan Ltd | カーボンナノコイルの成長方法 |
WO2008105936A2 (en) * | 2006-10-19 | 2008-09-04 | University Of Cincinnati | Composite catalyst and method for manufacturing carbon nanostructured materials |
JP2009078956A (ja) * | 2007-09-27 | 2009-04-16 | Panasonic Corp | カーボンナノチューブ複合体、これを用いたエネルギーデバイス及びカーボンナノチューブ複合体の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JP6212598B2 (ja) | 2017-10-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US9023221B2 (en) | Method of forming multi-layer graphene | |
JP5027167B2 (ja) | カーボンナノチューブ構造体及びその製造方法 | |
JP2007161576A (ja) | カーボンナノチューブアレイの製造方法 | |
JP5029603B2 (ja) | カーボンナノチューブの製造方法 | |
JP2006052122A (ja) | 炭素ナノチューブのマトリックス構造及びその製造方法 | |
JP5194514B2 (ja) | 基板構造及びその製造方法 | |
US20230012266A1 (en) | Maskless patterning and control of graphene layers | |
JP4558735B2 (ja) | カーボンナノチューブデバイス、ならびに、その製造方法 | |
JP5783669B2 (ja) | 触媒金属微粒子形成方法 | |
JP5016791B2 (ja) | グラファイトナノファイバーの製造方法 | |
JP6212598B2 (ja) | カーボンファイバ成長用Fe微粒子形成方法 | |
JP5989858B2 (ja) | 触媒金属微粒子形成基板 | |
JP5636337B2 (ja) | カーボンナノチューブ膜の製造方法 | |
US20150147525A1 (en) | Method for enhancing growth of carbon nanotubes on substrates | |
JP2969503B2 (ja) | 炭素質ファイバーの作成方法 | |
JP5154801B2 (ja) | 支持体上への材料層の製造方法 | |
Knyazev et al. | Direct growth of graphene-like film microstructure on charge pre-patterned SiO 2/Si substrate | |
US7799374B2 (en) | Method for manufacturing field emission cathode | |
CN110791809B (zh) | 一种单层和双层可逆调控的氧化铈单晶纳米薄膜的制备方法 | |
US9175387B2 (en) | Method for fabricating two dimensional nanostructured tungsten carbide | |
US11602743B2 (en) | Methods for fabricating carbon nanotube arrays with a high structural factor | |
Lan et al. | Grids for Applications in High-Temperature High-Resolution Transmission Electron Microscopy | |
TWI251250B (en) | A method of forming carbon nanotubes | |
JP5808468B1 (ja) | カーボンナノチューブ製造用触媒粒子の保持構造及びその製造方法 | |
TWI494268B (zh) | 準直性奈米碳管之製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20160629 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20160629 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20170208 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20170214 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20170414 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20170829 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20170915 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6212598 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |