FR2439243A1 - Installation de transport de pieces a travers une chambre de traitement sous vide et vanne d'isolement correspondante - Google Patents
Installation de transport de pieces a travers une chambre de traitement sous vide et vanne d'isolement correspondanteInfo
- Publication number
- FR2439243A1 FR2439243A1 FR7932014A FR7932014A FR2439243A1 FR 2439243 A1 FR2439243 A1 FR 2439243A1 FR 7932014 A FR7932014 A FR 7932014A FR 7932014 A FR7932014 A FR 7932014A FR 2439243 A1 FR2439243 A1 FR 2439243A1
- Authority
- FR
- France
- Prior art keywords
- parts
- cover
- installation
- processing chamber
- vacuum processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
- B01J3/006—Processes utilising sub-atmospheric pressure; Apparatus therefor
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Physical Vapour Deposition (AREA)
- Spray Control Apparatus (AREA)
- Coating By Spraying Or Casting (AREA)
- Nozzles (AREA)
Abstract
CHAQUE VANNE COMPREND UNE PLAQUE-OPERCULE 100 PLUS GRANDE QUE L'OUVERTURE CORRESPONDANTE DU CONDUIT DE LA VANNE. SUR SA FACE ARRIERE EST FIXEE UNE POUTRE PLUS LONGUE 104 SUR LES EXTREMITES DE LAQUELLE AGISSENT DES VERINS HORIZONTAUX 130, 131 ET AU MILIEU DE LAQUELLE AGISSENT DES MOYENS 134 DE LEVAGE DE L'OPERCULE. LE TRANSPORTEUR ADJACENT PRESENTE UNE EXTREMITE IMMEDIATEMENT ADJACENTE A L'OPERCULE, DE SORTE QU'IL EST CAPABLE D'ACHEMINER DES PIECES A DES EMPLACEMENTS ADJACENTS A L'OPERCULE AUSSI BIEN LORSQUE CET OPERCULE EST EN COURS D'OUVERTURE QUE S'IL EST EN COURS DE FERMETURE SANS QUE LES PIECES NE SE TROUVENT SUR LE TRAJET DE CET OPERCULE, CE QUI PERMET DE TRANSFERER LES PIECES A TRAVERS LA VANNE A UNE CADENCE DE PRODUCTION ELEVEE. APPLICATION AU REVETEMENT DE GRANDES PIECES PAR PULVERISATION SOUS VIDE.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/894,287 US4313815A (en) | 1978-04-07 | 1978-04-07 | Sputter-coating system, and vaccuum valve, transport, and sputter source array arrangements therefor |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2439243A1 true FR2439243A1 (fr) | 1980-05-16 |
FR2439243B1 FR2439243B1 (fr) | 1983-04-15 |
Family
ID=25402861
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7908918A Granted FR2439242A1 (fr) | 1978-04-07 | 1979-04-09 | Installation de revetement par pulverisation sous vide |
FR7932015A Expired FR2439244B1 (fr) | 1978-04-07 | 1979-12-28 | |
FR7932014A Granted FR2439243A1 (fr) | 1978-04-07 | 1979-12-28 | Installation de transport de pieces a travers une chambre de traitement sous vide et vanne d'isolement correspondante |
Family Applications Before (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7908918A Granted FR2439242A1 (fr) | 1978-04-07 | 1979-04-09 | Installation de revetement par pulverisation sous vide |
FR7932015A Expired FR2439244B1 (fr) | 1978-04-07 | 1979-12-28 |
Country Status (5)
Country | Link |
---|---|
US (1) | US4313815A (fr) |
JP (1) | JPS5511083A (fr) |
DE (1) | DE2913724A1 (fr) |
FR (3) | FR2439242A1 (fr) |
IT (1) | IT1166732B (fr) |
Families Citing this family (43)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4756815A (en) * | 1979-12-21 | 1988-07-12 | Varian Associates, Inc. | Wafer coating system |
JPS5794338A (en) * | 1980-12-04 | 1982-06-11 | Tdk Corp | Vapor deposition device |
EP0122092A3 (fr) * | 1983-04-06 | 1985-07-10 | General Engineering Radcliffe Limited | Dispositif de revêtement sous vide |
US4534921A (en) * | 1984-03-06 | 1985-08-13 | Asm Fico Tooling, B.V. | Method and apparatus for mold cleaning by reverse sputtering |
US4533449A (en) * | 1984-04-16 | 1985-08-06 | The Perkin-Elmer Corporation | Rapid surface figuring by selective deposition |
US4661228A (en) * | 1984-05-17 | 1987-04-28 | Varian Associates, Inc. | Apparatus and method for manufacturing planarized aluminum films |
US4606806A (en) * | 1984-05-17 | 1986-08-19 | Varian Associates, Inc. | Magnetron sputter device having planar and curved targets |
US4761218A (en) * | 1984-05-17 | 1988-08-02 | Varian Associates, Inc. | Sputter coating source having plural target rings |
US5021138A (en) * | 1985-01-17 | 1991-06-04 | Babu Suryadevara V | Side source center sink plasma reactor |
US4663009A (en) * | 1985-02-08 | 1987-05-05 | Hewlett-Packard Company | System and method for depositing plural thin film layers on a substrate |
US4749465A (en) * | 1985-05-09 | 1988-06-07 | Seagate Technology | In-line disk sputtering system |
WO1986006753A1 (fr) * | 1985-05-09 | 1986-11-20 | Seagate Technology | Systeme de traitement en ligne de disques par pulverisation |
US4894133A (en) * | 1985-11-12 | 1990-01-16 | Virgle L. Hedgcoth | Method and apparatus making magnetic recording disk |
US5082747A (en) * | 1985-11-12 | 1992-01-21 | Hedgcoth Virgle L | Magnetic recording disk and sputtering process and apparatus for producing same |
US4670126A (en) * | 1986-04-28 | 1987-06-02 | Varian Associates, Inc. | Sputter module for modular wafer processing system |
DE3634710A1 (de) * | 1986-10-11 | 1988-04-21 | Ver Glaswerke Gmbh | Vorrichtung zum vakuumbeschichten einer glasscheibe durch reaktive kathodenzerstaeubung |
US4795299A (en) * | 1987-04-15 | 1989-01-03 | Genus, Inc. | Dial deposition and processing apparatus |
US5591267A (en) * | 1988-01-11 | 1997-01-07 | Ohmi; Tadahiro | Reduced pressure device |
US5906688A (en) * | 1989-01-11 | 1999-05-25 | Ohmi; Tadahiro | Method of forming a passivation film |
US5225057A (en) * | 1988-02-08 | 1993-07-06 | Optical Coating Laboratory, Inc. | Process for depositing optical films on both planar and non-planar substrates |
US5798027A (en) * | 1988-02-08 | 1998-08-25 | Optical Coating Laboratory, Inc. | Process for depositing optical thin films on both planar and non-planar substrates |
US5618388A (en) * | 1988-02-08 | 1997-04-08 | Optical Coating Laboratory, Inc. | Geometries and configurations for magnetron sputtering apparatus |
US4911810A (en) * | 1988-06-21 | 1990-03-27 | Brown University | Modular sputtering apparatus |
US5683072A (en) * | 1988-11-01 | 1997-11-04 | Tadahiro Ohmi | Thin film forming equipment |
US5789086A (en) * | 1990-03-05 | 1998-08-04 | Ohmi; Tadahiro | Stainless steel surface having passivation film |
DE3912295C2 (de) * | 1989-04-14 | 1997-05-28 | Leybold Ag | Katodenzerstäubungsanlage |
US6024843A (en) * | 1989-05-22 | 2000-02-15 | Novellus Systems, Inc. | Sputtering apparatus with a rotating magnet array having a geometry for specified target erosion profile |
JPH03234979A (ja) * | 1990-02-09 | 1991-10-18 | Canon Inc | 仕切り弁 |
DE4010495C2 (de) * | 1990-03-31 | 1997-07-31 | Leybold Ag | Vorrichtung zum Beschichten eines Substrats mit Werkstoffen, beispielweise mit Metallen |
JP2644912B2 (ja) * | 1990-08-29 | 1997-08-25 | 株式会社日立製作所 | 真空処理装置及びその運転方法 |
US7089680B1 (en) | 1990-08-29 | 2006-08-15 | Hitachi, Ltd. | Vacuum processing apparatus and operating method therefor |
USRE39756E1 (en) * | 1990-08-29 | 2007-08-07 | Hitachi, Ltd. | Vacuum processing operating method with wafers, substrates and/or semiconductors |
