FR2501725B1 - Procede et dispositif pour l'evaporation d'un materiau sous vide - Google Patents
Procede et dispositif pour l'evaporation d'un materiau sous videInfo
- Publication number
- FR2501725B1 FR2501725B1 FR8204159A FR8204159A FR2501725B1 FR 2501725 B1 FR2501725 B1 FR 2501725B1 FR 8204159 A FR8204159 A FR 8204159A FR 8204159 A FR8204159 A FR 8204159A FR 2501725 B1 FR2501725 B1 FR 2501725B1
- Authority
- FR
- France
- Prior art keywords
- evaporating
- vacuum material
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Toxicology (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH171981A CH645137A5 (de) | 1981-03-13 | 1981-03-13 | Verfahren und vorrichtung zum verdampfen von material unter vakuum. |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2501725A1 FR2501725A1 (fr) | 1982-09-17 |
FR2501725B1 true FR2501725B1 (fr) | 1985-06-28 |
Family
ID=4217002
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR8204159A Expired FR2501725B1 (fr) | 1981-03-13 | 1982-03-12 | Procede et dispositif pour l'evaporation d'un materiau sous vide |
Country Status (6)
Country | Link |
---|---|
US (1) | US4448802A (fr) |
JP (1) | JPS57161062A (fr) |
CH (1) | CH645137A5 (fr) |
DE (1) | DE3206882C2 (fr) |
FR (1) | FR2501725B1 (fr) |
GB (1) | GB2095029B (fr) |
Families Citing this family (62)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH658545A5 (de) * | 1982-09-10 | 1986-11-14 | Balzers Hochvakuum | Verfahren zum gleichmaessigen erwaermen von heizgut in einem vakuumrezipienten. |
DE3406953C2 (de) * | 1983-04-19 | 1986-03-13 | Balzers Hochvakuum Gmbh, 6200 Wiesbaden | Verfahren zum Erwärmen von Heizgut in einem Vakuumrezipienten |
US5096558A (en) * | 1984-04-12 | 1992-03-17 | Plasco Dr. Ehrich Plasma - Coating Gmbh | Method and apparatus for evaporating material in vacuum |
CH664163A5 (de) * | 1985-03-01 | 1988-02-15 | Balzers Hochvakuum | Verfahren zum reaktiven aufdampfen von schichten aus oxiden, nitriden, oxynitriden und karbiden. |
DE3615361C2 (de) * | 1986-05-06 | 1994-09-01 | Santos Pereira Ribeiro Car Dos | Vorrichtung zur Oberflächenbehandlung von Werkstücken |
JPS6318064A (ja) * | 1986-07-10 | 1988-01-25 | Nippon Kokan Kk <Nkk> | 真空蒸着方法 |
JPS6318058A (ja) * | 1986-07-10 | 1988-01-25 | Nippon Kokan Kk <Nkk> | 真空蒸着装置 |
JPS6318063A (ja) * | 1986-07-10 | 1988-01-25 | Nippon Kokan Kk <Nkk> | 真空蒸着方法 |
US4777908A (en) * | 1986-11-26 | 1988-10-18 | Optical Coating Laboratory, Inc. | System and method for vacuum deposition of thin films |
US4882198A (en) * | 1986-11-26 | 1989-11-21 | Optical Coating Laboratory, Inc. | System and method for vacuum deposition of thin films |
US5133845A (en) * | 1986-12-12 | 1992-07-28 | Sorin Biomedica, S.P.A. | Method for making prosthesis of polymeric material coated with biocompatible carbon |
GB8701414D0 (en) * | 1987-01-22 | 1987-02-25 | Matthews A | Heating enhancement in physical vapour deposition |
US4863581A (en) * | 1987-02-12 | 1989-09-05 | Kawasaki Steel Corp. | Hollow cathode gun and deposition device for ion plating process |
US4866239A (en) * | 1988-05-31 | 1989-09-12 | The Boc Group, Inc. | Vapor source assembly with crucible |
US5234561A (en) * | 1988-08-25 | 1993-08-10 | Hauzer Industries Bv | Physical vapor deposition dual coating process |
US4951604A (en) * | 1989-02-17 | 1990-08-28 | Optical Coating Laboratory, Inc. | System and method for vacuum deposition of thin films |
US5075181A (en) * | 1989-05-05 | 1991-12-24 | Kennametal Inc. | High hardness/high compressive stress multilayer coated tool |
ATE133718T1 (de) * | 1989-08-21 | 1996-02-15 | Balzers Hochvakuum | Beschichtetes werkstück mit einer mischkristallbeschichtung, verfahren zu dessen herstellung, sowie vorrichtung zur durchführung des verfahrens |
DE4006457C2 (de) * | 1990-03-01 | 1993-09-30 | Balzers Hochvakuum | Verfahren zum Verdampfen von Material in einer Vakuumaufdampfanlage sowie Anlage derselben |
ATE146010T1 (de) * | 1990-03-01 | 1996-12-15 | Balzers Hochvakuum | Vorrichtung und verfahren zum verdampfen von material im vakuum sowie anwendung des verfahrens |
US5238546A (en) * | 1990-03-01 | 1993-08-24 | Balzers Aktiengesellschaft | Method and apparatus for vaporizing materials by plasma arc discharge |
DE4006456C1 (en) * | 1990-03-01 | 1991-05-29 | Balzers Ag, Balzers, Li | Appts. for vaporising material in vacuum - has electron beam gun or laser guided by electromagnet to form cloud or pre-melted spot on the target surface |
EP0470777A3 (en) * | 1990-08-07 | 1993-06-02 | The Boc Group, Inc. | Thin gas barrier films and rapid deposition method therefor |
US5232318A (en) * | 1990-09-17 | 1993-08-03 | Kennametal Inc. | Coated cutting tools |
US5250367A (en) * | 1990-09-17 | 1993-10-05 | Kennametal Inc. | Binder enriched CVD and PVD coated cutting tool |
US5325747A (en) * | 1990-09-17 | 1994-07-05 | Kennametal Inc. | Method of machining using coated cutting tools |
US5266388A (en) * | 1990-09-17 | 1993-11-30 | Kennametal Inc. | Binder enriched coated cutting tool |
WO1992005296A1 (fr) * | 1990-09-17 | 1992-04-02 | Kennametal Inc. | Outils a decouper recouverts d'une couche cvd et d'une couche pvd |
DE4035131C2 (de) * | 1990-11-05 | 1995-09-21 | Balzers Hochvakuum | Verfahren und Vorrichtung zum gleichmäßigen Erwärmen von Heizgut, insbes. von zu beschichtenden Substraten, in einer Vakuumkammer |
US5250779A (en) * | 1990-11-05 | 1993-10-05 | Balzers Aktiengesellschaft | Method and apparatus for heating-up a substrate by means of a low voltage arc discharge and variable magnetic field |
CH683776A5 (de) * | 1991-12-05 | 1994-05-13 | Alusuisse Lonza Services Ag | Beschichten einer Substratfläche mit einer Permeationssperre. |
CH687111A5 (de) * | 1992-05-26 | 1996-09-13 | Balzers Hochvakuum | Verfahren zum Erzeugen einer Niederspannungsentladung, Vakuumbehandlungsanlage hierfuer sowie Anwendung des Verfahrens. |
JPH0822483B2 (ja) * | 1993-08-05 | 1996-03-06 | 工業技術院長 | レーザ放電誘導式放電加工装置 |
DE4336681C2 (de) * | 1993-10-27 | 1996-10-02 | Fraunhofer Ges Forschung | Verfahren und Einrichtung zum plasmaaktivierten Elektronenstrahlverdampfen |
DE4336680C2 (de) * | 1993-10-27 | 1998-05-14 | Fraunhofer Ges Forschung | Verfahren zum Elektronenstrahlverdampfen |
US5418345A (en) * | 1994-02-28 | 1995-05-23 | United Technologies Corporation | Method for forming shaped passages |
DE4421045C2 (de) * | 1994-06-17 | 1997-01-23 | Dresden Vakuumtech Gmbh | Einrichtung zur plamagestützten Beschichtung von Substraten, insbesondere mit elektrisch isolierendem Material |
JP2655094B2 (ja) * | 1994-08-30 | 1997-09-17 | 日本電気株式会社 | 電子銃蒸着装置 |
US5753319A (en) * | 1995-03-08 | 1998-05-19 | Corion Corporation | Method for ion plating deposition |
DE29615190U1 (de) * | 1996-03-11 | 1996-11-28 | Balzers Verschleissschutz GmbH, 55411 Bingen | Anlage zur Beschichtung von Werkstücken |
US5750247A (en) * | 1996-03-15 | 1998-05-12 | Kennametal, Inc. | Coated cutting tool having an outer layer of TiC |
DE19612345C1 (de) * | 1996-03-28 | 1997-01-16 | Fraunhofer Ges Forschung | Verfahren zum plasmaaktivierten Hochgeschwindigkeits-Bedampfen großflächiger Substrate |
DE19612344C1 (de) * | 1996-03-28 | 1997-08-21 | Fraunhofer Ges Forschung | Einrichtung zur plasmaaktivierten Hochratebedampfung |
US6223683B1 (en) | 1997-03-14 | 2001-05-01 | The Coca-Cola Company | Hollow plastic containers with an external very thin coating of low permeability to gases and vapors through plasma-assisted deposition of inorganic substances and method and system for making the coating |
US5902462A (en) * | 1997-03-27 | 1999-05-11 | Krauss; Alan R. | Filtered cathodic arc deposition apparatus and method |
AU4028297A (en) * | 1997-09-12 | 1999-04-05 | Balzers Aktiengesellschaft | Tool having a protective layer system |
US6251233B1 (en) | 1998-08-03 | 2001-06-26 | The Coca-Cola Company | Plasma-enhanced vacuum vapor deposition system including systems for evaporation of a solid, producing an electric arc discharge and measuring ionization and evaporation |
