FR2252419A1 - - Google Patents

Info

Publication number
FR2252419A1
FR2252419A1 FR7503019A FR7503019A FR2252419A1 FR 2252419 A1 FR2252419 A1 FR 2252419A1 FR 7503019 A FR7503019 A FR 7503019A FR 7503019 A FR7503019 A FR 7503019A FR 2252419 A1 FR2252419 A1 FR 2252419A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7503019A
Other languages
French (fr)
Other versions
FR2252419B1 (de
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Balzers Patent und Beteiligungs AG
Original Assignee
Balzers Patent und Beteiligungs AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers Patent und Beteiligungs AG filed Critical Balzers Patent und Beteiligungs AG
Publication of FR2252419A1 publication Critical patent/FR2252419A1/fr
Application granted granted Critical
Publication of FR2252419B1 publication Critical patent/FR2252419B1/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/139—Associated with semiconductor wafer handling including wafer charging or discharging means for vacuum chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
FR7503019A 1973-11-22 1975-01-31 Expired FR2252419B1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH1660273A CH573985A5 (de) 1973-11-22 1973-11-22

Publications (2)

Publication Number Publication Date
FR2252419A1 true FR2252419A1 (de) 1975-06-20
FR2252419B1 FR2252419B1 (de) 1980-06-06

Family

ID=4418700

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7503019A Expired FR2252419B1 (de) 1973-11-22 1975-01-31

Country Status (6)

Country Link
US (1) US3915117A (de)
CH (1) CH573985A5 (de)
DE (1) DE2454544C4 (de)
FR (1) FR2252419B1 (de)
GB (1) GB1466790A (de)
NL (1) NL165224C (de)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2439243A1 (fr) * 1978-04-07 1980-05-16 Varian Associates Installation de transport de pieces a travers une chambre de traitement sous vide et vanne d'isolement correspondante
FR2604027A1 (fr) * 1986-07-23 1988-03-18 Boc Group Inc Machine de traitement de galettes, notamment de metallisation de galettes comportant un systeme de transport et de stockage de galettes sous vide
EP0421498A2 (de) * 1989-09-11 1991-04-10 Consorzio Ce.Te.V. Centro Tecnologie Del Vuoto Vorrichtung zum Einschleusen von Substraten oder anderen Artikeln in einen Vakuumkessel
EP0443049A1 (de) * 1989-09-13 1991-08-28 Sony Corporation Kathodenzerstäubungsgerät und kathodenzerstäubungsanlage
EP0448782A2 (de) * 1990-03-26 1991-10-02 Leybold Aktiengesellschaft Vorrichtung zum Ein- und Ausschleusen eines Werkstücks in eine Vakuumkammer
EP0449227A2 (de) * 1990-03-30 1991-10-02 Sony Corporation Sputteranlage

Families Citing this family (53)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2740129A1 (de) * 1976-09-18 1978-03-23 Claude John Lancelot Hunt Verfahren und vorrichtung zur metallbedampfung
US4226208A (en) * 1977-08-04 1980-10-07 Canon Kabushiki Kaisha Vapor deposition apparatus
DE2847632A1 (de) * 1977-11-19 1979-05-23 Claude John Lancelot Hunt Vakuummetallisierungsvorrichtung
DE2940064A1 (de) * 1979-10-03 1981-04-16 Leybold-Heraeus GmbH, 5000 Köln Vakuumaufdampfanlage mir einer ventilkammer, einer bedampfungskammer und einer verdampferkammer
US5024747A (en) * 1979-12-21 1991-06-18 Varian Associates, Inc. Wafer coating system
US4756815A (en) * 1979-12-21 1988-07-12 Varian Associates, Inc. Wafer coating system
JPS58197262A (ja) * 1982-05-13 1983-11-16 Canon Inc 量産型真空成膜装置及び真空成膜法
US4500407A (en) * 1983-07-19 1985-02-19 Varian Associates, Inc. Disk or wafer handling and coating system
DE3448599B4 (de) * 1983-11-28 2004-04-08 Hitachi, Ltd. Verfahren zur Durchführung einer Behandlung unter Vakuum
JPS60184678A (ja) * 1984-03-02 1985-09-20 Canon Inc 真空処理装置
US4534314A (en) * 1984-05-10 1985-08-13 Varian Associates, Inc. Load lock pumping mechanism
JPS61291032A (ja) * 1985-06-17 1986-12-20 Fujitsu Ltd 真空装置
CA1287594C (en) * 1986-04-04 1991-08-13 Miroslav Eror Method and apparatus for handling and processing wafer like materials
DE3716498C2 (de) * 1987-05-16 1994-08-04 Leybold Ag Vorrichtung zum Ein- und Ausschleusen von Werkstücken in eine Beschichtungskammer
DE3735284A1 (de) * 1987-10-17 1989-04-27 Leybold Ag Vorrichtung nach dem karussell-prinzip zum beschichten von substraten
US4951603A (en) * 1988-09-12 1990-08-28 Daidousanso Co., Ltd. Apparatus for producing semiconductors
US5259942A (en) * 1989-03-30 1993-11-09 Leybold Aktiengesellschaft Device for transferring a workpiece into and out from a vacuum chamber
DE59001747D1 (de) * 1989-03-30 1993-07-22 Leybold Ag Vorrichtung zum ein- und ausschleusen eines werkstuecks in eine vakuumkammer.
DE4009603A1 (de) * 1989-03-30 1990-10-04 Leybold Ag Vorrichtung zum ein- und ausschleusen eines werkstuecks in eine vakuumkammer
US5002010A (en) * 1989-10-18 1991-03-26 Varian Associates, Inc. Vacuum vessel
JP2913745B2 (ja) * 1990-04-10 1999-06-28 松下電器産業株式会社 真空蒸着装置
DE4117969C2 (de) * 1991-05-31 2000-11-09 Balzers Ag Liechtenstein Vakuumkammer
EP1179611B1 (de) * 1992-10-06 2004-09-15 Unaxis Balzers Aktiengesellschaft Kammer für den Transport von Werkstücken
CH691377A5 (de) * 1992-10-06 2001-07-13 Unaxis Balzers Ag Kammeranordnung für den Transport von Werkstücken und deren Verwendung.
DE4235674C2 (de) * 1992-10-22 2000-12-28 Balzers Ag Liechtenstein Kammer für den Transport von Werkstücken in Vakuumatmosphäre, Kammerkombination und Verfahren zum Transportieren eines Werkstückes
DE4235676C2 (de) * 1992-10-22 1997-08-28 Balzers Hochvakuum Vakuumkammer zum Transport scheibenförmiger Werkstücke in einer Vakuumanlage
DE4235677C2 (de) * 1992-10-22 1996-10-31 Balzers Hochvakuum Vakuumkammer, Vakuumbehandlungsanlage mit einer solchen Kammer sowie Transportverfahren
DE4302851A1 (de) * 1993-02-02 1994-08-04 Leybold Ag Vorrichtung zum Anbringen und/oder Entfernen einer Maske an einem Substrat
DE4341635C2 (de) * 1993-12-07 2002-07-18 Unaxis Deutschland Holding Vakuumbeschichtungsanlage
NL1000138C2 (nl) * 1995-04-13 1996-10-15 Od & Me Bv Inrichtingen voor het bewerken van een substraat alsmede werkwijze geschikt voor toepassing bij dergelijke inrichtingen.
US5773088A (en) * 1995-12-05 1998-06-30 Materials Research Group, Inc. Treatment system including vacuum isolated sources and method
DE19624609B4 (de) * 1996-06-20 2009-04-16 Leybold Optics Gmbh Vakuumbehandlungsanlage zum Aufbringen dünner Schichten auf Substrate, beispielsweise auf Scheinwerferreflektoren
DE19626861B4 (de) * 1996-07-04 2009-04-16 Leybold Optics Gmbh Vakuumbehandlungsanlage zum Aufbringen dünner Schichten auf Substrate, beispielsweise auf Scheinwerferreflektoren
DE19642852A1 (de) 1996-10-17 1998-04-23 Leybold Systems Gmbh Vakuumbehandlungsanlage zum Aufbringen dünner Schichten auf dreidimensionale, schalenförmige oder prismatische Substrate
DE19742923A1 (de) 1997-09-29 1999-04-01 Leybold Systems Gmbh Vorrichtung zum Beschichten eines im wesentlichen flachen, scheibenförmigen Substrats
EP0943699B1 (de) 1998-02-19 2003-12-17 Applied Films GmbH & Co. KG Schleuseneinrichtung zum Ein- und/oder Ausbringen von Substraten in und/oder aus einer Behandlungskammer
DE19807031A1 (de) * 1998-02-19 1999-08-26 Leybold Systems Gmbh Schleuseneinrichtung zum Ein- und/oder Ausbringen von Substraten in und/oder aus einer Behandlungskammer
US6184132B1 (en) * 1999-08-03 2001-02-06 International Business Machines Corporation Integrated cobalt silicide process for semiconductor devices
US6193804B1 (en) * 1999-10-02 2001-02-27 Taiwan Semiconductor Manufacturing Company, Ltd Apparatus and method for sealing a vacuum chamber
WO2001072094A1 (en) * 2000-03-20 2001-09-27 Tokyo Electron Limited High speed photoresist stripping chamber
US6413381B1 (en) 2000-04-12 2002-07-02 Steag Hamatech Ag Horizontal sputtering system
US6264804B1 (en) 2000-04-12 2001-07-24 Ske Technology Corp. System and method for handling and masking a substrate in a sputter deposition system
US6620252B2 (en) * 2001-10-29 2003-09-16 Thomson Licensing S.A. Metallization module for cathode-ray tube (CRT) applications
JP2008192642A (ja) * 2007-01-31 2008-08-21 Tokyo Electron Ltd 基板処理装置
DE102009018700B4 (de) * 2008-09-01 2020-02-13 Singulus Technologies Ag Beschichtungsanlage und Verfahren zum Beschichten
KR102298893B1 (ko) * 2009-03-18 2021-09-08 에바텍 아크티엔게젤샤프트 진공처리 장치
US10689753B1 (en) * 2009-04-21 2020-06-23 Goodrich Corporation System having a cooling element for densifying a substrate
DE102009037290A1 (de) * 2009-04-24 2010-11-11 Singulus Technologies Ag Transporteinrichtung mit einem auslenkbaren Dichtrahmen
DE102009060649A1 (de) * 2009-12-22 2011-06-30 EISENMANN Anlagenbau GmbH & Co. KG, 71032 Anlage zur Oberflächenbehandlung von Gegenständen
DE102011114593B4 (de) 2011-09-30 2016-11-03 Manz Ag Transporteinrichtung zum Transportieren mehrerer Substrate in den Bereich einer Substrat-Behandlungseinrichtung sowie eine derart ausgestaltete Vakuumbehandlungseinrichtung
EP2641665A1 (de) * 2012-03-19 2013-09-25 Deceuninck NV Verfahren in mehreren Schritten für durchgefärbte Bauelemente
CN110218976A (zh) * 2019-07-17 2019-09-10 南通职业大学 一种零部件自动镀膜装置
CN112206947B (zh) * 2020-10-16 2021-09-28 泰安市力华液压设备有限公司 一种柱塞液压油缸喷漆加工工序用挂具及其使用方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1118869A (en) * 1914-11-24 Carl Kugel Annealing furnace.
US1073235A (en) * 1912-06-19 1913-09-16 Hermann Hillebrand Jr Annealing apparatus.
US1617056A (en) * 1926-04-10 1927-02-08 Charles F Kenworthy Inc Furnace
CH311812A (de) * 1951-11-05 1955-12-15 Zeiss Carl Fa Aufdampfeinrichtung.
US2799600A (en) * 1954-08-17 1957-07-16 Noel W Scott Method of producing electrically conducting transparent coatings on optical surfaces
US3473954A (en) * 1965-12-08 1969-10-21 Ethyl Corp Method and apparatus for tunnel plating
US3568632A (en) * 1969-03-24 1971-03-09 Gary F Cawthon Lens coating apparatus
US3649339A (en) * 1969-09-05 1972-03-14 Eugene C Smith Apparatus and method for securing a high vacuum for particle coating process
US3749383A (en) * 1971-04-29 1973-07-31 Rca Corp Apparatus for processing semiconductor devices
US3856654A (en) * 1971-08-26 1974-12-24 Western Electric Co Apparatus for feeding and coating masses of workpieces in a controlled atmosphere