USRE39823E1 (en) | 1990-08-29 | 2007-09-11 | Hitachi, Ltd. | Vacuum processing operating method with wafers, substrates and/or semiconductors |
EP0837491A3 (fr) * | 1996-10-21 | 2000-11-15 | Nihon Shinku Gijutsu Kabushiki Kaisha | Dispositif de cathode composite de pulvérisation, et appareil de pulvérisation comportant une telle cathode composite |
JP5026631B2 (ja) | 1999-06-24 | 2012-09-12 | 株式会社アルバック | スパッタリング装置 |
US6605195B2 (en) | 2000-04-14 | 2003-08-12 | Seagate Technology Llc | Multi-layer deposition process using four ring sputter sources |
CN102234784A (zh) * | 2010-04-29 | 2011-11-09 | 鸿富锦精密工业(深圳)有限公司 | 镀膜*** |
CN102021576B (zh) * | 2010-09-30 | 2012-06-27 | 深圳市信诺泰创业投资企业(普通合伙) | 一种连续生产挠性覆铜板的方法 |
CN103538894B (zh) * | 2013-10-25 | 2015-08-05 | 山东开泰工业科技有限公司 | 一种360抛丸器制造生产线 |
JP2019052371A (ja) * | 2017-09-14 | 2019-04-04 | エフ・ハー・エル・アンラーゲンバウ・ゲゼルシャフト・ミト・ベシュレンクテル・ハフツング | 3dサブストレートを均一にコーティングするための方法及び装置 |
WO2019212512A1 (fr) * | 2018-04-30 | 2019-11-07 | Hewlett-Packard Development Company, L.P. | Dépôt physique en phase vapeur multidirectionnel (pvd) |
US11713816B1 (en) | 2019-08-22 | 2023-08-01 | Colt Irrigation, LLC | Pressure loss mitigation and durable valve |
DE102019134546A1 (de) | 2019-12-16 | 2021-06-17 | VON ARDENNE Asset GmbH & Co. KG | Verfahren, Steuervorrichtung und Vakuumanordnung |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3641973A (en) * | 1970-11-25 | 1972-02-15 | Air Reduction | Vacuum coating apparatus |
FR2252419A1 (fr) * | 1973-11-22 | 1975-06-20 | Balzers Patent Beteilig Ag | |
US3904506A (en) * | 1972-11-13 | 1975-09-09 | Shatterproof Glass Corp | Apparatus for continuous production of sputter-coated glass products |
FR2341800A1 (fr) * | 1976-02-20 | 1977-09-16 | Kernforschung Gmbh Ges Fuer | Dispositif de fermeture du type a tiroir |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2350322A (en) * | 1939-12-04 | 1944-06-06 | Berl Ernst | Process of making ammonium salts of aromatic compounds |
GB747580A (en) * | 1952-12-05 | 1956-04-11 | Standard Telephones Cables Ltd | Method of making thin metal layers by cathodic sputtering |
FR1574686A (fr) * | 1968-01-11 | 1969-07-18 | ||
FR1595037A (fr) * | 1968-02-12 | 1970-06-08 | ||
US3616402A (en) * | 1968-05-31 | 1971-10-26 | Western Electric Co | Sputtering method and apparatus |
US3968018A (en) * | 1969-09-29 | 1976-07-06 | Warner-Lambert Company | Sputter coating method |
JPS4715202U (fr) * | 1971-03-20 | 1972-10-23 | ||
DE2114470B2 (de) * | 1971-03-25 | 1975-02-13 | Flachglas Ag Delog-Detag, 4650 Gelsenkirchen | Vorrichtung zum kontinuierlichen, einseitigen Beschichten von Platten, wie Glasscheiben, Keramik- oder Kunststoffplatten u. dgl. mittels Kathodenzerstäubung |
AU485283B2 (en) * | 1971-05-18 | 1974-10-03 | Warner-Lambert Company | Method of making a razorblade |
US3714925A (en) * | 1971-07-30 | 1973-02-06 | Gen Motors Corp | Vacuum processing machine |
JPS5322861B1 (fr) * | 1972-07-12 | 1978-07-11 | ||
US3973753A (en) * | 1974-03-18 | 1976-08-10 | Varian Associates | High vacuum gate valve |
JPS51131461A (en) * | 1975-05-13 | 1976-11-15 | Ulvac Corp | A vacuum treatment chamber apparatus |
US4047624A (en) * | 1975-10-21 | 1977-09-13 | Airco, Inc. | Workpiece handling system for vacuum processing |
US4100055A (en) * | 1977-06-10 | 1978-07-11 | Varian Associates, Inc. | Target profile for sputtering apparatus |
-
1978
