FR2009250A1 - - Google Patents

Info

Publication number
FR2009250A1
FR2009250A1 FR6916789A FR6916789A FR2009250A1 FR 2009250 A1 FR2009250 A1 FR 2009250A1 FR 6916789 A FR6916789 A FR 6916789A FR 6916789 A FR6916789 A FR 6916789A FR 2009250 A1 FR2009250 A1 FR 2009250A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
FR6916789A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of FR2009250A1 publication Critical patent/FR2009250A1/fr
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/113—Binder containing with plasticizer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring
FR6916789A 1968-05-24 1969-05-22 Pending FR2009250A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US73173368A 1968-05-24 1968-05-24

Publications (1)

Publication Number Publication Date
FR2009250A1 true FR2009250A1 (fr) 1970-01-30

Family

ID=24940743

Family Applications (1)

Application Number Title Priority Date Filing Date
FR6916789A Pending FR2009250A1 (fr) 1968-05-24 1969-05-22

Country Status (7)

Country Link
US (1) US3549367A (fr)
JP (1) JPS4838403B1 (fr)
BE (1) BE733543A (fr)
DE (1) DE1924317A1 (fr)
FR (1) FR2009250A1 (fr)
GB (1) GB1231345A (fr)
NL (1) NL164136C (fr)

Cited By (8)

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FR2322653A1 (fr) * 1975-09-02 1977-04-01 Minnesota Mining & Mfg Photo-sensibilisation de composes aromatiques de sulfonium
FR2397653A1 (fr) * 1977-07-11 1979-02-09 Du Pont Elements photopolymerisables et procedes de formation d'images
EP0005274A1 (fr) * 1978-05-08 1979-11-14 E.I. Du Pont De Nemours And Company Composition photopolymérisable contenant des dérivés d'arylcétones et de para-dialcoylaminoaldéhydes comme sensibilisateurs dans le domaine du visible
FR2425468A1 (fr) * 1978-05-09 1979-12-07 Polychrome Corp Encres d'imprimerie durcissant sous l'effet des ultraviolets et presentant une duree de conservation amelioree
EP0006125A1 (fr) * 1978-05-20 1980-01-09 Hoechst Aktiengesellschaft Mélange photopolymérisable et matière de revêtement photosensible
EP0243934A2 (fr) * 1986-05-01 1987-11-04 E.I. Du Pont De Nemours And Company Impression électrophotographique avec plaque d'impression à base de photopolymère
EP0606642A1 (fr) * 1993-01-15 1994-07-20 Basf Lacke + Farben Ag Elément d'énregistrement photosensible et procédé de fabrication d'une plaque d'impression en relief
WO1996005539A1 (fr) * 1994-08-11 1996-02-22 Horsell Plc Plaques offset a procede anhydre

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EP0005274A1 (fr) * 1978-05-08 1979-11-14 E.I. Du Pont De Nemours And Company Composition photopolymérisable contenant des dérivés d'arylcétones et de para-dialcoylaminoaldéhydes comme sensibilisateurs dans le domaine du visible
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EP0606642A1 (fr) * 1993-01-15 1994-07-20 Basf Lacke + Farben Ag Elément d'énregistrement photosensible et procédé de fabrication d'une plaque d'impression en relief
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NL164136B (nl) 1980-06-16
DE1924317A1 (de) 1970-10-29
BE733543A (fr) 1969-11-24
US3549367A (en) 1970-12-22
NL6907917A (fr) 1969-11-26
GB1231345A (fr) 1971-05-12
NL164136C (nl) 1980-11-17
JPS4838403B1 (fr) 1973-11-17
DE1924317B2 (fr) 1971-02-25

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