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2439243A1 (fr) * 1978-04-07 1980-05-16 Varian Associates Installation de transport de pieces a travers une chambre de traitement sous vide et vanne d'isolement correspondante
FR2604027A1 (fr) * 1986-07-23 1988-03-18 Boc Group Inc Machine de traitement de galettes, notamment de metallisation de galettes comportant un systeme de transport et de stockage de galettes sous vide
EP0421498A2 (de) * 1989-09-11 1991-04-10 Consorzio Ce.Te.V. Centro Tecnologie Del Vuoto Vorrichtung zum Einschleusen von Substraten oder anderen Artikeln in einen Vakuumkessel
EP0421498A3 (en) * 1989-09-11 1991-09-04 Consorzio Ce.Te.V. Centro Tecnologie Del Vuoto Device for the rapid loading of substrates or other articles into vacuum plants
EP0443049A1 (de) * 1989-09-13 1991-08-28 Sony Corporation Kathodenzerstäubungsgerät und kathodenzerstäubungsanlage
EP0443049A4 (en) * 1989-09-13 1992-07-08 Sony Corporation Sputtering apparatus and sputtering processing system using the same
US5183547A (en) * 1989-09-13 1993-02-02 Sony Corporation Sputtering apparatus and system for sputtering employing same
EP0448782A2 (de) * 1990-03-26 1991-10-02 Leybold Aktiengesellschaft Vorrichtung zum Ein- und Ausschleusen eines Werkstücks in eine Vakuumkammer
EP0448782A3 (en) * 1990-03-26 1991-12-04 Leybold Aktiengesellschaft Apparatus for loading and unloading an article into a vacuum chamber
EP0449227A2 (de) * 1990-03-30 1991-10-02 Sony Corporation Sputteranlage
EP0449227A3 (en) * 1990-03-30 1991-12-11 Sony Corporation Sputtering apparatus
US5135635A (en) * 1990-03-30 1992-08-04 Sony Corporation Sputtering apparatus

Also Published As

Publication number Publication date
DE2454544C4 (de) 1992-07-16
GB1466790A (en) 1977-03-09
DE2454544B2 (de) 1978-07-13
NL165224B (nl) 1980-10-15
DE2454544A1 (de) 1975-07-31
NL7400848A (nl) 1975-05-26
FR2252419B1 (de) 1980-06-06
CH573985A5 (de) 1976-03-31
NL165224C (nl) 1981-03-16
DE2454544C3 (de) 1979-03-29
US3915117A (en) 1975-10-28

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