- 1978-04-07 US US05/894,287 patent/US4313815A/en not_active Expired - Lifetime
-
1979
- 1979-04-05 DE DE19792913724 patent/DE2913724A1/de not_active Ceased
- 1979-04-06 IT IT21645/79A patent/IT1166732B/it active
- 1979-04-07 JP JP4157079A patent/JPS5511083A/ja active Pending
- 1979-04-09 FR FR7908918A patent/FR2439242A1/fr active Granted
- 1979-12-28 FR FR7932015A patent/FR2439244B1/fr not_active Expired
- 1979-12-28 FR FR7932014A patent/FR2439243A1/fr active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3641973A (en) * | 1970-11-25 | 1972-02-15 | Air Reduction | Vacuum coating apparatus |
US3904506A (en) * | 1972-11-13 | 1975-09-09 | Shatterproof Glass Corp | Apparatus for continuous production of sputter-coated glass products |
FR2252419A1 (fr) * | 1973-11-22 | 1975-06-20 | Balzers Patent Beteilig Ag | |
FR2341800A1 (fr) * | 1976-02-20 | 1977-09-16 | Kernforschung Gmbh Ges Fuer | Dispositif de fermeture du type a tiroir |
Also Published As
Publication number | Publication date |
---|---|
IT1166732B (it) | 1987-05-06 |
US4313815A (en) | 1982-02-02 |
JPS5511083A (en) | 1980-01-25 |
FR2439242B1 (fr) | 1984-01-06 |
FR2439244B1 (fr) | 1983-01-28 |
FR2439244A1 (fr) | 1980-05-16 |
FR2439242A1 (fr) | 1980-05-16 |
IT7921645A0 (it) | 1979-04-06 |
DE2913724A1 (de) | 1979-10-11 |
FR2439243B1 (fr) | 1983-04-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
FR2439243A1 (fr) | Installation de transport de pieces a travers une chambre de traitement sous vide et vanne d'isolement correspondante | |
FR2358020A1 (fr) | Dispositif pour la pulverisation cathodique et procede pour la pulverisation a l'aide d'un tel dispositif | |
SE9400038D0 (sv) | A device and method for forming a coating by pyrolysis | |
ES8601642A1 (es) | Un dispositivo dosificador de siembra | |
FR2364072A1 (fr) | Procede de lavage d'objets divers | |
ATE275073T1 (de) | Antistatischer behälter | |
FR2396807A1 (fr) | Installation de depot par evaporation sous vide | |
IT8921988V0 (it) | Dispositivo di recupero della vernice da trasportatori a nastro in impianti di verniciatura a spruzzo | |
FR2374769A1 (fr) | Dispositif de concentration de flux pour exercer des forces de traction electromagnetiques, procede pour sa fabrication et son application, notamment au debosselage de pieces conduisant l'electricite | |
FR2439550A1 (fr) | Moulinet de peche | |
FR2421677A1 (fr) | Emetteur d'eau d'arrosage | |
KR840005934A (ko) | 이면 반사기가 형성된 대면적 광전소자 제조장치 및 방법 | |
MY126617A (en) | Noodle gelating device | |
ATE73177T1 (de) | Verfahren und vorrichtung zum metallisieren von folienoberflaechen. | |
FR2667247A1 (fr) | Appareil a soufflerie d'air chaud pour drainage lymphatique. | |
KR920013558A (ko) | 새도우마스크의 안티도우밍재 증착방법 | |
Menzel | Effects of man's activities on estuarine fisheries. | |
FR2413783A1 (fr) | Borne pour bouton a diode | |
JPS5794338A (en) | Vapor deposition device | |
Leboutet et al. | Vacuum chamber intended principally for the scanning device of a particle accelerator | |
GB953556A (en) | Improvements in or relating to the preparation of the surfaces of metals or semi-conductor bodies | |
Schmidbauer | Chemical Innovations for the Current-Free Deposition of Conducting and Semiconducting Materials on Surfaces | |
KR910012324A (ko) | 플라즈마 증착방법과 이에 적합한 장치 | |
JPS5424976A (en) | Plated polyacetal | |
Naidyuk | Characteristics of Point-Contact Spectra of Heterojunctions Between Simple Metals.(Translation) |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |