JP2004193525A5 - - Google Patents
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- Publication number
- JP2004193525A5 JP2004193525A5 JP2002363132A JP2002363132A JP2004193525A5 JP 2004193525 A5 JP2004193525 A5 JP 2004193525A5 JP 2002363132 A JP2002363132 A JP 2002363132A JP 2002363132 A JP2002363132 A JP 2002363132A JP 2004193525 A5 JP2004193525 A5 JP 2004193525A5
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- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002363132A JP4454931B2 (ja) | 2002-12-13 | 2002-12-13 | ドットパターンを有する基板の製造方法及び柱状構造体の製造方法 |
| AU2003285773A AU2003285773A1 (en) | 2002-12-13 | 2003-12-12 | Columnar structured material and method of manufacturing the same |
| US10/535,452 US7387967B2 (en) | 2002-12-13 | 2003-12-12 | Columnar structured material and method of manufacturing the same |
| PCT/JP2003/015950 WO2004055872A2 (en) | 2002-12-13 | 2003-12-12 | Columnar structured material and method of manufacturing the same |
| US12/119,739 US7892979B2 (en) | 2002-12-13 | 2008-05-13 | Columnar structured material and method of manufacturing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002363132A JP4454931B2 (ja) | 2002-12-13 | 2002-12-13 | ドットパターンを有する基板の製造方法及び柱状構造体の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004193525A JP2004193525A (ja) | 2004-07-08 |
| JP2004193525A5 true JP2004193525A5 (ja) | 2008-01-31 |
| JP4454931B2 JP4454931B2 (ja) | 2010-04-21 |
Family
ID=32588192
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002363132A Expired - Fee Related JP4454931B2 (ja) | 2002-12-13 | 2002-12-13 | ドットパターンを有する基板の製造方法及び柱状構造体の製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (2) | US7387967B2 (ja) |
| JP (1) | JP4454931B2 (ja) |
| AU (1) | AU2003285773A1 (ja) |
| WO (1) | WO2004055872A2 (ja) |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4454931B2 (ja) * | 2002-12-13 | 2010-04-21 | キヤノン株式会社 | ドットパターンを有する基板の製造方法及び柱状構造体の製造方法 |
| JP4923477B2 (ja) | 2004-11-24 | 2012-04-25 | 株式会社豊田中央研究所 | 量子ドットアレイ及びその製造方法、並びに量子ドットアレイ素子及びその製造方法 |
| DE102004060738B4 (de) * | 2004-12-15 | 2008-07-03 | Forschungszentrum Jülich GmbH | Verfahren zum strukturierten Aufbringen von Molekülen auf eine Leiterbahn |
| WO2007062527A1 (en) * | 2005-11-30 | 2007-06-07 | The Governors Of The University Of Alberta | Organic columnar thin films |
| FR2895391B1 (fr) * | 2005-12-27 | 2008-01-25 | Commissariat Energie Atomique | Procede d'elaboration de nanostructures ordonnees |
| WO2007105405A1 (ja) * | 2006-03-10 | 2007-09-20 | Matsushita Electric Industrial Co., Ltd. | 異方性形状部材のマウント方法およびマウント装置と、電子デバイスの製造方法と、電子デバイスと、表示装置 |
| US8045141B2 (en) * | 2006-05-12 | 2011-10-25 | Canon Kabushiki Kaisha | Detecting element, detecting device and detecting method |
| EP1879214B1 (en) * | 2006-07-11 | 2011-10-12 | Canon Kabushiki Kaisha | Substrate for mass spectrometry, and method for manufacturing substrate for mass spectrometry |