US7300559B2 (en) * | 2000-04-10 | 2007-11-27 | G & H Technologies Llc | Filtered cathodic arc deposition method and apparatus |
CA2305938C (fr) * | 2000-04-10 | 2007-07-03 | Vladimir I. Gorokhovsky | Methode et appareillage de depot d'arc cathodique filtre |
US6348764B1 (en) * | 2000-08-17 | 2002-02-19 | Taiwan Semiconductor Manufacturing Company, Ltd | Indirect hot cathode (IHC) ion source |
US6740378B1 (en) | 2000-08-24 | 2004-05-25 | The Coca-Cola Company | Multilayer polymeric/zero valent material structure for enhanced gas or vapor barrier and uv barrier and method for making same |
US6720052B1 (en) | 2000-08-24 | 2004-04-13 | The Coca-Cola Company | Multilayer polymeric/inorganic oxide structure with top coat for enhanced gas or vapor barrier and method for making same |
ITRM20010060A1 (it) * | 2001-02-06 | 2001-05-07 | Carlo Misiano | Perfezionamento di un metodo e apparato per la deposizione di film sottili, soprattutto in condizioni reattive. |
US6599584B2 (en) * | 2001-04-27 | 2003-07-29 | The Coca-Cola Company | Barrier coated plastic containers and coating methods therefor |
DE10129507C2 (de) * | 2001-06-19 | 2003-07-17 | Fraunhofer Ges Forschung | Einrichtung zur plasmaaktivierten Bedampfung großer Flächen |
AU2003226307A1 (en) * | 2002-04-15 | 2003-11-03 | Colormatrix Corporation | Coating composition containing an epoxide additive and structures coated therewith |
US20050181177A1 (en) * | 2004-02-18 | 2005-08-18 | Jamie Knapp | Isotropic glass-like conformal coatings and methods for applying same to non-planar substrate surfaces at microscopic levels |
DE102009019146B4 (de) * | 2009-04-29 | 2014-07-24 | THEVA DüNNSCHICHTTECHNIK GMBH | Verfahren und Vorrichtung zur Hochratenbeschichtung durch Hochdruckverdampfen |
WO2010141306A1 (fr) * | 2009-06-03 | 2010-12-09 | Ixys Corporation | Procédés et appareils pour transformer du dioxyde de carbone et traiter des déchets |
CN201864770U (zh) * | 2010-11-22 | 2011-06-15 | 江苏淘镜有限公司 | 电子枪蒸发用坩埚 |
US20150152543A1 (en) * | 2013-10-30 | 2015-06-04 | Skyworks Solutions, Inc. | Systems, devices and methods related to reactive evaporation of refractory materials |
CN112176293A (zh) * | 2020-09-28 | 2021-01-05 | 杨雪 | 一种耐高温多弧离子真空镀膜装置及其镀膜方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL292036A (fr) * | 1900-01-01 | |||
US2998376A (en) * | 1956-10-29 | 1961-08-29 | Temescal Metallurgical Corp | High-vacuum evaporator |
DE2519537C2 (de) * | 1975-05-02 | 1982-11-04 | Leybold-Heraeus GmbH, 5000 Köln | Elektronenstrahlgerät für Heiz-, Schmelz- und Verdampfungszwecke mit Ablenksystemen |
DE2624005C2 (de) * | 1976-05-28 | 1982-04-08 | Siemens AG, 1000 Berlin und 8000 München | Verfahren und Vorrichtung zum Aufbringen von dünnen Schichten auf ein Substrat nach dem "Ion-plating"-Verfahren. |
CH631743A5 (de) * | 1977-06-01 | 1982-08-31 | Balzers Hochvakuum | Verfahren zum aufdampfen von material in einer vakuumaufdampfanlage. |
FR2405111A1 (fr) * | 1977-10-07 | 1979-05-04 | Thomson Csf | Procede d'usinage par bombardement ionique et dispositif de mise en oeuvre d'un tel procede |
CH619344B (de) * | 1977-12-23 | Balzers Hochvakuum | Verfahren zur herstellung goldfarbener ueberzuege. |
-
1981
- 1981-03-13 CH CH171981A patent/CH645137A5/de not_active IP Right Cessation
-
1982
- 1982-02-26 DE DE3206882A patent/DE3206882C2/de not_active Expired
- 1982-03-12 JP JP57039259A patent/JPS57161062A/ja active Granted
- 1982-03-12 FR FR8204159A patent/FR2501725B1/fr not_active Expired
- 1982-03-12 GB GB8207351A patent/GB2095029B/en not_active Expired
- 1982-03-12 US US06/357,719 patent/US4448802A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE3206882A1 (de) | 1982-10-14 |
JPS629188B2 (fr) | 1987-02-26 |
FR2501725A1 (fr) | 1982-09-17 |
GB2095029A (en) | 1982-09-22 |
US4448802A (en) | 1984-05-15 |
GB2095029B (en) | 1984-09-26 |
CH645137A5 (de) | 1984-09-14 |
JPS57161062A (en) | 1982-10-04 |
DE3206882C2 (de) | 1985-04-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |