FR2252419A1 - - Google Patents
Info
- Publication number
- FR2252419A1 FR2252419A1 FR7503019A FR7503019A FR2252419A1 FR 2252419 A1 FR2252419 A1 FR 2252419A1 FR 7503019 A FR7503019 A FR 7503019A FR 7503019 A FR7503019 A FR 7503019A FR 2252419 A1 FR2252419 A1 FR 2252419A1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
- C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/139—Associated with semiconductor wafer handling including wafer charging or discharging means for vacuum chamber
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH1660273A CH573985A5 (fr) | 1973-11-22 | 1973-11-22 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2252419A1 true FR2252419A1 (fr) | 1975-06-20 |
FR2252419B1 FR2252419B1 (fr) | 1980-06-06 |
Family
ID=4418700
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7503019A Expired FR2252419B1 (fr) | 1973-11-22 | 1975-01-31 |
Country Status (6)
Country | Link |
---|---|
US (1) | US3915117A (fr) |
CH (1) | CH573985A5 (fr) |
DE (1) | DE2454544C4 (fr) |
FR (1) | FR2252419B1 (fr) |
GB (1) | GB1466790A (fr) |
NL (1) | NL165224C (fr) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2439243A1 (fr) * | 1978-04-07 | 1980-05-16 | Varian Associates | Installation de transport de pieces a travers une chambre de traitement sous vide et vanne d'isolement correspondante |
FR2604027A1 (fr) * | 1986-07-23 | 1988-03-18 | Boc Group Inc | Machine de traitement de galettes, notamment de metallisation de galettes comportant un systeme de transport et de stockage de galettes sous vide |
EP0421498A2 (fr) * | 1989-09-11 | 1991-04-10 | Consorzio Ce.Te.V. Centro Tecnologie Del Vuoto | Appareillage de chargement rapide des substrats ou autres articles dans une chambre à vide |
EP0443049A1 (fr) * | 1989-09-13 | 1991-08-28 | Sony Corporation | Appareil et systeme de pulverisation cathodique |
EP0448782A2 (fr) * | 1990-03-26 | 1991-10-02 | Leybold Aktiengesellschaft | Dispositif de chargement et de déchargement d'une pièce dans une chambre à vide |
EP0449227A2 (fr) * | 1990-03-30 | 1991-10-02 | Sony Corporation | Appareillage de pulvérisation cathodique |
Families Citing this family (53)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2740129A1 (de) * | 1976-09-18 | 1978-03-23 | Claude John Lancelot Hunt | Verfahren und vorrichtung zur metallbedampfung |
US4226208A (en) * | 1977-08-04 | 1980-10-07 | Canon Kabushiki Kaisha | Vapor deposition apparatus |
DE2847632A1 (de) * | 1977-11-19 | 1979-05-23 | Claude John Lancelot Hunt | Vakuummetallisierungsvorrichtung |
DE2940064A1 (de) * | 1979-10-03 | 1981-04-16 | Leybold-Heraeus GmbH, 5000 Köln | Vakuumaufdampfanlage mir einer ventilkammer, einer bedampfungskammer und einer verdampferkammer |
US5024747A (en) * | 1979-12-21 | 1991-06-18 | Varian Associates, Inc. | Wafer coating system |
US4756815A (en) * | 1979-12-21 | 1988-07-12 | Varian Associates, Inc. | Wafer coating system |
JPS58197262A (ja) * | 1982-05-13 | 1983-11-16 | Canon Inc | 量産型真空成膜装置及び真空成膜法 |
US4500407A (en) * | 1983-07-19 | 1985-02-19 | Varian Associates, Inc. | Disk or wafer handling and coating system |
DE3448599B4 (de) * | 1983-11-28 | 2004-04-08 | Hitachi, Ltd. | Verfahren zur Durchführung einer Behandlung unter Vakuum |
JPS60184678A (ja) * | 1984-03-02 | 1985-09-20 | Canon Inc | 真空処理装置 |
US4534314A (en) * | 1984-05-10 | 1985-08-13 | Varian Associates, Inc. | Load lock pumping mechanism |
JPS61291032A (ja) * | 1985-06-17 | 1986-12-20 | Fujitsu Ltd | 真空装置 |
CA1287594C (fr) * | 1986-04-04 | 1991-08-13 | Miroslav Eror | Methode et dispositif de manutention et de traitement d'articles de type puce pour l'electronique |
DE3716498C2 (de) * | 1987-05-16 | 1994-08-04 | Leybold Ag | Vorrichtung zum Ein- und Ausschleusen von Werkstücken in eine Beschichtungskammer |
DE3735284A1 (de) * | 1987-10-17 | 1989-04-27 | Leybold Ag | Vorrichtung nach dem karussell-prinzip zum beschichten von substraten |
US4951603A (en) * | 1988-09-12 | 1990-08-28 | Daidousanso Co., Ltd. | Apparatus for producing semiconductors |
EP0389820B1 (fr) * | 1989-03-30 | 1993-06-16 | Leybold Aktiengesellschaft | Dispositif pour faire entrer ou sortir par une écluse une pièce dans une chambre à vide |
DE4009603A1 (de) * | 1989-03-30 | 1990-10-04 | Leybold Ag | Vorrichtung zum ein- und ausschleusen eines werkstuecks in eine vakuumkammer |
US5259942A (en) * | 1989-03-30 | 1993-11-09 | Leybold Aktiengesellschaft | Device for transferring a workpiece into and out from a vacuum chamber |
US5002010A (en) * | 1989-10-18 | 1991-03-26 | Varian Associates, Inc. | Vacuum vessel |
JP2913745B2 (ja) * | 1990-04-10 | 1999-06-28 | 松下電器産業株式会社 | 真空蒸着装置 |
DE4117969C2 (de) * | 1991-05-31 | 2000-11-09 | Balzers Ag Liechtenstein | Vakuumkammer |
CH691377A5 (de) * | 1992-10-06 | 2001-07-13 | Unaxis Balzers Ag | Kammeranordnung für den Transport von Werkstücken und deren Verwendung. |
EP0591706B1 (fr) * | 1992-10-06 | 2002-04-24 | Unaxis Balzers Aktiengesellschaft | Enceinte pour le transport des substrats |
DE4235674C2 (de) * | 1992-10-22 | 2000-12-28 | Balzers Ag Liechtenstein | Kammer für den Transport von Werkstücken in Vakuumatmosphäre, Kammerkombination und Verfahren zum Transportieren eines Werkstückes |
DE4235676C2 (de) * | 1992-10-22 | 1997-08-28 | Balzers Hochvakuum | Vakuumkammer zum Transport scheibenförmiger Werkstücke in einer Vakuumanlage |
DE4235677C2 (de) * | 1992-10-22 | 1996-10-31 | Balzers Hochvakuum | Vakuumkammer, Vakuumbehandlungsanlage mit einer solchen Kammer sowie Transportverfahren |
DE4302851A1 (de) * | 1993-02-02 | 1994-08-04 | Leybold Ag | Vorrichtung zum Anbringen und/oder Entfernen einer Maske an einem Substrat |
DE4341635C2 (de) * | 1993-12-07 | 2002-07-18 | Unaxis Deutschland Holding | Vakuumbeschichtungsanlage |
NL1000138C2 (nl) * | 1995-04-13 | 1996-10-15 | Od & Me Bv | Inrichtingen voor het bewerken van een substraat alsmede werkwijze geschikt voor toepassing bij dergelijke inrichtingen. |
US5773088A (en) * | 1995-12-05 | 1998-06-30 | Materials Research Group, Inc. | Treatment system including vacuum isolated sources and method |
DE19624609B4 (de) * | 1996-06-20 | 2009-04-16 | Leybold Optics Gmbh | Vakuumbehandlungsanlage zum Aufbringen dünner Schichten auf Substrate, beispielsweise auf Scheinwerferreflektoren |
DE19626861B4 (de) * | 1996-07-04 | 2009-04-16 | Leybold Optics Gmbh | Vakuumbehandlungsanlage zum Aufbringen dünner Schichten auf Substrate, beispielsweise auf Scheinwerferreflektoren |
DE19642852A1 (de) * | 1996-10-17 | 1998-04-23 | Leybold Systems Gmbh | Vakuumbehandlungsanlage zum Aufbringen dünner Schichten auf dreidimensionale, schalenförmige oder prismatische Substrate |
DE19742923A1 (de) | 1997-09-29 | 1999-04-01 | Leybold Systems Gmbh | Vorrichtung zum Beschichten eines im wesentlichen flachen, scheibenförmigen Substrats |
EP0943699B1 (fr) | 1998-02-19 | 2003-12-17 | Applied Films GmbH & Co. KG | Dispositif de sas pour le chargement et déchargement des substrats d'une chambre de traitement |
DE19807031A1 (de) * | 1998-02-19 | 1999-08-26 | Leybold Systems Gmbh | Schleuseneinrichtung zum Ein- und/oder Ausbringen von Substraten in und/oder aus einer Behandlungskammer |
US6184132B1 (en) * | 1999-08-03 | 2001-02-06 | International Business Machines Corporation | Integrated cobalt silicide process for semiconductor devices |
US6193804B1 (en) * | 1999-10-02 | 2001-02-27 | Taiwan Semiconductor Manufacturing Company, Ltd | Apparatus and method for sealing a vacuum chamber |
WO2001072094A1 (fr) * | 2000-03-20 | 2001-09-27 | Tokyo Electron Limited | Chambre de decapage a vitesse elevee |
US6413381B1 (en) | 2000-04-12 | 2002-07-02 | Steag Hamatech Ag | Horizontal sputtering system |
US6264804B1 (en) | 2000-04-12 | 2001-07-24 | Ske Technology Corp. | System and method for handling and masking a substrate in a sputter deposition system |
US6620252B2 (en) * | 2001-10-29 | 2003-09-16 | Thomson Licensing S.A. | Metallization module for cathode-ray tube (CRT) applications |
JP2008192642A (ja) * | 2007-01-31 | 2008-08-21 | Tokyo Electron Ltd | 基板処理装置 |
DE102009018700B4 (de) * | 2008-09-01 | 2020-02-13 | Singulus Technologies Ag | Beschichtungsanlage und Verfahren zum Beschichten |
PL2409317T3 (pl) * | 2009-03-18 | 2014-06-30 | Oerlikon Advanced Tech Ag | Urządzenie do obróbki próżniowej |
US10689753B1 (en) * | 2009-04-21 | 2020-06-23 | Goodrich Corporation | System having a cooling element for densifying a substrate |
DE102009037290A1 (de) * | 2009-04-24 | 2010-11-11 | Singulus Technologies Ag | Transporteinrichtung mit einem auslenkbaren Dichtrahmen |
DE102009060649A1 (de) * | 2009-12-22 | 2011-06-30 | EISENMANN Anlagenbau GmbH & Co. KG, 71032 | Anlage zur Oberflächenbehandlung von Gegenständen |
DE102011114593B4 (de) | 2011-09-30 | 2016-11-03 | Manz Ag | Transporteinrichtung zum Transportieren mehrerer Substrate in den Bereich einer Substrat-Behandlungseinrichtung sowie eine derart ausgestaltete Vakuumbehandlungseinrichtung |
EP2641665A1 (fr) * | 2012-03-19 | 2013-09-25 | Deceuninck NV | Procédé en plusieurs étapes pour éléments de construction entièrement colorés |
CN110218976A (zh) * | 2019-07-17 | 2019-09-10 | 南通职业大学 | 一种零部件自动镀膜装置 |
CN112206947B (zh) * | 2020-10-16 | 2021-09-28 | 泰安市力华液压设备有限公司 | 一种柱塞液压油缸喷漆加工工序用挂具及其使用方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1118869A (en) * | 1914-11-24 | Carl Kugel | Annealing furnace. | |
US1073235A (en) * | 1912-06-19 | 1913-09-16 | Hermann Hillebrand Jr | Annealing apparatus. |
US1617056A (en) * | 1926-04-10 | 1927-02-08 | Charles F Kenworthy Inc | Furnace |
CH311812A (de) * | 1951-11-05 | 1955-12-15 | Zeiss Carl Fa | Aufdampfeinrichtung. |
US2799600A (en) * | 1954-08-17 | 1957-07-16 | Noel W Scott | Method of producing electrically conducting transparent coatings on optical surfaces |
US3473954A (en) * | 1965-12-08 | 1969-10-21 | Ethyl Corp | Method and apparatus for tunnel plating |
US3568632A (en) * | 1969-03-24 | 1971-03-09 | Gary F Cawthon | Lens coating apparatus |
US3649339A (en) * | 1969-09-05 | 1972-03-14 | Eugene C Smith | Apparatus and method for securing a high vacuum for particle coating process |
US3749383A (en) * | 1971-04-29 | 1973-07-31 | Rca Corp | Apparatus for processing semiconductor devices |
US3856654A (en) * | 1971-08-26 | 1974-12-24 | Western Electric Co | Apparatus for feeding and coating masses of workpieces in a controlled atmosphere |
-
1973
- 1973-11-22 CH CH1660273A patent/CH573985A5/xx not_active IP Right Cessation
-
1974
- 1974-01-22 NL NL7400848.A patent/NL165224C/xx not_active IP Right Cessation
- 1974-11-12 GB GB4882374A patent/GB1466790A/en not_active Expired
- 1974-11-18 DE DE19742454544 patent/DE2454544C4/de not_active Expired - Lifetime
- 1974-11-18 US US524865A patent/US3915117A/en not_active Expired - Lifetime
-
1975
- 1975-01-31 FR FR7503019A patent/FR2252419B1/fr not_active Expired
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2439243A1 (fr) * | 1978-04-07 | 1980-05-16 | Varian Associates | Installation de transport de pieces a travers une chambre de traitement sous vide et vanne d'isolement correspondante |
FR2604027A1 (fr) * | 1986-07-23 | 1988-03-18 | Boc Group Inc | Machine de traitement de galettes, notamment de metallisation de galettes comportant un systeme de transport et de stockage de galettes sous vide |
EP0421498A2 (fr) * | 1989-09-11 | 1991-04-10 | Consorzio Ce.Te.V. Centro Tecnologie Del Vuoto | Appareillage de chargement rapide des substrats ou autres articles dans une chambre à vide |
EP0421498A3 (en) * | 1989-09-11 | 1991-09-04 | Consorzio Ce.Te.V. Centro Tecnologie Del Vuoto | Device for the rapid loading of substrates or other articles into vacuum plants |
EP0443049A1 (fr) * | 1989-09-13 | 1991-08-28 | Sony Corporation | Appareil et systeme de pulverisation cathodique |
EP0443049A4 (en) * | 1989-09-13 | 1992-07-08 | Sony Corporation | Sputtering apparatus and sputtering processing system using the same |
US5183547A (en) * | 1989-09-13 | 1993-02-02 | Sony Corporation | Sputtering apparatus and system for sputtering employing same |
EP0448782A2 (fr) * | 1990-03-26 | 1991-10-02 | Leybold Aktiengesellschaft | Dispositif de chargement et de déchargement d'une pièce dans une chambre à vide |
EP0448782A3 (en) * | 1990-03-26 | 1991-12-04 | Leybold Aktiengesellschaft | Apparatus for loading and unloading an article into a vacuum chamber |
EP0449227A2 (fr) * | 1990-03-30 | 1991-10-02 | Sony Corporation | Appareillage de pulvérisation cathodique |
EP0449227A3 (en) * | 1990-03-30 | 1991-12-11 | Sony Corporation | Sputtering apparatus |
US5135635A (en) * | 1990-03-30 | 1992-08-04 | Sony Corporation | Sputtering apparatus |
Also Published As
Publication number | Publication date |
---|---|
DE2454544B2 (de) | 1978-07-13 |
NL165224C (nl) | 1981-03-16 |
CH573985A5 (fr) | 1976-03-31 |
DE2454544C4 (de) | 1992-07-16 |
GB1466790A (en) | 1977-03-09 |
NL165224B (nl) | 1980-10-15 |
DE2454544C3 (de) | 1979-03-29 |
US3915117A (en) | 1975-10-28 |
FR2252419B1 (fr) | 1980-06-06 |
NL7400848A (nl) | 1975-05-26 |
DE2454544A1 (de) | 1975-07-31 |