FI20095796A - Menetelmä integraatiotiheydeltään korkean kuva-anturin valmistamiseksi - Google Patents
Menetelmä integraatiotiheydeltään korkean kuva-anturin valmistamiseksi Download PDFInfo
- Publication number
- FI20095796A FI20095796A FI20095796A FI20095796A FI20095796A FI 20095796 A FI20095796 A FI 20095796A FI 20095796 A FI20095796 A FI 20095796A FI 20095796 A FI20095796 A FI 20095796A FI 20095796 A FI20095796 A FI 20095796A
- Authority
- FI
- Finland
- Prior art keywords
- manufacturing
- image sensor
- high density
- density image
- sensor
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14634—Assemblies, i.e. Hybrid structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14636—Interconnect structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/1464—Back illuminated imager structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14683—Processes or apparatus peculiar to the manufacture or treatment of these devices or parts thereof
- H01L27/1469—Assemblies, i.e. hybrid integration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/91—Methods for connecting semiconductor or solid state bodies including different methods provided for in two or more of groups H01L2224/80 - H01L2224/90
- H01L2224/92—Specific sequence of method steps
- H01L2224/921—Connecting a surface with connectors of different types
- H01L2224/9212—Sequential connecting processes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14632—Wafer-level processed structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14683—Processes or apparatus peculiar to the manufacture or treatment of these devices or parts thereof
- H01L27/14687—Wafer level processing
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Solid State Image Pick-Up Elements (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0611082A FR2910707B1 (fr) | 2006-12-20 | 2006-12-20 | Capteur d'image a haute densite d'integration |
PCT/EP2007/063664 WO2008074688A1 (fr) | 2006-12-20 | 2007-12-11 | Procede de fabrication de capteur d'image a haute densite d'integration |
Publications (1)
Publication Number | Publication Date |
---|---|
FI20095796A true FI20095796A (fi) | 2009-07-17 |
Family
ID=38255891
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FI20095796A FI20095796A (fi) | 2006-12-20 | 2009-07-17 | Menetelmä integraatiotiheydeltään korkean kuva-anturin valmistamiseksi |
Country Status (5)
Country | Link |
---|---|
US (1) | US8003433B2 (fi) |
JP (1) | JP5250911B2 (fi) |
FI (1) | FI20095796A (fi) |
FR (1) | FR2910707B1 (fi) |
WO (1) | WO2008074688A1 (fi) |
Families Citing this family (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5367323B2 (ja) * | 2008-07-23 | 2013-12-11 | ラピスセミコンダクタ株式会社 | 半導体装置および半導体装置の製造方法 |
FR2937790B1 (fr) * | 2008-10-28 | 2011-03-25 | E2V Semiconductors | Capteur d'image aminci |
JP5178569B2 (ja) * | 2009-02-13 | 2013-04-10 | 株式会社東芝 | 固体撮像装置 |
FR2943177B1 (fr) | 2009-03-12 | 2011-05-06 | Soitec Silicon On Insulator | Procede de fabrication d'une structure multicouche avec report de couche circuit |
JP5773379B2 (ja) * | 2009-03-19 | 2015-09-02 | ソニー株式会社 | 半導体装置とその製造方法、及び電子機器 |
JP5985136B2 (ja) * | 2009-03-19 | 2016-09-06 | ソニー株式会社 | 半導体装置とその製造方法、及び電子機器 |
FR2947380B1 (fr) * | 2009-06-26 | 2012-12-14 | Soitec Silicon Insulator Technologies | Procede de collage par adhesion moleculaire. |
KR101648200B1 (ko) | 2009-10-22 | 2016-08-12 | 삼성전자주식회사 | 이미지 센서 및 그 제조 방법 |
JP5442394B2 (ja) | 2009-10-29 | 2014-03-12 | ソニー株式会社 | 固体撮像装置とその製造方法、及び電子機器 |
TWI420662B (zh) | 2009-12-25 | 2013-12-21 | Sony Corp | 半導體元件及其製造方法,及電子裝置 |
JP5853351B2 (ja) | 2010-03-25 | 2016-02-09 | ソニー株式会社 | 半導体装置、半導体装置の製造方法、及び電子機器 |
JP5553693B2 (ja) | 2010-06-30 | 2014-07-16 | キヤノン株式会社 | 固体撮像装置及び撮像システム |
JP6173410B2 (ja) * | 2010-06-30 | 2017-08-02 | キヤノン株式会社 | 固体撮像装置および固体撮像装置の製造方法 |
JP2012064709A (ja) | 2010-09-15 | 2012-03-29 | Sony Corp | 固体撮像装置及び電子機器 |