| KR101291223B1 (ko) * | 2007-08-09 | 2013-07-31 | 한국과학기술원 | 블록 공중합체를 이용한 미세 패턴 형성 방법 |
| KR101039140B1 (ko) * | 2007-10-26 | 2011-06-03 | 주식회사 하이닉스반도체 | 고집적 반도체 메모리소자의 제조방법 |
| JP2010016162A (ja) * | 2008-07-03 | 2010-01-21 | Oki Semiconductor Co Ltd | 多孔質構造体の製造方法 |
| US8148264B2 (en) | 2009-02-25 | 2012-04-03 | California Institue Of Technology | Methods for fabrication of high aspect ratio micropillars and nanopillars |
| EP2446467A4 (en) | 2009-06-26 | 2014-07-02 | California Inst Of Techn | METHOD FOR PRODUCING PASSIVATED SILICON NANODRICES AND APPARATUS THUS OBTAINED THEREFOR |
| US8809093B2 (en) | 2009-11-19 | 2014-08-19 | California Institute Of Technology | Methods for fabricating self-aligning semicondutor heterostructures using silicon nanowires |
| US9018684B2 (en) | 2009-11-23 | 2015-04-28 | California Institute Of Technology | Chemical sensing and/or measuring devices and methods |
| JP6046974B2 (ja) * | 2012-09-28 | 2016-12-21 | 東京エレクトロン株式会社 | パターン形成方法 |
| US9347196B2 (en) | 2014-02-07 | 2016-05-24 | Bennie R. Wagler | Post-frame footing assembly and vertical post |
| US10761428B2 (en) | 2018-08-28 | 2020-09-01 | Saudi Arabian Oil Company | Fabricating calcite nanofluidic channels |
| US10926227B2 (en) * | 2018-12-03 | 2021-02-23 | Saudi Arabian Oil Company | Fabricating calcite nanofluidic channels |
| CN111637783B (zh) * | 2020-05-11 | 2021-07-20 | 东南大学 | 一种用于蒸汽冷凝的仿生亲疏水结构及制备方法 |
| US11961702B2 (en) | 2021-12-09 | 2024-04-16 | Saudi Arabian Oil Company | Fabrication of in situ HR-LCTEM nanofluidic cell for nanobubble interactions during EOR processes in carbonate rocks |
| US11787993B1 (en) | 2022-03-28 | 2023-10-17 | Saudi Arabian Oil Company | In-situ foamed gel for lost circulation |
| US11913319B2 (en) | 2022-06-21 | 2024-02-27 | Saudi Arabian Oil Company | Sandstone stimulation |
Family Cites Families (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL6908381A (ja) * | 1969-06-03 | 1970-12-07 | ||
| JPS58142523A (ja) | 1982-02-19 | 1983-08-24 | Tadashi Mizoguchi | 非平衡相薄膜作製装置 |
| US4420365A (en) * | 1983-03-14 | 1983-12-13 | Fairchild Camera And Instrument Corporation | Formation of patterned film over semiconductor structure |
| US5068152A (en) * | 1987-11-26 | 1991-11-26 | Hitachi Maxell, Ltd. | Magnetic recording medium |
| JP2684201B2 (ja) | 1987-11-26 | 1997-12-03 | 日立マクセル株式会社 | 磁気記録媒体 |
| GB9014979D0 (en) * | 1990-07-06 | 1990-08-29 | Walters Colin R | Method of fabricating an elongated artefact |
| AU8872891A (en) * | 1990-10-15 | 1992-05-20 | United Solar Systems Corporation | Monolithic solar cell array and method for its manufacture |
| JPH0555545A (ja) | 1991-08-27 | 1993-03-05 | Matsushita Electric Ind Co Ltd | 量子素子の製造方法 |
| US5240558A (en) * | 1992-10-27 | 1993-08-31 | Motorola, Inc. | Method for forming a semiconductor device |
| JPH07202164A (ja) * | 1993-12-28 | 1995-08-04 | Furukawa Electric Co Ltd:The | 半導体微細構造の製作方法 |
| JP3135110B2 (ja) | 1995-11-29 | 2001-02-13 | 工業技術院長 | 多孔質セラミックス膜とその製造方法 |
| JP3182522B2 (ja) * | 1996-12-20 | 2001-07-03 | ファインセラミックス技術研究組合 | 一次元貫通気孔を持つセラミック膜とその製造方法 |
| JPH10189779A (ja) | 1996-12-27 | 1998-07-21 | Sanyo Electric Co Ltd | 半導体装置及びその製造方法 |
| JP2993470B2 (ja) | 1997-07-14 | 1999-12-20 | 日本電気株式会社 | 半導体立体量子構造の作製方法 |
| JPH11112099A (ja) * | 1997-09-30 | 1999-04-23 | Nippon Telegr & Teleph Corp <Ntt> | 半導体光素子の作製方法 |
| JPH11251334A (ja) | 1998-03-06 | 1999-09-17 | Furukawa Electric Co Ltd:The | 電界効果トランジスタ |
| JP4532634B2 (ja) * | 1998-12-25 | 2010-08-25 | キヤノン株式会社 | 細孔の製造方法 |
| US6602620B1 (en) * | 1998-12-28 | 2003-08-05 | Kabushiki Kaisha Toshiba | Magnetic recording apparatus, magnetic recording medium and manufacturing method thereof |
| JP2000327491A (ja) | 1999-05-11 | 2000-11-28 | Hitachi Maxell Ltd | 無機化合物薄膜、磁気記録媒体および磁気記録装置 |
| AU4431100A (en) * | 1999-05-11 | 2000-11-21 | Hitachi Maxell, Ltd. | Magnetic recording medium and its production method, and magnetic recorder |
| JP2001261376A (ja) | 2000-03-17 | 2001-09-26 | Asahi Glass Co Ltd | 防曇膜および防曇膜付き基体 |
| WO2001071394A1 (fr) | 2000-03-21 | 2001-09-27 | Asahi Glass Company, Limited | Article antireflet et procédé de production |
| TW447013B (en) * | 2000-05-18 | 2001-07-21 | Nat Science Council | Manufacturing method for self-polymerized silicon quantum dots |
| US6518194B2 (en) * | 2000-12-28 | 2003-02-11 | Thomas Andrew Winningham | Intermediate transfer layers for nanoscale pattern transfer and nanostructure formation |
| US6936854B2 (en) * | 2001-05-10 | 2005-08-30 | Canon Kabushiki Kaisha | Optoelectronic substrate |
| AU2003207199A1 (en) | 2002-02-12 | 2003-09-04 | Canon Kabushiki Kaisha | Structure, method of manufacturing the same, and device using the same |
| AU2003221347A1 (en) * | 2002-03-15 | 2003-09-29 | Canon Kabushiki Kaisha | Functional device and method of manufacturing the device, vertical magnetic recording medium, magnetic recording and reproducing device, and information processing device |
| US6972146B2 (en) * | 2002-03-15 | 2005-12-06 | Canon Kabushiki Kaisha | Structure having holes and method for producing the same |
| AU2003213353A1 (en) * | 2002-03-15 | 2003-09-29 | Canon Kabushiki Kaisha | Porous material and process for producing the same |
| AU2003221365A1 (en) * | 2002-03-15 | 2003-09-29 | Canon Kabushiki Kaisha | Porous material and process for producing the same |
| JP4454931B2 (ja) * | 2002-12-13 | 2010-04-21 | キヤノン株式会社 | ドットパターンを有する基板の製造方法及び柱状構造体の製造方法 |
-
2002
- 2002-12-13 JP JP2002363132A patent/JP4454931B2/ja not_active Expired - Fee Related
-
2003
- 2003-12-12 WO PCT/JP2003/015950 patent/WO2004055872A2/en active Application Filing
- 2003-12-12 US US10/535,452 patent/US7387967B2/en not_active Expired - Fee Related
- 2003-12-12 AU AU2003285773A patent/AU2003285773A1/en not_active Abandoned
-
2008
- 2008-05-13 US US12/119,739 patent/US7892979B2/en not_active Expired - Fee Related