JP2012094720A (ja) * | 2010-10-27 | 2012-05-17 | Sony Corp | 固体撮像装置、半導体装置、固体撮像装置の製造方法、半導体装置の製造方法、及び電子機器 |
TWI467746B (zh) * | 2010-12-15 | 2015-01-01 | Sony Corp | 半導體元件及其製造方法與電子裝置 |
JP2013077711A (ja) * | 2011-09-30 | 2013-04-25 | Sony Corp | 半導体装置および半導体装置の製造方法 |
JP5970826B2 (ja) * | 2012-01-18 | 2016-08-17 | ソニー株式会社 | 半導体装置、半導体装置の製造方法、固体撮像装置および電子機器 |
JP6214132B2 (ja) | 2012-02-29 | 2017-10-18 | キヤノン株式会社 | 光電変換装置、撮像システムおよび光電変換装置の製造方法 |
DE102013217577A1 (de) * | 2013-09-04 | 2015-03-05 | Conti Temic Microelectronic Gmbh | Kamerasystem für ein Fahrzeug |
JP2015135839A (ja) * | 2014-01-16 | 2015-07-27 | オリンパス株式会社 | 半導体装置、固体撮像装置、および撮像装置 |
JP6079807B2 (ja) * | 2015-03-24 | 2017-02-15 | ソニー株式会社 | 固体撮像装置及び電子機器 |
US9704827B2 (en) | 2015-06-25 | 2017-07-11 | Taiwan Semiconductor Manufacturing Co., Ltd. | Hybrid bond pad structure |
JP6233376B2 (ja) * | 2015-09-28 | 2017-11-22 | ソニー株式会社 | 固体撮像装置及び電子機器 |
JP6256562B2 (ja) * | 2016-10-13 | 2018-01-10 | ソニー株式会社 | 固体撮像装置及び電子機器 |
JP6746547B2 (ja) * | 2017-09-12 | 2020-08-26 | キヤノン株式会社 | 光電変換装置、撮像システムおよび光電変換装置の製造方法 |
JP2018078305A (ja) * | 2017-12-07 | 2018-05-17 | ソニー株式会社 | 固体撮像装置及び電子機器 |
JP7116591B2 (ja) * | 2018-05-18 | 2022-08-10 | キヤノン株式会社 | 撮像装置及びその製造方法 |
JP7034997B2 (ja) * | 2019-09-26 | 2022-03-14 | キヤノン株式会社 | 半導体デバイスおよび装置の製造方法 |
JP7001120B2 (ja) * | 2020-04-14 | 2022-01-19 | ソニーグループ株式会社 | 固体撮像装置及び電子機器 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6897477B2 (en) * | 2001-06-01 | 2005-05-24 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device, manufacturing method thereof, and display device |
JP4304927B2 (ja) * | 2002-07-16 | 2009-07-29 | ソニー株式会社 | 固体撮像素子及びその製造方法 |
US6984816B2 (en) * | 2003-08-13 | 2006-01-10 | Motorola, Inc. | Vertically integrated photosensor for CMOS imagers |
US6927432B2 (en) * | 2003-08-13 | 2005-08-09 | Motorola, Inc. | Vertically integrated photosensor for CMOS imagers |
US6809008B1 (en) * | 2003-08-28 | 2004-10-26 | Motorola, Inc. | Integrated photosensor for CMOS imagers |
US7214999B2 (en) * | 2003-10-31 | 2007-05-08 | Motorola, Inc. | Integrated photoserver for CMOS imagers |
FR2863773B1 (fr) * | 2003-12-12 | 2006-05-19 | Atmel Grenoble Sa | Procede de fabrication de puces electroniques en silicium aminci |
JP4432502B2 (ja) * | 2004-01-20 | 2010-03-17 | ソニー株式会社 | 半導体装置 |
JP4389626B2 (ja) * | 2004-03-29 | 2009-12-24 | ソニー株式会社 | 固体撮像素子の製造方法 |
US8049293B2 (en) * | 2005-03-07 | 2011-11-01 | Sony Corporation | Solid-state image pickup device, electronic apparatus using such solid-state image pickup device and method of manufacturing solid-state image pickup device |
FR2888043B1 (fr) * | 2005-07-01 | 2007-11-30 | Atmel Grenoble Soc Par Actions | Capteur d'image a galette de fibres optiques |
FR2895566B1 (fr) * | 2005-12-23 | 2008-04-18 | Atmel Grenoble Soc Par Actions | Capteur d'image aminci a plots de contact isoles par tranchee |
FR2910705B1 (fr) * | 2006-12-20 | 2009-02-27 | E2V Semiconductors Soc Par Act | Structure de plots de connexion pour capteur d'image sur substrat aminci |
US7528420B2 (en) * | 2007-05-23 | 2009-05-05 | Visera Technologies Company Limited | Image sensing devices and methods for fabricating the same |
-
2006
- 2006-12-20 FR FR0611082A patent/FR2910707B1/fr not_active Expired - Fee Related
-
2007
- 2007-12-11 JP JP2009541977A patent/JP5250911B2/ja not_active Expired - Fee Related
- 2007-12-11 US US12/518,456 patent/US8003433B2/en not_active Expired - Fee Related
- 2007-12-11 WO PCT/EP2007/063664 patent/WO2008074688A1/fr active Application Filing
-
2009
- 2009-07-17 FI FI20095796A patent/FI20095796A/fi not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
WO2008074688A1 (fr) | 2008-06-26 |
FR2910707B1 (fr) | 2009-06-12 |
JP2010514177A (ja) | 2010-04-30 |
FR2910707A1 (fr) | 2008-06-27 |
US8003433B2 (en) | 2011-08-23 |
US20090275165A1 (en) | 2009-11-05 |
JP5250911B2 (ja) | 2013-07-31 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM | Patent lapsed |